DE69416564T2 - Positiv arbeitender elektronenstrahlresist - Google Patents

Positiv arbeitender elektronenstrahlresist

Info

Publication number
DE69416564T2
DE69416564T2 DE69416564T DE69416564T DE69416564T2 DE 69416564 T2 DE69416564 T2 DE 69416564T2 DE 69416564 T DE69416564 T DE 69416564T DE 69416564 T DE69416564 T DE 69416564T DE 69416564 T2 DE69416564 T2 DE 69416564T2
Authority
DE
Germany
Prior art keywords
electron beam
beam resist
positively working
working electron
positively
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69416564T
Other languages
English (en)
Other versions
DE69416564D1 (de
Inventor
Hiroki Oosedo
Shigeyoshi Kanetsuki
Kazutaka Tamura
Masaya Asano
Mutsuo Di Kataoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Publication of DE69416564D1 publication Critical patent/DE69416564D1/de
Application granted granted Critical
Publication of DE69416564T2 publication Critical patent/DE69416564T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143—Electron beam
DE69416564T 1993-04-28 1994-04-28 Positiv arbeitender elektronenstrahlresist Expired - Fee Related DE69416564T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP10242893 1993-04-28
PCT/JP1994/000720 WO1994025904A1 (en) 1993-04-28 1994-04-28 Positive electron-beam resist composition and developer for positive electron-beam resist

Publications (2)

Publication Number Publication Date
DE69416564D1 DE69416564D1 (de) 1999-03-25
DE69416564T2 true DE69416564T2 (de) 1999-07-15

Family

ID=14327197

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69430960T Expired - Fee Related DE69430960T2 (de) 1993-04-28 1994-04-28 Entwickler für positiv arbeitenden Elektronenstrahlresist
DE69416564T Expired - Fee Related DE69416564T2 (de) 1993-04-28 1994-04-28 Positiv arbeitender elektronenstrahlresist

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE69430960T Expired - Fee Related DE69430960T2 (de) 1993-04-28 1994-04-28 Entwickler für positiv arbeitenden Elektronenstrahlresist

Country Status (5)

Country Link
US (2) US5629127A (de)
EP (2) EP0649061B1 (de)
KR (1) KR100194370B1 (de)
DE (2) DE69430960T2 (de)
WO (1) WO1994025904A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3473931B2 (ja) * 1996-11-11 2003-12-08 東京応化工業株式会社 リフトオフ用ポジ型感光性組成物およびパターン形成方法
JP3369471B2 (ja) * 1998-05-29 2003-01-20 東京応化工業株式会社 ポジ型ホトレジスト組成物およびレジストパターンの形成方法
JP3688469B2 (ja) * 1998-06-04 2005-08-31 東京応化工業株式会社 ポジ型ホトレジスト組成物およびこれを用いたレジストパターンの形成方法
JP3968177B2 (ja) 1998-09-29 2007-08-29 Ａｚエレクトロニックマテリアルズ株式会社 微細レジストパターン形成方法
JP3989149B2 (ja) * 1999-12-16 2007-10-10 富士フイルム株式会社 電子線またはｘ線用化学増幅系ネガ型レジスト組成物
KR100783603B1 (ko) * 2002-01-05 2007-12-07 삼성전자주식회사 포토레지스트 조성물 및 이를 사용한 패턴의 형성방법
JP2004341431A (ja) * 2003-05-19 2004-12-02 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト組成物およびレジストパターンの形成方法
EP2105798A4 (de) * 2007-01-17 2012-02-08 Sony Corp Entwicklungslösung und verfahren zur herstellung eines fein strukturierten materials

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4314022A (en) * 1980-05-05 1982-02-02 Minnesota Mining And Manufacturing Company Photoresist developers and process
EP0097282A3 (de) * 1982-06-17 1984-07-25 Shipley Company Inc. Entwicklerzusammensetzung für Fotolacke
DE3439597A1 (de) * 1984-10-30 1986-04-30 Hoechst Ag, 6230 Frankfurt Entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen und verwendung des entwicklers
US4592992A (en) * 1985-04-11 1986-06-03 American Hoechst Corporation Developer compositions for lithographic plates
JPS63115162A (ja) * 1986-10-31 1988-05-19 Hitachi Chem Co Ltd ポジ形感光性樹脂組成物
US5278030A (en) * 1988-10-24 1994-01-11 Du Pont-Howson Limited Developer solution comprising ethyl hexyl sulphate, a surfactant, an alkaline material and having a pH of not less than 12
JP2589803B2 (ja) * 1989-03-22 1997-03-12 富士写真フイルム株式会社 感電離放射線性樹脂組成物
CA2019632A1 (en) * 1989-06-29 1990-12-29 Kazuhiro Shimura Method of processing presensitized lithographic printing plate
DE3938107A1 (de) * 1989-11-16 1991-05-23 Hoechst Ag Entwicklerkonzentrat und daraus hergestellter entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen
DE3938108A1 (de) * 1989-11-16 1991-05-23 Hoechst Ag Entwicklerkonzentrat und daraus hergestellter entwickler fuer belichtete negativ arbeitende reproduktionsschichten mit deckschicht sowie verfahren zur herstellung von druckformen
JPH03230164A (ja) * 1990-02-05 1991-10-14 Toray Ind Inc ポジ型フォトレジスト組成物
JPH03251845A (ja) * 1990-03-01 1991-11-11 Toray Ind Inc ポジ型フォトレジスト組成物
JP2629403B2 (ja) * 1990-04-28 1997-07-09 東レ株式会社 ポジ型フォトレジスト組成物
JPH0412356A (ja) * 1990-04-28 1992-01-16 Toray Ind Inc ポジ型フォトレジスト組成物
JPH0470756A (ja) * 1990-07-11 1992-03-05 Konica Corp 感光性平版印刷版の現像方法及び現像液
JP2711590B2 (ja) * 1990-09-13 1998-02-10 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JPH04278954A (ja) * 1991-03-07 1992-10-05 Toray Ind Inc ポジ型フォトレジスト組成物
US5275915A (en) * 1991-06-05 1994-01-04 Dainippon Ink And Chemicals, Inc. Developer for light-sensitive material
JP3123563B2 (ja) * 1991-09-27 2001-01-15 チッソ株式会社 感光性樹脂現像液
DE4233797A1 (de) * 1991-10-07 1993-04-08 Fuji Photo Film Co Ltd Lichtempfindliche zusammensetzung
JP2626363B2 (ja) * 1991-11-05 1997-07-02 東レ株式会社 電子線感応組成物およびそれを用いるパターン形成方法
US5279927A (en) * 1992-07-23 1994-01-18 Eastman Kodak Company Aqueous developer for lithographic printing plates with improved desensitizing capability
US5316892A (en) * 1992-07-23 1994-05-31 Eastman Kodak Company Method for developing lithographic printing plates
US5380623A (en) * 1992-12-17 1995-01-10 Eastman Kodak Company Aqueous developer for lithographic printing plates which provides improved oleophilicity

Also Published As

Publication number Publication date
EP0649061B1 (de) 1999-02-17
DE69430960D1 (de) 2002-08-14
EP0874284A1 (de) 1998-10-28
DE69430960T2 (de) 2003-02-20
EP0649061A1 (de) 1995-04-19
US5629127A (en) 1997-05-13
EP0649061A4 (de) 1995-08-09
US5851739A (en) 1998-12-22
WO1994025904A1 (en) 1994-11-10
DE69416564D1 (de) 1999-03-25
EP0874284B1 (de) 2002-07-10
KR100194370B1 (ko) 1999-06-15

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Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee