DE69320241T2 - Chemisch amplifizierte Resistzusammensetzung - Google Patents

Chemisch amplifizierte Resistzusammensetzung

Info

Publication number
DE69320241T2
DE69320241T2 DE69320241T DE69320241T DE69320241T2 DE 69320241 T2 DE69320241 T2 DE 69320241T2 DE 69320241 T DE69320241 T DE 69320241T DE 69320241 T DE69320241 T DE 69320241T DE 69320241 T2 DE69320241 T2 DE 69320241T2
Authority
DE
Germany
Prior art keywords
resist composition
chemically amplified
amplified resist
chemically
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69320241T
Other languages
English (en)
Other versions
DE69320241D1 (de
Inventor
Tsuguo Yamaoka
Kenichi Koseki
Mitsuharu Obara
Ikuo Shimizu
Yukiyoshi Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KH Neochem Co Ltd
Original Assignee
Kyowa Hakko Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyowa Hakko Kogyo Co Ltd filed Critical Kyowa Hakko Kogyo Co Ltd
Publication of DE69320241D1 publication Critical patent/DE69320241D1/de
Application granted granted Critical
Publication of DE69320241T2 publication Critical patent/DE69320241T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
DE69320241T 1992-05-06 1993-05-05 Chemisch amplifizierte Resistzusammensetzung Expired - Fee Related DE69320241T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11360492 1992-05-06

Publications (2)

Publication Number Publication Date
DE69320241D1 DE69320241D1 (de) 1998-09-17
DE69320241T2 true DE69320241T2 (de) 1999-04-29

Family

ID=14616431

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69320241T Expired - Fee Related DE69320241T2 (de) 1992-05-06 1993-05-05 Chemisch amplifizierte Resistzusammensetzung

Country Status (3)

Country Link
US (1) US5527659A (de)
EP (1) EP0568993B1 (de)
DE (1) DE69320241T2 (de)

Families Citing this family (64)

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EP0838463B1 (de) * 1992-04-24 2002-03-27 Kyowa Hakko Kogyo Co., Ltd. Squaryliumverbindungen und diese benutzende optische Informationsaufzeichnungsmittel
US6007965A (en) * 1992-07-13 1999-12-28 Yamaoka; Tsuguo Photopolymerizable compositions including squarylium compounds
US5756258A (en) * 1992-07-13 1998-05-26 Kyowa Hakko Co., Ltd. Photopolymerizable composition containing an addition polymerizable compound, a radical-producing agent and a squarylium compound
EP1113335B1 (de) * 1992-07-13 2003-11-26 Kyowa Hakko Kogyo Co., Ltd. Photopolymerisierbare Zusammensetungen
US6391512B1 (en) * 1995-10-20 2002-05-21 Konica Corporation Image forming material and image forming method
US5814431A (en) * 1996-01-10 1998-09-29 Mitsubishi Chemical Corporation Photosensitive composition and lithographic printing plate
DE69701266T2 (de) * 1996-03-11 2000-06-08 Fuji Photo Film Co Ltd Negativarbeitendes Bildaufzeichnungsmaterial
US5747217A (en) * 1996-04-03 1998-05-05 Minnesota Mining And Manufacturing Company Laser-induced mass transfer imaging materials and methods utilizing colorless sublimable compounds
US5691098A (en) * 1996-04-03 1997-11-25 Minnesota Mining And Manufacturing Company Laser-Induced mass transfer imaging materials utilizing diazo compounds
US7534543B2 (en) 1996-04-15 2009-05-19 3M Innovative Properties Company Texture control of thin film layers prepared via laser induced thermal imaging
US5725989A (en) 1996-04-15 1998-03-10 Chang; Jeffrey C. Laser addressable thermal transfer imaging element with an interlayer
US5763134A (en) * 1996-05-13 1998-06-09 Imation Corp Composition comprising photochemical acid progenitor and specific squarylium dye
US6489065B1 (en) * 1996-05-17 2002-12-03 Polaroid Corporation Holographic medium and process for use thereof
US5710097A (en) * 1996-06-27 1998-01-20 Minnesota Mining And Manufacturing Company Process and materials for imagewise placement of uniform spacers in flat panel displays
US6140022A (en) * 1996-07-19 2000-10-31 Agfa-Gevaert, N.V. Radiation sensitive imaging element and a method for producing lithographic plates therewith
US5998085A (en) * 1996-07-23 1999-12-07 3M Innovative Properties Process for preparing high resolution emissive arrays and corresponding articles
US6060222A (en) 1996-11-19 2000-05-09 Kodak Polcyhrome Graphics Llc 1Postitve-working imaging composition and element and method of forming positive image with a laser
US6077641A (en) * 1997-01-17 2000-06-20 Kodak Polychrome Graphics Llc Lithographic plates
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US5865115A (en) * 1998-06-03 1999-02-02 Eastman Kodak Company Using electro-osmosis for re-inking a moveable belt
US6195112B1 (en) 1998-07-16 2001-02-27 Eastman Kodak Company Steering apparatus for re-inkable belt
ATE528973T1 (de) * 1998-12-22 2011-10-15 Huntsman Adv Mat Switzerland Herstellung von photoresistbeschichtungen
US6114088A (en) 1999-01-15 2000-09-05 3M Innovative Properties Company Thermal transfer element for forming multilayer devices
DE60035078T2 (de) 1999-01-15 2008-01-31 3M Innovative Properties Co., St. Paul Herstellungsverfahren eines Donorelements für Übertragung durch Wärme
SG78412A1 (en) 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
US6461775B1 (en) 1999-05-14 2002-10-08 3M Innovative Properties Company Thermal transfer of a black matrix containing carbon black
US6228543B1 (en) 1999-09-09 2001-05-08 3M Innovative Properties Company Thermal transfer with a plasticizer-containing transfer layer
US6521324B1 (en) 1999-11-30 2003-02-18 3M Innovative Properties Company Thermal transfer of microstructured layers
US6451502B1 (en) 2000-10-10 2002-09-17 Kodak Polychrome Graphics Llc manufacture of electronic parts
US20030008229A1 (en) * 2001-06-25 2003-01-09 Prakash Seth Thermally sensitive coating compositions useful for lithographic elements
JP2003326691A (ja) 2002-05-09 2003-11-19 Konica Minolta Holdings Inc 画像記録方法、エネルギー線硬化インク及び画像記録装置
US7309122B2 (en) 2003-06-24 2007-12-18 Konica Minolta Medical & Graphic, Inc. Method for storing cationic polymerizable composition and container for using thereof
US7396631B2 (en) 2005-10-07 2008-07-08 3M Innovative Properties Company Radiation curable thermal transfer elements
US7678526B2 (en) 2005-10-07 2010-03-16 3M Innovative Properties Company Radiation curable thermal transfer elements
JP5171005B2 (ja) 2006-03-17 2013-03-27 富士フイルム株式会社 高分子化合物およびその製造方法、並びに顔料分散剤
US7223515B1 (en) 2006-05-30 2007-05-29 3M Innovative Properties Company Thermal mass transfer substrate films, donor elements, and methods of making and using same
US7670450B2 (en) 2006-07-31 2010-03-02 3M Innovative Properties Company Patterning and treatment methods for organic light emitting diode devices
EP1975702B1 (de) 2007-03-29 2013-07-24 FUJIFILM Corporation Farbige lichthärtbare Zusammensetzung für eine Festkörperbildaufnahmevorrichtung, Farbfilter und Verfahren zur Herstellung davon, sowie Festkörperbildaufnahmevorrichtung
JP5030638B2 (ja) 2007-03-29 2012-09-19 富士フイルム株式会社 カラーフィルタ及びその製造方法
JP5213375B2 (ja) 2007-07-13 2013-06-19 富士フイルム株式会社 顔料分散液、硬化性組成物、それを用いるカラーフィルタ及び固体撮像素子
US7927454B2 (en) 2007-07-17 2011-04-19 Samsung Mobile Display Co., Ltd. Method of patterning a substrate
JP5371449B2 (ja) 2008-01-31 2013-12-18 富士フイルム株式会社 樹脂、顔料分散液、着色硬化性組成物、これを用いたカラーフィルタ及びその製造方法
JP5448352B2 (ja) 2008-03-10 2014-03-19 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及び、固体撮像素子
JP5334624B2 (ja) 2008-03-17 2013-11-06 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及びカラーフィルタの製造方法
JP5535444B2 (ja) 2008-03-28 2014-07-02 富士フイルム株式会社 固体撮像素子用緑色硬化性組成物、固体撮像素子用カラーフィルタ及びその製造方法
US8454152B2 (en) 2008-06-23 2013-06-04 Konica Minolta Holdings, Inc. Ink jet recording device and ink jet recording method
JP5106285B2 (ja) 2008-07-16 2012-12-26 富士フイルム株式会社 光硬化性組成物、インク組成物、及び該インク組成物を用いたインクジェット記録方法
JP5079653B2 (ja) 2008-09-29 2012-11-21 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子
JP5171514B2 (ja) 2008-09-29 2013-03-27 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及びカラーフィルタの製造方法
JP5127651B2 (ja) 2008-09-30 2013-01-23 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子
JP5374403B2 (ja) 2009-02-13 2013-12-25 三菱製紙株式会社 感光性平版印刷版材料
KR101651157B1 (ko) 2009-08-13 2016-08-25 후지필름 가부시키가이샤 웨이퍼 레벨 렌즈, 웨이퍼 레벨 렌즈의 제조 방법, 및 촬상 유닛
JP2012003225A (ja) 2010-01-27 2012-01-05 Fujifilm Corp ソルダーレジスト用重合性組成物及びソルダーレジストパターンの形成方法
WO2011104127A1 (en) 2010-02-24 2011-09-01 Basf Se Latent acids and their use
WO2011122473A1 (ja) 2010-03-29 2011-10-06 三菱製紙株式会社 感光性組成物及び感光性平版印刷版材料
JP5544239B2 (ja) 2010-07-29 2014-07-09 富士フイルム株式会社 重合性組成物
JP5417364B2 (ja) 2011-03-08 2014-02-12 富士フイルム株式会社 固体撮像素子用硬化性組成物、並びに、これを用いた感光層、永久パターン、ウエハレベルレンズ、固体撮像素子、及び、パターン形成方法
JP5934682B2 (ja) 2012-08-31 2016-06-15 富士フイルム株式会社 マイクロレンズ形成用又はカラーフィルターの下塗り膜形成用硬化性組成物、透明膜、マイクロレンズ、固体撮像素子、及び、硬化性組成物の製造方法
EP2927717A4 (de) 2012-11-30 2016-01-06 Fujifilm Corp Härtbare harzzusammensetzung und bildsensorchipherstellungsverfahren sowie bildsensorchip damit
EP2927716A4 (de) 2012-11-30 2015-12-30 Fujifilm Corp Härtbare harzzusammensetzung und bildsensorchpherstellungsverfahren und bildsensorchip damit
CN104812571B (zh) 2013-08-01 2016-10-19 Lg化学株式会社 具有三维结构的金属图形的制造方法
WO2016124493A1 (en) 2015-02-02 2016-08-11 Basf Se Latent acids and their use
CN114269556A (zh) 2019-08-29 2022-04-01 富士胶片株式会社 组合物、膜、近红外线截止滤波器、图案形成方法、层叠体、固体摄像元件、红外线传感器、图像显示装置、相机模块及化合物
WO2021039253A1 (ja) 2019-08-30 2021-03-04 富士フイルム株式会社 組成物、膜、光学フィルタ及びその製造方法、固体撮像素子、赤外線センサ、並びに、センサモジュール

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Also Published As

Publication number Publication date
US5527659A (en) 1996-06-18
EP0568993A2 (de) 1993-11-10
EP0568993B1 (de) 1998-08-12
EP0568993A3 (de) 1994-12-14
DE69320241D1 (de) 1998-09-17

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