DE69835752D1 - Profilierungssystem mit verteiltem widerstand - Google Patents

Profilierungssystem mit verteiltem widerstand

Info

Publication number
DE69835752D1
DE69835752D1 DE69835752T DE69835752T DE69835752D1 DE 69835752 D1 DE69835752 D1 DE 69835752D1 DE 69835752 T DE69835752 T DE 69835752T DE 69835752 T DE69835752 T DE 69835752T DE 69835752 D1 DE69835752 D1 DE 69835752D1
Authority
DE
Germany
Prior art keywords
probe
profiling
profiling system
distributed resistance
specimens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69835752T
Other languages
English (en)
Other versions
DE69835752T2 (de
Inventor
Robert Mazur
Robert C Stephenson
Mark Andy
Catherine L Hartford
John R Rogers
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Solid State Measurements Inc
Original Assignee
Solid State Measurements Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Solid State Measurements Inc filed Critical Solid State Measurements Inc
Application granted granted Critical
Publication of DE69835752D1 publication Critical patent/DE69835752D1/de
Publication of DE69835752T2 publication Critical patent/DE69835752T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/282Testing of electronic circuits specially adapted for particular applications not provided for elsewhere
    • G01R31/2831Testing of materials or semi-finished products, e.g. semiconductor wafers or substrates
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/06705Apparatus for holding or moving single probes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R27/00Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
    • G01R27/02Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
DE69835752T 1997-07-11 1998-07-10 Profilierungssystem mit verteiltem widerstand Expired - Fee Related DE69835752T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/890,775 US6052653A (en) 1997-07-11 1997-07-11 Spreading resistance profiling system
US890775 1997-07-11
PCT/US1998/014353 WO1999002999A1 (en) 1997-07-11 1998-07-10 Spreading resistance profiling system

Publications (2)

Publication Number Publication Date
DE69835752D1 true DE69835752D1 (de) 2006-10-12
DE69835752T2 DE69835752T2 (de) 2007-09-20

Family

ID=25397129

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69835752T Expired - Fee Related DE69835752T2 (de) 1997-07-11 1998-07-10 Profilierungssystem mit verteiltem widerstand

Country Status (8)

Country Link
US (1) US6052653A (de)
EP (1) EP1000363B1 (de)
JP (1) JP2003531469A (de)
AT (1) ATE338279T1 (de)
AU (1) AU8299098A (de)
DE (1) DE69835752T2 (de)
TW (1) TW371321B (de)
WO (1) WO1999002999A1 (de)

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US5914613A (en) 1996-08-08 1999-06-22 Cascade Microtech, Inc. Membrane probing system with local contact scrub
US5952833A (en) * 1997-03-07 1999-09-14 Micron Technology, Inc. Programmable voltage divider and method for testing the impedance of a programmable element
US6256882B1 (en) 1998-07-14 2001-07-10 Cascade Microtech, Inc. Membrane probing system
US6215127B1 (en) * 1999-03-08 2001-04-10 Advanced Micro Devices, Inc. Method of using critical dimension mapping to qualify a new integrated circuit fabrication tool set
US6259262B1 (en) * 1999-03-10 2001-07-10 Delware Capital Formation, Inc. Camera system for automated verification and repair station
US6445202B1 (en) 1999-06-30 2002-09-03 Cascade Microtech, Inc. Probe station thermal chuck with shielding for capacitive current
WO2001013347A1 (fr) * 1999-08-17 2001-02-22 Advantest Corporation Adaptateur de commande d'instrument de mesure, instrument de mesure, systeme de commande d'instrument de mesure, procede d'execution de mesure et support enregistre
US6848168B1 (en) * 1999-08-20 2005-02-01 Seagate Technology Llc Method for controlling installation of a head stack assembly
EP1146376A1 (de) * 2000-04-12 2001-10-17 Triple-O Microscopy GmbH Verfahren und Vorrichtung zur kontrollierten Bearbeitung von Abtastsonden
US6914423B2 (en) 2000-09-05 2005-07-05 Cascade Microtech, Inc. Probe station
US6965226B2 (en) 2000-09-05 2005-11-15 Cascade Microtech, Inc. Chuck for holding a device under test
DE20114544U1 (de) 2000-12-04 2002-02-21 Cascade Microtech Inc Wafersonde
US6845345B1 (en) * 2001-02-06 2005-01-18 Advanced Micro Devices, Inc. System for monitoring and analyzing diagnostic data of spin tracks
WO2003052435A1 (en) 2001-08-21 2003-06-26 Cascade Microtech, Inc. Membrane probing system
DE10155020B4 (de) * 2001-10-31 2006-06-01 IHP GmbH - Innovations for High Performance Microelectronics/Institut für innovative Mikroelektronik Referenzprobe zur quantitativen Bestimmung von Oberflächenkontaminationen und Verfahren zu ihrer Herstellung
DE10156210A1 (de) * 2001-11-15 2003-06-05 Infineon Technologies Ag Prüfanordnung zur messtechnischen Untersuchung einesPrüfobjektes, insbesondere in Form einer integrierten Schaltung
US7057404B2 (en) 2003-05-23 2006-06-06 Sharp Laboratories Of America, Inc. Shielded probe for testing a device under test
US7492172B2 (en) 2003-05-23 2009-02-17 Cascade Microtech, Inc. Chuck for holding a device under test
US7250626B2 (en) 2003-10-22 2007-07-31 Cascade Microtech, Inc. Probe testing structure
US7187188B2 (en) 2003-12-24 2007-03-06 Cascade Microtech, Inc. Chuck with integrated wafer support
JP2007517231A (ja) 2003-12-24 2007-06-28 カスケード マイクロテック インコーポレイテッド アクティブ・ウェハプローブ
DE202005021435U1 (de) 2004-09-13 2008-02-28 Cascade Microtech, Inc., Beaverton Doppelseitige Prüfaufbauten
US7656172B2 (en) 2005-01-31 2010-02-02 Cascade Microtech, Inc. System for testing semiconductors
US7535247B2 (en) 2005-01-31 2009-05-19 Cascade Microtech, Inc. Interface for testing semiconductors
US7403028B2 (en) 2006-06-12 2008-07-22 Cascade Microtech, Inc. Test structure and probe for differential signals
US7764072B2 (en) 2006-06-12 2010-07-27 Cascade Microtech, Inc. Differential signal probing system
US7723999B2 (en) 2006-06-12 2010-05-25 Cascade Microtech, Inc. Calibration structures for differential signal probing
US7876114B2 (en) 2007-08-08 2011-01-25 Cascade Microtech, Inc. Differential waveguide probe
US7888957B2 (en) 2008-10-06 2011-02-15 Cascade Microtech, Inc. Probing apparatus with impedance optimized interface
US8410806B2 (en) 2008-11-21 2013-04-02 Cascade Microtech, Inc. Replaceable coupon for a probing apparatus
US8319503B2 (en) 2008-11-24 2012-11-27 Cascade Microtech, Inc. Test apparatus for measuring a characteristic of a device under test
FR2985812B1 (fr) * 2012-01-16 2014-02-07 Soitec Silicon On Insulator Procede et dispositif de test de substrats semi-conducteurs pour applications radiofrequences
CN104377144B (zh) * 2014-10-30 2017-06-06 上海华虹宏力半导体制造有限公司 狭长图形的srp分析方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE759342A (fr) * 1969-11-24 1971-05-24 Westinghouse Electric Corp Appareil et methode pour la determination automatique de la resistance d'etalement, la resistivite et la concentration d'impuretes dans des corps semi-conducteurs
US4845552A (en) * 1987-08-20 1989-07-04 Bruno Jaggi Quantitative light microscope using a solid state detector in the primary image plane
US4966520A (en) * 1988-11-02 1990-10-30 Tokyo Electron Limited Method of positioning objects to be measured
JP2555775B2 (ja) * 1990-11-28 1996-11-20 富士通株式会社 荷電粒子ビーム偏向装置およびその製造方法
JPH04312939A (ja) * 1990-12-28 1992-11-04 Tokyo Electron Ltd プローブ装置
US5347226A (en) * 1992-11-16 1994-09-13 National Semiconductor Corporation Array spreading resistance probe (ASRP) method for profile extraction from semiconductor chips of cellular construction
US5644245A (en) * 1993-11-24 1997-07-01 Tokyo Electron Limited Probe apparatus for inspecting electrical characteristics of a microelectronic element
JP3787185B2 (ja) * 1995-04-28 2006-06-21 アヴェンティス・リサーチ・ウント・テクノロジーズ・ゲーエムベーハー・ウント・コー・カーゲー 配線基板の配線の欠陥を検出する装置
US5726907A (en) * 1995-07-31 1998-03-10 Southwest Research Institute Biaxial non-contacting strain measurement using machine vision

Also Published As

Publication number Publication date
WO1999002999A1 (en) 1999-01-21
ATE338279T1 (de) 2006-09-15
DE69835752T2 (de) 2007-09-20
EP1000363A1 (de) 2000-05-17
US6052653A (en) 2000-04-18
EP1000363A4 (de) 2004-04-14
JP2003531469A (ja) 2003-10-21
AU8299098A (en) 1999-02-08
EP1000363B1 (de) 2006-08-30
TW371321B (en) 1999-10-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee