DE69621517D1 - Integrierte monolithische Mikrowellenschaltung und Verfahren - Google Patents
Integrierte monolithische Mikrowellenschaltung und VerfahrenInfo
- Publication number
- DE69621517D1 DE69621517D1 DE69621517T DE69621517T DE69621517D1 DE 69621517 D1 DE69621517 D1 DE 69621517D1 DE 69621517 T DE69621517 T DE 69621517T DE 69621517 T DE69621517 T DE 69621517T DE 69621517 D1 DE69621517 D1 DE 69621517D1
- Authority
- DE
- Germany
- Prior art keywords
- microwave circuit
- monolithic microwave
- integrated monolithic
- integrated
- circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/0605—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits made of compound material, e.g. AIIIBV
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/58—Structural electrical arrangements for semiconductor devices not otherwise provided for
- H01L2223/64—Impedance arrangements
- H01L2223/66—High-frequency adaptations
- H01L2223/6605—High-frequency electrical connections
- H01L2223/6627—Waveguides, e.g. microstrip line, strip line, coplanar line
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/58—Structural electrical arrangements for semiconductor devices not otherwise provided for
- H01L2223/64—Impedance arrangements
- H01L2223/66—High-frequency adaptations
- H01L2223/6644—Packaging aspects of high-frequency amplifiers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/58—Structural electrical arrangements for semiconductor devices not otherwise provided for
- H01L2223/64—Impedance arrangements
- H01L2223/66—High-frequency adaptations
- H01L2223/6683—High-frequency adaptations for monolithic microwave integrated circuit [MMIC]
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/430,067 US5528209A (en) | 1995-04-27 | 1995-04-27 | Monolithic microwave integrated circuit and method |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69621517D1 true DE69621517D1 (de) | 2002-07-11 |
DE69621517T2 DE69621517T2 (de) | 2002-09-26 |
Family
ID=23705930
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69621517T Expired - Lifetime DE69621517T2 (de) | 1995-04-27 | 1996-04-25 | Integrierte monolithische Mikrowellenschaltung und Verfahren |
Country Status (4)
Country | Link |
---|---|
US (1) | US5528209A (de) |
EP (1) | EP0741414B1 (de) |
JP (1) | JPH0917959A (de) |
DE (1) | DE69621517T2 (de) |
Families Citing this family (53)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5994721A (en) | 1995-06-06 | 1999-11-30 | Ois Optical Imaging Systems, Inc. | High aperture LCD with insulating color filters overlapping bus lines on active substrate |
US5641974A (en) | 1995-06-06 | 1997-06-24 | Ois Optical Imaging Systems, Inc. | LCD with bus lines overlapped by pixel electrodes and photo-imageable insulating layer therebetween |
US6310394B1 (en) * | 1996-06-28 | 2001-10-30 | Tyco Electronics | Reduced parasitic capacitance semiconductor devices |
US5883422A (en) * | 1996-06-28 | 1999-03-16 | The Whitaker Corporation | Reduced parasitic capacitance semiconductor devices |
JPH10163772A (ja) * | 1996-10-04 | 1998-06-19 | Sanyo Electric Co Ltd | 電力増幅器およびチップキャリヤ |
JP4330919B2 (ja) * | 1997-03-14 | 2009-09-16 | 株式会社東芝 | マイクロ波集積回路素子 |
US5886597A (en) * | 1997-03-28 | 1999-03-23 | Virginia Tech Intellectual Properties, Inc. | Circuit structure including RF/wideband resonant vias |
US5945734A (en) * | 1997-09-19 | 1999-08-31 | Samsung Electronics Co., Ltd. | Wire-bond free input/output interface for GaAs ICs with means of determining known good die |
US6011274A (en) * | 1997-10-20 | 2000-01-04 | Ois Optical Imaging Systems, Inc. | X-ray imager or LCD with bus lines overlapped by pixel electrodes and dual insulating layers therebetween |
US6359672B2 (en) | 1997-10-20 | 2002-03-19 | Guardian Industries Corp. | Method of making an LCD or X-ray imaging device with first and second insulating layers |
FR2793008B1 (fr) * | 1999-04-30 | 2001-07-27 | Valeurs Bois Ind | Procede d'extraction de jus naturel de matieres vegetales ligneuses, dispositif permettant la mise en oeuvre du procede et utilisation du procede pour la production de vegetaux ligneux seches |
EP0940848A3 (de) * | 1998-03-05 | 2000-03-22 | Interuniversitair Micro-Elektronica Centrum Vzw | Verlustarme Leiterbahn und Verfahren zu ihrer Herstellung |
US6259148B1 (en) | 1998-08-13 | 2001-07-10 | International Business Machines Corporation | Modular high frequency integrated circuit structure |
US6222246B1 (en) * | 1999-01-08 | 2001-04-24 | Intel Corporation | Flip-chip having an on-chip decoupling capacitor |
US6693033B2 (en) * | 2000-02-10 | 2004-02-17 | Motorola, Inc. | Method of removing an amorphous oxide from a monocrystalline surface |
US20020008234A1 (en) * | 2000-06-28 | 2002-01-24 | Motorola, Inc. | Mixed-signal semiconductor structure, device including the structure, and methods of forming the device and the structure |
US20020096683A1 (en) * | 2001-01-19 | 2002-07-25 | Motorola, Inc. | Structure and method for fabricating GaN devices utilizing the formation of a compliant substrate |
KR20020070739A (ko) * | 2001-03-03 | 2002-09-11 | 삼성전자 주식회사 | 단일 칩 고주파 집적회로 및 그 제조 방법 |
TW546819B (en) * | 2001-05-30 | 2003-08-11 | Sharp Kk | Semiconductor device, manufacturing method thereof, and monolithic microwave integrated circuit |
US6709989B2 (en) | 2001-06-21 | 2004-03-23 | Motorola, Inc. | Method for fabricating a semiconductor structure including a metal oxide interface with silicon |
US6693298B2 (en) | 2001-07-20 | 2004-02-17 | Motorola, Inc. | Structure and method for fabricating epitaxial semiconductor on insulator (SOI) structures and devices utilizing the formation of a compliant substrate for materials used to form same |
US7019332B2 (en) * | 2001-07-20 | 2006-03-28 | Freescale Semiconductor, Inc. | Fabrication of a wavelength locker within a semiconductor structure |
US6639249B2 (en) * | 2001-08-06 | 2003-10-28 | Motorola, Inc. | Structure and method for fabrication for a solid-state lighting device |
US20030026310A1 (en) * | 2001-08-06 | 2003-02-06 | Motorola, Inc. | Structure and method for fabrication for a lighting device |
US6673667B2 (en) * | 2001-08-15 | 2004-01-06 | Motorola, Inc. | Method for manufacturing a substantially integral monolithic apparatus including a plurality of semiconductor materials |
JP3674780B2 (ja) * | 2001-11-29 | 2005-07-20 | ユーディナデバイス株式会社 | 高周波半導体装置 |
US7169619B2 (en) * | 2002-11-19 | 2007-01-30 | Freescale Semiconductor, Inc. | Method for fabricating semiconductor structures on vicinal substrates using a low temperature, low pressure, alkaline earth metal-rich process |
US6806202B2 (en) | 2002-12-03 | 2004-10-19 | Motorola, Inc. | Method of removing silicon oxide from a surface of a substrate |
US6963090B2 (en) * | 2003-01-09 | 2005-11-08 | Freescale Semiconductor, Inc. | Enhancement mode metal-oxide-semiconductor field effect transistor |
NL1027745C1 (nl) * | 2004-12-14 | 2006-06-16 | Bosma Beheersmij B V H O D N M | Verliesarme, asymmetrische combinator voor faseverschil systemen en adaptieve RF-versterker omvattende een asymmetrische combinator. |
US8324660B2 (en) | 2005-05-17 | 2012-12-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lattice-mismatched semiconductor structures with reduced dislocation defect densities and related methods for device fabrication |
US9153645B2 (en) | 2005-05-17 | 2015-10-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lattice-mismatched semiconductor structures with reduced dislocation defect densities and related methods for device fabrication |
US7777250B2 (en) | 2006-03-24 | 2010-08-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lattice-mismatched semiconductor structures and related methods for device fabrication |
EP2062290B1 (de) | 2006-09-07 | 2019-08-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Defektreduzierung durch kontrolle des aspektverhältnisses |
US7875958B2 (en) | 2006-09-27 | 2011-01-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Quantum tunneling devices and circuits with lattice-mismatched semiconductor structures |
US8502263B2 (en) | 2006-10-19 | 2013-08-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Light-emitter-based devices with lattice-mismatched semiconductor structures |
US7825328B2 (en) | 2007-04-09 | 2010-11-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Nitride-based multi-junction solar cell modules and methods for making the same |
US8237151B2 (en) | 2009-01-09 | 2012-08-07 | Taiwan Semiconductor Manufacturing Company, Ltd. | Diode-based devices and methods for making the same |
US8304805B2 (en) | 2009-01-09 | 2012-11-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor diodes fabricated by aspect ratio trapping with coalesced films |
WO2008124154A2 (en) | 2007-04-09 | 2008-10-16 | Amberwave Systems Corporation | Photovoltaics on silicon |
US8329541B2 (en) | 2007-06-15 | 2012-12-11 | Taiwan Semiconductor Manufacturing Company, Ltd. | InP-based transistor fabrication |
US8344242B2 (en) | 2007-09-07 | 2013-01-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Multi-junction solar cells |
JP5337041B2 (ja) * | 2007-10-09 | 2013-11-06 | パナソニック株式会社 | 回路装置 |
US8183667B2 (en) | 2008-06-03 | 2012-05-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | Epitaxial growth of crystalline material |
US8274097B2 (en) | 2008-07-01 | 2012-09-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Reduction of edge effects from aspect ratio trapping |
US8981427B2 (en) | 2008-07-15 | 2015-03-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Polishing of small composite semiconductor materials |
US20100072515A1 (en) | 2008-09-19 | 2010-03-25 | Amberwave Systems Corporation | Fabrication and structures of crystalline material |
WO2010033813A2 (en) | 2008-09-19 | 2010-03-25 | Amberwave System Corporation | Formation of devices by epitaxial layer overgrowth |
US8253211B2 (en) | 2008-09-24 | 2012-08-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor sensor structures with reduced dislocation defect densities |
JP2010205941A (ja) | 2009-03-03 | 2010-09-16 | Panasonic Corp | 半導体チップ及び半導体装置 |
SG171987A1 (en) | 2009-04-02 | 2011-07-28 | Taiwan Semiconductor Mfg | Devices formed from a non-polar plane of a crystalline material and method of making the same |
US9912303B2 (en) * | 2010-02-03 | 2018-03-06 | Massachusetts Institute Of Technology | RF-input / RF-output outphasing amplifier |
FI130081B (en) * | 2019-03-18 | 2023-01-31 | Teknologian Tutkimuskeskus Vtt Oy | Wilkinson divider |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4967201A (en) * | 1987-10-22 | 1990-10-30 | Westinghouse Electric Corp. | Multi-layer single substrate microwave transmit/receive module |
US5040047A (en) * | 1989-12-26 | 1991-08-13 | General Electric Company | Enhanced fluorescence polymers and interconnect structures using them |
US5202752A (en) * | 1990-05-16 | 1993-04-13 | Nec Corporation | Monolithic integrated circuit device |
JPH06125208A (ja) * | 1992-10-09 | 1994-05-06 | Mitsubishi Electric Corp | マイクロ波集積回路およびその製造方法 |
JPH0758526A (ja) * | 1993-08-10 | 1995-03-03 | Nippon Telegr & Teleph Corp <Ntt> | 集積回路 |
US5521406A (en) * | 1994-08-31 | 1996-05-28 | Texas Instruments Incorporated | Integrated circuit with improved thermal impedance |
-
1995
- 1995-04-27 US US08/430,067 patent/US5528209A/en not_active Expired - Lifetime
-
1996
- 1996-04-25 DE DE69621517T patent/DE69621517T2/de not_active Expired - Lifetime
- 1996-04-25 EP EP96106512A patent/EP0741414B1/de not_active Expired - Lifetime
- 1996-04-26 JP JP8106894A patent/JPH0917959A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
DE69621517T2 (de) | 2002-09-26 |
EP0741414A2 (de) | 1996-11-06 |
EP0741414B1 (de) | 2002-06-05 |
US5528209A (en) | 1996-06-18 |
JPH0917959A (ja) | 1997-01-17 |
EP0741414A3 (de) | 1998-10-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |