DE69400458D1 - Einrichtung zum Beschicken mit hochreinen chemischen Werkstoffen - Google Patents
Einrichtung zum Beschicken mit hochreinen chemischen WerkstoffenInfo
- Publication number
- DE69400458D1 DE69400458D1 DE69400458T DE69400458T DE69400458D1 DE 69400458 D1 DE69400458 D1 DE 69400458D1 DE 69400458 T DE69400458 T DE 69400458T DE 69400458 T DE69400458 T DE 69400458T DE 69400458 D1 DE69400458 D1 DE 69400458D1
- Authority
- DE
- Germany
- Prior art keywords
- delivery conduit
- source
- use point
- pressure
- chemical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000126 substance Substances 0.000 title abstract 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 abstract 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 abstract 1
- 230000008595 infiltration Effects 0.000 abstract 1
- 238000001764 infiltration Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 230000005514 two-phase flow Effects 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4402—Reduction of impurities in the source gas
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/049,042 US5359787A (en) | 1993-04-16 | 1993-04-16 | High purity bulk chemical delivery system |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69400458D1 true DE69400458D1 (de) | 1996-10-10 |
DE69400458T2 DE69400458T2 (de) | 1997-01-30 |
Family
ID=21957754
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69400458T Expired - Lifetime DE69400458T2 (de) | 1993-04-16 | 1994-04-11 | Einrichtung zum Beschicken mit hochreinen chemischen Werkstoffen |
Country Status (5)
Country | Link |
---|---|
US (2) | US5359787A (de) |
EP (1) | EP0620291B1 (de) |
AT (1) | ATE142282T1 (de) |
DE (1) | DE69400458T2 (de) |
ES (1) | ES2094582T3 (de) |
Families Citing this family (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5359787A (en) * | 1993-04-16 | 1994-11-01 | Air Products And Chemicals, Inc. | High purity bulk chemical delivery system |
US5673562A (en) * | 1996-02-23 | 1997-10-07 | L'air Liquide, S.A. | Bulk delivery of ultra-high purity gases at high flow rates |
US5833738A (en) * | 1996-03-01 | 1998-11-10 | D.D.I. Ltd. | Specialty gas purification system |
US6076359A (en) * | 1996-11-25 | 2000-06-20 | American Air Liquide Inc. | System and method for controlled delivery of liquified gases |
US5761911A (en) * | 1996-11-25 | 1998-06-09 | American Air Liquide Inc. | System and method for controlled delivery of liquified gases |
US6004433A (en) * | 1997-02-03 | 1999-12-21 | L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes George Claude | Purification of electronic specialty gases by vapor phase transfilling |
JPH11139805A (ja) * | 1997-07-29 | 1999-05-25 | Millipore Corp | ハロゲン化水素から水分を除去するための組成物とその方法 |
US5910292A (en) * | 1997-08-19 | 1999-06-08 | Aeronex, Inc. | Method for water removal from corrosive gas streams |
US5894742A (en) * | 1997-09-16 | 1999-04-20 | L'air Liquide, Societe Anonyme Pour L'etude Et, L'exploitation Des Procedes Georges Claude | Methods and systems for delivering an ultra-pure gas to a point of use |
US5958356A (en) * | 1997-11-05 | 1999-09-28 | Air Products And Chemicals, Inc. | Method for removal of moisture from gaseous HCl |
WO1999027572A1 (en) * | 1997-11-20 | 1999-06-03 | Fsi International, Inc. | Method for delivery of hydrogen fluoride gas |
US6122931A (en) * | 1998-04-07 | 2000-09-26 | American Air Liquide Inc. | System and method for delivery of a vapor phase product to a point of use |
US6032483A (en) * | 1998-04-07 | 2000-03-07 | American Air Liquide Inc. | System and method for delivery of a vapor phase product to a point of use |
US6224252B1 (en) | 1998-07-07 | 2001-05-01 | Air Products And Chemicals, Inc. | Chemical generator with controlled mixing and concentration feedback and adjustment |
US6134805A (en) * | 1998-08-24 | 2000-10-24 | Air Products And Chemicals, Inc. | Detecting liquid dry conditions for liquefied compressed gases |
US6643951B1 (en) * | 1998-08-24 | 2003-11-11 | Air Products And Chemicals, Inc. | Detecting liquid dry conditions for liquified compressed gases |
US6207460B1 (en) * | 1999-01-14 | 2001-03-27 | Extraction Systems, Inc. | Detection of base contaminants in gas samples |
US6221132B1 (en) | 1999-10-14 | 2001-04-24 | Air Products And Chemicals, Inc. | Vacuum preparation of hydrogen halide drier |
US6363728B1 (en) | 2000-06-20 | 2002-04-02 | American Air Liquide Inc. | System and method for controlled delivery of liquefied gases from a bulk source |
US6915660B2 (en) * | 2001-04-06 | 2005-07-12 | The Boc Group, Inc. | Method and system for liquefaction monitoring |
US7334708B2 (en) * | 2001-07-16 | 2008-02-26 | L'air Liquide, Societe Anonyme A Directoire Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude | Integral blocks, chemical delivery systems and methods for delivering an ultrapure chemical |
US7270848B2 (en) | 2004-11-23 | 2007-09-18 | Tokyo Electron Limited | Method for increasing deposition rates of metal layers from metal-carbonyl precursors |
US7279421B2 (en) | 2004-11-23 | 2007-10-09 | Tokyo Electron Limited | Method and deposition system for increasing deposition rates of metal layers from metal-carbonyl precursors |
US7345184B2 (en) | 2005-03-31 | 2008-03-18 | Tokyo Electron Limited | Method and system for refurbishing a metal carbonyl precursor |
US20070266585A1 (en) * | 2005-04-16 | 2007-11-22 | Michael Arno | Portable Disposable Air/Gas Dryer |
US7264013B2 (en) * | 2005-05-13 | 2007-09-04 | Air Products And Chemicals, Inc. | Enhanced purge effect in gas conduit |
US7459395B2 (en) * | 2005-09-28 | 2008-12-02 | Tokyo Electron Limited | Method for purifying a metal carbonyl precursor |
US7644512B1 (en) | 2006-01-18 | 2010-01-12 | Akrion, Inc. | Systems and methods for drying a rotating substrate |
US20070204631A1 (en) * | 2006-03-03 | 2007-09-06 | American Air Liquide, Inc. | Liquefied Chemical Gas Delivery System |
US7892358B2 (en) | 2006-03-29 | 2011-02-22 | Tokyo Electron Limited | System for introducing a precursor gas to a vapor deposition system |
US7829454B2 (en) | 2007-09-11 | 2010-11-09 | Tokyo Electron Limited | Method for integrating selective ruthenium deposition into manufacturing of a semiconductior device |
US7704879B2 (en) | 2007-09-27 | 2010-04-27 | Tokyo Electron Limited | Method of forming low-resistivity recessed features in copper metallization |
US7884012B2 (en) | 2007-09-28 | 2011-02-08 | Tokyo Electron Limited | Void-free copper filling of recessed features for semiconductor devices |
US7776740B2 (en) | 2008-01-22 | 2010-08-17 | Tokyo Electron Limited | Method for integrating selective low-temperature ruthenium deposition into copper metallization of a semiconductor device |
US8247030B2 (en) | 2008-03-07 | 2012-08-21 | Tokyo Electron Limited | Void-free copper filling of recessed features using a smooth non-agglomerated copper seed layer |
US7799681B2 (en) | 2008-07-15 | 2010-09-21 | Tokyo Electron Limited | Method for forming a ruthenium metal cap layer |
US7776743B2 (en) | 2008-07-30 | 2010-08-17 | Tel Epion Inc. | Method of forming semiconductor devices containing metal cap layers |
US7871929B2 (en) | 2008-07-30 | 2011-01-18 | Tel Epion Inc. | Method of forming semiconductor devices containing metal cap layers |
TW201028363A (en) * | 2008-10-24 | 2010-08-01 | Solvay Fluor Gmbh | Bundle trailer for gas delivery |
US7977235B2 (en) | 2009-02-02 | 2011-07-12 | Tokyo Electron Limited | Method for manufacturing a semiconductor device with metal-containing cap layers |
US8716132B2 (en) | 2009-02-13 | 2014-05-06 | Tokyo Electron Limited | Radiation-assisted selective deposition of metal-containing cap layers |
US9416919B2 (en) * | 2013-10-11 | 2016-08-16 | Applied Materials, Inc. | Compact hazardous gas line distribution enabling system single point connections for multiple chambers |
US11155758B2 (en) * | 2019-05-30 | 2021-10-26 | Airgas, Inc. | Method of dosing a system with HCL then evacuating and purging |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2057661B (en) * | 1979-07-23 | 1983-04-13 | British Nuclear Fuels Ltd | Apparatus for metering and controlling a feed of hydrogen fluoride vapour |
US4532778A (en) * | 1979-11-16 | 1985-08-06 | Rocket Research Company | Chemical heat pump and chemical energy storage system |
US4640221A (en) * | 1985-10-30 | 1987-02-03 | International Business Machines Corporation | Vacuum deposition system with improved mass flow control |
JPH0698292B2 (ja) * | 1986-07-03 | 1994-12-07 | 忠弘 大見 | 超高純度ガスの供給方法及び供給系 |
IT1198290B (it) * | 1986-12-02 | 1988-12-21 | Sgs Microelettronica Spa | Metodo di decontaminazione di una camera utilizzata nei processi sotto vuoto di deposizione,attacco o crescita di films di elevata purezza,di particolare applicazione nella tecnologia dei semiconduttori |
US4853148A (en) * | 1987-03-24 | 1989-08-01 | Advanced Technology Materials, Inc. | Process and composition for drying of gaseous hydrogen halides |
US5137047A (en) * | 1990-08-24 | 1992-08-11 | Mark George | Delivery of reactive gas from gas pad to process tool |
US5148945B1 (en) * | 1990-09-17 | 1996-07-02 | Applied Chemical Solutions | Apparatus and method for the transfer and delivery of high purity chemicals |
US5359787A (en) * | 1993-04-16 | 1994-11-01 | Air Products And Chemicals, Inc. | High purity bulk chemical delivery system |
-
1993
- 1993-04-16 US US08/049,042 patent/US5359787A/en not_active Expired - Lifetime
-
1994
- 1994-04-11 EP EP94105564A patent/EP0620291B1/de not_active Expired - Lifetime
- 1994-04-11 AT AT94105564T patent/ATE142282T1/de active
- 1994-04-11 ES ES94105564T patent/ES2094582T3/es not_active Expired - Lifetime
- 1994-04-11 DE DE69400458T patent/DE69400458T2/de not_active Expired - Lifetime
- 1994-09-09 US US08/303,986 patent/US5539998A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
ATE142282T1 (de) | 1996-09-15 |
US5539998A (en) | 1996-07-30 |
DE69400458T2 (de) | 1997-01-30 |
EP0620291B1 (de) | 1996-09-04 |
US5359787A (en) | 1994-11-01 |
ES2094582T3 (es) | 1997-01-16 |
EP0620291A1 (de) | 1994-10-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |