DE69703165D1 - Strahlhomogenisierer - Google Patents
StrahlhomogenisiererInfo
- Publication number
- DE69703165D1 DE69703165D1 DE69703165T DE69703165T DE69703165D1 DE 69703165 D1 DE69703165 D1 DE 69703165D1 DE 69703165 T DE69703165 T DE 69703165T DE 69703165 T DE69703165 T DE 69703165T DE 69703165 D1 DE69703165 D1 DE 69703165D1
- Authority
- DE
- Germany
- Prior art keywords
- output plane
- homogenizer
- hologram
- input beam
- output
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/0252—Diffusing elements; Afocal elements characterised by the diffusing properties using holographic or diffractive means
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0905—Dividing and/or superposing multiple light beams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0643—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising mirrors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0648—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/0665—Shaping the laser beam, e.g. by masks or multi-focusing by beam condensation on the workpiece, e.g. for focusing
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
- G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
- G02B19/0014—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only at least one surface having optical power
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
- G02B19/0052—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode
- G02B19/0057—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode in the form of a laser diode array, e.g. laser diode bar
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/0944—Diffractive optical elements, e.g. gratings, holograms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0273—Diffusing elements; Afocal elements characterized by the use
- G02B5/0278—Diffusing elements; Afocal elements characterized by the use used in transmission
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
- G02B5/1819—Plural gratings positioned on the same surface, e.g. array of gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/32—Holograms used as optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/22—Processes or apparatus for obtaining an optical image from holograms
- G03H1/2286—Particular reconstruction light ; Beam properties
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04B—TRANSMISSION
- H04B10/00—Transmission systems employing electromagnetic waves other than radio-waves, e.g. infrared, visible or ultraviolet light, or employing corpuscular radiation, e.g. quantum communication
- H04B10/50—Transmitters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/0236—Form or shape of the hologram when not registered to the substrate, e.g. trimming the hologram to alphanumerical shape
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
- G03H1/0841—Encoding method mapping the synthesized field into a restricted set of values representative of the modulator parameters, e.g. detour phase coding
- G03H2001/085—Kinoform, i.e. phase only encoding wherein the computed field is processed into a distribution of phase differences
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/26—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique
- G03H1/30—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique discrete holograms only
- G03H2001/303—Interleaved sub-holograms, e.g. three RGB sub-holograms having interleaved pixels for reconstructing coloured holobject
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2222/00—Light sources or light beam properties
- G03H2222/35—Transverse intensity distribution of the light beam
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S359/00—Optical: systems and elements
- Y10S359/90—Methods
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/770,524 US5850300A (en) | 1994-02-28 | 1996-12-20 | Diffractive beam homogenizer having free-form fringes |
PCT/US1997/023715 WO1998028650A1 (en) | 1996-12-20 | 1997-12-19 | Beam homogenizer |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69703165D1 true DE69703165D1 (de) | 2000-10-26 |
DE69703165T2 DE69703165T2 (de) | 2001-05-17 |
Family
ID=25088849
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69703165T Expired - Lifetime DE69703165T2 (de) | 1996-12-20 | 1997-12-19 | Strahlhomogenisierer |
Country Status (8)
Country | Link |
---|---|
US (6) | US5850300A (de) |
EP (1) | EP0946894B1 (de) |
JP (3) | JP4787944B2 (de) |
KR (1) | KR100486997B1 (de) |
AT (1) | ATE196550T1 (de) |
AU (1) | AU5617098A (de) |
DE (1) | DE69703165T2 (de) |
WO (1) | WO1998028650A1 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6707537B2 (en) | 2001-07-06 | 2004-03-16 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Projection exposure system |
Families Citing this family (91)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5850300A (en) * | 1994-02-28 | 1998-12-15 | Digital Optics Corporation | Diffractive beam homogenizer having free-form fringes |
US6741394B1 (en) | 1998-03-12 | 2004-05-25 | Nikon Corporation | Optical integrator, illumination optical apparatus, exposure apparatus and observation apparatus |
US20040114035A1 (en) * | 1998-03-24 | 2004-06-17 | Timothy White | Focusing panel illumination method and apparatus |
EP1073937A4 (de) * | 1998-04-24 | 2002-08-14 | Digital Optics Corp | Bilderzeugung durch diffusion und verwandte verfahren |
US6898216B1 (en) * | 1999-06-30 | 2005-05-24 | Lambda Physik Ag | Reduction of laser speckle in photolithography by controlled disruption of spatial coherence of laser beam |
US6072631A (en) * | 1998-07-09 | 2000-06-06 | 3M Innovative Properties Company | Diffractive homogenizer with compensation for spatial coherence |
US6166389A (en) * | 1998-08-25 | 2000-12-26 | Physical Optics Corporation | Apparatus having a light source and a sol-gel monolithic diffuser |
US6266476B1 (en) * | 1998-08-25 | 2001-07-24 | Physical Optics Corporation | Optical element having an integral surface diffuser |
US6259562B1 (en) * | 1998-08-25 | 2001-07-10 | Physical Optics Corporation | Device including an optical element with an integral surface diffuser |
US6563567B1 (en) | 1998-12-17 | 2003-05-13 | Nikon Corporation | Method and apparatus for illuminating a surface using a projection imaging apparatus |
JP2001174615A (ja) * | 1999-04-15 | 2001-06-29 | Nikon Corp | 回折光学素子、該素子の製造方法、該素子を備える照明装置、投影露光装置、露光方法、及び光ホモジナイザー、該光ホモジナイザーの製造方法 |
PL354040A1 (en) | 1999-06-01 | 2003-12-15 | De La Rue International Limitedde La Rue International Limited | Security device |
US6313948B1 (en) * | 1999-08-02 | 2001-11-06 | James I. Hanna | Optical beam shaper |
EP1139138A4 (de) | 1999-09-29 | 2006-03-08 | Nikon Corp | Projektionsbelichtungsverfahren, vorrichtung und optisches projektionssystem |
WO2001023933A1 (fr) | 1999-09-29 | 2001-04-05 | Nikon Corporation | Systeme optique de projection |
US6671035B2 (en) | 1999-09-29 | 2003-12-30 | Asml Netherlands B.V. | Illuminator for a lithography apparatus, a lithography apparatus comprising such an illuminator, and a manufacturing method employing such a lithography apparatus |
TW546550B (en) * | 1999-12-13 | 2003-08-11 | Asml Netherlands Bv | An illuminator for a lithography apparatus, a lithography apparatus comprising such an illuminator, and a manufacturing method employing such a lithography apparatus |
DE10062579A1 (de) * | 1999-12-15 | 2001-06-21 | Nikon Corp | Optischer Integrierer,optische Beleuchtungseinrichtung, Photolithographie-Belichtungseinrichtung,und Beobachtungseinrichtung |
US6421148B2 (en) * | 2000-01-07 | 2002-07-16 | Honeywell International Inc. | Volume holographic diffusers |
US6714328B2 (en) * | 2000-01-07 | 2004-03-30 | Honeywell International Inc. | Volume holographic diffusers |
US7301605B2 (en) * | 2000-03-03 | 2007-11-27 | Nikon Corporation | Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices |
WO2001096958A2 (en) * | 2000-06-15 | 2001-12-20 | 3M Innovative Properties Company | Process for producing microfluidic articles |
JP2004503928A (ja) * | 2000-06-15 | 2004-02-05 | スリーエム イノベイティブ プロパティズ カンパニー | 多方向光反応吸収方法 |
US6852766B1 (en) * | 2000-06-15 | 2005-02-08 | 3M Innovative Properties Company | Multiphoton photosensitization system |
AU2001266919A1 (en) * | 2000-06-15 | 2001-12-24 | 3M Innovative Properties Company | Multipass multiphoton absorption method and apparatus |
JP4786858B2 (ja) * | 2000-06-15 | 2011-10-05 | スリーエム イノベイティブ プロパティズ カンパニー | 封入光学素子を提供するための多光子硬化 |
US7026103B2 (en) * | 2000-06-15 | 2006-04-11 | 3M Innovative Properties Company | Multicolor imaging using multiphoton photochemical processes |
KR100810546B1 (ko) * | 2000-06-15 | 2008-03-18 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 삼차원 광학 소자의 가공 방법 |
US6731432B1 (en) | 2000-06-16 | 2004-05-04 | Mem Optical, Inc. | Off-axis diffractive beam shapers and splitters for reducing sensitivity to manufacturing tolerances |
CA2426848C (en) * | 2000-10-25 | 2009-08-25 | Optek Limited | Laser cutting method and apparatus for optical fibres or waveguides |
WO2002039387A1 (en) * | 2000-11-07 | 2002-05-16 | Holographic Imaging Llc | Improved three dimensional display |
EP1332475A1 (de) * | 2000-11-07 | 2003-08-06 | Holographic Imaging LLC | Anzeigesystem für computergenerierte hologramme |
US6568846B1 (en) * | 2000-11-15 | 2003-05-27 | The United States Of America As Represented By The Secretary Of The Army | Pulsed laser heating simulation of thermal damage on coated surface |
JP2002231619A (ja) * | 2000-11-29 | 2002-08-16 | Nikon Corp | 照明光学装置および該照明光学装置を備えた露光装置 |
JP2002323652A (ja) | 2001-02-23 | 2002-11-08 | Nikon Corp | 投影光学系,該投影光学系を備えた投影露光装置および投影露光方法 |
KR100433585B1 (ko) * | 2001-02-28 | 2004-05-31 | 한국전자통신연구원 | 비접촉식 결합형 이진 위상 홀로그램 및 그 구현 방법 |
JP2002287023A (ja) * | 2001-03-27 | 2002-10-03 | Nikon Corp | 投影光学系、該投影光学系を備えた投影露光装置及び投影露光方法 |
US7199929B2 (en) * | 2001-04-27 | 2007-04-03 | Asml Holdings N.V. | Methods for optical beam shaping and diffusing |
US7295356B2 (en) * | 2001-06-08 | 2007-11-13 | Inphase Technologies, Inc. | Method for improved holographic recording using beam apodization |
US20040012872A1 (en) * | 2001-06-14 | 2004-01-22 | Fleming Patrick R | Multiphoton absorption method using patterned light |
CA2451325A1 (en) * | 2001-07-16 | 2003-02-06 | Jari Turunen | Diffractive shaping of the intensity distribution of a spatially partially coherent light beam |
DE10136611C1 (de) * | 2001-07-23 | 2002-11-21 | Jenoptik Laserdiode Gmbh | Optische Anordnung zur Formung und Homogenisierung eines von einer Laserdiodenanordnung ausgehenden Laserstrahls |
US6744502B2 (en) * | 2001-09-28 | 2004-06-01 | Pe Corporation (Ny) | Shaped illumination geometry and intensity using a diffractive optical element |
US20030067774A1 (en) * | 2001-10-04 | 2003-04-10 | Nanovia, L.P. | Illumination systems and methods employing diffractive holographic optical elements |
KR100431587B1 (ko) * | 2002-05-08 | 2004-05-17 | 한국원자력연구소 | 분리-재결합 방식의 레이저빔 균질화 장치 및 방법 |
US6859326B2 (en) * | 2002-09-20 | 2005-02-22 | Corning Incorporated | Random microlens array for optical beam shaping and homogenization |
US20030155667A1 (en) * | 2002-12-12 | 2003-08-21 | Devoe Robert J | Method for making or adding structures to an article |
JP3794406B2 (ja) | 2003-01-21 | 2006-07-05 | セイコーエプソン株式会社 | 液滴吐出装置、印刷装置、印刷方法および電気光学装置 |
US6842223B2 (en) | 2003-04-11 | 2005-01-11 | Nikon Precision Inc. | Enhanced illuminator for use in photolithographic systems |
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- 1997-12-19 WO PCT/US1997/023715 patent/WO1998028650A1/en active IP Right Grant
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Also Published As
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ATE196550T1 (de) | 2000-10-15 |
JP2010153871A (ja) | 2010-07-08 |
US6847485B2 (en) | 2005-01-25 |
US6970292B2 (en) | 2005-11-29 |
AU5617098A (en) | 1998-07-17 |
EP0946894B1 (de) | 2000-09-20 |
US6025938A (en) | 2000-02-15 |
US6396635B2 (en) | 2002-05-28 |
KR20000069648A (ko) | 2000-11-25 |
US6278550B1 (en) | 2001-08-21 |
JP2007150345A (ja) | 2007-06-14 |
WO1998028650A1 (en) | 1998-07-02 |
DE69703165T2 (de) | 2001-05-17 |
JP4951670B2 (ja) | 2012-06-13 |
US20010046073A1 (en) | 2001-11-29 |
KR100486997B1 (ko) | 2005-05-03 |
US5850300A (en) | 1998-12-15 |
US20050128540A1 (en) | 2005-06-16 |
EP0946894A1 (de) | 1999-10-06 |
JP4787944B2 (ja) | 2011-10-05 |
JP2001507139A (ja) | 2001-05-29 |
US20040179269A1 (en) | 2004-09-16 |
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