DE69714106T2 - Resistzusammenzetzungen zum Metallabscheiden - Google Patents

Resistzusammenzetzungen zum Metallabscheiden

Info

Publication number
DE69714106T2
DE69714106T2 DE69714106T DE69714106T DE69714106T2 DE 69714106 T2 DE69714106 T2 DE 69714106T2 DE 69714106 T DE69714106 T DE 69714106T DE 69714106 T DE69714106 T DE 69714106T DE 69714106 T2 DE69714106 T2 DE 69714106T2
Authority
DE
Germany
Prior art keywords
metal deposition
resist compositions
resist
compositions
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69714106T
Other languages
English (en)
Other versions
DE69714106D1 (de
Inventor
Akihiko Goto
Yoshitaka Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ibiden Co Ltd
Original Assignee
Ibiden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP8580296A external-priority patent/JPH09244241A/ja
Priority claimed from JP23985596A external-priority patent/JPH1062987A/ja
Application filed by Ibiden Co Ltd filed Critical Ibiden Co Ltd
Application granted granted Critical
Publication of DE69714106D1 publication Critical patent/DE69714106D1/de
Publication of DE69714106T2 publication Critical patent/DE69714106T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/184—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method using masks
DE69714106T 1996-03-13 1997-03-10 Resistzusammenzetzungen zum Metallabscheiden Expired - Lifetime DE69714106T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP8580296A JPH09244241A (ja) 1996-03-13 1996-03-13 めっきレジスト組成物及びプリント配線板
JP23985596A JPH1062987A (ja) 1996-08-21 1996-08-21 めっきレジスト組成物およびプリント配線板

Publications (2)

Publication Number Publication Date
DE69714106D1 DE69714106D1 (de) 2002-08-29
DE69714106T2 true DE69714106T2 (de) 2003-01-23

Family

ID=26426810

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69714106T Expired - Lifetime DE69714106T2 (de) 1996-03-13 1997-03-10 Resistzusammenzetzungen zum Metallabscheiden

Country Status (5)

Country Link
US (1) US6010823A (de)
EP (1) EP0795788B1 (de)
DE (1) DE69714106T2 (de)
MY (1) MY126796A (de)
SG (1) SG96170A1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6583198B2 (en) 1997-11-28 2003-06-24 Hitachi Chemical Company, Ltd. Photo curable resin composition and photosensitive element
WO2001095030A2 (en) * 2000-06-09 2001-12-13 Dsm N.V. Resin composition and three-dimensional object
US6713535B2 (en) * 2002-02-28 2004-03-30 Turbine Controls, Inc. Low-friction chromate-free coating of epoxy resins and sulfonyldianiline
US20060068207A1 (en) * 2004-09-28 2006-03-30 Brewer Science Inc., A Missouri Corporation Curable high refractive index resins for optoelectronic applications
KR20100094475A (ko) * 2007-10-26 2010-08-26 이 아이 듀폰 디 네모아 앤드 캄파니 격납된 층을 제조하기 위한 방법 및 재료, 및 이를 사용하여 제조된 소자

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5790072A (en) * 1980-11-25 1982-06-04 Hitachi Ltd Resist ink composition for chemical plating
JPS6159447A (ja) * 1984-08-31 1986-03-26 Sony Corp 感光性樹脂組成物
JPS61243869A (ja) * 1985-04-19 1986-10-30 Taiyo Ink Seizo Kk レジストインキ組成物
JPS62165904A (ja) * 1986-01-17 1987-07-22 日本化成株式会社 フイルムコンデンサ被覆用樹脂組成物
JPS63286841A (ja) * 1987-05-19 1988-11-24 Hitachi Chem Co Ltd 感光性樹脂組成物溶液
JPH0268A (ja) * 1987-11-13 1990-01-05 Toshiba Corp ソルダ−レジスト組成物
JPH01266534A (ja) * 1988-04-18 1989-10-24 Sekisui Chem Co Ltd 光及び熱硬化性組成物
JPH0823694B2 (ja) * 1988-08-04 1996-03-06 富士写真フイルム株式会社 液状感光性樹脂組成物
JP2770252B2 (ja) * 1991-12-11 1998-06-25 日本石油株式会社 エポキシ樹脂組成物、封止材用エポキシ樹脂組成物、積層板用エポキシ樹脂組成物及びソルダーレジスト用エポキシ樹脂組成物
JP3073094B2 (ja) * 1992-03-28 2000-08-07 サンノプコ株式会社 感光性樹脂組成物
JP3115449B2 (ja) * 1993-05-07 2000-12-04 イビデン株式会社 配線板用めっきレジスト組成物およびプリント配線板
JPH08239640A (ja) * 1995-02-28 1996-09-17 Ibiden Co Ltd 無電解めっき用接着剤の調製方法および無電解めっき用接着剤
US5677398A (en) * 1995-04-13 1997-10-14 Mitsui Toatsu Chemicals, Inc. Epoxy acrylate resins and their uses

Also Published As

Publication number Publication date
EP0795788A1 (de) 1997-09-17
EP0795788B1 (de) 2002-07-24
US6010823A (en) 2000-01-04
SG96170A1 (en) 2003-05-23
DE69714106D1 (de) 2002-08-29
MY126796A (en) 2006-10-31

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition