DE69908775D1 - Flüssige, strahlenhärtbare zusammensetzung insbesondere für stereolithographie - Google Patents

Flüssige, strahlenhärtbare zusammensetzung insbesondere für stereolithographie

Info

Publication number
DE69908775D1
DE69908775D1 DE69908775T DE69908775T DE69908775D1 DE 69908775 D1 DE69908775 D1 DE 69908775D1 DE 69908775 T DE69908775 T DE 69908775T DE 69908775 T DE69908775 T DE 69908775T DE 69908775 D1 DE69908775 D1 DE 69908775D1
Authority
DE
Germany
Prior art keywords
stereolithography
radiation
liquid
hardenable composition
provides
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69908775T
Other languages
English (en)
Other versions
DE69908775T2 (de
Inventor
Hsing Pang
Panayiotis Melisaris
Renyi Wang
Wai Fong
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3D Systems Inc
Original Assignee
Vantico GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=22000442&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69908775(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Vantico GmbH filed Critical Vantico GmbH
Application granted granted Critical
Publication of DE69908775D1 publication Critical patent/DE69908775D1/de
Publication of DE69908775T2 publication Critical patent/DE69908775T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • B33Y70/10—Composites of different types of material, e.g. mixtures of ceramics and polymers or mixtures of metals and biomaterials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Structural Engineering (AREA)
  • Civil Engineering (AREA)
  • Composite Materials (AREA)
  • Ceramic Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Optics & Photonics (AREA)
  • Epoxy Resins (AREA)
  • Polymerisation Methods In General (AREA)
DE69908775T 1998-04-06 1999-03-25 Flüssige, strahlenhärtbare zusammensetzung insbesondere für stereolithographie Expired - Lifetime DE69908775T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US55832 1998-04-06
US09/055,832 US6100007A (en) 1998-04-06 1998-04-06 Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures
PCT/EP1999/002033 WO1999052017A1 (en) 1998-04-06 1999-03-25 Liquid, radiation-curable composition, especially for stereolithography

Publications (2)

Publication Number Publication Date
DE69908775D1 true DE69908775D1 (de) 2003-07-17
DE69908775T2 DE69908775T2 (de) 2004-04-22

Family

ID=22000442

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69908775T Expired - Lifetime DE69908775T2 (de) 1998-04-06 1999-03-25 Flüssige, strahlenhärtbare zusammensetzung insbesondere für stereolithographie

Country Status (15)

Country Link
US (3) US6100007A (de)
EP (2) EP1327911B1 (de)
JP (1) JP4798846B2 (de)
KR (1) KR100608588B1 (de)
CN (2) CN1690855B (de)
AT (1) ATE242890T1 (de)
AU (1) AU748042B2 (de)
BR (1) BR9909404A (de)
CA (1) CA2325716C (de)
DE (1) DE69908775T2 (de)
IL (1) IL138449A0 (de)
MY (1) MY133766A (de)
TR (1) TR200002895T2 (de)
TW (1) TW593525B (de)
WO (1) WO1999052017A1 (de)

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US6989225B2 (en) * 2002-07-18 2006-01-24 3D Systems, Inc. Stereolithographic resins with high temperature and high impact resistance
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US7211368B2 (en) * 2003-01-07 2007-05-01 3 Birds, Inc. Stereolithography resins and methods
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US20040170923A1 (en) * 2003-02-27 2004-09-02 3D Systems, Inc. Colored stereolithographic resins
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Also Published As

Publication number Publication date
US6100007A (en) 2000-08-08
KR100608588B1 (ko) 2006-08-03
DE69908775T2 (de) 2004-04-22
CN1296578A (zh) 2001-05-23
CN1690855B (zh) 2010-06-16
TW593525B (en) 2004-06-21
ATE242890T1 (de) 2003-06-15
US6413696B1 (en) 2002-07-02
BR9909404A (pt) 2000-12-19
WO1999052017A1 (en) 1999-10-14
CA2325716C (en) 2007-05-15
EP1327911B1 (de) 2014-05-07
EP1086403B1 (de) 2003-06-11
KR20010042514A (ko) 2001-05-25
TR200002895T2 (tr) 2001-01-22
MY133766A (en) 2007-11-30
CN1273868C (zh) 2006-09-06
EP1327911A1 (de) 2003-07-16
US20020160309A1 (en) 2002-10-31
CA2325716A1 (en) 1999-10-14
AU3599399A (en) 1999-10-25
IL138449A0 (en) 2001-10-31
JP2002510748A (ja) 2002-04-09
JP4798846B2 (ja) 2011-10-19
AU748042B2 (en) 2002-05-30
CN1690855A (zh) 2005-11-02
EP1086403A1 (de) 2001-03-28

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