DE69227840D1 - Verfahren und zusammensetzungen für diffusionsmuster. - Google Patents

Verfahren und zusammensetzungen für diffusionsmuster.

Info

Publication number
DE69227840D1
DE69227840D1 DE69227840T DE69227840T DE69227840D1 DE 69227840 D1 DE69227840 D1 DE 69227840D1 DE 69227840 T DE69227840 T DE 69227840T DE 69227840 T DE69227840 T DE 69227840T DE 69227840 D1 DE69227840 D1 DE 69227840D1
Authority
DE
Germany
Prior art keywords
compositions
diffusion patterns
diffusion
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69227840T
Other languages
English (en)
Other versions
DE69227840T2 (de
Inventor
John Felten
Sheau-Hwa Ma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Application granted granted Critical
Publication of DE69227840D1 publication Critical patent/DE69227840D1/de
Publication of DE69227840T2 publication Critical patent/DE69227840T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4803—Insulating or insulated parts, e.g. mountings, containers, diamond heatsinks
    • H01L21/481—Insulating layers on insulating parts, with or without metallisation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0502—Patterning and lithography
    • H05K2203/0511—Diffusion patterning
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
DE69227840T 1991-09-30 1992-09-30 Verfahren und zusammensetzungen für diffusionsmuster. Expired - Fee Related DE69227840T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/768,504 US5209814A (en) 1991-09-30 1991-09-30 Method for diffusion patterning
PCT/US1992/008142 WO1993007640A1 (en) 1991-09-30 1992-09-30 Method and compositions for diffusion patterning

Publications (2)

Publication Number Publication Date
DE69227840D1 true DE69227840D1 (de) 1999-01-21
DE69227840T2 DE69227840T2 (de) 1999-04-29

Family

ID=25082692

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69227840T Expired - Fee Related DE69227840T2 (de) 1991-09-30 1992-09-30 Verfahren und zusammensetzungen für diffusionsmuster.

Country Status (7)

Country Link
US (2) US5209814A (de)
EP (1) EP0606355B1 (de)
JP (1) JP2688542B2 (de)
CN (2) CN1032614C (de)
DE (1) DE69227840T2 (de)
TW (1) TW200582B (de)
WO (1) WO1993007640A1 (de)

