DE69320241D1 - Chemisch amplifizierte Resistzusammensetzung - Google Patents

Chemisch amplifizierte Resistzusammensetzung

Info

Publication number
DE69320241D1
DE69320241D1 DE69320241T DE69320241T DE69320241D1 DE 69320241 D1 DE69320241 D1 DE 69320241D1 DE 69320241 T DE69320241 T DE 69320241T DE 69320241 T DE69320241 T DE 69320241T DE 69320241 D1 DE69320241 D1 DE 69320241D1
Authority
DE
Germany
Prior art keywords
resist composition
chemically amplified
amplified resist
chemically
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69320241T
Other languages
English (en)
Other versions
DE69320241T2 (de
Inventor
Tsuguo Yamaoka
Kenichi Koseki
Mitsuharu Obara
Ikuo Shimizu
Yukiyoshi Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KH Neochem Co Ltd
Original Assignee
Kyowa Hakko Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyowa Hakko Kogyo Co Ltd filed Critical Kyowa Hakko Kogyo Co Ltd
Application granted granted Critical
Publication of DE69320241D1 publication Critical patent/DE69320241D1/de
Publication of DE69320241T2 publication Critical patent/DE69320241T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
DE69320241T 1992-05-06 1993-05-05 Chemisch amplifizierte Resistzusammensetzung Expired - Fee Related DE69320241T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11360492 1992-05-06

Publications (2)

Publication Number Publication Date
DE69320241D1 true DE69320241D1 (de) 1998-09-17
DE69320241T2 DE69320241T2 (de) 1999-04-29

Family

ID=14616431

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69320241T Expired - Fee Related DE69320241T2 (de) 1992-05-06 1993-05-05 Chemisch amplifizierte Resistzusammensetzung

Country Status (3)

Country Link
US (1) US5527659A (de)
EP (1) EP0568993B1 (de)
DE (1) DE69320241T2 (de)

Families Citing this family (64)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69331772T2 (de) * 1992-04-24 2002-11-07 Ricoh Kk Squaryliumverbindungen und diese benutzende optische Informationsaufzeichnungsmittel
US6007965A (en) * 1992-07-13 1999-12-28 Yamaoka; Tsuguo Photopolymerizable compositions including squarylium compounds
US5756258A (en) * 1992-07-13 1998-05-26 Kyowa Hakko Co., Ltd. Photopolymerizable composition containing an addition polymerizable compound, a radical-producing agent and a squarylium compound
CA2118604C (en) * 1992-07-13 2004-07-06 Tsuguo Yamaoka Photopolymerizable composition comprising a squarylium compound
US6391512B1 (en) * 1995-10-20 2002-05-21 Konica Corporation Image forming material and image forming method
US5814431A (en) * 1996-01-10 1998-09-29 Mitsubishi Chemical Corporation Photosensitive composition and lithographic printing plate
EP0795789B1 (de) * 1996-03-11 2000-02-09 Fuji Photo Film Co., Ltd. Negativarbeitendes Bildaufzeichnungsmaterial
US5691098A (en) * 1996-04-03 1997-11-25 Minnesota Mining And Manufacturing Company Laser-Induced mass transfer imaging materials utilizing diazo compounds
US5747217A (en) * 1996-04-03 1998-05-05 Minnesota Mining And Manufacturing Company Laser-induced mass transfer imaging materials and methods utilizing colorless sublimable compounds
US7534543B2 (en) 1996-04-15 2009-05-19 3M Innovative Properties Company Texture control of thin film layers prepared via laser induced thermal imaging
US5725989A (en) 1996-04-15 1998-03-10 Chang; Jeffrey C. Laser addressable thermal transfer imaging element with an interlayer
US5763134A (en) 1996-05-13 1998-06-09 Imation Corp Composition comprising photochemical acid progenitor and specific squarylium dye
US6489065B1 (en) * 1996-05-17 2002-12-03 Polaroid Corporation Holographic medium and process for use thereof
US5710097A (en) * 1996-06-27 1998-01-20 Minnesota Mining And Manufacturing Company Process and materials for imagewise placement of uniform spacers in flat panel displays
US6140022A (en) * 1996-07-19 2000-10-31 Agfa-Gevaert, N.V. Radiation sensitive imaging element and a method for producing lithographic plates therewith
US5998085A (en) * 1996-07-23 1999-12-07 3M Innovative Properties Process for preparing high resolution emissive arrays and corresponding articles
US6060222A (en) 1996-11-19 2000-05-09 Kodak Polcyhrome Graphics Llc 1Postitve-working imaging composition and element and method of forming positive image with a laser
US6077641A (en) * 1997-01-17 2000-06-20 Kodak Polychrome Graphics Llc Lithographic plates
US6165674A (en) * 1998-01-15 2000-12-26 Shipley Company, L.L.C. Polymers and photoresist compositions for short wavelength imaging
US5865115A (en) * 1998-06-03 1999-02-02 Eastman Kodak Company Using electro-osmosis for re-inking a moveable belt
US6195112B1 (en) 1998-07-16 2001-02-27 Eastman Kodak Company Steering apparatus for re-inkable belt
ES2374807T3 (es) 1998-12-22 2012-02-22 Huntsman Advanced Materials (Switzerland) Gmbh Producción de revestimientos fotorresistentes.
US6114088A (en) 1999-01-15 2000-09-05 3M Innovative Properties Company Thermal transfer element for forming multilayer devices
EP1144197B1 (de) 1999-01-15 2003-06-11 3M Innovative Properties Company Thermisches Übertragungsverfahren.
SG78412A1 (en) 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
US6461775B1 (en) 1999-05-14 2002-10-08 3M Innovative Properties Company Thermal transfer of a black matrix containing carbon black
US6228543B1 (en) 1999-09-09 2001-05-08 3M Innovative Properties Company Thermal transfer with a plasticizer-containing transfer layer
US6521324B1 (en) 1999-11-30 2003-02-18 3M Innovative Properties Company Thermal transfer of microstructured layers
US6451502B1 (en) 2000-10-10 2002-09-17 Kodak Polychrome Graphics Llc manufacture of electronic parts
US20030008229A1 (en) * 2001-06-25 2003-01-09 Prakash Seth Thermally sensitive coating compositions useful for lithographic elements
JP2003326691A (ja) 2002-05-09 2003-11-19 Konica Minolta Holdings Inc 画像記録方法、エネルギー線硬化インク及び画像記録装置
US7309122B2 (en) 2003-06-24 2007-12-18 Konica Minolta Medical & Graphic, Inc. Method for storing cationic polymerizable composition and container for using thereof
US7678526B2 (en) 2005-10-07 2010-03-16 3M Innovative Properties Company Radiation curable thermal transfer elements
US7396631B2 (en) 2005-10-07 2008-07-08 3M Innovative Properties Company Radiation curable thermal transfer elements
JP5171005B2 (ja) 2006-03-17 2013-03-27 富士フイルム株式会社 高分子化合物およびその製造方法、並びに顔料分散剤
US7223515B1 (en) 2006-05-30 2007-05-29 3M Innovative Properties Company Thermal mass transfer substrate films, donor elements, and methods of making and using same
US7670450B2 (en) 2006-07-31 2010-03-02 3M Innovative Properties Company Patterning and treatment methods for organic light emitting diode devices
EP1975702B1 (de) 2007-03-29 2013-07-24 FUJIFILM Corporation Farbige lichthärtbare Zusammensetzung für eine Festkörperbildaufnahmevorrichtung, Farbfilter und Verfahren zur Herstellung davon, sowie Festkörperbildaufnahmevorrichtung
JP5030638B2 (ja) 2007-03-29 2012-09-19 富士フイルム株式会社 カラーフィルタ及びその製造方法
JP5213375B2 (ja) 2007-07-13 2013-06-19 富士フイルム株式会社 顔料分散液、硬化性組成物、それを用いるカラーフィルタ及び固体撮像素子
US7927454B2 (en) 2007-07-17 2011-04-19 Samsung Mobile Display Co., Ltd. Method of patterning a substrate
JP5371449B2 (ja) 2008-01-31 2013-12-18 富士フイルム株式会社 樹脂、顔料分散液、着色硬化性組成物、これを用いたカラーフィルタ及びその製造方法
JP5448352B2 (ja) 2008-03-10 2014-03-19 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及び、固体撮像素子
JP5334624B2 (ja) 2008-03-17 2013-11-06 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及びカラーフィルタの製造方法
JP5535444B2 (ja) 2008-03-28 2014-07-02 富士フイルム株式会社 固体撮像素子用緑色硬化性組成物、固体撮像素子用カラーフィルタ及びその製造方法
JP4951784B2 (ja) 2008-06-23 2012-06-13 コニカミノルタホールディングス株式会社 インクジェット記録装置及びインクジェット記録方法
JP5106285B2 (ja) 2008-07-16 2012-12-26 富士フイルム株式会社 光硬化性組成物、インク組成物、及び該インク組成物を用いたインクジェット記録方法
JP5171514B2 (ja) 2008-09-29 2013-03-27 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ、及びカラーフィルタの製造方法
JP5079653B2 (ja) 2008-09-29 2012-11-21 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子
JP5127651B2 (ja) 2008-09-30 2013-01-23 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子
JP5374403B2 (ja) 2009-02-13 2013-12-25 三菱製紙株式会社 感光性平版印刷版材料
EP2466341A1 (de) 2009-08-13 2012-06-20 FUJIFILM Corporation Linse auf wafer-ebene, verfahren zur herstellung der linse auf wafer-ebene und bildgebungseinheit damit
JP2012003225A (ja) 2010-01-27 2012-01-05 Fujifilm Corp ソルダーレジスト用重合性組成物及びソルダーレジストパターンの形成方法
WO2011104127A1 (en) 2010-02-24 2011-09-01 Basf Se Latent acids and their use
US8647813B2 (en) 2010-03-29 2014-02-11 Mitsubishi Paper Mills Limited Photosensitive composition and photosensitive lithographic printing plate material
JP5544239B2 (ja) 2010-07-29 2014-07-09 富士フイルム株式会社 重合性組成物
JP5417364B2 (ja) 2011-03-08 2014-02-12 富士フイルム株式会社 固体撮像素子用硬化性組成物、並びに、これを用いた感光層、永久パターン、ウエハレベルレンズ、固体撮像素子、及び、パターン形成方法
JP5934682B2 (ja) 2012-08-31 2016-06-15 富士フイルム株式会社 マイクロレンズ形成用又はカラーフィルターの下塗り膜形成用硬化性組成物、透明膜、マイクロレンズ、固体撮像素子、及び、硬化性組成物の製造方法
CN104854486A (zh) 2012-11-30 2015-08-19 富士胶片株式会社 硬化性树脂组合物、使用其的图像传感器芯片的制造方法及图像传感器芯片
CN104823083A (zh) 2012-11-30 2015-08-05 富士胶片株式会社 硬化性树脂组合物、使用其的图像传感器芯片的制造方法及图像传感器芯片
KR101617534B1 (ko) 2013-08-01 2016-05-02 주식회사 엘지화학 3차원 구조의 금속 패턴 제조 방법
KR102537349B1 (ko) 2015-02-02 2023-05-26 바스프 에스이 잠재성 산 및 그의 용도
CN114269556A (zh) 2019-08-29 2022-04-01 富士胶片株式会社 组合物、膜、近红外线截止滤波器、图案形成方法、层叠体、固体摄像元件、红外线传感器、图像显示装置、相机模块及化合物
JPWO2021039253A1 (de) 2019-08-30 2021-03-04

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4554238A (en) * 1984-03-20 1985-11-19 Minnesota Mining And Manufacturing Company Spectrally-sensitized imaging system
US4743530A (en) * 1986-11-21 1988-05-10 Eastman Kodak Company Negative working photoresists responsive to longer wavelengths and novel coated articles
US4743531A (en) * 1986-11-21 1988-05-10 Eastman Kodak Company Dye sensitized photographic imaging system
US4743528A (en) * 1986-11-21 1988-05-10 Eastman Kodak Company Enhanced imaging composition containing an azinium activator
JPH0820734B2 (ja) * 1988-08-11 1996-03-04 富士写真フイルム株式会社 感光性組成物及びそれを用いた光重合性組成物
EP0379200A3 (de) * 1989-01-19 1991-11-13 Mitsubishi Kasei Corporation Photopolymerisierbare Zusammensetzung
EP0452263B1 (de) * 1990-04-10 1995-07-19 Ciba-Geigy Ag Epoxidharz-Stoffgemische enthaltend Eisen-Aren-Komplexe und bestimmte Amine
JP2897375B2 (ja) * 1990-08-27 1999-05-31 三菱化学株式会社 光重合性組成物

Also Published As

Publication number Publication date
US5527659A (en) 1996-06-18
DE69320241T2 (de) 1999-04-29
EP0568993A2 (de) 1993-11-10
EP0568993A3 (de) 1994-12-14
EP0568993B1 (de) 1998-08-12

Similar Documents

Publication Publication Date Title
DE69320241T2 (de) Chemisch amplifizierte Resistzusammensetzung
DE69407882T2 (de) Chemisch verstärkter Resist
DE69027799T2 (de) Chemisch amplifizierter Photolack
DE69327741T2 (de) Photopolymerisierbare Zusammensetzung
DE69325158D1 (de) Photokromische Zusammensetzung
DE69322946T2 (de) Photolackzusammensetzung
DE69301999T2 (de) Photoresist Zusammensetzung
DE69222234D1 (de) Photopolymerisierbare Zusammensetzung
DE69434482D1 (de) Verstärker
DE69319008T2 (de) Verstärker
DE69320397D1 (de) Photopolymerisierbare Zusammensetzung
DE69330631D1 (de) Trennmittel
DE69309769D1 (de) Positivarbeitende Resistzusammensetzung
DE69322737D1 (de) Verstärker
DK0750080T3 (da) Konstruktioner
DE69208580D1 (de) Photopolymerisierbare Zusammensetzung
DE69332687T2 (de) Photopolymerisierbare zusammensetzung
DE69326721D1 (de) Insektizidzusammensetzung
BR9104279A (pt) Composicao e composto
DE69217904T2 (de) Zusammensetzung
DE69416474D1 (de) Verstärker
KR950703757A (ko) 양성-작용 포토레지스트 조성물(posivive-working pothoresist composition)
ITMI920089A1 (it) Composizione antiemorroidale
DE69333526D1 (de) Dermatologische zusammensetzung
DE9302283U1 (de) Verstärker

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee