DE69626898T2 - Strahlungsempfindliche Zusammensetzung - Google Patents
Strahlungsempfindliche ZusammensetzungInfo
- Publication number
- DE69626898T2 DE69626898T2 DE69626898T DE69626898T DE69626898T2 DE 69626898 T2 DE69626898 T2 DE 69626898T2 DE 69626898 T DE69626898 T DE 69626898T DE 69626898 T DE69626898 T DE 69626898T DE 69626898 T2 DE69626898 T2 DE 69626898T2
- Authority
- DE
- Germany
- Prior art keywords
- radiation
- sensitive composition
- sensitive
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/11—Vinyl alcohol polymer or derivative
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21118395A JP3506817B2 (ja) | 1995-07-26 | 1995-07-26 | 放射線感応性組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69626898D1 DE69626898D1 (de) | 2003-04-30 |
DE69626898T2 true DE69626898T2 (de) | 2003-09-11 |
Family
ID=16601794
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69626898T Expired - Lifetime DE69626898T2 (de) | 1995-07-26 | 1996-07-04 | Strahlungsempfindliche Zusammensetzung |
Country Status (4)
Country | Link |
---|---|
US (1) | US5773191A (de) |
EP (1) | EP0756203B1 (de) |
JP (1) | JP3506817B2 (de) |
DE (1) | DE69626898T2 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3743187B2 (ja) * | 1998-05-08 | 2006-02-08 | 住友化学株式会社 | フォトレジスト組成物 |
TWI250379B (en) * | 1998-08-07 | 2006-03-01 | Az Electronic Materials Japan | Chemical amplified radiation-sensitive composition which contains onium salt and generator |
US6958865B1 (en) * | 1998-11-12 | 2005-10-25 | California Institute Of Technology | Microlicensing particles and applications |
US6492092B1 (en) | 1999-03-12 | 2002-12-10 | Arch Specialty Chemicals, Inc. | Hydroxy-epoxide thermally cured undercoat for 193 NM lithography |
KR100308423B1 (ko) | 1999-09-07 | 2001-09-26 | 주식회사 동진쎄미켐 | 화학 증폭 레지스트용 폴리머 및 이를 이용한 레지스트 조성물 |
TWI289238B (en) * | 2000-01-13 | 2007-11-01 | Fujifilm Corp | Negative resist compositions using for electronic irradiation |
EP1179750B1 (de) | 2000-08-08 | 2012-07-25 | FUJIFILM Corporation | Positiv arbeitende lichtempfindliche Zusammensetzung und Verfahren zur Herstellung einer integrierten Präzisions-Schaltung mit derselben |
JP4092083B2 (ja) | 2001-03-21 | 2008-05-28 | 富士フイルム株式会社 | 電子線又はx線用ネガ型レジスト組成物 |
JP3790960B2 (ja) | 2001-10-19 | 2006-06-28 | 富士写真フイルム株式会社 | ネガ型レジスト組成物 |
JP4168095B2 (ja) * | 2002-05-24 | 2008-10-22 | サンノプコ株式会社 | 感光性樹脂組成物 |
CN101467101A (zh) * | 2006-06-13 | 2009-06-24 | 柯尼卡美能达医疗印刷器材株式会社 | 平版印刷版材料 |
US7914967B2 (en) * | 2007-08-03 | 2011-03-29 | Tokyo Ohka Kogyo Co., Ltd. | Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern |
JP5303142B2 (ja) * | 2007-11-30 | 2013-10-02 | 東京応化工業株式会社 | 含フッ素化合物、含フッ素高分子化合物、液浸露光用レジスト組成物およびレジストパターン形成方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2718254C3 (de) * | 1977-04-25 | 1980-04-10 | Hoechst Ag, 6000 Frankfurt | Strahlungsempfindliche Kopiermasse |
DE3528929A1 (de) * | 1985-08-13 | 1987-02-26 | Hoechst Ag | Strahlungsempfindliches gemisch, dieses enthaltendes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefbildern |
DE69125634T2 (de) * | 1990-01-30 | 1998-01-02 | Wako Pure Chem Ind Ltd | Chemisch verstärktes Photolack-Material |
JP3030672B2 (ja) * | 1991-06-18 | 2000-04-10 | 和光純薬工業株式会社 | 新規なレジスト材料及びパタ−ン形成方法 |
JP2655384B2 (ja) * | 1991-11-08 | 1997-09-17 | 富士写真フイルム株式会社 | ポジ型レジスト組成物 |
US5296332A (en) * | 1991-11-22 | 1994-03-22 | International Business Machines Corporation | Crosslinkable aqueous developable photoresist compositions and method for use thereof |
EP0599779A1 (de) * | 1992-10-29 | 1994-06-01 | OCG Microelectronic Materials AG | Hochauflösender negativ arbeitender Photoresist mit grossem Prozessspielraum |
JP3148426B2 (ja) * | 1992-12-25 | 2001-03-19 | クラリアント インターナショナル リミテッド | パターン形成用材料 |
TW288112B (de) * | 1993-06-02 | 1996-10-11 | Sumitomo Chemical Co | |
JP3203995B2 (ja) * | 1993-12-24 | 2001-09-04 | ジェイエスアール株式会社 | 感放射線性樹脂組成物 |
JP3573358B2 (ja) * | 1994-02-25 | 2004-10-06 | クラリアント インターナショナル リミテッド | 放射線感応性組成物 |
US5558971A (en) * | 1994-09-02 | 1996-09-24 | Wako Pure Chemical Industries, Ltd. | Resist material |
-
1995
- 1995-07-26 JP JP21118395A patent/JP3506817B2/ja not_active Expired - Lifetime
-
1996
- 1996-07-04 DE DE69626898T patent/DE69626898T2/de not_active Expired - Lifetime
- 1996-07-04 EP EP96110854A patent/EP0756203B1/de not_active Expired - Lifetime
- 1996-07-24 US US08/685,850 patent/US5773191A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US5773191A (en) | 1998-06-30 |
DE69626898D1 (de) | 2003-04-30 |
JP3506817B2 (ja) | 2004-03-15 |
JPH0943837A (ja) | 1997-02-14 |
EP0756203A1 (de) | 1997-01-29 |
EP0756203B1 (de) | 2003-03-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: AZ ELECTRONIC MATERIALS USA CORP., SOMERVILLE, N.J |
|
8328 | Change in the person/name/address of the agent |
Representative=s name: PATENTANWAELTE ISENBRUCK BOESL HOERSCHLER WICHMANN HU |