DE69411448D1 - Verfahren zum Herstellen von Silizium enthaltenden Kathoden-Targets - Google Patents
Verfahren zum Herstellen von Silizium enthaltenden Kathoden-TargetsInfo
- Publication number
- DE69411448D1 DE69411448D1 DE69411448T DE69411448T DE69411448D1 DE 69411448 D1 DE69411448 D1 DE 69411448D1 DE 69411448 T DE69411448 T DE 69411448T DE 69411448 T DE69411448 T DE 69411448T DE 69411448 D1 DE69411448 D1 DE 69411448D1
- Authority
- DE
- Germany
- Prior art keywords
- producing silicon
- containing cathode
- cathode targets
- targets
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/001—Interlayers, transition pieces for metallurgical bonding of workpieces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/001—Interlayers, transition pieces for metallurgical bonding of workpieces
- B23K2035/008—Interlayers, transition pieces for metallurgical bonding of workpieces at least one of the workpieces being of silicium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/001—Interlayers, transition pieces for metallurgical bonding of workpieces
- B23K35/002—Interlayers, transition pieces for metallurgical bonding of workpieces at least one of the workpieces being of light metal
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/001—Interlayers, transition pieces for metallurgical bonding of workpieces
- B23K35/005—Interlayers, transition pieces for metallurgical bonding of workpieces at least one of the workpieces being of a refractory metal
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/001—Interlayers, transition pieces for metallurgical bonding of workpieces
- B23K35/007—Interlayers, transition pieces for metallurgical bonding of workpieces at least one of the workpieces being of copper or another noble metal
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/922—Static electricity metal bleed-off metallic stock
- Y10S428/9335—Product by special process
- Y10S428/937—Sprayed metal
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12674—Ge- or Si-base component
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/042,185 US5965278A (en) | 1993-04-02 | 1993-04-02 | Method of making cathode targets comprising silicon |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69411448D1 true DE69411448D1 (de) | 1998-08-13 |
DE69411448T2 DE69411448T2 (de) | 1999-01-28 |
Family
ID=21920509
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69411448T Expired - Fee Related DE69411448T2 (de) | 1993-04-02 | 1994-03-24 | Verfahren zum Herstellen von Silizium enthaltenden Kathoden-Targets |
Country Status (6)
Country | Link |
---|---|
US (1) | US5965278A (de) |
EP (1) | EP0623415B1 (de) |
JP (1) | JP3548221B2 (de) |
KR (1) | KR0160169B1 (de) |
DE (1) | DE69411448T2 (de) |
ES (1) | ES2121107T3 (de) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3311282B2 (ja) * | 1997-10-13 | 2002-08-05 | 株式会社東芝 | 金属部材の接合方法及び接合体 |
SE512906C2 (sv) * | 1998-10-02 | 2000-06-05 | Ericsson Telefon Ab L M | Förfarande vid lödning av ett halvledarchip samt RF-power transistor för genomförande därav |
US6517908B1 (en) * | 2000-01-10 | 2003-02-11 | Nec Electronics, Inc. | Method for making a test wafer from a substrate |
US6619537B1 (en) * | 2000-06-12 | 2003-09-16 | Tosoh Smd, Inc. | Diffusion bonding of copper sputtering targets to backing plates using nickel alloy interlayers |
WO2002040733A1 (fr) * | 2000-11-17 | 2002-05-23 | Nikko Materials Company, Limited | Cible de pulverisation produisant peu de particules, plaque support ou appareil de pulverisation, et procede de pulverisation produisant peu de particules |
US6608432B2 (en) * | 2001-04-03 | 2003-08-19 | General Electric Company | Cathode target mounting for cathodic arc cathodes |
US6673220B2 (en) * | 2001-05-21 | 2004-01-06 | Sharp Laboratories Of America, Inc. | System and method for fabricating silicon targets |
DE50300776D1 (de) * | 2002-04-11 | 2005-08-18 | Grillo Werke Ag | Verfahren zum verbinden von teilen |
TWI269815B (en) * | 2002-05-20 | 2007-01-01 | Tosoh Smd Inc | Replaceable target sidewall insert with texturing |
WO2004065046A2 (en) * | 2003-01-22 | 2004-08-05 | Tosoh Smd, Inc. | Brittle material sputtering target assembly and method of making same |
US20090078570A1 (en) * | 2003-08-11 | 2009-03-26 | Wuwen Yi | Target/backing plate constructions, and methods of forming target/backing plate constructions |
US20080220558A1 (en) * | 2007-03-08 | 2008-09-11 | Integrated Photovoltaics, Inc. | Plasma spraying for semiconductor grade silicon |
US8498127B2 (en) * | 2010-09-10 | 2013-07-30 | Ge Intelligent Platforms, Inc. | Thermal interface material for reducing thermal resistance and method of making the same |
DE102011083791A1 (de) * | 2011-09-29 | 2013-04-04 | Robert Bosch Gmbh | Verfahren zur Herstellung einer Lötverbindung |
JP2015504479A (ja) * | 2011-11-08 | 2015-02-12 | トーソー エスエムディー,インク. | 特別な表面処理及び優れた粒子性能を有するシリコンスパッターターゲット及びその製造方法 |
WO2013122927A1 (en) | 2012-02-14 | 2013-08-22 | Tosoh Smd, Inc. | Low deflection sputtering target assembly and methods of making same |
JP5799154B2 (ja) * | 2013-12-13 | 2015-10-21 | Jx日鉱日石金属株式会社 | スパッタリングターゲット及びその製造方法 |
CN113458523A (zh) * | 2021-07-05 | 2021-10-01 | 宁波江丰电子材料股份有限公司 | 一种钽靶材组件的焊接方法 |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3922385A (en) * | 1973-07-02 | 1975-11-25 | Gen Motors Corp | Solderable multilayer contact for silicon semiconductor |
US4035526A (en) * | 1975-08-20 | 1977-07-12 | General Motors Corporation | Evaporated solderable multilayer contact for silicon semiconductor |
US4297391A (en) * | 1979-01-16 | 1981-10-27 | Solarex Corporation | Method of applying electrical contacts to a photovoltaic cell |
US4209375A (en) * | 1979-08-02 | 1980-06-24 | The United States Of America As Represented By The United States Department Of Energy | Sputter target |
DE2933835A1 (de) * | 1979-08-21 | 1981-03-26 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum befestigen von in scheiben- oder plattenform vorliegenden targetmaterialien auf kuehlteller fuer aufstaeubanlagen |
US4320251A (en) * | 1980-07-28 | 1982-03-16 | Solamat Inc. | Ohmic contacts for solar cells by arc plasma spraying |
DE3039821A1 (de) * | 1980-10-22 | 1982-06-03 | Robert Bosch Gmbh, 7000 Stuttgart | Mehrschichtsystem fuer waermeschutzanwendung |
US4492812A (en) * | 1981-07-08 | 1985-01-08 | Solarex Corporation | Electrical contacts for a solar cell |
EP0098852B1 (de) * | 1982-01-20 | 1986-09-10 | The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and | Schmelzschweissverfahren |
DE3318828C2 (de) * | 1983-05-24 | 1986-01-02 | Interpane Entwicklungs- und Beratungsgesellschaft mbH & Co. KG, 3471 Lauenförde | Verfahren zum Aufbonden von Targetmaterial |
US4511600A (en) * | 1984-02-10 | 1985-04-16 | Solarex Corporation | Solar cell metal spray process |
DE3417732A1 (de) * | 1984-05-12 | 1986-07-10 | Leybold-Heraeus GmbH, 5000 Köln | Verfahren zum aufbringen von siliziumhaltigen schichten auf substraten durch katodenzerstaeubung und zerstaeubungskatode zur durchfuehrung des verfahrens |
US5215639A (en) * | 1984-10-09 | 1993-06-01 | Genus, Inc. | Composite sputtering target structures and process for producing such structures |
US4716086A (en) * | 1984-12-19 | 1987-12-29 | Ppg Industries, Inc. | Protective overcoat for low emissivity coated article |
US4690871A (en) * | 1986-03-10 | 1987-09-01 | Gordon Roy G | Protective overcoat of titanium nitride films |
US4847157A (en) * | 1986-08-28 | 1989-07-11 | Libbey-Owens-Ford Co. | Glass coating method and resulting article |
US4769291A (en) * | 1987-02-02 | 1988-09-06 | The Boc Group, Inc. | Transparent coatings by reactive sputtering |
DE3716860A1 (de) * | 1987-03-13 | 1988-09-22 | Flachglas Ag | Verfahren zum herstellen einer vorgespannten und/oder gebogenen glasscheibe mit silberschicht, danach hergestellte glasscheibe sowie deren verwendung |
JPS63242948A (ja) * | 1987-03-31 | 1988-10-07 | Asahi Glass Co Ltd | 熱線反射ガラス |
GB8717959D0 (en) * | 1987-07-29 | 1987-09-03 | Pilkington Brothers Plc | Coated glass |
DE3902596A1 (de) * | 1989-01-28 | 1990-08-02 | Flachglas Ag | Verfahren zum herstellen einer vorgespannten oder gebogenen glasscheibe mit rueckseitiger beschichtung, danach hergestellte glasscheibe sowie deren verwendung |
DE3906453A1 (de) * | 1989-03-01 | 1990-09-06 | Leybold Ag | Verfahren zum beschichten von substraten aus durchscheinendem werkstoff, beispielsweise aus floatglas |
US5170291A (en) * | 1989-12-19 | 1992-12-08 | Leybold Aktiengesellschaft | Coating, composed of an optically effective layer system, for substrates, whereby the layer system has a high anti-reflective effect, and method for manufacturing the coating |
WO1992017622A1 (en) * | 1991-04-08 | 1992-10-15 | Tosoh Smd, Inc. | Thermally compatible sputter target and backing plate assembly |
US5185183A (en) * | 1992-01-10 | 1993-02-09 | Westinghouse Electric Corp. | Apparatus and method for blasting and metal spraying a cylindrical surface |
-
1993
- 1993-04-02 US US08/042,185 patent/US5965278A/en not_active Expired - Lifetime
-
1994
- 1994-03-24 EP EP94104644A patent/EP0623415B1/de not_active Expired - Lifetime
- 1994-03-24 DE DE69411448T patent/DE69411448T2/de not_active Expired - Fee Related
- 1994-03-24 ES ES94104644T patent/ES2121107T3/es not_active Expired - Lifetime
- 1994-04-01 KR KR1019940006871A patent/KR0160169B1/ko not_active IP Right Cessation
- 1994-04-01 JP JP06484694A patent/JP3548221B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH06346215A (ja) | 1994-12-20 |
KR0160169B1 (ko) | 1999-01-15 |
JP3548221B2 (ja) | 2004-07-28 |
EP0623415A1 (de) | 1994-11-09 |
ES2121107T3 (es) | 1998-11-16 |
EP0623415B1 (de) | 1998-07-08 |
DE69411448T2 (de) | 1999-01-28 |
US5965278A (en) | 1999-10-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: PPG INDUSTRIES OHIO, INC., CLEVELAND, OHIO, US |
|
8339 | Ceased/non-payment of the annual fee |