DE69804614T2 - Scheibenanordnung für gasinjektion bei cvd anwendungen - Google Patents

Scheibenanordnung für gasinjektion bei cvd anwendungen

Info

Publication number
DE69804614T2
DE69804614T2 DE69804614T DE69804614T DE69804614T2 DE 69804614 T2 DE69804614 T2 DE 69804614T2 DE 69804614 T DE69804614 T DE 69804614T DE 69804614 T DE69804614 T DE 69804614T DE 69804614 T2 DE69804614 T2 DE 69804614T2
Authority
DE
Germany
Prior art keywords
gas injection
disc arrangement
cvd applications
cvd
applications
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69804614T
Other languages
English (en)
Other versions
DE69804614D1 (de
Inventor
George Quirk
V Raney
Scott Heuser
B Shepard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Ceramics and Plastics Inc
Original Assignee
Saint Gobain Norton Industrial Ceramics Corp
Saint Gobain Industrial Ceramics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain Norton Industrial Ceramics Corp, Saint Gobain Industrial Ceramics Inc filed Critical Saint Gobain Norton Industrial Ceramics Corp
Publication of DE69804614D1 publication Critical patent/DE69804614D1/de
Application granted granted Critical
Publication of DE69804614T2 publication Critical patent/DE69804614T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/4558—Perforated rings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
DE69804614T 1997-06-26 1998-06-22 Scheibenanordnung für gasinjektion bei cvd anwendungen Expired - Fee Related DE69804614T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/883,020 US5846330A (en) 1997-06-26 1997-06-26 Gas injection disc assembly for CVD applications
PCT/US1998/013037 WO1999000533A1 (en) 1997-06-26 1998-06-22 Gas injection disc assembly for cvd applications

Publications (2)

Publication Number Publication Date
DE69804614D1 DE69804614D1 (de) 2002-05-08
DE69804614T2 true DE69804614T2 (de) 2002-11-21

Family

ID=25381825

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69804614T Expired - Fee Related DE69804614T2 (de) 1997-06-26 1998-06-22 Scheibenanordnung für gasinjektion bei cvd anwendungen

Country Status (6)

Country Link
US (1) US5846330A (de)
EP (1) EP0991792B1 (de)
JP (1) JP2002508808A (de)
CA (1) CA2295180C (de)
DE (1) DE69804614T2 (de)
WO (1) WO1999000533A1 (de)

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US7906393B2 (en) * 2004-01-28 2011-03-15 Micron Technology, Inc. Methods for forming small-scale capacitor structures
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US20070048456A1 (en) * 2004-09-14 2007-03-01 Keshner Marvin S Plasma enhanced chemical vapor deposition apparatus and method
US7679024B2 (en) * 2005-12-23 2010-03-16 Lam Research Corporation Highly efficient gas distribution arrangement for plasma tube of a plasma processing chamber
US7562638B2 (en) * 2005-12-23 2009-07-21 Lam Research Corporation Methods and arrangement for implementing highly efficient plasma traps
US7554053B2 (en) * 2005-12-23 2009-06-30 Lam Research Corporation Corrugated plasma trap arrangement for creating a highly efficient downstream microwave plasma system
US20080139003A1 (en) * 2006-10-26 2008-06-12 Shahid Pirzada Barrier coating deposition for thin film devices using plasma enhanced chemical vapor deposition process
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US8291857B2 (en) 2008-07-03 2012-10-23 Applied Materials, Inc. Apparatuses and methods for atomic layer deposition
TWI385042B (zh) * 2009-06-26 2013-02-11 Iner Aec Executive Yuan 多氣式混合器與電漿火炬的混合氣供氣裝置
KR101810532B1 (ko) * 2010-03-12 2017-12-19 어플라이드 머티어리얼스, 인코포레이티드 다중 인젝트를 이용하는 원자 층 증착 챔버
US9574268B1 (en) 2011-10-28 2017-02-21 Asm America, Inc. Pulsed valve manifold for atomic layer deposition
CA2910086C (en) * 2012-04-30 2021-01-26 Eigen Systems Limited Clamp foot air jet apparatus
KR102104018B1 (ko) 2013-03-12 2020-04-23 어플라이드 머티어리얼스, 인코포레이티드 방위각 및 방사상 분배 제어되는 다중-구역 가스 주입 조립체
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US10113232B2 (en) 2014-07-31 2018-10-30 Lam Research Corporation Azimuthal mixer
US9951421B2 (en) * 2014-12-10 2018-04-24 Lam Research Corporation Inlet for effective mixing and purging
US10662527B2 (en) 2016-06-01 2020-05-26 Asm Ip Holding B.V. Manifolds for uniform vapor deposition
CN113196444A (zh) * 2018-12-20 2021-07-30 应用材料公司 用于供应改良的气流至处理腔室的处理空间的方法和设备
US11492701B2 (en) 2019-03-19 2022-11-08 Asm Ip Holding B.V. Reactor manifolds
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Also Published As

Publication number Publication date
WO1999000533A1 (en) 1999-01-07
EP0991792A1 (de) 2000-04-12
DE69804614D1 (de) 2002-05-08
CA2295180C (en) 2003-11-04
CA2295180A1 (en) 1999-01-07
JP2002508808A (ja) 2002-03-19
EP0991792B1 (de) 2002-04-03
US5846330A (en) 1998-12-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee