DE69630902D1 - Lichtempfindliche Schicht - Google Patents

Lichtempfindliche Schicht

Info

Publication number
DE69630902D1
DE69630902D1 DE69630902T DE69630902T DE69630902D1 DE 69630902 D1 DE69630902 D1 DE 69630902D1 DE 69630902 T DE69630902 T DE 69630902T DE 69630902 T DE69630902 T DE 69630902T DE 69630902 D1 DE69630902 D1 DE 69630902D1
Authority
DE
Germany
Prior art keywords
photosensitive layer
photosensitive
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69630902T
Other languages
English (en)
Other versions
DE69630902T2 (de
Inventor
Tatsuya Ichikawa
Tatsuo Chiba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP09353695A external-priority patent/JP3199600B2/ja
Priority claimed from JP7104480A external-priority patent/JPH08297368A/ja
Priority claimed from JP16244595A external-priority patent/JP3199607B2/ja
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Publication of DE69630902D1 publication Critical patent/DE69630902D1/de
Application granted granted Critical
Publication of DE69630902T2 publication Critical patent/DE69630902T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
DE69630902T 1995-04-19 1996-04-16 Lichtempfindliche Schicht Expired - Lifetime DE69630902T2 (de)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP9353695 1995-04-19
JP09353695A JP3199600B2 (ja) 1995-04-19 1995-04-19 感光性樹脂組成物及びこれを用いた感光性エレメント
JP10448095 1995-04-27
JP7104480A JPH08297368A (ja) 1995-04-27 1995-04-27 感光性樹脂組成物及びこれを用いた感光性エレメント
JP16244595 1995-06-28
JP16244595A JP3199607B2 (ja) 1995-06-28 1995-06-28 感光性樹脂組成物及びこれを用いた感光性エレメント

Publications (2)

Publication Number Publication Date
DE69630902D1 true DE69630902D1 (de) 2004-01-08
DE69630902T2 DE69630902T2 (de) 2004-09-02

Family

ID=27307309

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69609757T Expired - Lifetime DE69609757T2 (de) 1995-04-19 1996-04-16 Lichtempfindliche Kunststoffzusammensetzung und lichtempfindliches Element unter Verwendung dieser Zusammensetzung
DE69630902T Expired - Lifetime DE69630902T2 (de) 1995-04-19 1996-04-16 Lichtempfindliche Schicht

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE69609757T Expired - Lifetime DE69609757T2 (de) 1995-04-19 1996-04-16 Lichtempfindliche Kunststoffzusammensetzung und lichtempfindliches Element unter Verwendung dieser Zusammensetzung

Country Status (5)

Country Link
US (4) US5744282A (de)
EP (2) EP0999473B1 (de)
KR (1) KR100191177B1 (de)
DE (2) DE69609757T2 (de)
TW (1) TW424172B (de)

Families Citing this family (35)

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TW424172B (en) * 1995-04-19 2001-03-01 Hitachi Chemical Co Ltd Photosensitive resin composition and photosensitive element using the same
EP1030882A2 (de) 1997-11-13 2000-08-30 H.B. Fuller Licensing & Financing, Inc. Strahlungshärtbare zusammensetzungen, die metallocen-polyolefine enthalten
JPH11167203A (ja) * 1997-12-01 1999-06-22 Nichigoo Mooton Kk 感光性樹脂組成物及びそれを用いた感光性エレメント
US5939238A (en) * 1998-06-02 1999-08-17 Morton International, Inc. Photoimageable composition having improved photoinitiator system
US5939239A (en) * 1997-12-01 1999-08-17 Nichigo-Morton Co., Ltd. Photoimageable compositions containing photopolymerizable urethane oligomers and dibenzoate plasticizers
CA2249697A1 (en) * 1997-12-01 1999-06-01 Daniel E. Lundy Photoimageable compositions for improved adhesion and processing times
SG79240A1 (en) * 1997-12-01 2001-03-20 Nichigo Morton Co Ltd Photoimageable compositions containing photopolymerizable urethane oligomers and low tg binder polymers
US5952153A (en) * 1997-12-01 1999-09-14 Morton International, Inc. Photoimageable composition having improved flexibility, adhesion and stripping characteristics
AU707217B1 (en) * 1997-12-01 1999-07-08 Nichigo Morton Co., Ltd. Photoimageable compositions
US6004725A (en) * 1997-12-01 1999-12-21 Morton International, Inc. Photoimageable compositions
DE69834092T2 (de) * 1997-12-02 2006-09-21 Ciba Speciality Chemicals Holding Inc. Polyolefinmaterialien mit verbesserter Oberflächenhaltbarkeit und Verfahren zu ihrer Herstellung durch Strahlung
US20010010893A1 (en) * 1998-03-05 2001-08-02 Hiroshi Takanashi Negative-working photosensitive resin composition and photosensitive resin plate using the same
US5952154A (en) * 1998-05-29 1999-09-14 Morton International, Inc. Photoimageable composition having improved flexibility
EP1008911A1 (de) * 1998-12-11 2000-06-14 Shipley Company LLC Lichtempfindliche Bildaufzeichnungszusammensetzungen mit verbesserter Flexibilität und Entschichtung
US6322951B1 (en) 1998-12-11 2001-11-27 Norton International, Inc. Photoimageable compositions having improved flexibility and stripping ability
EP1008910A1 (de) * 1998-12-11 2000-06-14 Shipley Company LLC Lichtempfindliche Bildaufzeichnungszusammensetzungen mit verbesserter Entschichtung und Bildauflösung
AU2824900A (en) * 1999-03-03 2000-09-21 Hitachi Chemical Company, Ltd. Photosensitive resin composition, photosensitive element comprising the same, process for producing resist pattern, and process for producing printed circuit board
TWI306546B (de) * 2000-05-29 2009-02-21 Hitachi Chemical Co Ltd
JP4153159B2 (ja) * 2000-12-18 2008-09-17 富士フイルム株式会社 ネガ型感光性熱硬化性樹脂組成物、ネガ型感光性熱硬化性樹脂層転写材料、及びネガ型耐性画像形成方法
BRPI0313763B8 (pt) * 2002-08-19 2021-05-25 4325231 Canada Inc imidazóis 2,4,5-trissubstituídos, seus usos, e composições farmacêutica e anti-microbiana
KR100522002B1 (ko) * 2003-09-22 2005-10-18 주식회사 코오롱 액상 포토 솔더 레지스트 조성물 및 이로부터 제조된 포토솔더 레지스트 필름
JP5095216B2 (ja) 2003-11-14 2012-12-12 ローラス セラピューティクス インコーポレーテッド アリールイミダゾールおよびその抗癌剤としての使用
KR100941781B1 (ko) 2004-02-11 2010-02-11 주식회사 코오롱 액상 포토 솔더 레지스트 조성물 및 이로부터 제조된 포토솔더 레지스트 필름
US20050271973A1 (en) * 2004-06-04 2005-12-08 Ziegler Michael J Negative acting photoresist with improved blocking resistance
KR101046976B1 (ko) * 2004-10-19 2011-07-07 삼성에스디아이 주식회사 전자 방출원 형성용 조성물, 이를 이용한 전자 방출원제조 방법 및 전자 방출원
AU2006250809B2 (en) * 2005-05-25 2011-05-12 Lorus Therapeutics Inc. 2-indolyl imidazo(4,5-D)phenanthroline derivatives and their use in the treatment of cancer
US8042211B2 (en) * 2005-08-16 2011-10-25 Whirlpool Corporation Method of detecting an off-balance condition of a clothes load in a washing machine
KR101002832B1 (ko) * 2005-10-07 2010-12-21 히다치 가세고교 가부시끼가이샤 감광성 수지 조성물 및 이것을 이용한 감광성 엘리먼트
MY148552A (en) * 2005-10-25 2013-04-30 Hitachi Chemical Co Ltd Photosensitive resin composition, photosensitive element comprising the same, method of forming resist pattern, and process for producing printed wiring board
US20080033609A1 (en) * 2006-08-04 2008-02-07 Ramin Razavi Automotive diagnostic and tuning system
JP5344034B2 (ja) * 2009-03-13 2013-11-20 日立化成株式会社 感光性樹脂組成物、並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
EP2976342A4 (de) 2013-03-20 2016-08-10 Aptose Biosciences Inc 2-substituierte imidazo[4,5-d]phenanthrolin-derivate und deren verwendung bei der behandlung von krebs
US9567643B2 (en) 2013-10-04 2017-02-14 Aptose Biosciences Inc. Compositions and methods for treating cancers
US11149047B2 (en) 2017-10-30 2021-10-19 Aptose Biosciences, Inc. Aryl imidazoles for treatment of cancer
CN113185408B (zh) * 2021-04-15 2023-11-17 佳化化学科技发展（上海）有限公司 一种环氧乙烷改性的丙烯酸、低粘度聚氨酯丙烯酸酯、制备方法及应用

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US3549367A (en) * 1968-05-24 1970-12-22 Du Pont Photopolymerizable compositions containing triarylimidazolyl dimers and p-aminophenyl ketones
US3905815A (en) * 1971-12-17 1975-09-16 Minnesota Mining & Mfg Photopolymerizable sheet material with diazo resin layer
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Also Published As

Publication number Publication date
EP0999473A1 (de) 2000-05-10
EP0738927B1 (de) 2000-08-16
EP0738927A3 (de) 1997-08-20
KR100191177B1 (ko) 1999-06-15
TW424172B (en) 2001-03-01
DE69609757T2 (de) 2000-12-28
EP0999473B1 (de) 2003-11-26
DE69609757D1 (de) 2000-09-21
US6228560B1 (en) 2001-05-08
DE69630902T2 (de) 2004-09-02
US5744282A (en) 1998-04-28
KR960038489A (ko) 1996-11-21
US6060216A (en) 2000-05-09
EP0738927A2 (de) 1996-10-23
US6555290B1 (en) 2003-04-29

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Legal Events

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