DE69425642D1 - Flüssigkristall-Anzeigevorrichtung - Google Patents

Flüssigkristall-Anzeigevorrichtung

Info

Publication number
DE69425642D1
DE69425642D1 DE69425642T DE69425642T DE69425642D1 DE 69425642 D1 DE69425642 D1 DE 69425642D1 DE 69425642 T DE69425642 T DE 69425642T DE 69425642 T DE69425642 T DE 69425642T DE 69425642 D1 DE69425642 D1 DE 69425642D1
Authority
DE
Germany
Prior art keywords
liquid crystal
display device
crystal display
liquid
display
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69425642T
Other languages
English (en)
Other versions
DE69425642T2 (de
Inventor
Mamoru Miyawaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE69425642D1 publication Critical patent/DE69425642D1/de
Application granted granted Critical
Publication of DE69425642T2 publication Critical patent/DE69425642T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78606Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
    • H01L29/78612Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device for preventing the kink- or the snapback effect, e.g. discharging the minority carriers of the channel region for preventing bipolar effect
    • H01L29/78615Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device for preventing the kink- or the snapback effect, e.g. discharging the minority carriers of the channel region for preventing bipolar effect with a body contact
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1345Conductors connecting electrodes to cell terminals
    • G02F1/13454Drivers integrated on the active matrix substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1203Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being other than a semiconductor body, e.g. an insulating body the substrate comprising an insulating body on a semiconductor body, e.g. SOI
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136213Storage capacitors associated with the pixel electrode
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78606Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
    • H01L29/78618Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure
DE69425642T 1993-12-28 1994-12-23 Flüssigkristall-Anzeigevorrichtung Expired - Lifetime DE69425642T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5337495A JPH07199150A (ja) 1993-12-28 1993-12-28 液晶表示装置

Publications (2)

Publication Number Publication Date
DE69425642D1 true DE69425642D1 (de) 2000-09-28
DE69425642T2 DE69425642T2 (de) 2001-04-19

Family

ID=18309194

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69425642T Expired - Lifetime DE69425642T2 (de) 1993-12-28 1994-12-23 Flüssigkristall-Anzeigevorrichtung

Country Status (4)

Country Link
US (1) US5717473A (de)
EP (1) EP0661582B1 (de)
JP (1) JPH07199150A (de)
DE (1) DE69425642T2 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08264802A (ja) * 1995-03-28 1996-10-11 Semiconductor Energy Lab Co Ltd 半導体作製方法、薄膜トランジスタ作製方法および薄膜トランジスタ
US7271410B2 (en) * 1995-03-28 2007-09-18 Semiconductor Energy Laboratory Co., Ltd. Active matrix circuit
JP3143592B2 (ja) * 1995-09-14 2001-03-07 キヤノン株式会社 表示装置
US5917563A (en) * 1995-10-16 1999-06-29 Sharp Kabushiki Kaisha Liquid crystal display device having an insulation film made of organic material between an additional capacity and a bus line
US5985740A (en) * 1996-01-19 1999-11-16 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a semiconductor device including reduction of a catalyst
JP3645379B2 (ja) * 1996-01-19 2005-05-11 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP3645380B2 (ja) 1996-01-19 2005-05-11 株式会社半導体エネルギー研究所 半導体装置の作製方法、情報端末、ヘッドマウントディスプレイ、ナビゲーションシステム、携帯電話、ビデオカメラ、投射型表示装置
JP3729955B2 (ja) * 1996-01-19 2005-12-21 株式会社半導体エネルギー研究所 半導体装置の作製方法
KR100193987B1 (ko) * 1996-05-11 1999-06-15 구자홍 구동회로 일체형 액정표시소자 및 제조방법
JP3571887B2 (ja) * 1996-10-18 2004-09-29 キヤノン株式会社 アクティブマトリクス基板及び液晶装置
JP3188411B2 (ja) * 1996-10-18 2001-07-16 キヤノン株式会社 反射型液晶装置用画素電極基板、該画素電極基板を用いた液晶装置及び該液晶装置を用いた表示装置
JP3513371B2 (ja) * 1996-10-18 2004-03-31 キヤノン株式会社 マトリクス基板と液晶装置とこれらを用いた表示装置
US6445004B1 (en) 1998-02-26 2002-09-03 Samsung Electronics Co., Ltd. Composition for a wiring, a wiring using the composition, manufacturing method thereof, a display using the wiring and a manufacturing method thereof
US6433841B1 (en) 1997-12-19 2002-08-13 Seiko Epson Corporation Electro-optical apparatus having faces holding electro-optical material in between flattened by using concave recess, manufacturing method thereof, and electronic device using same
TW413949B (en) * 1998-12-12 2000-12-01 Samsung Electronics Co Ltd Thin film transistor array panels for liquid crystal displays and methods of manufacturing the same
TW478169B (en) * 1999-07-16 2002-03-01 Seiko Epson Corp Electro optical device and the projection display device using the same
JP4647843B2 (ja) * 2001-06-28 2011-03-09 株式会社日立製作所 液晶表示装置
JP3575481B2 (ja) * 2003-01-16 2004-10-13 セイコーエプソン株式会社 液晶装置及びその製造方法並びに電子機器
TW594653B (en) * 2003-06-02 2004-06-21 Toppoly Optoelectronics Corp Low leakage thin film transistor circuit
JP2005092122A (ja) * 2003-09-19 2005-04-07 Nec Corp 薄膜トランジスタ基板及びその製造方法
CN112987418B (zh) * 2021-03-01 2022-07-22 福州京东方光电科技有限公司 一种显示面板以及显示装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2042238B (en) * 1979-02-14 1982-12-08 Matsushita Electric Ind Co Ltd Drive circuit for a liquid crystal display panel
JPH06105784B2 (ja) * 1984-07-26 1994-12-21 株式会社日立製作所 半導体装置
JPS63316027A (ja) * 1987-06-18 1988-12-23 Fuji Electric Co Ltd アクティブマトリクス基板
JPH01276755A (ja) * 1988-04-28 1989-11-07 Sony Corp 薄膜トランジスタ
JPH02178965A (ja) * 1988-12-29 1990-07-11 Nippondenso Co Ltd 絶縁分離型電界効果半導体装置
EP0412701B1 (de) * 1989-07-31 1996-09-25 Canon Kabushiki Kaisha Dünnschicht-Transistor und seine Herstellung
US5305128A (en) * 1989-12-22 1994-04-19 North American Philips Corporation Active matrix electro-optic display device with storage capacitors and projection color apparatus employing same
US5162933A (en) * 1990-05-16 1992-11-10 Nippon Telegraph And Telephone Corporation Active matrix structure for liquid crystal display elements wherein each of the gate/data lines includes at least a molybdenum-base alloy layer containing 0.5 to 10 wt. % of chromium
JPH04241466A (ja) * 1991-01-16 1992-08-28 Casio Comput Co Ltd 電界効果型トランジスタ
JP3191061B2 (ja) * 1992-01-31 2001-07-23 キヤノン株式会社 半導体装置及び液晶表示装置
US5546204A (en) * 1994-05-26 1996-08-13 Honeywell Inc. TFT matrix liquid crystal device having data source lines and drain means of etched and doped single crystal silicon
US5483366A (en) * 1994-07-20 1996-01-09 David Sarnoff Research Center Inc LCD with hige capacitance pixel having an ITO active region/poly SI pixel region electrical connection and having poly SI selection line extensions along pixel edges

Also Published As

Publication number Publication date
EP0661582A3 (de) 1995-11-02
JPH07199150A (ja) 1995-08-04
EP0661582B1 (de) 2000-08-23
EP0661582A2 (de) 1995-07-05
US5717473A (en) 1998-02-10
DE69425642T2 (de) 2001-04-19

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