DE69407620D1 - Ablationsabbildung durch quasikontaktlithographie - Google Patents
Ablationsabbildung durch quasikontaktlithographieInfo
- Publication number
- DE69407620D1 DE69407620D1 DE69407620T DE69407620T DE69407620D1 DE 69407620 D1 DE69407620 D1 DE 69407620D1 DE 69407620 T DE69407620 T DE 69407620T DE 69407620 T DE69407620 T DE 69407620T DE 69407620 D1 DE69407620 D1 DE 69407620D1
- Authority
- DE
- Germany
- Prior art keywords
- quasicontact
- lithography
- ablation image
- ablation
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
- B23K26/0661—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks disposed on the workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/009—Working by laser beam, e.g. welding, cutting or boring using a non-absorbing, e.g. transparent, reflective or refractive, layer on the workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/24—Ablative recording, e.g. by burning marks; Spark recording
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06K—GRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
- G06K1/00—Methods or arrangements for marking the record carrier in digital fashion
- G06K1/12—Methods or arrangements for marking the record carrier in digital fashion otherwise than by punching
- G06K1/126—Methods or arrangements for marking the record carrier in digital fashion otherwise than by punching by photographic or thermographic registration
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/48—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed
- G11B5/58—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed with provision for moving the head for the purpose of maintaining alignment of the head relative to the record carrier during transducing operation, e.g. to compensate for surface irregularities of the latter or for track following
- G11B5/596—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed with provision for moving the head for the purpose of maintaining alignment of the head relative to the record carrier during transducing operation, e.g. to compensate for surface irregularities of the latter or for track following for track following on disks
- G11B5/59677—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed with provision for moving the head for the purpose of maintaining alignment of the head relative to the record carrier during transducing operation, e.g. to compensate for surface irregularities of the latter or for track following for track following on disks with optical servo tracking
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/74—Record carriers characterised by the form, e.g. sheet shaped to wrap around a drum
- G11B5/82—Disk carriers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/855—Coating only part of a support with a magnetic layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/165—Thermal imaging composition
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US16950493A | 1993-12-17 | 1993-12-17 | |
PCT/US1994/012487 WO1995016570A1 (en) | 1993-12-17 | 1994-10-31 | Ablative imaging by proximity lithography |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69407620D1 true DE69407620D1 (de) | 1998-02-05 |
DE69407620T2 DE69407620T2 (de) | 1998-04-09 |
Family
ID=22615978
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69407620T Expired - Fee Related DE69407620T2 (de) | 1993-12-17 | 1994-10-31 | Ablationsabbildung durch quasikontaktlithographie |
Country Status (8)
Country | Link |
---|---|
US (2) | US5501944A (de) |
EP (1) | EP0734325B1 (de) |
JP (1) | JPH09506565A (de) |
KR (1) | KR960706405A (de) |
CN (1) | CN1057731C (de) |
CA (1) | CA2175678A1 (de) |
DE (1) | DE69407620T2 (de) |
WO (1) | WO1995016570A1 (de) |
Families Citing this family (40)
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US5506086A (en) * | 1995-05-01 | 1996-04-09 | E. I. Du Pont De Nemours And Company | Process for making a flexographic printing plate |
DE19652253C2 (de) * | 1996-12-16 | 1999-04-29 | Kloeckner Moeller Gmbh | Laser-Beschriftungsverfahren zur Beschriftung von Bezeichnungsschildern |
US5934197A (en) * | 1997-06-03 | 1999-08-10 | Gerber Systems Corporation | Lithographic printing plate and method for manufacturing the same |
GB9711382D0 (en) * | 1997-06-03 | 1997-07-30 | Du Pont Uk | Heat sensitive printing plate precursors |
US20030054203A1 (en) * | 1997-10-22 | 2003-03-20 | Quantum Corporation, A California Corporation | Magnetic tape |
US6529139B1 (en) | 1997-11-17 | 2003-03-04 | 3M Innovative Properties Company | Toy having enclosed antenna |
AU6445898A (en) | 1997-11-17 | 1999-06-07 | Minnesota Mining And Manufacturing Company | Toy having antenna |
JPH11339254A (ja) * | 1998-03-24 | 1999-12-10 | Quantum Corp | 磁気記録テ―プ、情報記憶媒体および磁気テ―プ記録再生システム |
US6078713A (en) * | 1998-06-08 | 2000-06-20 | Uv Technology, Inc. | Beam delivery system for curing of photo initiated inks |
JP3178524B2 (ja) * | 1998-11-26 | 2001-06-18 | 住友重機械工業株式会社 | レーザマーキング方法と装置及びマーキングされた部材 |
US6203952B1 (en) | 1999-01-14 | 2001-03-20 | 3M Innovative Properties Company | Imaged article on polymeric substrate |
DE19910892A1 (de) * | 1999-03-11 | 2000-09-14 | Linde Tech Gase Gmbh | Qualitätssicherung beim thermischen Spritzen mittels rechnerischer Überarbeitung oder Verfremdung digitaler Bilder |
KR100477146B1 (ko) * | 1999-09-28 | 2005-03-17 | 스미도모쥬기가이고교 가부시키가이샤 | 레이저천공 가공방법 및 가공장치 |
EP1112802B1 (de) * | 1999-12-23 | 2003-06-11 | Leister Process Technologies | Verfahren und Vorrichtung zum Erwärmen von mindestens zwei Elementen mittels Laserstrahlen mit hoher Energiedichte |
US6308628B1 (en) * | 2000-01-10 | 2001-10-30 | Karat Digital Press L.P. | Imaging method of a printing member having magnetic particles |
US20100242299A1 (en) * | 2003-01-09 | 2010-09-30 | Con-Trol-Cure, Inc. | Uv curing system and process |
US6867388B2 (en) | 2003-04-08 | 2005-03-15 | Branson Ultrasonics Corporation | Electronic masking laser imaging system |
DE10330421A1 (de) * | 2003-07-04 | 2005-02-03 | Leonhard Kurz Gmbh & Co. Kg | Belichtungsstation für Folienbahnen |
WO2005027039A2 (en) * | 2003-09-08 | 2005-03-24 | Laser Projection Technologies, Inc. | 3d projection with image recording |
JP4222296B2 (ja) * | 2004-11-22 | 2009-02-12 | 住友電気工業株式会社 | レーザ加工方法とレーザ加工装置 |
JP4950101B2 (ja) | 2008-03-05 | 2012-06-13 | 富士フイルム株式会社 | フォトレジスト層を有するワークの加工方法 |
JP5746045B2 (ja) | 2008-12-22 | 2015-07-08 | スリーエム イノベイティブ プロパティズ カンパニー | 複数の複屈折層を有する内部パターン形成多層光学フィルム |
US8314408B2 (en) | 2008-12-31 | 2012-11-20 | Draka Comteq, B.V. | UVLED apparatus for curing glass-fiber coatings |
US8314357B2 (en) * | 2009-05-08 | 2012-11-20 | Children's Hospital And Research Center At Oakland | Joule heated nanowire biosensors |
DK2388239T3 (da) | 2010-05-20 | 2017-04-24 | Draka Comteq Bv | Hærdningsapparat, der anvender vinklede UV-LED'er |
US8871311B2 (en) | 2010-06-03 | 2014-10-28 | Draka Comteq, B.V. | Curing method employing UV sources that emit differing ranges of UV radiation |
KR101877209B1 (ko) | 2010-06-30 | 2018-07-10 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 공간 선택적 복굴절 감소를 갖는 필름을 사용하는 마스크 처리 |
KR101841310B1 (ko) | 2010-06-30 | 2018-03-22 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 공간 선택적 복굴절 감소를 갖는 지연기 필름 조합물 |
JP6251569B2 (ja) | 2010-06-30 | 2018-01-10 | スリーエム イノベイティブ プロパティズ カンパニー | 空間的に選択的な複屈折性の減少を有する拡散反射光学フィルム |
TWI520839B (zh) | 2010-07-20 | 2016-02-11 | 國立成功大學 | 可撓性光學板的製造方法、其方法製成的可撓性光學板,及背光模組 |
DK2418183T3 (en) | 2010-08-10 | 2018-11-12 | Draka Comteq Bv | Method of curing coated glass fibers which provides increased UVLED intensity |
CN102200609A (zh) * | 2011-06-24 | 2011-09-28 | 锺震桂 | 可挠性光学板的制造方法、该方法制成的可挠性光学板及背光模组 |
US9475268B2 (en) * | 2012-03-05 | 2016-10-25 | Saint-Gobain Glass France | Process for producing a laminated glass pane with sensor window |
US20140054065A1 (en) * | 2012-08-21 | 2014-02-27 | Abner D. Joseph | Electrical circuit trace manufacturing for electro-chemical sensors |
US9653104B2 (en) | 2012-11-16 | 2017-05-16 | University Of Houston | System and method for selectively removing atoms and uses thereof |
KR102015400B1 (ko) * | 2012-11-29 | 2019-10-22 | 삼성디스플레이 주식회사 | 캐리어 기판의 박리 장치, 캐리어 기판의 박리 방법 및 표시 장치의 제조 방법 |
WO2016019071A1 (en) | 2014-07-29 | 2016-02-04 | Gentex Corporation | Laser ablation with reduced visual effects |
CN106794553B (zh) * | 2014-10-03 | 2020-01-07 | 金泰克斯公司 | 第二表面激光烧蚀 |
CN108351564B (zh) | 2015-06-19 | 2020-10-09 | 金泰克斯公司 | 第二表面激光烧蚀 |
US11009760B2 (en) | 2017-05-05 | 2021-05-18 | Gentex Corporation | Interleaving laser ablation |
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US3440388A (en) * | 1966-04-04 | 1969-04-22 | Monsanto Co | Method for machining with laser beam |
US3832547A (en) * | 1970-08-03 | 1974-08-27 | D Silverman | Apparatus for transferring a unique micropattern of microperforations in a first metal layer to an underlying second metal layer |
US3945318A (en) * | 1974-04-08 | 1976-03-23 | Logetronics, Inc. | Printing plate blank and image sheet by laser transfer |
DE2441263A1 (de) * | 1974-08-28 | 1976-03-18 | Philips Patentverwaltung | Aufzeichnungsverfahren |
US4032743A (en) * | 1975-06-27 | 1977-06-28 | Marvel Engineering Company | Laser microperforator |
DE2616362A1 (de) * | 1976-04-14 | 1977-11-03 | Philips Patentverwaltung | Vorrichtung zum herstellen optisch lesbarer servospuren in der magnetspeicherschicht von datentraegern |
JPS5624112A (en) * | 1979-08-03 | 1981-03-07 | Daicel Chem Ind Ltd | Cutting method for specific layer of filmy synthetic resin laminate |
US4323755A (en) * | 1979-09-24 | 1982-04-06 | Rca Corporation | Method of making a machine-readable marking in a workpiece |
US4515867A (en) * | 1982-09-20 | 1985-05-07 | Rca Corporation | Method for ablating a coded marking into a glass workpiece and product thereof |
JPS61262187A (ja) * | 1985-05-17 | 1986-11-20 | Toppan Printing Co Ltd | レ−ザ−によるマ−キング方法 |
US4877480A (en) * | 1986-08-08 | 1989-10-31 | Digital Equipment Corporation | Lithographic technique using laser for fabrication of electronic components and the like |
JPH0688148B2 (ja) * | 1986-08-08 | 1994-11-09 | マツダ株式会社 | 物品へのレ−ザ刻印方法 |
US4879176A (en) * | 1987-03-16 | 1989-11-07 | Minnesota Mining And Manufacturing Company | Surface modification of semicrystalline polymers |
US4868006A (en) * | 1987-03-16 | 1989-09-19 | Minnesota Mining And Manufacturing Company | Polymeric film with reduced surface friction |
US4774170A (en) * | 1987-06-05 | 1988-09-27 | Eastman Kodak Company | Recording elements comprising write-once thin film alloy layers |
US4973572A (en) * | 1987-12-21 | 1990-11-27 | Eastman Kodak Company | Infrared absorbing cyanine dyes for dye-donor element used in laser-induced thermal dye transfer |
US4822451A (en) * | 1988-04-27 | 1989-04-18 | Minnesota Mining And Manufacturing Company | Process for the surface modification of semicrystalline polymers |
CA1324821C (en) * | 1988-08-04 | 1993-11-30 | Milan Brandt | Manufacture of finely perforated sheet material |
US5171650A (en) * | 1990-10-04 | 1992-12-15 | Graphics Technology International, Inc. | Ablation-transfer imaging/recording |
US5156938A (en) * | 1989-03-30 | 1992-10-20 | Graphics Technology International, Inc. | Ablation-transfer imaging/recording |
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US5217829A (en) * | 1990-02-22 | 1993-06-08 | Presstek, Inc. | Method for producing photomasks |
US5061604A (en) * | 1990-05-04 | 1991-10-29 | Minnesota Mining And Manufacturing Company | Negative crystalline photoresists for UV photoimaging |
DE4034134A1 (de) * | 1990-10-26 | 1992-04-30 | Hoechst Ag | Beidseitig siegelbare, biaxial orientierte polyolefin-mehrschichtfolie mit erhoehtem schrumpf |
US5178726A (en) * | 1991-03-07 | 1993-01-12 | Minnesota Mining And Manufacturing Company | Process for producing a patterned metal surface |
US5229247A (en) * | 1991-11-27 | 1993-07-20 | Polaroid Corporation | Method of preparing a laminar thermal imaging medium capable of converting brief and intense radiation into heat |
US5204517A (en) * | 1991-12-24 | 1993-04-20 | Maxwell Laboratories, Inc. | Method and system for control of a material removal process using spectral emission discrimination |
FR2690862A1 (fr) * | 1992-05-07 | 1993-11-12 | Ares Sa | Procédé et installation de gravure au laser de la surface intérieure d'une paroi d'un réceptacle. |
US5339737B1 (en) * | 1992-07-20 | 1997-06-10 | Presstek Inc | Lithographic printing plates for use with laser-discharge imaging apparatus |
US5379698A (en) * | 1992-07-20 | 1995-01-10 | Presstek, Inc. | Lithographic printing members for use with laser-discharge imaging |
AU674518B2 (en) * | 1992-07-20 | 1997-01-02 | Presstek, Inc. | Lithographic printing plates for use with laser-discharge imaging apparatus |
US5376314A (en) * | 1993-04-29 | 1994-12-27 | Illinois Tool Works Inc. | Method of making a laser ablated formed cap |
-
1994
- 1994-10-31 CN CN94194403A patent/CN1057731C/zh not_active Expired - Fee Related
- 1994-10-31 WO PCT/US1994/012487 patent/WO1995016570A1/en active IP Right Grant
- 1994-10-31 CA CA002175678A patent/CA2175678A1/en not_active Abandoned
- 1994-10-31 KR KR1019960703151A patent/KR960706405A/ko not_active Application Discontinuation
- 1994-10-31 EP EP95903102A patent/EP0734325B1/de not_active Expired - Lifetime
- 1994-10-31 DE DE69407620T patent/DE69407620T2/de not_active Expired - Fee Related
- 1994-10-31 JP JP7516749A patent/JPH09506565A/ja active Pending
-
1995
- 1995-01-31 US US08/381,022 patent/US5501944A/en not_active Expired - Fee Related
- 1995-12-20 US US08/575,242 patent/US5633123A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CA2175678A1 (en) | 1995-05-22 |
JPH09506565A (ja) | 1997-06-30 |
DE69407620T2 (de) | 1998-04-09 |
CN1057731C (zh) | 2000-10-25 |
US5501944A (en) | 1996-03-26 |
US5633123A (en) | 1997-05-27 |
WO1995016570A1 (en) | 1995-06-22 |
CN1136792A (zh) | 1996-11-27 |
KR960706405A (ko) | 1996-12-09 |
EP0734325B1 (de) | 1997-12-29 |
EP0734325A1 (de) | 1996-10-02 |
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