DE69626898D1 - Strahlungsempfindliche Zusammensetzung - Google Patents

Strahlungsempfindliche Zusammensetzung

Info

Publication number: DE69626898D1
Authority: DE; Germany
Prior art keywords: radiation; sensitive composition; sensitive; composition
Prior art date: 1995-07-26
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

DE69626898T

Other languages

English (en)

Other versions

DE69626898T2 (de

Inventor

Munirathna Padmanaban

Yoshiaki Kinoshita

Satoru Funato

Natsumi Suehiro

Hiroshi Okazaki

Georg Pawlowski

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

EMD Performance Materials Corp

Original Assignee

Clariant Finance BVI Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1995-07-26

Filing date

1996-07-04

Publication date

2003-04-30

1996-07-04 Application filed by Clariant Finance BVI Ltd filed Critical Clariant Finance BVI Ltd

2003-04-30 Publication of DE69626898D1 publication Critical patent/DE69626898D1/de

2003-09-11 Application granted granted Critical

2003-09-11 Publication of DE69626898T2 publication Critical patent/DE69626898T2/de

2016-07-05 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Links

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/11—Vinyl alcohol polymer or derivative

DE69626898T 1995-07-26 1996-07-04 Strahlungsempfindliche Zusammensetzung Expired - Lifetime DE69626898T2 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP21118395A JP3506817B2 (ja)	1995-07-26	1995-07-26	放射線感応性組成物

Publications (2)

Publication Number	Publication Date
DE69626898D1 true DE69626898D1 (de)	2003-04-30
DE69626898T2 DE69626898T2 (de)	2003-09-11

Family

ID=16601794

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE69626898T Expired - Lifetime DE69626898T2 (de)	1995-07-26	1996-07-04	Strahlungsempfindliche Zusammensetzung

Country Status (4)

Country	Link
US (1)	US5773191A (de)
EP (1)	EP0756203B1 (de)
JP (1)	JP3506817B2 (de)
DE (1)	DE69626898T2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP3743187B2 (ja) *	1998-05-08	2006-02-08	住友化学株式会社	フォトレジスト組成物
TWI250379B (en) *	1998-08-07	2006-03-01	Az Electronic Materials Japan	Chemical amplified radiation-sensitive composition which contains onium salt and generator
US6958865B1 (en) *	1998-11-12	2005-10-25	California Institute Of Technology	Microlicensing particles and applications
US6492092B1 (en)	1999-03-12	2002-12-10	Arch Specialty Chemicals, Inc.	Hydroxy-epoxide thermally cured undercoat for 193 NM lithography
KR100308423B1 (ko) *	1999-09-07	2001-09-26	주식회사 동진쎄미켐	화학 증폭 레지스트용 폴리머 및 이를 이용한 레지스트 조성물
TWI289238B (en)	2000-01-13	2007-11-01	Fujifilm Corp	Negative resist compositions using for electronic irradiation
EP1179750B1 (de)	2000-08-08	2012-07-25	FUJIFILM Corporation	Positiv arbeitende lichtempfindliche Zusammensetzung und Verfahren zur Herstellung einer integrierten Präzisions-Schaltung mit derselben
JP4092083B2 (ja)	2001-03-21	2008-05-28	富士フイルム株式会社	電子線又はｘ線用ネガ型レジスト組成物
JP3790960B2 (ja)	2001-10-19	2006-06-28	富士写真フイルム株式会社	ネガ型レジスト組成物
JP4168095B2 (ja) *	2002-05-24	2008-10-22	サンノプコ株式会社	感光性樹脂組成物
WO2007145059A1 (ja) *	2006-06-13	2007-12-21	Konica Minolta Medical & Graphic, Inc.	平版印刷版材料
KR101004984B1 (ko) *	2007-08-03	2011-01-04	도오꾜오까고오교 가부시끼가이샤	불소 함유 화합물, 액침 노광용 레지스트 조성물 및레지스트 패턴 형성 방법
JP5303142B2 (ja) *	2007-11-30	2013-10-02	東京応化工業株式会社	含フッ素化合物、含フッ素高分子化合物、液浸露光用レジスト組成物およびレジストパターン形成方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE2718254C3 (de) *	1977-04-25	1980-04-10	Hoechst Ag, 6000 Frankfurt	Strahlungsempfindliche Kopiermasse
DE3528929A1 (de) *	1985-08-13	1987-02-26	Hoechst Ag	Strahlungsempfindliches gemisch, dieses enthaltendes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefbildern
DE69125634T2 (de) *	1990-01-30	1998-01-02	Wako Pure Chem Ind Ltd	Chemisch verstärktes Photolack-Material
JP3030672B2 (ja) *	1991-06-18	2000-04-10	和光純薬工業株式会社	新規なレジスト材料及びパタ−ン形成方法
JP2655384B2 (ja) *	1991-11-08	1997-09-17	富士写真フイルム株式会社	ポジ型レジスト組成物
US5296332A (en) *	1991-11-22	1994-03-22	International Business Machines Corporation	Crosslinkable aqueous developable photoresist compositions and method for use thereof
EP0599779A1 (de) *	1992-10-29	1994-06-01	OCG Microelectronic Materials AG	Hochauflösender negativ arbeitender Photoresist mit grossem Prozessspielraum
JP3148426B2 (ja) *	1992-12-25	2001-03-19	クラリアントインターナショナルリミテッド	パターン形成用材料
TW288112B (de) *	1993-06-02	1996-10-11	Sumitomo Chemical Co
JP3203995B2 (ja) *	1993-12-24	2001-09-04	ジェイエスアール株式会社	感放射線性樹脂組成物
JP3573358B2 (ja) *	1994-02-25	2004-10-06	クラリアントインターナショナルリミテッド	放射線感応性組成物
US5558971A (en) *	1994-09-02	1996-09-24	Wako Pure Chemical Industries, Ltd.	Resist material

1995
- 1995-07-26 JP JP21118395A patent/JP3506817B2/ja not_active Expired - Lifetime
1996
- 1996-07-04 DE DE69626898T patent/DE69626898T2/de not_active Expired - Lifetime
- 1996-07-04 EP EP96110854A patent/EP0756203B1/de not_active Expired - Lifetime
- 1996-07-24 US US08/685,850 patent/US5773191A/en not_active Expired - Fee Related

Also Published As

Publication number	Publication date
EP0756203A1 (de)	1997-01-29
EP0756203B1 (de)	2003-03-26
JP3506817B2 (ja)	2004-03-15
JPH0943837A (ja)	1997-02-14
DE69626898T2 (de)	2003-09-11
US5773191A (en)	1998-06-30

Legal Events

Date	Code	Title	Description
2004-04-22	8364	No opposition during term of opposition
2006-03-23	8327	Change in the person/name/address of the patent owner	Owner name: AZ ELECTRONIC MATERIALS USA CORP., SOMERVILLE, N.J
2006-03-23	8328	Change in the person/name/address of the agent	Representative=s name: PATENTANWAELTE ISENBRUCK BOESL HOERSCHLER WICHMANN HU

Publication	Publication Date	Title
FI974241A0 (fi)	1997-11-14	BPM-15 -koostumukset
DE69618854T2 (de)	2002-07-11	Fotopolymerisierbare Zusammensetzung
ID16345A (id)	1997-09-25	Senyawa-senyawa heterosiklik
DK1114817T3 (da)	2004-04-26	Substituerede benzylaminopiperidinforbindelser
DE69607710T2 (de)	2000-08-17	Lichtempfindliche Zusammensetzung
KR970002471A (ko)	1997-01-24	포지티브형 포토레지스트조성물
BR9607058A (pt)	1998-12-15	Composição
BR9606809A (pt)	1997-12-30	Composição inseticidamente ativa
NO981568D0 (no)	1998-04-06	Randtennings-tennsatssammensetninger
DE69605381T2 (de)	2000-04-06	Fotoresistzusammensetzung
DE69617029D1 (de)	2001-12-20	Organoton-zusammensetzungen
DE69604601D1 (de)	1999-11-18	Fotopolymerisierbare Zusammensetzung
EE9800172A (et)	1998-12-15	Ühendid
PT728814E (pt)	2002-09-30	Composicao betuminosa
DE69626898D1 (de)	2003-04-30	Strahlungsempfindliche Zusammensetzung
DE69616104T2 (de)	2002-03-14	Lichtempfindliche Zusammensetzung
BR9609903A (pt)	1999-05-25	ComposiçÃo inseticidamente ativa
NO974170D0 (no)	1997-09-09	Polyazacykloalkan-forbindelser
DE69616374D1 (de)	2001-11-29	Germizide zusammensetzung
DE69502645D1 (de)	1998-07-02	Fotoempfindliche Zusammensetzung
DE69603228T2 (de)	1999-11-11	Aluminoxanate-Zusammensetzungen
ATE206150T1 (de)	2001-10-15	Farbstoffstabilisierte zusammensetzungen
BR9607946A (pt)	1998-06-02	Composição
DE69603749D1 (de)	1999-09-16	Feste zusammensetzung
DE69605584D1 (de)	2000-01-20	Fotopolymerisierbare Zusammensetzung