DE69835752D1 - Profilierungssystem mit verteiltem widerstand - Google Patents
Profilierungssystem mit verteiltem widerstandInfo
- Publication number
- DE69835752D1 DE69835752D1 DE69835752T DE69835752T DE69835752D1 DE 69835752 D1 DE69835752 D1 DE 69835752D1 DE 69835752 T DE69835752 T DE 69835752T DE 69835752 T DE69835752 T DE 69835752T DE 69835752 D1 DE69835752 D1 DE 69835752D1
- Authority
- DE
- Germany
- Prior art keywords
- probe
- profiling
- profiling system
- distributed resistance
- specimens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/282—Testing of electronic circuits specially adapted for particular applications not provided for elsewhere
- G01R31/2831—Testing of materials or semi-finished products, e.g. semiconductor wafers or substrates
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/06705—Apparatus for holding or moving single probes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
- G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/890,775 US6052653A (en) | 1997-07-11 | 1997-07-11 | Spreading resistance profiling system |
US890775 | 1997-07-11 | ||
PCT/US1998/014353 WO1999002999A1 (en) | 1997-07-11 | 1998-07-10 | Spreading resistance profiling system |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69835752D1 true DE69835752D1 (de) | 2006-10-12 |
DE69835752T2 DE69835752T2 (de) | 2007-09-20 |
Family
ID=25397129
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69835752T Expired - Fee Related DE69835752T2 (de) | 1997-07-11 | 1998-07-10 | Profilierungssystem mit verteiltem widerstand |
Country Status (8)
Country | Link |
---|---|
US (1) | US6052653A (de) |
EP (1) | EP1000363B1 (de) |
JP (1) | JP2003531469A (de) |
AT (1) | ATE338279T1 (de) |
AU (1) | AU8299098A (de) |
DE (1) | DE69835752T2 (de) |
TW (1) | TW371321B (de) |
WO (1) | WO1999002999A1 (de) |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5914613A (en) | 1996-08-08 | 1999-06-22 | Cascade Microtech, Inc. | Membrane probing system with local contact scrub |
US5952833A (en) * | 1997-03-07 | 1999-09-14 | Micron Technology, Inc. | Programmable voltage divider and method for testing the impedance of a programmable element |
US6256882B1 (en) | 1998-07-14 | 2001-07-10 | Cascade Microtech, Inc. | Membrane probing system |
US6215127B1 (en) * | 1999-03-08 | 2001-04-10 | Advanced Micro Devices, Inc. | Method of using critical dimension mapping to qualify a new integrated circuit fabrication tool set |
US6259262B1 (en) * | 1999-03-10 | 2001-07-10 | Delware Capital Formation, Inc. | Camera system for automated verification and repair station |
US6445202B1 (en) | 1999-06-30 | 2002-09-03 | Cascade Microtech, Inc. | Probe station thermal chuck with shielding for capacitive current |
DE10082824T1 (de) * | 1999-08-17 | 2002-02-28 | Advantest Corp | Adapter zum Steuern einer Meßvorrichtung, eine Meßvorrichtung, eine Steuervorrichtung für eine Meßvorrichtung, ein Verfahren zum Verarbeiten der Messung und ein Aufzeichnungsmedium |
US6848168B1 (en) * | 1999-08-20 | 2005-02-01 | Seagate Technology Llc | Method for controlling installation of a head stack assembly |
EP1146376A1 (de) * | 2000-04-12 | 2001-10-17 | Triple-O Microscopy GmbH | Verfahren und Vorrichtung zur kontrollierten Bearbeitung von Abtastsonden |
US6965226B2 (en) | 2000-09-05 | 2005-11-15 | Cascade Microtech, Inc. | Chuck for holding a device under test |
US6914423B2 (en) | 2000-09-05 | 2005-07-05 | Cascade Microtech, Inc. | Probe station |
DE10143173A1 (de) | 2000-12-04 | 2002-06-06 | Cascade Microtech Inc | Wafersonde |
US6845345B1 (en) * | 2001-02-06 | 2005-01-18 | Advanced Micro Devices, Inc. | System for monitoring and analyzing diagnostic data of spin tracks |
AU2002327490A1 (en) | 2001-08-21 | 2003-06-30 | Cascade Microtech, Inc. | Membrane probing system |
DE10155020B4 (de) * | 2001-10-31 | 2006-06-01 | IHP GmbH - Innovations for High Performance Microelectronics/Institut für innovative Mikroelektronik | Referenzprobe zur quantitativen Bestimmung von Oberflächenkontaminationen und Verfahren zu ihrer Herstellung |
DE10156210A1 (de) * | 2001-11-15 | 2003-06-05 | Infineon Technologies Ag | Prüfanordnung zur messtechnischen Untersuchung einesPrüfobjektes, insbesondere in Form einer integrierten Schaltung |
US7492172B2 (en) | 2003-05-23 | 2009-02-17 | Cascade Microtech, Inc. | Chuck for holding a device under test |
US7057404B2 (en) | 2003-05-23 | 2006-06-06 | Sharp Laboratories Of America, Inc. | Shielded probe for testing a device under test |
US7250626B2 (en) | 2003-10-22 | 2007-07-31 | Cascade Microtech, Inc. | Probe testing structure |
US7187188B2 (en) | 2003-12-24 | 2007-03-06 | Cascade Microtech, Inc. | Chuck with integrated wafer support |
US7427868B2 (en) | 2003-12-24 | 2008-09-23 | Cascade Microtech, Inc. | Active wafer probe |
US7420381B2 (en) | 2004-09-13 | 2008-09-02 | Cascade Microtech, Inc. | Double sided probing structures |
US7656172B2 (en) | 2005-01-31 | 2010-02-02 | Cascade Microtech, Inc. | System for testing semiconductors |
US7535247B2 (en) | 2005-01-31 | 2009-05-19 | Cascade Microtech, Inc. | Interface for testing semiconductors |
US7723999B2 (en) | 2006-06-12 | 2010-05-25 | Cascade Microtech, Inc. | Calibration structures for differential signal probing |
US7403028B2 (en) | 2006-06-12 | 2008-07-22 | Cascade Microtech, Inc. | Test structure and probe for differential signals |
US7764072B2 (en) | 2006-06-12 | 2010-07-27 | Cascade Microtech, Inc. | Differential signal probing system |
US7876114B2 (en) | 2007-08-08 | 2011-01-25 | Cascade Microtech, Inc. | Differential waveguide probe |
US7888957B2 (en) | 2008-10-06 | 2011-02-15 | Cascade Microtech, Inc. | Probing apparatus with impedance optimized interface |
US8410806B2 (en) | 2008-11-21 | 2013-04-02 | Cascade Microtech, Inc. | Replaceable coupon for a probing apparatus |
US8319503B2 (en) | 2008-11-24 | 2012-11-27 | Cascade Microtech, Inc. | Test apparatus for measuring a characteristic of a device under test |
FR2985812B1 (fr) * | 2012-01-16 | 2014-02-07 | Soitec Silicon On Insulator | Procede et dispositif de test de substrats semi-conducteurs pour applications radiofrequences |
CN104377144B (zh) * | 2014-10-30 | 2017-06-06 | 上海华虹宏力半导体制造有限公司 | 狭长图形的srp分析方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE759342A (fr) * | 1969-11-24 | 1971-05-24 | Westinghouse Electric Corp | Appareil et methode pour la determination automatique de la resistance d'etalement, la resistivite et la concentration d'impuretes dans des corps semi-conducteurs |
US4845552A (en) * | 1987-08-20 | 1989-07-04 | Bruno Jaggi | Quantitative light microscope using a solid state detector in the primary image plane |
US4966520A (en) * | 1988-11-02 | 1990-10-30 | Tokyo Electron Limited | Method of positioning objects to be measured |
JP2555775B2 (ja) * | 1990-11-28 | 1996-11-20 | 富士通株式会社 | 荷電粒子ビーム偏向装置およびその製造方法 |
JPH04312939A (ja) * | 1990-12-28 | 1992-11-04 | Tokyo Electron Ltd | プローブ装置 |
US5347226A (en) * | 1992-11-16 | 1994-09-13 | National Semiconductor Corporation | Array spreading resistance probe (ASRP) method for profile extraction from semiconductor chips of cellular construction |
US5644245A (en) * | 1993-11-24 | 1997-07-01 | Tokyo Electron Limited | Probe apparatus for inspecting electrical characteristics of a microelectronic element |
JP3787185B2 (ja) * | 1995-04-28 | 2006-06-21 | アヴェンティス・リサーチ・ウント・テクノロジーズ・ゲーエムベーハー・ウント・コー・カーゲー | 配線基板の配線の欠陥を検出する装置 |
US5726907A (en) * | 1995-07-31 | 1998-03-10 | Southwest Research Institute | Biaxial non-contacting strain measurement using machine vision |
-
1997
- 1997-07-11 US US08/890,775 patent/US6052653A/en not_active Expired - Lifetime
-
1998
- 1998-07-03 TW TW087110782A patent/TW371321B/zh not_active IP Right Cessation
- 1998-07-10 EP EP98933325A patent/EP1000363B1/de not_active Expired - Lifetime
- 1998-07-10 JP JP2000502428A patent/JP2003531469A/ja active Pending
- 1998-07-10 AU AU82990/98A patent/AU8299098A/en not_active Abandoned
- 1998-07-10 WO PCT/US1998/014353 patent/WO1999002999A1/en active IP Right Grant
- 1998-07-10 AT AT98933325T patent/ATE338279T1/de not_active IP Right Cessation
- 1998-07-10 DE DE69835752T patent/DE69835752T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
WO1999002999A1 (en) | 1999-01-21 |
TW371321B (en) | 1999-10-01 |
EP1000363B1 (de) | 2006-08-30 |
JP2003531469A (ja) | 2003-10-21 |
ATE338279T1 (de) | 2006-09-15 |
EP1000363A4 (de) | 2004-04-14 |
DE69835752T2 (de) | 2007-09-20 |
AU8299098A (en) | 1999-02-08 |
US6052653A (en) | 2000-04-18 |
EP1000363A1 (de) | 2000-05-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |