DE69506865D1 - NIEDERTEMPERATURHERSTELLUNG VON TiN FILMEN MITTELS PLASMA CVD - Google Patents

NIEDERTEMPERATURHERSTELLUNG VON TiN FILMEN MITTELS PLASMA CVD

Info

Publication number
DE69506865D1
DE69506865D1 DE69506865T DE69506865T DE69506865D1 DE 69506865 D1 DE69506865 D1 DE 69506865D1 DE 69506865 T DE69506865 T DE 69506865T DE 69506865 T DE69506865 T DE 69506865T DE 69506865 D1 DE69506865 D1 DE 69506865D1
Authority
DE
Germany
Prior art keywords
low temperature
plasma cvd
temperature production
tin films
tin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69506865T
Other languages
English (en)
Other versions
DE69506865T2 (de
Inventor
Robert Foster
Joseph Hillman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Application granted granted Critical
Publication of DE69506865D1 publication Critical patent/DE69506865D1/de
Publication of DE69506865T2 publication Critical patent/DE69506865T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
DE69506865T 1994-06-03 1995-04-03 NIEDERTEMPERATURHERSTELLUNG VON TiN FILMEN MITTELS PLASMA CVD Expired - Fee Related DE69506865T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/253,978 US5975912A (en) 1994-06-03 1994-06-03 Low temperature plasma-enhanced formation of integrated circuits
PCT/US1995/004127 WO1995033865A1 (en) 1994-06-03 1995-04-03 Low temperature plasma-enhanced formation of integrated circuits

Publications (2)

Publication Number Publication Date
DE69506865D1 true DE69506865D1 (de) 1999-02-04
DE69506865T2 DE69506865T2 (de) 1999-05-27

Family

ID=22962443

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69506865T Expired - Fee Related DE69506865T2 (de) 1994-06-03 1995-04-03 NIEDERTEMPERATURHERSTELLUNG VON TiN FILMEN MITTELS PLASMA CVD

Country Status (9)

Country Link
US (2) US5975912A (de)
EP (1) EP0763146B1 (de)
JP (1) JP3404536B2 (de)
KR (1) KR100355914B1 (de)
AU (1) AU2238595A (de)
CA (1) CA2191458A1 (de)
DE (1) DE69506865T2 (de)
TW (1) TW294827B (de)
WO (1) WO1995033865A1 (de)

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KR970703443A (ko) 1997-07-03
WO1995033865A1 (en) 1995-12-14
KR100355914B1 (ko) 2003-01-08
EP0763146B1 (de) 1998-12-23
DE69506865T2 (de) 1999-05-27
CA2191458A1 (en) 1995-12-14
US5975912A (en) 1999-11-02
TW294827B (de) 1997-01-01
EP0763146A1 (de) 1997-03-19
US6221770B1 (en) 2001-04-24
AU2238595A (en) 1996-01-04
JPH10501100A (ja) 1998-01-27
JP3404536B2 (ja) 2003-05-12

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