DE69600636D1 - Silikaglas für Photolithographie, optisches Element damit, Belichtungsapparat damit und Verfahren zu dessen Herstellung - Google Patents

Silikaglas für Photolithographie, optisches Element damit, Belichtungsapparat damit und Verfahren zu dessen Herstellung

Info

Publication number
DE69600636D1
DE69600636D1 DE69600636T DE69600636T DE69600636D1 DE 69600636 D1 DE69600636 D1 DE 69600636D1 DE 69600636 T DE69600636 T DE 69600636T DE 69600636 T DE69600636 T DE 69600636T DE 69600636 D1 DE69600636 D1 DE 69600636D1
Authority
DE
Germany
Prior art keywords
photolithography
production
optical element
exposure apparatus
silica glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69600636T
Other languages
English (en)
Other versions
DE69600636T2 (de
Inventor
Hiroki Jinbo
Norio Komine
Hiroyuki Hiraiwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26333474&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69600636(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of DE69600636D1 publication Critical patent/DE69600636D1/de
Application granted granted Critical
Publication of DE69600636T2 publication Critical patent/DE69600636T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C03B19/1423—Reactant deposition burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/11—Doped silica-based glasses containing boron or halide containing chlorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C03C2203/42—Gas-phase processes using silicon halides as starting materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C03C2203/42—Gas-phase processes using silicon halides as starting materials
    • C03C2203/44—Gas-phase processes using silicon halides as starting materials chlorine containing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates
DE69600636T 1995-01-06 1996-01-05 Silikaglas für Photolithographie, optisches Element damit, Belichtungsapparat damit und Verfahren zu dessen Herstellung Expired - Lifetime DE69600636T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP47995 1995-01-06
JP407795 1995-01-13

Publications (2)

Publication Number Publication Date
DE69600636D1 true DE69600636D1 (de) 1998-10-22
DE69600636T2 DE69600636T2 (de) 1999-03-25

Family

ID=26333474

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69600636T Expired - Lifetime DE69600636T2 (de) 1995-01-06 1996-01-05 Silikaglas für Photolithographie, optisches Element damit, Belichtungsapparat damit und Verfahren zu dessen Herstellung

Country Status (4)

Country Link
US (2) US6087283A (de)
EP (1) EP0720970B1 (de)
KR (1) KR100392127B1 (de)
DE (1) DE69600636T2 (de)

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US6442973B1 (en) * 1995-01-06 2002-09-03 Nikon Corporation Synthetic silica glass and its manufacturing method
JPH11209134A (ja) * 1998-01-23 1999-08-03 Nikon Corp 合成石英ガラスおよびその製造方法
EP0835848A3 (de) * 1996-08-21 1998-06-10 Nikon Corporation Fluor enthaltendes Silicaglas, sein Herstellungsverfahren und ein dieses Glas enthaltender Projektionsbelichtungsapparat
US6291377B1 (en) 1997-08-21 2001-09-18 Nikon Corporation Silica glass and its manufacturing method
US6309991B1 (en) * 1996-08-29 2001-10-30 Corning Incorporated Silica with low compaction under high energy irradiation
JP3832008B2 (ja) * 1997-02-28 2006-10-11 株式会社ニコン 石英ガラスの製造装置
US6423656B1 (en) * 1997-03-07 2002-07-23 Schott Ml Gmbh Synthetic quartz glass preform
TW440548B (en) * 1997-05-14 2001-06-16 Nippon Kogaku Kk Synthetic silica glass optical member and method of manufacturing the same
EP1031877A4 (de) 1997-11-11 2001-05-09 Nikon Corp Photomaske, aberrationskorrekturplatte, sowie belichtungsgerät und verfahren zur herstellung einer mikrostruktur
EP0972753B1 (de) * 1998-07-15 2004-03-03 Kitagawa Industries Co., Ltd. Quarzglas, optisches Element und gegen ultraviolette und radioaktive Strahlung resistente faseroptische Vorrichtung, und Herstellungsverfahren dafür
JP2000143278A (ja) * 1998-11-10 2000-05-23 Nikon Corp 耐久性の向上された投影露光装置及び結像光学系の製造方法
US6563567B1 (en) 1998-12-17 2003-05-13 Nikon Corporation Method and apparatus for illuminating a surface using a projection imaging apparatus
KR20010088279A (ko) * 1999-01-06 2001-09-26 시마무라 테루오 투영광학계, 그 제조방법, 및 이를 사용한 투영노광장치
US6319634B1 (en) 1999-03-12 2001-11-20 Corning Incorporated Projection lithography photomasks and methods of making
US6242136B1 (en) 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6682859B2 (en) * 1999-02-12 2004-01-27 Corning Incorporated Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass
US6783898B2 (en) 1999-02-12 2004-08-31 Corning Incorporated Projection lithography photomask blanks, preforms and method of making
US6265115B1 (en) * 1999-03-15 2001-07-24 Corning Incorporated Projection lithography photomask blanks, preforms and methods of making
TW581747B (en) * 1999-02-16 2004-04-01 Nikon Corp Synthetic quartz glass optical member for ultraviolet light
JP4601022B2 (ja) * 1999-03-04 2010-12-22 信越石英株式会社 ＡｒＦエキシマレーザーリソグラフィー用合成石英ガラス部材
AU6321600A (en) * 1999-08-12 2001-03-13 Nikon Corporation Method for preparation of synthetic vitreous silica and apparatus for heat treatment
WO2001023935A1 (fr) 1999-09-29 2001-04-05 Nikon Corporation Procede et dispositif d'exposition par projection, et systeme optique de projection
WO2001023933A1 (fr) 1999-09-29 2001-04-05 Nikon Corporation Systeme optique de projection
ATE289282T1 (de) 1999-10-14 2005-03-15 Schott Ag Anordnung zur erzeugung optisch homogener, schlierenfreier quarzglaskörper durch flammenhydrolyse
US6410192B1 (en) 1999-11-15 2002-06-25 Corning Incorporated Photolithography method, photolithography mask blanks, and method of making
JP2001270731A (ja) * 2000-03-28 2001-10-02 Nikon Corp 合成石英ガラス部材及びこれを用いた光リソグラフィー装置
US6541168B2 (en) 2000-04-28 2003-04-01 Corning Incorporated Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks
US6339505B1 (en) * 2000-06-26 2002-01-15 International Business Machines Corporation Method for radiation projection and lens assembly for semiconductor exposure tools
WO2002021217A1 (en) * 2000-09-08 2002-03-14 Corning Incorporated Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks
EP1288169A1 (de) * 2001-08-30 2003-03-05 Schott Glas Verfahren zur Wasserstoffbeladung von Quarzglaskörpern zur Verbesserung der Brechzahlhomogenität und der Laserfestigkeit bei gleichzeitiger Einhaltung einer vorgegebenen Spannungsdoppelbrechung und danach hergestellte Quarzglaskörper
EP1441994A4 (de) * 2001-09-27 2008-09-03 Corning Inc Quarzgut mit hoher interner transmission und kleiner doppelbrechung
DE10159961C2 (de) 2001-12-06 2003-12-24 Heraeus Quarzglas Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben
DE10159959A1 (de) 2001-12-06 2003-06-26 Heraeus Quarzglas Quarzglasrohling für ein optisches Bauteil und Verwendung desselben
DE10159962A1 (de) 2001-12-06 2003-07-03 Heraeus Quarzglas Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben
JPWO2003080525A1 (ja) * 2002-03-25 2005-07-21 株式会社ニコン 合成石英ガラス部材及びその製造方法
US6910352B2 (en) * 2002-04-24 2005-06-28 Corning Incorporated Deposition of high fluorine content silica soot
JP4370581B2 (ja) * 2003-02-17 2009-11-25 株式会社ニコン 露光装置及び露光装置用光学部材
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US10248032B1 (en) 2018-04-17 2019-04-02 Gooch And Housego Plc Dual cone-based polarizer

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Also Published As

Publication number Publication date
DE69600636T2 (de) 1999-03-25
KR100392127B1 (ko) 2004-06-23
EP0720970B1 (de) 1998-09-16
US6087283A (en) 2000-07-11
US20030119649A1 (en) 2003-06-26
EP0720970A1 (de) 1996-07-10
KR960029908A (ko) 1996-08-17

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8363 Opposition against the patent
8365 Fully valid after opposition proceedings