DE69320963D1 - Plasmareinigungsverfahren zum entfernen von rückständen in einer plasmabehandlungskammer - Google Patents

Plasmareinigungsverfahren zum entfernen von rückständen in einer plasmabehandlungskammer

Info

Publication number
DE69320963D1
DE69320963D1 DE69320963T DE69320963T DE69320963D1 DE 69320963 D1 DE69320963 D1 DE 69320963D1 DE 69320963 T DE69320963 T DE 69320963T DE 69320963 T DE69320963 T DE 69320963T DE 69320963 D1 DE69320963 D1 DE 69320963D1
Authority
DE
Germany
Prior art keywords
plasma
treatment chamber
cleaning method
removing residues
plasma treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69320963T
Other languages
English (en)
Other versions
DE69320963T2 (de
Inventor
Ching-Hwa Chen
David Arnett
David Liu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lam Research Corp
Original Assignee
Lam Research Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Research Corp filed Critical Lam Research Corp
Publication of DE69320963D1 publication Critical patent/DE69320963D1/de
Application granted granted Critical
Publication of DE69320963T2 publication Critical patent/DE69320963T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/22—Removing surface-material, e.g. by engraving, by etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32853—Hygiene
    • H01J37/32862—In situ cleaning of vessels and/or internal parts
DE69320963T 1992-06-22 1993-06-16 Plasmareinigungsverfahren zum entfernen von rückständen in einer plasmabehandlungskammer Expired - Fee Related DE69320963T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US90266392A 1992-06-22 1992-06-22
PCT/US1993/005750 WO1994000251A1 (en) 1992-06-22 1993-06-16 A plasma cleaning method for removing residues in a plasma treatment chamber

Publications (2)

Publication Number Publication Date
DE69320963D1 true DE69320963D1 (de) 1998-10-15
DE69320963T2 DE69320963T2 (de) 1999-05-12

Family

ID=25416198

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69320963T Expired - Fee Related DE69320963T2 (de) 1992-06-22 1993-06-16 Plasmareinigungsverfahren zum entfernen von rückständen in einer plasmabehandlungskammer

Country Status (7)

Country Link
US (1) US5356478A (de)
EP (1) EP0647163B1 (de)
JP (1) JP3502096B2 (de)
KR (1) KR100293830B1 (de)
DE (1) DE69320963T2 (de)
TW (1) TW227643B (de)
WO (1) WO1994000251A1 (de)

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EP0647163B1 (de) 1998-09-09
KR950702140A (ko) 1995-06-19
US5356478A (en) 1994-10-18
WO1994000251A1 (en) 1994-01-06
JPH07508313A (ja) 1995-09-14
TW227643B (de) 1994-08-01
JP3502096B2 (ja) 2004-03-02
EP0647163A4 (de) 1996-02-07
EP0647163A1 (de) 1995-04-12
DE69320963T2 (de) 1999-05-12

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