DE69801032D1 - Verfahren zur Beschichtung eines Gegenstandes mit einem Polysilsesquioxan - Google Patents

Verfahren zur Beschichtung eines Gegenstandes mit einem Polysilsesquioxan

Info

Publication number
DE69801032D1
DE69801032D1 DE69801032T DE69801032T DE69801032D1 DE 69801032 D1 DE69801032 D1 DE 69801032D1 DE 69801032 T DE69801032 T DE 69801032T DE 69801032 T DE69801032 T DE 69801032T DE 69801032 D1 DE69801032 D1 DE 69801032D1
Authority
DE
Germany
Prior art keywords
polysilsesquioxane
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69801032T
Other languages
English (en)
Other versions
DE69801032T2 (de
Inventor
Jerry Rodolfo Bautista
Valerie Jeanne Kuck
Edwin Arthur Chandross
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nokia of America Corp
Original Assignee
Lucent Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lucent Technologies Inc filed Critical Lucent Technologies Inc
Publication of DE69801032D1 publication Critical patent/DE69801032D1/de
Application granted granted Critical
Publication of DE69801032T2 publication Critical patent/DE69801032T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C03C17/30Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C25/00Surface treatment of fibres or filaments made from glass, minerals or slags
    • C03C25/10Coating
    • C03C25/104Coating to obtain optical fibres
    • C03C25/105Organic claddings
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C25/00Surface treatment of fibres or filaments made from glass, minerals or slags
    • C03C25/10Coating
    • C03C25/104Coating to obtain optical fibres
    • C03C25/106Single coatings
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C25/00Surface treatment of fibres or filaments made from glass, minerals or slags
    • C03C25/10Coating
    • C03C25/24Coatings containing organic materials
    • C03C25/40Organo-silicon compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/04Oxygen-containing compounds
    • C08K5/07Aldehydes; Ketones
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/49Phosphorus-containing compounds
    • C08K5/51Phosphorus bound to oxygen
    • C08K5/53Phosphorus bound to oxygen bound to oxygen and to carbon only
    • C08K5/5317Phosphonic compounds, e.g. R—P(:O)(OR')2
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/249921Web or sheet containing structurally defined element or component
    • Y10T428/249953Composite having voids in a component [e.g., porous, cellular, etc.]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/29Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2913Rod, strand, filament or fiber
    • Y10T428/2933Coated or with bond, impregnation or core
    • Y10T428/2962Silane, silicone or siloxane in coating
DE1998601032 1997-09-09 1998-09-01 Verfahren zur Beschichtung eines Gegenstandes mit einem Polysilsesquioxan Expired - Lifetime DE69801032T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/926,210 US5962067A (en) 1997-09-09 1997-09-09 Method for coating an article with a ladder siloxane polymer and coated article

Publications (2)

Publication Number Publication Date
DE69801032D1 true DE69801032D1 (de) 2001-08-09
DE69801032T2 DE69801032T2 (de) 2002-06-06

Family

ID=25452899

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1998601032 Expired - Lifetime DE69801032T2 (de) 1997-09-09 1998-09-01 Verfahren zur Beschichtung eines Gegenstandes mit einem Polysilsesquioxan

Country Status (4)

Country Link
US (2) US5962067A (de)
EP (3) EP1111019A3 (de)
JP (1) JP3481467B2 (de)
DE (1) DE69801032T2 (de)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5962067A (en) * 1997-09-09 1999-10-05 Lucent Technologies Inc. Method for coating an article with a ladder siloxane polymer and coated article
US6268457B1 (en) 1999-06-10 2001-07-31 Allied Signal, Inc. Spin-on glass anti-reflective coatings for photolithography
CA2374944A1 (en) * 1999-06-10 2000-12-21 Nigel Hacker Spin-on-glass anti-reflective coatings for photolithography
KR100371070B1 (ko) * 1999-12-02 2003-02-05 한국과학기술연구원 폴리지방족방향족실세스퀴옥산 및 그의 제조 방법
KR20000063142A (ko) * 2000-02-17 2000-11-06 이응찬 폴리오르가노실세스키옥산 제조용 출발물질,폴리오르가노실세스키옥산 및 폴리오르가노실세스키옥산제조방법
US6891237B1 (en) * 2000-06-27 2005-05-10 Lucent Technologies Inc. Organic semiconductor device having an active dielectric layer comprising silsesquioxanes
US6368400B1 (en) * 2000-07-17 2002-04-09 Honeywell International Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography
US6599995B2 (en) * 2001-05-01 2003-07-29 Korea Institute Of Science And Technology Polyalkylaromaticsilsesquioxane and preparation method thereof
US6856745B2 (en) * 2002-07-02 2005-02-15 Lucent Technologies Inc. Waveguide and applications therefor
US6842577B2 (en) * 2002-12-02 2005-01-11 Shipley Company L.L.C. Photoimageable waveguide composition and waveguide formed therefrom
US7041748B2 (en) * 2003-01-08 2006-05-09 International Business Machines Corporation Patternable low dielectric constant materials and their use in ULSI interconnection
US20060004169A1 (en) * 2003-01-10 2006-01-05 Sherwood Walter J Jr Ceramic-forming polymer material
WO2004078866A1 (en) * 2003-03-07 2004-09-16 Henkel Corporation Curable coating compositions
US7297731B2 (en) 2003-03-11 2007-11-20 3M Innovative Properties Company Coating dispersions for optical fibers
US20050069718A1 (en) * 2003-09-30 2005-03-31 Voss-Kehl Jessica L. Printable insulating compositions and printable articles
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
JP5102428B2 (ja) * 2003-11-25 2012-12-19 ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. 導波路組成物およびこれから形成された導波路
US7072564B2 (en) * 2003-11-25 2006-07-04 Rohm And Haas Electronic Materials Llc Waveguide compositions and waveguides formed therefrom
DE602005014984D1 (de) * 2004-04-14 2009-07-30 Rohm & Haas Elect Mat Zusammensetzungen für Wellenleiter und daraus hergestellte Wellenleiter
US8901268B2 (en) 2004-08-03 2014-12-02 Ahila Krishnamoorthy Compositions, layers and films for optoelectronic devices, methods of production and uses thereof
US20080088051A1 (en) * 2006-10-16 2008-04-17 Robert Harvey Moffett Rotational molding paint-ready polyurethane
KR100834351B1 (ko) * 2006-11-24 2008-06-02 제일모직주식회사 멀티칩 패키지 밀봉용 에폭시 수지 조성물 및 이를이용한 멀티칩 패키지
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US8026035B2 (en) * 2007-03-30 2011-09-27 Cheil Industries, Inc. Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same
JP2009215344A (ja) * 2008-03-07 2009-09-24 Central Glass Co Ltd 熱硬化性有機無機ハイブリッド透明材料
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US20140039089A1 (en) * 2011-03-31 2014-02-06 Dow Corning Corporation Compositions Containing Phosphonate Catalysts And Methods For The Preparation And Use Of The Compositions
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US8871425B2 (en) * 2012-02-09 2014-10-28 Az Electronic Materials (Luxembourg) S.A.R.L. Low dielectric photoimageable compositions and electronic devices made therefrom
US9765190B2 (en) * 2014-01-31 2017-09-19 Sumitomo Chemical Company, Limited Polysilsesquioxane based encapsulating material composition for UV-LED and use of phosphoric acid based catalyst therefor
US10655034B2 (en) 2014-07-29 2020-05-19 Ofs Fitel, Llc UV-curable silsesquioxane-containing write-through optical fiber coatings for fabrication of optical fiber Bragg gratings, and fibers made therefrom
CN107709614B (zh) * 2015-03-31 2019-08-09 日本帕卡濑精株式会社 金属材料用表面处理剂和带表面处理被膜的金属材料
EP3194502A4 (de) 2015-04-13 2018-05-16 Honeywell International Inc. Polysiloxanformulierungen und beschichtungen für optoelektronische anwendungen
WO2018142552A1 (ja) * 2017-02-02 2018-08-09 日立化成株式会社 繊維処理用の処理剤、繊維及びその製造方法並びに繊維シートの製造方法
IT201700089398A1 (it) 2017-08-03 2019-02-03 Freni Brembo Spa Preforma per la realizzazione di un componente di impianto frenante, costituita in un materiale composito ceramico fibro-rinforzato ottenuto per formatura e pirolisi di un pre-preg
US11015082B2 (en) 2017-12-19 2021-05-25 Honeywell International Inc. Crack-resistant polysiloxane dielectric planarizing compositions, methods and films
US10947412B2 (en) 2017-12-19 2021-03-16 Honeywell International Inc. Crack-resistant silicon-based planarizing compositions, methods and films
CN111909527B (zh) * 2019-05-10 2021-09-28 中国科学院化学研究所 可交联的有机硅组合物及反应产物及制备方法和应用

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3453106A (en) * 1965-06-21 1969-07-01 Owens Illinois Inc Compositions exhibiting persistent internal polarization where a photoconductive material is dispersed in a polysiloxane resin derived from trifunctional monomers
US3450672A (en) * 1967-01-12 1969-06-17 Gen Electric Organosilsesquioxanes and a method for making them
GB1544065A (en) * 1976-04-09 1979-04-11 Deere & Co Check valve and internal stop clip therefor
US4264649A (en) 1979-12-26 1981-04-28 Corning Glass Works Method for coating optical waveguide filaments
JPS56129261A (en) * 1980-03-17 1981-10-09 Hitachi Ltd Thin film-forming coating liquid composition
JPS6356569A (ja) * 1986-08-27 1988-03-11 Fujitsu Ltd 耐熱性樹脂塗料
US4835057A (en) 1987-03-25 1989-05-30 At&T Bell Laboratories Glass fibers having organosilsesquioxane coatings and claddings
US5286572A (en) 1988-11-28 1994-02-15 International Business Machines Corporation Planarizing ladder-type silsequioxane polymer insulation layer
US4981530A (en) 1988-11-28 1991-01-01 International Business Machines Corporation Planarizing ladder-type silsesquioxane polymer insulation layer
AU627913B2 (en) * 1989-07-31 1992-09-03 Sumitomo Electric Industries, Ltd. Polymer clad optical fiber
JP2712817B2 (ja) * 1990-11-15 1998-02-16 信越化学工業株式会社 ポリオルガノシロキサン樹脂の製造方法
JP3272002B2 (ja) * 1991-09-02 2002-04-08 昭和電工株式会社 ポリオルガノシルセスキオキサンの製造方法
US5232548A (en) 1991-10-29 1993-08-03 International Business Machines Corporation Discrete fabrication of multi-layer thin film, wiring structures
US5224265A (en) 1991-10-29 1993-07-06 International Business Machines Corporation Fabrication of discrete thin film wiring structures
JPH06200030A (ja) * 1992-12-29 1994-07-19 Nippon Zeon Co Ltd シルセスキオキサンポリマーの製造法
DE69535718T2 (de) 1994-05-27 2009-03-19 Texas Instruments Inc., Dallas Verbindungsverfahren mit Benutzung eines porösen Isolators zur Reduzierung der Kapazitäten zwischen Leiterbahnen
US5534731A (en) 1994-10-28 1996-07-09 Advanced Micro Devices, Incorporated Layered low dielectric constant technology
US5550405A (en) 1994-12-21 1996-08-27 Advanced Micro Devices, Incorporated Processing techniques for achieving production-worthy, low dielectric, low interconnect resistance and high performance ICS
JP3542185B2 (ja) * 1995-02-02 2004-07-14 ダウ コーニング アジア株式会社 シリコーンレジン、これを含む組成物およびその硬化方法
JPH08245792A (ja) * 1995-03-10 1996-09-24 Mitsubishi Electric Corp シリコーンラダーポリマー、シリコーンラダープレポリマーおよびそれらの製造方法
US5804607A (en) 1996-03-21 1998-09-08 International Business Machines Corporation Process for making a foamed elastomeric polymer
US5726211A (en) 1996-03-21 1998-03-10 International Business Machines Corporation Process for making a foamed elastometric polymer
US5854131A (en) 1996-06-05 1998-12-29 Advanced Micro Devices, Inc. Integrated circuit having horizontally and vertically offset interconnect lines
US5773197A (en) 1996-10-28 1998-06-30 International Business Machines Corporation Integrated circuit device and process for its manufacture
US5895263A (en) 1996-12-19 1999-04-20 International Business Machines Corporation Process for manufacture of integrated circuit device
US5883219A (en) 1997-05-29 1999-03-16 International Business Machines Corporation Integrated circuit device and process for its manufacture
US5962067A (en) * 1997-09-09 1999-10-05 Lucent Technologies Inc. Method for coating an article with a ladder siloxane polymer and coated article

Also Published As

Publication number Publication date
EP1111019A2 (de) 2001-06-27
EP1111019A3 (de) 2001-09-19
JP3481467B2 (ja) 2003-12-22
US6251486B1 (en) 2001-06-26
EP1123955A2 (de) 2001-08-16
EP1123955A3 (de) 2001-09-26
DE69801032T2 (de) 2002-06-06
EP0902067B1 (de) 2001-07-04
US5962067A (en) 1999-10-05
EP0902067A1 (de) 1999-03-17
JPH11189437A (ja) 1999-07-13

Similar Documents

Publication Publication Date Title
DE69801032D1 (de) Verfahren zur Beschichtung eines Gegenstandes mit einem Polysilsesquioxan
DE794839T1 (de) Verfahren zur beschichtung einer oberfläche
DE19781838T1 (de) Verfahren zur Beschichtung eines Substrats
DE69841545D1 (de) Verfahren zur übertragung eines dünnfilms mit einem einschlusserzeugungschritt
DE69735999D1 (de) Verfahren zur elektrobeschichtung eines nichtleitenden geformten kunststoffgegenstands
DE69304924T2 (de) Verfahren zur herstellung eines beschichteten schleifmittels mit einem leitenden träger.
DE69804058D1 (de) Verfahren zur Beschichtung eines gedruckten Aufzeichnungsmaterials
DE59603566D1 (de) Verfahren zur mehrschichtlackierung
DE69300916T2 (de) Verfahren zur Herstellung eines beschichteten Schleifmittels.
DE69815024D1 (de) Verfahren zum Beschichten eines Bauelementes
DE69611684T2 (de) Verfahren zur erhöhung der reichweite in einem tdma-system
DE69807892T2 (de) Verfahren zur herstellung eines durchbrochenen artikels zur wiederbeschichtung
DE69510206D1 (de) Verfahren zur abscheidung von pyro-kohlenstoff-beschichtungen in einem fliessbett
DE69705262T2 (de) Verfahren zur Beschichtung eines Gegenstandes mit einer konformen Nickelbeschichtung
DE69612091D1 (de) Verfahren zum beschichten mit einem fotokatalytischen halbleiter
DE69806551D1 (de) Verfahren zur Herstellung eines Mehrschicht-Überzugfilms
DE59901823D1 (de) Verfahren zur beschichtung einer oberfläche mit einem trennmittel
DE69526423D1 (de) Verfahren zur beschichtung eines lumineszenten materials
DE69507273T2 (de) Verfahren zur Bereitstellung einer Beschichtung mit maximalem Glanz
ATA170197A (de) Verfahren zur anpassung eines brennerbeheizten heizgerätes
DE69714563T2 (de) Verfahren zur Beschichtung eines lichtempfindlichen Materials
DE69605561D1 (de) Verfahren zur beschichtung
DE69431365D1 (de) Verfahren zur Beschichtung mittels MOCVD
DE69119497T2 (de) Verfahren zur Beschichtung eines Gegenstandes mit einer Substanz
DE59502787D1 (de) Verfahren zur ausstattung eines geschirrgegenstandes mit einer antihaftbeschichtung

Legal Events

Date Code Title Description
8332 No legal effect for de
8370 Indication of lapse of patent is to be deleted
8364 No opposition during term of opposition