DE69501163D1 - Moduliertes Spektralellipsometer - Google Patents

Moduliertes Spektralellipsometer

Info

Publication number
DE69501163D1
DE69501163D1 DE69501163T DE69501163T DE69501163D1 DE 69501163 D1 DE69501163 D1 DE 69501163D1 DE 69501163 T DE69501163 T DE 69501163T DE 69501163 T DE69501163 T DE 69501163T DE 69501163 D1 DE69501163 D1 DE 69501163D1
Authority
DE
Germany
Prior art keywords
spectral ellipsometer
modulated spectral
modulated
ellipsometer
spectral
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69501163T
Other languages
English (en)
Other versions
DE69501163T2 (de
Inventor
Bernard Drevillon
Jean-Yves Parey
Razvigor Ossikovski
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Original Assignee
Centre National de la Recherche Scientifique CNRS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS filed Critical Centre National de la Recherche Scientifique CNRS
Application granted granted Critical
Publication of DE69501163D1 publication Critical patent/DE69501163D1/de
Publication of DE69501163T2 publication Critical patent/DE69501163T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
DE69501163T 1994-01-12 1995-01-10 Moduliertes Spektralellipsometer Expired - Lifetime DE69501163T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9400285A FR2714970B1 (fr) 1994-01-12 1994-01-12 Ellipsomètre spectroscopique modulé.

Publications (2)

Publication Number Publication Date
DE69501163D1 true DE69501163D1 (de) 1998-01-22
DE69501163T2 DE69501163T2 (de) 1998-07-09

Family

ID=9458971

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69501163T Expired - Lifetime DE69501163T2 (de) 1994-01-12 1995-01-10 Moduliertes Spektralellipsometer

Country Status (5)

Country Link
US (1) US5536936A (de)
EP (1) EP0663590B1 (de)
JP (1) JP3782481B2 (de)
DE (1) DE69501163T2 (de)
FR (1) FR2714970B1 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2737572B1 (fr) * 1995-08-03 1997-10-24 Centre Nat Rech Scient Ellipsometre multi-detecteurs et procede de mesure ellipsometrique multi-detecteurs
JP3286138B2 (ja) * 1995-08-03 2002-05-27 日東電工株式会社 導光板、面光源装置、偏光光源装置及び液晶表示装置
EP0841692A3 (de) 1996-11-08 1998-12-23 Matsushita Electric Industrial Co., Ltd. Apparat und Methode zur optischen Halbleiterschaltungs-Kontrolle
US6849470B1 (en) 1996-11-08 2005-02-01 Matsushita Electric Industrial Co., Ltd. Apparatus and method for optical evaluation, apparatus and method for manufacturing semiconductor device, method of controlling apparatus for manufacturing semiconductor device, and semiconductor device
GB9626765D0 (en) 1996-12-23 1997-02-12 Secr Defence In-situ monitoring of electrical properties by ellipsometry
WO1998048252A1 (en) 1997-04-22 1998-10-29 The Regents Of The University Of California Laser detection of material thickness
EP1000330A4 (de) 1997-07-28 2001-11-21 Hinds Instruments Inc Messung der verzögerung einer wellenplatte mittels eines photoelastischen modulators
CA2319729A1 (en) 1998-02-20 1999-08-26 Hinds Instruments, Inc. Birefringence measurement system
FR2784749B1 (fr) 1998-10-14 2000-12-29 Instruments Sa Appareil de caracterisation optique de materiau en couche mince
AU4059200A (en) * 1999-03-31 2000-10-16 Hinds Instruments, Inc. Integrated diagnostic system for photoelastic modulator
US6268916B1 (en) * 1999-05-11 2001-07-31 Kla-Tencor Corporation System for non-destructive measurement of samples
US6697157B2 (en) * 1999-05-24 2004-02-24 Hinds Instruments Birefringence measurement
US6268914B1 (en) 2000-01-14 2001-07-31 Hinds Instruments, Inc. Calibration Process For Birefringence Measurement System
US6535285B1 (en) * 2000-02-08 2003-03-18 Therma-Wave, Inc. Combination thermal wave and optical spectroscopy measurement system
US7002685B2 (en) * 2000-03-31 2006-02-21 Hinds Instruments, Inc System for measuring of both circular and linear birefringence
DE10056768B4 (de) * 2000-11-14 2004-08-26 Stephan la Barré Verfahren und Vorrichtung zur Messung von Eigenschaften einer Probe mit Meßsignal-Modulation
DE60220521T2 (de) * 2001-06-18 2007-09-27 Hinds Instruments, Inc., Hillsboro Doppelbrechungsmessung für wellenlängen im tiefen ultraviolettbereich
EP1446641A4 (de) * 2001-10-15 2009-01-07 Xiangdong Zhu Verfahren und vorrichtungen zur messung des brechnungsindex und optischer absorptionsdifferenzen
US7239392B2 (en) 2003-05-22 2007-07-03 Xitronix Corporation Polarization modulation photoreflectance characterization of semiconductor electronic interfaces
US6963402B2 (en) * 2003-05-22 2005-11-08 Chism Ii William W Polarization modulation photoreflectance characterization of semiconductor quantum confined structures
US20060114478A1 (en) * 2004-11-26 2006-06-01 Applied Materials, Inc. Evaluating effects of tilt angle in ion implantation
KR101314929B1 (ko) * 2005-10-27 2013-10-04 지트로닉스 코포레이션 반도체 구조에서 변형 및 활성 도펀트의 광반사율에 의한특성 기술 방법
JP2009047685A (ja) * 2007-07-25 2009-03-05 Keio Gijuku 光弾性測定方法およびその装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4211488A (en) * 1978-10-03 1980-07-08 Rca Corporation Optical testing of a semiconductor
US4632561A (en) * 1985-04-30 1986-12-30 Therma-Wave, Inc. Evaluation of surface and subsurface characteristics of a sample
US5329357A (en) * 1986-03-06 1994-07-12 Sopra-Societe De Production Et De Recherches Appliquees Spectroscopic ellipsometry apparatus including an optical fiber
US4866264A (en) * 1988-10-31 1989-09-12 Northrop Corporation Method and apparatus for measuring non-reciprocal loss of thin magnetic films and magnetic mirrors
FR2685962B1 (fr) * 1992-01-07 1994-05-20 Centre Nal Recherc Scientifique Ellipsometre infrarouge.

Also Published As

Publication number Publication date
DE69501163T2 (de) 1998-07-09
JP3782481B2 (ja) 2006-06-07
EP0663590A1 (de) 1995-07-19
JPH0850058A (ja) 1996-02-20
FR2714970B1 (fr) 1996-03-29
US5536936A (en) 1996-07-16
EP0663590B1 (de) 1997-12-10
FR2714970A1 (fr) 1995-07-13

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Legal Events

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8364 No opposition during term of opposition