DE69306020D1 - Polylactid-Verbindungen als Empfindlichkeitsförderer für strahlungsempfindliche Mischungen - Google Patents

Polylactid-Verbindungen als Empfindlichkeitsförderer für strahlungsempfindliche Mischungen

Info

Publication number
DE69306020D1
DE69306020D1 DE69306020T DE69306020T DE69306020D1 DE 69306020 D1 DE69306020 D1 DE 69306020D1 DE 69306020 T DE69306020 T DE 69306020T DE 69306020 T DE69306020 T DE 69306020T DE 69306020 D1 DE69306020 D1 DE 69306020D1
Authority
DE
Germany
Prior art keywords
radiation
sensitive mixtures
promoters
sensitivity
polylactide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69306020T
Other languages
English (en)
Inventor
James G Favier
Lawrence Ferreira
John A Mcfarland
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OCG Microelectronic Materials Inc
Original Assignee
OCG Microelectronic Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OCG Microelectronic Materials Inc filed Critical OCG Microelectronic Materials Inc
Application granted granted Critical
Publication of DE69306020D1 publication Critical patent/DE69306020D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
DE69306020T 1992-03-19 1993-03-17 Polylactid-Verbindungen als Empfindlichkeitsförderer für strahlungsempfindliche Mischungen Expired - Lifetime DE69306020D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/854,101 US5234789A (en) 1992-03-19 1992-03-19 Polylactide compounds as sensitivity enhancers for radiation sensitive mixtures containing o-quinonediazide photoactive compounds

Publications (1)

Publication Number Publication Date
DE69306020D1 true DE69306020D1 (de) 1997-01-02

Family

ID=25317733

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69306020T Expired - Lifetime DE69306020D1 (de) 1992-03-19 1993-03-17 Polylactid-Verbindungen als Empfindlichkeitsförderer für strahlungsempfindliche Mischungen

Country Status (5)

Country Link
US (1) US5234789A (de)
EP (1) EP0561625B1 (de)
JP (1) JPH0683051A (de)
KR (1) KR930020218A (de)
DE (1) DE69306020D1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5571657A (en) * 1993-09-30 1996-11-05 Shipley Company, Inc. Modified cation exhange process
US5443736A (en) * 1993-10-20 1995-08-22 Shipley Company Inc. Purification process
US7329354B2 (en) * 1998-06-09 2008-02-12 Ppt Technologies, Llc Purification of organic solvent fluids
US6660875B1 (en) 1998-06-09 2003-12-09 Ppt Technologies, Llc Ion exchange purification of dielectric condensate precursor fluids and silicate esters such as tetraethylorthosilicate (TEOS)
KR100498045B1 (ko) 2003-07-14 2005-07-01 삼성전자주식회사 현상장치
JP2005099500A (ja) * 2003-09-25 2005-04-14 Harison Toshiba Lighting Corp レジストおよびリソグラフィー方法
JP4789599B2 (ja) * 2004-12-06 2011-10-12 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． フォトレジスト組成物
TWI406876B (zh) * 2008-06-02 2013-09-01 Ind Tech Res Inst 兩性共聚物及其製造方法及包含其之高分子組合物
US9081275B2 (en) 2010-12-02 2015-07-14 Industrial Technology Research Institute Photosensitive composition and photoresist

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5128230A (en) * 1986-12-23 1992-07-07 Shipley Company Inc. Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate
US5063138A (en) * 1988-11-10 1991-11-05 Ocg Microelectronic Materials, Inc. Positive-working photoresist process employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent during photoresist coating
US4965167A (en) * 1988-11-10 1990-10-23 Olin Hunt Specialty Products, Inc. Positive-working photoresist employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent
JP2966917B2 (ja) * 1990-11-14 1999-10-25 三井化学株式会社 感光材料用樹脂組成物
DE4141352A1 (de) * 1991-12-14 1993-06-17 Basf Ag Verfahren zur herstellung von mikrostrukturkoerpern

Also Published As

Publication number Publication date
KR930020218A (ko) 1993-10-19
EP0561625B1 (de) 1996-11-20
JPH0683051A (ja) 1994-03-25
EP0561625A1 (de) 1993-09-22
US5234789A (en) 1993-08-10

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Legal Events

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