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JPH05205989A (ja) * 1992-01-28 1993-08-13 Hitachi Ltd リソグラフィ法及び半導体装置の製造方法
US5270078A (en) * 1992-08-14 1993-12-14 E. I. Du Pont De Nemours And Company Method for preparing high resolution wash-off images
EP0613166B1 (de) * 1993-02-26 2000-04-19 E.I. Du Pont De Nemours And Company Verfahren zur Herstellung eines Plasma-Anzeigegeräts
US6017661A (en) 1994-11-09 2000-01-25 Kimberly-Clark Corporation Temporary marking using photoerasable colorants
US6017471A (en) 1993-08-05 2000-01-25 Kimberly-Clark Worldwide, Inc. Colorants and colorant modifiers
US6211383B1 (en) 1993-08-05 2001-04-03 Kimberly-Clark Worldwide, Inc. Nohr-McDonald elimination reaction
US5733693A (en) 1993-08-05 1998-03-31 Kimberly-Clark Worldwide, Inc. Method for improving the readability of data processing forms
US5700850A (en) 1993-08-05 1997-12-23 Kimberly-Clark Worldwide Colorant compositions and colorant stabilizers
US5865471A (en) 1993-08-05 1999-02-02 Kimberly-Clark Worldwide, Inc. Photo-erasable data processing forms
US5643356A (en) 1993-08-05 1997-07-01 Kimberly-Clark Corporation Ink for ink jet printers
US5681380A (en) 1995-06-05 1997-10-28 Kimberly-Clark Worldwide, Inc. Ink for ink jet printers
US5773182A (en) 1993-08-05 1998-06-30 Kimberly-Clark Worldwide, Inc. Method of light stabilizing a colorant
CA2120838A1 (en) 1993-08-05 1995-02-06 Ronald Sinclair Nohr Solid colored composition mutable by ultraviolet radiation
US5721287A (en) 1993-08-05 1998-02-24 Kimberly-Clark Worldwide, Inc. Method of mutating a colorant by irradiation
US5645964A (en) 1993-08-05 1997-07-08 Kimberly-Clark Corporation Digital information recording media and method of using same
US5411628A (en) * 1993-10-21 1995-05-02 E. I. Du Pont De Nemours And Company Diffusion patterning process and screen therefor
US5466653A (en) * 1994-06-29 1995-11-14 E. I. Du Pont De Nemours And Company Method for preparing negative-working wash-off relief images and non-photosensitive elements for use therein
US6242057B1 (en) 1994-06-30 2001-06-05 Kimberly-Clark Worldwide, Inc. Photoreactor composition and applications therefor
US5739175A (en) 1995-06-05 1998-04-14 Kimberly-Clark Worldwide, Inc. Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer
US5685754A (en) 1994-06-30 1997-11-11 Kimberly-Clark Corporation Method of generating a reactive species and polymer coating applications therefor
US6071979A (en) 1994-06-30 2000-06-06 Kimberly-Clark Worldwide, Inc. Photoreactor composition method of generating a reactive species and applications therefor
US6008268A (en) 1994-10-21 1999-12-28 Kimberly-Clark Worldwide, Inc. Photoreactor composition, method of generating a reactive species, and applications therefor
EP0742585A1 (de) * 1995-05-08 1996-11-13 E.I. Du Pont De Nemours And Company Verfahren und Zusammensetzung zur Diffusionsmusterung eines Bandes auf einem Substrat
US5849411A (en) 1995-06-05 1998-12-15 Kimberly-Clark Worldwide, Inc. Polymer film, nonwoven web and fibers containing a photoreactor composition
SK160497A3 (en) 1995-06-05 1998-06-03 Kimberly Clark Co Novel pre-dyes
US5798015A (en) 1995-06-05 1998-08-25 Kimberly-Clark Worldwide, Inc. Method of laminating a structure with adhesive containing a photoreactor composition
US5811199A (en) 1995-06-05 1998-09-22 Kimberly-Clark Worldwide, Inc. Adhesive compositions containing a photoreactor composition
US5747550A (en) 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
US5786132A (en) 1995-06-05 1998-07-28 Kimberly-Clark Corporation Pre-dyes, mutable dye compositions, and methods of developing a color
MX9710016A (es) 1995-06-28 1998-07-31 Kimberly Clark Co Colorantes novedosos y modificadores de colorante.
US5855655A (en) 1996-03-29 1999-01-05 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
DE69620428T2 (de) 1995-11-28 2002-11-14 Kimberly Clark Co Lichtstabilisierte fabstoffzusammensetzungen
US5891229A (en) 1996-03-29 1999-04-06 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
WO1998043268A1 (en) * 1997-03-25 1998-10-01 E.I. Du Pont De Nemours And Company Field emitter cathode backplate structures for display panels
US6524379B2 (en) 1997-08-15 2003-02-25 Kimberly-Clark Worldwide, Inc. Colorants, colorant stabilizers, ink compositions, and improved methods of making the same
CN1055194C (zh) * 1997-11-21 2000-08-02 厦门市科学技术委员会 覆铜板快速印制方法
JP2002517540A (ja) 1998-06-03 2002-06-18 キンバリー クラーク ワールドワイド インコーポレイテッド インク及びインクジェット印刷用のネオナノプラスト及びマイクロエマルション技術
SK1552000A3 (en) 1998-06-03 2000-08-14 Kimberly Clark Co Novel photoinitiators and applications therefor
BR9912003A (pt) 1998-07-20 2001-04-10 Kimberly Clark Co Composições de tinta para jato de tinta aperfeiçoadas
CA2353685A1 (en) 1998-09-28 2000-04-06 Kimberly-Clark Worldwide, Inc. Chelates comprising chinoid groups as photoinitiators
ES2195869T3 (es) 1999-01-19 2003-12-16 Kimberly Clark Co Nuevos colorantes, estabilizantes de colorantes, compuestos de tinta y metodos mejorados para su fabricacion.
US6331056B1 (en) 1999-02-25 2001-12-18 Kimberly-Clark Worldwide, Inc. Printing apparatus and applications therefor
US6294698B1 (en) 1999-04-16 2001-09-25 Kimberly-Clark Worldwide, Inc. Photoinitiators and applications therefor
US6368395B1 (en) 1999-05-24 2002-04-09 Kimberly-Clark Worldwide, Inc. Subphthalocyanine colorants, ink compositions, and method of making the same
US20060208621A1 (en) * 1999-09-21 2006-09-21 Amey Daniel I Jr Field emitter cathode backplate structures for display panels
US6691618B2 (en) 2000-05-08 2004-02-17 Pisces-Print Imaging Sciences, Inc. Chemical imaging of a lithographic printing plate
US20040154489A1 (en) * 2000-05-08 2004-08-12 Deutsch Albert S. Chemical imaging of a lithographic printing plate
US6315916B1 (en) 2000-05-08 2001-11-13 Pisces-Print Image Sciences, Inc. Chemical imaging of a lithographic printing plate
US7741773B2 (en) * 2004-04-09 2010-06-22 Ifire Ip Corporation Thick film dielectric structure for thick dielectric electroluminescent displays
JP4657068B2 (ja) * 2005-09-22 2011-03-23 シャープ株式会社 裏面接合型太陽電池の製造方法
JP5226255B2 (ja) * 2007-07-13 2013-07-03 シャープ株式会社 太陽電池の製造方法
KR101206250B1 (ko) 2009-10-13 2012-11-28 주식회사 엘지화학 식각 마스크 패턴 형성용 페이스트 및 이의 스크린 인쇄법을 이용한 실리콘 태양전지의 제조방법

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4020966A (en) * 1975-03-28 1977-05-03 W. R. Grace & Co. Plastisol composition and container closure gasket made therefrom
US4195169A (en) * 1977-09-13 1980-03-25 The Dow Chemical Company Devolatilizing polymers of styrene and acrylic or methacrylic acid
US4289668A (en) * 1980-10-14 1981-09-15 The Standard Oil Company Polymer systems plasticized with hydroxy fatty acids
DE3308925A1 (de) * 1983-03-12 1984-09-13 Basf Ag, 6700 Ludwigshafen Verfahren zur herstellung lagerstabiler plastisole und organosole
US4912160A (en) * 1987-11-16 1990-03-27 The Sherwin-Williams Company Acid-functional polymers from hydroxy polymers and cyclic anhydrides
JPH07102646B2 (ja) * 1988-09-30 1995-11-08 株式会社日立製作所 金属とポリイミドの複合成形体
US5032216A (en) * 1989-10-20 1991-07-16 E. I. Du Pont De Nemours And Company Non-photographic method for patterning organic polymer films

Also Published As

Publication number Publication date
CN1110694A (zh) 1995-10-25
US5209814A (en) 1993-05-11
EP0606355A1 (de) 1994-07-20
WO1993007640A1 (en) 1993-04-15
CN1071031A (zh) 1993-04-14
JPH06511355A (ja) 1994-12-15
EP0606355B1 (de) 1998-12-09
CN1032614C (zh) 1996-08-21
DE69227840T2 (de) 1999-04-29
US5306756A (en) 1994-04-26
JP2688542B2 (ja) 1997-12-10
TW200582B (de) 1993-02-21
CN1090651C (zh) 2002-09-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee