DE69610674T2 - Halogenfreie Polyarylenetherdielectrika - Google Patents

Halogenfreie Polyarylenetherdielectrika

Info

Publication number
DE69610674T2
DE69610674T2 DE69610674T DE69610674T DE69610674T2 DE 69610674 T2 DE69610674 T2 DE 69610674T2 DE 69610674 T DE69610674 T DE 69610674T DE 69610674 T DE69610674 T DE 69610674T DE 69610674 T2 DE69610674 T2 DE 69610674T2
Authority
DE
Germany
Prior art keywords
dielectrics
halogen
polyarylene ether
free
free polyarylene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69610674T
Other languages
English (en)
Other versions
DE69610674D1 (de
Inventor
Burgoyne, Jr
Raymond Nicholas Vrtis
Lloyd Mahlon Robeson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Products and Chemicals Inc
Original Assignee
Air Products and Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Products and Chemicals Inc filed Critical Air Products and Chemicals Inc
Application granted granted Critical
Publication of DE69610674D1 publication Critical patent/DE69610674D1/de
Publication of DE69610674T2 publication Critical patent/DE69610674T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
    • C08G65/38—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols
    • C08G65/40—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • H01B3/42—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes polyesters; polyethers; polyacetals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49866—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials
    • H01L23/49894—Materials of the insulating layers or coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
    • H01L23/5329—Insulating materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2203/00—Applications
    • C08L2203/20—Applications use in electrical or conductive gadgets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
    • H01L2924/097—Glass-ceramics, e.g. devitrified glass
    • H01L2924/09701—Low temperature co-fired ceramic [LTCC]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31533—Of polythioether
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
    • Y10T428/31645—Next to addition polymer from unsaturated monomers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31667—Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
DE69610674T 1995-07-13 1996-07-11 Halogenfreie Polyarylenetherdielectrika Expired - Lifetime DE69610674T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/502,511 US5658994A (en) 1995-07-13 1995-07-13 Nonfunctionalized poly(arylene ether) dielectrics

Publications (2)

Publication Number Publication Date
DE69610674D1 DE69610674D1 (de) 2000-11-23
DE69610674T2 true DE69610674T2 (de) 2001-05-17

Family

ID=23998165

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69610674T Expired - Lifetime DE69610674T2 (de) 1995-07-13 1996-07-11 Halogenfreie Polyarylenetherdielectrika

Country Status (8)

Country Link
US (1) US5658994A (de)
EP (1) EP0758664B1 (de)
JP (1) JP2933124B2 (de)
KR (1) KR100215325B1 (de)
DE (1) DE69610674T2 (de)
IL (1) IL118813A (de)
SG (1) SG43382A1 (de)
TW (1) TW334571B (de)

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KR19990024596A (ko) * 1997-09-04 1999-04-06 윤종용 광통신용 폴리아릴렌에테르
US6124421A (en) * 1997-12-12 2000-09-26 Alliedsignal Inc. Poly(arylene ether) compositions and methods of manufacture thereof
US6303733B1 (en) 1997-12-12 2001-10-16 Alliedsignal Inc. Poly(arylene ether) homopolymer compositions and methods of manufacture thereof
US6235353B1 (en) * 1998-02-24 2001-05-22 Alliedsignal Inc. Low dielectric constant films with high glass transition temperatures made by electron beam curing
US6060170A (en) * 1998-02-25 2000-05-09 Air Products And Chemicals, Inc. Functional groups for thermal crosslinking of polymeric systems
US6333141B1 (en) 1998-07-08 2001-12-25 International Business Machines Corporation Process for manufacture of integrated circuit device using inorganic/organic matrix comprising polymers of three dimensional architecture
US6143643A (en) * 1998-07-08 2000-11-07 International Business Machines Corporation Process for manufacture of integrated circuit device using organosilicate insulative matrices
US6093636A (en) * 1998-07-08 2000-07-25 International Business Machines Corporation Process for manufacture of integrated circuit device using a matrix comprising porous high temperature thermosets
US6174800B1 (en) 1998-09-08 2001-01-16 Taiwan Semiconductor Manufacturing Company Via formation in a poly(arylene ether) inter metal dielectric layer
US6472335B1 (en) 1998-10-19 2002-10-29 Taiwan Semiconductor Manufacturing Company Methods of adhesion promoter between low-K layer and underlying insulating layer
US6187248B1 (en) 1998-11-19 2001-02-13 Air Products And Chemicals, Inc. Nanoporous polymer films for extreme low and interlayer dielectrics
US6399666B1 (en) 1999-01-27 2002-06-04 International Business Machines Corporation Insulative matrix material
US6391082B1 (en) * 1999-07-02 2002-05-21 Holl Technologies Company Composites of powdered fillers and polymer matrix
US7538237B2 (en) * 1999-07-02 2009-05-26 Kreido Laboratories Process for high shear gas-liquid reactions
US6471392B1 (en) 2001-03-07 2002-10-29 Holl Technologies Company Methods and apparatus for materials processing
US6742774B2 (en) * 1999-07-02 2004-06-01 Holl Technologies Company Process for high shear gas-liquid reactions
JP2001181577A (ja) 1999-12-27 2001-07-03 Sumitomo Chem Co Ltd 多孔質有機膜形成用塗布液および多孔質有機膜の形成方法
US6468589B2 (en) * 2000-02-02 2002-10-22 Jsr Corporation Composition for film formation and insulating film
JP4496448B2 (ja) * 2000-07-24 2010-07-07 Ｊｓｒ株式会社 塗膜形成方法およびそれを用いた絶縁膜
JP4588179B2 (ja) * 2000-08-21 2010-11-24 株式会社日本触媒 多層配線基板
CA2441901A1 (en) * 2001-04-06 2002-10-17 Paul Apen Low dielectric constant materials and methods of preparation thereof
US6830806B2 (en) * 2001-04-12 2004-12-14 Kreido Laboratories Methods of manufacture of electric circuit substrates and components having multiple electric characteristics and substrates and components so manufactured
US20030066624A1 (en) * 2001-09-13 2003-04-10 Holl Richard A. Methods and apparatus for transfer of heat energy between a body surface and heat transfer fluid
US6787246B2 (en) 2001-10-05 2004-09-07 Kreido Laboratories Manufacture of flat surfaced composites comprising powdered fillers in a polymer matrix
US20040247896A1 (en) * 2001-12-31 2004-12-09 Paul Apen Organic compositions
US6716955B2 (en) * 2002-01-14 2004-04-06 Air Products And Chemicals, Inc. Poly(arylene ether) polymer with low temperature crosslinking grafts and adhesive comprising the same
US6660645B1 (en) 2002-01-17 2003-12-09 Advanced Micro Devices, Inc. Process for etching an organic dielectric using a silyated photoresist mask
US6806182B2 (en) 2002-05-01 2004-10-19 International Business Machines Corporation Method for eliminating via resistance shift in organic ILD
US7098360B2 (en) * 2002-07-16 2006-08-29 Kreido Laboratories Processes employing multiple successive chemical reaction process steps and apparatus therefore
US7165881B2 (en) * 2002-09-11 2007-01-23 Holl Technologies Corporation Methods and apparatus for high-shear mixing and reacting of materials
US6818919B2 (en) * 2002-09-23 2004-11-16 Air Products And Chemicals, Inc. Light emitting layers for LED devices based on high Tg polymer matrix compositions
US6846899B2 (en) * 2002-10-01 2005-01-25 Chartered Semiconductor Manufacturing Ltd. Poly(arylene ether) dielectrics
WO2004030802A2 (en) * 2002-10-03 2004-04-15 Kreido Laboratories Apparatus for transfer of heat energy between a body surface and heat transfer fluid
JP4243209B2 (ja) * 2003-03-28 2009-03-25 富士フイルム株式会社 絶縁膜形成材料及びそれを用いた絶縁膜
US7309833B2 (en) * 2003-07-29 2007-12-18 Air Products And Chemicals, Inc. Photovoltaic devices comprising layer(s) of photoactive organics dissolved in high Tg polymers
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JP4802933B2 (ja) * 2006-08-17 2011-10-26 セイコーエプソン株式会社 半導体装置、電子装置及び電子機器
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US8153617B2 (en) * 2007-08-10 2012-04-10 Allaccem, Inc. Bridged polycyclic compound based compositions for coating oral surfaces in humans
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Also Published As

Publication number Publication date
TW334571B (en) 1998-06-21
JPH09202823A (ja) 1997-08-05
EP0758664B1 (de) 2000-10-18
IL118813A (en) 2000-10-31
KR970006354A (ko) 1997-02-19
JP2933124B2 (ja) 1999-08-09
KR100215325B1 (ko) 1999-08-16
IL118813A0 (en) 1996-10-31
US5658994A (en) 1997-08-19
SG43382A1 (en) 1997-10-17
DE69610674D1 (de) 2000-11-23
EP0758664A1 (de) 1997-02-19

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