DE69827789D1 - Verfahren zum herstellen von einem photolithographisch gemusterten kunststoffpolierkissen - Google Patents

Verfahren zum herstellen von einem photolithographisch gemusterten kunststoffpolierkissen

Info

Publication number
DE69827789D1
DE69827789D1 DE69827789T DE69827789T DE69827789D1 DE 69827789 D1 DE69827789 D1 DE 69827789D1 DE 69827789 T DE69827789 T DE 69827789T DE 69827789 T DE69827789 T DE 69827789T DE 69827789 D1 DE69827789 D1 DE 69827789D1
Authority
DE
Germany
Prior art keywords
producing
photolithographically patterned
patterned plastic
polishing cushion
plastic polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69827789T
Other languages
English (en)
Other versions
DE69827789T2 (de
Inventor
Melbourne Cook
B James
G Chechik
D Budinger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rodel Inc
Original Assignee
Rodel Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rodel Inc filed Critical Rodel Inc
Publication of DE69827789D1 publication Critical patent/DE69827789D1/de
Application granted granted Critical
Publication of DE69827789T2 publication Critical patent/DE69827789T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
DE69827789T 1997-01-13 1998-01-12 Verfahren zum herstellen von einem photolithographisch gemusterten kunststoffpolierkissen Expired - Lifetime DE69827789T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US3449297P 1997-01-13 1997-01-13
US34492P 1997-01-13
PCT/US1998/000317 WO1998030356A1 (en) 1997-01-13 1998-01-12 Polymeric polishing pad having photolithographically induced surface pattern(s) and methods relating thereto

Publications (2)

Publication Number Publication Date
DE69827789D1 true DE69827789D1 (de) 2004-12-30
DE69827789T2 DE69827789T2 (de) 2005-11-10

Family

ID=21876756

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69827789T Expired - Lifetime DE69827789T2 (de) 1997-01-13 1998-01-12 Verfahren zum herstellen von einem photolithographisch gemusterten kunststoffpolierkissen

Country Status (6)

Country Link
US (2) US6036579A (de)
EP (1) EP0984846B1 (de)
JP (1) JP4163756B2 (de)
KR (1) KR100487455B1 (de)
DE (1) DE69827789T2 (de)
WO (1) WO1998030356A1 (de)

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US9993907B2 (en) * 2013-12-20 2018-06-12 Applied Materials, Inc. Printed chemical mechanical polishing pad having printed window
US9873180B2 (en) * 2014-10-17 2018-01-23 Applied Materials, Inc. CMP pad construction with composite material properties using additive manufacturing processes
US11745302B2 (en) 2014-10-17 2023-09-05 Applied Materials, Inc. Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process
US10875145B2 (en) 2014-10-17 2020-12-29 Applied Materials, Inc. Polishing pads produced by an additive manufacturing process
US10399201B2 (en) 2014-10-17 2019-09-03 Applied Materials, Inc. Advanced polishing pads having compositional gradients by use of an additive manufacturing process
SG11201703114QA (en) 2014-10-17 2017-06-29 Applied Materials Inc Cmp pad construction with composite material properties using additive manufacturing processes
US10821573B2 (en) 2014-10-17 2020-11-03 Applied Materials, Inc. Polishing pads produced by an additive manufacturing process
US9776361B2 (en) 2014-10-17 2017-10-03 Applied Materials, Inc. Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles
US10875153B2 (en) 2014-10-17 2020-12-29 Applied Materials, Inc. Advanced polishing pad materials and formulations
CN113103145B (zh) * 2015-10-30 2023-04-11 应用材料公司 形成具有期望ζ电位的抛光制品的设备与方法
US10391605B2 (en) 2016-01-19 2019-08-27 Applied Materials, Inc. Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process
US10773509B2 (en) * 2016-03-09 2020-09-15 Applied Materials, Inc. Pad structure and fabrication methods
US20180304539A1 (en) 2017-04-21 2018-10-25 Applied Materials, Inc. Energy delivery system with array of energy sources for an additive manufacturing apparatus
US11471999B2 (en) 2017-07-26 2022-10-18 Applied Materials, Inc. Integrated abrasive polishing pads and manufacturing methods
US11072050B2 (en) 2017-08-04 2021-07-27 Applied Materials, Inc. Polishing pad with window and manufacturing methods thereof
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TWI779275B (zh) 2020-03-31 2022-10-01 望隼科技股份有限公司 防藍光隱形眼鏡、其組合物及製備方法
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Also Published As

Publication number Publication date
JP2001507997A (ja) 2001-06-19
US6036579A (en) 2000-03-14
JP4163756B2 (ja) 2008-10-08
EP0984846A1 (de) 2000-03-15
KR100487455B1 (ko) 2005-05-09
EP0984846B1 (de) 2004-11-24
EP0984846A4 (de) 2000-03-15
US6210254B1 (en) 2001-04-03
KR20000070068A (ko) 2000-11-25
WO1998030356A1 (en) 1998-07-16
DE69827789T2 (de) 2005-11-10

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