DE69625126T2 - Verfahren zur Kontrolle von Excimerlaserausgangsstrahlung - Google Patents

Verfahren zur Kontrolle von Excimerlaserausgangsstrahlung

Info

Publication number
DE69625126T2
DE69625126T2 DE69625126T DE69625126T DE69625126T2 DE 69625126 T2 DE69625126 T2 DE 69625126T2 DE 69625126 T DE69625126 T DE 69625126T DE 69625126 T DE69625126 T DE 69625126T DE 69625126 T2 DE69625126 T2 DE 69625126T2
Authority
DE
Germany
Prior art keywords
excimer laser
laser output
output radiation
controlling
controlling excimer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69625126T
Other languages
English (en)
Other versions
DE69625126D1 (de
Inventor
Noriyasu Hasegawa
Kunitaka Ozawa
Hiroshi Kurosawa
Keiji Yoshimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP7137860A external-priority patent/JPH08330681A/ja
Priority claimed from JP7140569A external-priority patent/JPH08335546A/ja
Priority claimed from JP7141946A external-priority patent/JPH08334904A/ja
Priority claimed from JP8018380A external-priority patent/JPH09190966A/ja
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69625126D1 publication Critical patent/DE69625126D1/de
Publication of DE69625126T2 publication Critical patent/DE69625126T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/134—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
DE69625126T 1995-06-05 1996-06-04 Verfahren zur Kontrolle von Excimerlaserausgangsstrahlung Expired - Fee Related DE69625126T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP7137860A JPH08330681A (ja) 1995-06-05 1995-06-05 エキシマレーザの出力制御方法
JP7140569A JPH08335546A (ja) 1995-06-07 1995-06-07 照明方法及び照明装置及びそれを用いた走査型露光装置
JP7141946A JPH08334904A (ja) 1995-06-08 1995-06-08 光量制御方法及び光量制御装置及びそれを用いた露光装置
JP8018380A JPH09190966A (ja) 1996-01-08 1996-01-08 走査型露光装置及びそれを用いたデバイスの製造方法

Publications (2)

Publication Number Publication Date
DE69625126D1 DE69625126D1 (de) 2003-01-16
DE69625126T2 true DE69625126T2 (de) 2003-07-31

Family

ID=27456949

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69625126T Expired - Fee Related DE69625126T2 (de) 1995-06-05 1996-06-04 Verfahren zur Kontrolle von Excimerlaserausgangsstrahlung

Country Status (4)

Country Link
US (1) US5757838A (de)
EP (1) EP0748009B1 (de)
KR (1) KR100239628B1 (de)
DE (1) DE69625126T2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5793842A (en) 1995-02-27 1998-08-11 Schloemer; Jerry R. System and method of call routing and connection in a mobile (remote) radio telephone system
JP3413160B2 (ja) 2000-06-15 2003-06-03 キヤノン株式会社 照明装置及びそれを用いた走査型露光装置
JP3576960B2 (ja) * 2000-11-10 2004-10-13 キヤノン株式会社 走査型露光装置及びデバイス製造方法
US10234765B2 (en) 2017-06-05 2019-03-19 Coherent Lasersystems Gmbh & Co. Kg Energy controller for excimer-laser silicon crystallization

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2210945C3 (de) * 1972-03-07 1978-09-21 Gerhard 8200 Rosenheim Krause Belichtungsmefigerät
US4519692A (en) * 1983-04-08 1985-05-28 Warner-Lambert Technologies, Inc. Exposure and camera control
US4822975A (en) * 1984-01-30 1989-04-18 Canon Kabushiki Kaisha Method and apparatus for scanning exposure
US5171965A (en) * 1984-02-01 1992-12-15 Canon Kabushiki Kaisha Exposure method and apparatus
JPS6197830A (ja) * 1984-10-18 1986-05-16 Canon Inc 露光装置
JPH0614508B2 (ja) * 1985-03-06 1994-02-23 キヤノン株式会社 ステップアンドリピート露光方法
DE3750174T2 (de) * 1986-10-30 1994-11-17 Canon Kk Belichtungseinrichtung.
US4884101A (en) * 1987-02-03 1989-11-28 Nikon Corporation Apparatus capable of adjusting the light amount
JPS63193130A (ja) * 1987-02-05 1988-08-10 Canon Inc 光量制御装置
US4804978A (en) * 1988-02-19 1989-02-14 The Perkin-Elmer Corporation Exposure control system for full field photolithography using pulsed sources
JP2569711B2 (ja) * 1988-04-07 1997-01-08 株式会社ニコン 露光制御装置及び該装置による露光方法
US5191374A (en) * 1988-11-17 1993-03-02 Nikon Corporation Exposure control apparatus
JPH02177415A (ja) * 1988-12-28 1990-07-10 Canon Inc 露光装置
JPH02177313A (ja) * 1988-12-28 1990-07-10 Canon Inc 露光制御装置
US5475491A (en) * 1989-02-10 1995-12-12 Canon Kabushiki Kaisha Exposure apparatus
US5121160A (en) * 1989-03-09 1992-06-09 Canon Kabushiki Kaisha Exposure method and apparatus
JP2731953B2 (ja) * 1989-08-07 1998-03-25 キヤノン株式会社 エネルギー量制御装置
JP2849944B2 (ja) * 1990-07-11 1999-01-27 キヤノン株式会社 露光装置及びエネルギー制御装置並びに半導体素子の製造方法
US5250797A (en) * 1990-10-05 1993-10-05 Canon Kabushiki Kaisha Exposure method and apparatus for controlling light pulse emission using determined exposure quantities and control parameters
JP2902172B2 (ja) * 1991-09-04 1999-06-07 キヤノン株式会社 露光装置
JP2779566B2 (ja) * 1992-07-17 1998-07-23 株式会社小松製作所 エキシマレーザ装置の制御装置
US5463650A (en) * 1992-07-17 1995-10-31 Kabushiki Kaisha Komatsu Seisakusho Apparatus for controlling output of an excimer laser device
JP2779571B2 (ja) * 1992-11-30 1998-07-23 株式会社小松製作所 レーザ装置の出力制御装置
JP2779569B2 (ja) * 1992-10-19 1998-07-23 株式会社小松製作所 レーザ装置の出力制御装置
JP3425447B2 (ja) * 1992-09-14 2003-07-14 株式会社小松製作所 エキシマレーザ装置の出力制御装置
JPH06119971A (ja) * 1992-10-02 1994-04-28 Seikosha Co Ltd Ｅｌ素子の製造方法
JP2862477B2 (ja) * 1993-06-29 1999-03-03 キヤノン株式会社 露光装置及び該露光装置を用いてデバイスを製造する方法

Also Published As

Publication number Publication date
DE69625126D1 (de) 2003-01-16
EP0748009B1 (de) 2002-12-04
EP0748009A2 (de) 1996-12-11
US5757838A (en) 1998-05-26
KR970002485A (ko) 1997-01-24
EP0748009A3 (de) 1997-11-05
KR100239628B1 (ko) 2000-02-01

Similar Documents

Publication Publication Date Title
DE59602559D1 (de) Laserstrahlgerät und verfahren zur bearbeitung von werkstücken
DE69527076D1 (de) Excimerlasersystem zur sehkorrektur
DE69322805D1 (de) Verfahren zur Steuerung von Tonquellenposition
DE69331453D1 (de) Vorrichtung zur Erzeugung von Laserstrahlen
DE69603255T2 (de) Verfahren zur modifizierung von oberflächen
DE59606916D1 (de) Lasergravuranlage
DE59601470D1 (de) Verfahren und vorrichtung zur ansteuerung von diodengepumpten festkörperlasern
DE69310681T2 (de) Laserstrahlschneidverfahren
DE69627957D1 (de) Ausgangsleistungsapparat und Verfahren zur Steuerung desselben
ATE157981T1 (de) Verfahren zur herstellung von kalium clavulanat
DE69601074D1 (de) Verfahren zur erzeugung von langen laserpulsen
DE69605902D1 (de) Verfahren zur stabilisierung von schlamm
DE69308567D1 (de) Verfahren und vorrichtung zur steuerung von geldausgabe
ATE187727T1 (de) Verfahren zur herstellung von imidazo- benzodiazepin-derivaten
DE69402315T2 (de) Laserstrahlschneidverfahren
DE69628203D1 (de) Verfahren zur herstellung von phenylimidazolin-derivaten
DE69418318D1 (de) Verfahren zur krafterzeugung
ATE309230T1 (de) Verfahren zur herstellung von 2- chlorthiazolderivaten
DK0626106T3 (da) Laserkontrolfremgangsmåde og -apparatur
DE69323615D1 (de) Verfahren zur kontrolle von baumwuchs
DE69625126T2 (de) Verfahren zur Kontrolle von Excimerlaserausgangsstrahlung
ATA182793A (de) Verfahren zur insektenbekämpfung
DE59106946D1 (de) Stromquelle und Verfahren zur Steuerung einer Stromquelle.
DE59505311D1 (de) Stabilisierte multifrequenz-lichtquelle sowie verfahren zur erzeugung von synthetischer lichtwellenlänge
DE59607463D1 (de) Vorrichtung zur kontrolle von flächenmassen

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee