DE69221350T2 - Herstellung von submikrometrischen Anordnungen - Google Patents

Herstellung von submikrometrischen Anordnungen

Info

Publication number: DE69221350T2
Authority: DE; Germany
Prior art keywords: submicrometric; arrays; manufacture; submicrometric arrays
Prior art date: 1991-03-22
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE69221350T

Other languages

English (en)

Other versions

DE69221350D1 (de

Inventor

Donald Lawrence White

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

AT&T Corp

Original Assignee

AT&T Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1991-03-22

Filing date

1992-03-13

Publication date

1997-11-20

1992-03-13 Application filed by AT&T Corp filed Critical AT&T Corp

1997-09-11 Publication of DE69221350D1 publication Critical patent/DE69221350D1/de

1997-11-20 Application granted granted Critical

1997-11-20 Publication of DE69221350T2 publication Critical patent/DE69221350T2/de

2012-03-14 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/28—Phase shift masks [PSM]; PSM blanks; Preparation thereof with three or more diverse phases on the same PSM; Preparation thereof

DE69221350T 1991-03-22 1992-03-13 Herstellung von submikrometrischen Anordnungen Expired - Fee Related DE69221350T2 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US07/673,626 US5217831A (en)	1991-03-22	1991-03-22	Sub-micron device fabrication

Publications (2)

Publication Number	Publication Date
DE69221350D1 DE69221350D1 (de)	1997-09-11
DE69221350T2 true DE69221350T2 (de)	1997-11-20

Family

ID=24703433

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE69221350T Expired - Fee Related DE69221350T2 (de)	1991-03-22	1992-03-13	Herstellung von submikrometrischen Anordnungen

Country Status (7)

Country	Link
US (1)	US5217831A (de)
EP (1)	EP0505103B1 (de)
JP (1)	JPH0594001A (de)
KR (1)	KR100211624B1 (de)
CA (1)	CA2061622C (de)
DE (1)	DE69221350T2 (de)
HK (1)	HK1001927A1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP3179520B2 (ja) *	1991-07-11	2001-06-25	株式会社日立製作所	半導体装置の製造方法
US5821033A (en) *	1992-09-18	1998-10-13	Pinnacle Research Institute, Inc.	Photolithographic production of microprotrusions for use as a space separator in an electrical storage device
US5867363A (en) *	1992-09-18	1999-02-02	Pinnacle Research Institute, Inc.	Energy storage device
US5279925A (en) *	1992-12-16	1994-01-18	At&T Bell Laboratories	Projection electron lithographic procedure
JP2546135B2 (ja) *	1993-05-31	1996-10-23	日本電気株式会社	半導体微細形状の形成方法、ＩｎＰ回折格子の製造方法および分布帰還型レーザの製造方法
US5980977A (en) *	1996-12-09	1999-11-09	Pinnacle Research Institute, Inc.	Method of producing high surface area metal oxynitrides as substrates in electrical energy storage
US6248486B1 (en)	1998-11-23	2001-06-19	U.S. Philips Corporation	Method of detecting aberrations of an optical imaging system
US6368763B2 (en)	1998-11-23	2002-04-09	U.S. Philips Corporation	Method of detecting aberrations of an optical imaging system
US6361911B1 (en)	2000-04-17	2002-03-26	Taiwan Semiconductor Manufacturing Company	Using a dummy frame pattern to improve CD control of VSB E-beam exposure system and the proximity effect of laser beam exposure system and Gaussian E-beam exposure system
EP1869399A2 (de) *	2005-04-11	2007-12-26	Zetetic Institute	Vorrichtung und verfahren zur in-situ- und ex-situ-messung der räumlichen impulsantwort eines optischen systems mit phasenverschiebungs-punktbeugungs-interferometrie
US7428058B2 (en) *	2005-05-18	2008-09-23	Zetetic Institute	Apparatus and method for in situ and ex situ measurements of optical system flare
US11528971B2 (en) *	2018-05-13	2022-12-20	Bob Michael Lansdorp	Jewelry image projection and method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4665007A (en) *	1985-08-19	1987-05-12	International Business Machines Corporation	Planarization process for organic filling of deep trenches
JP2710967B2 (ja) *	1988-11-22	1998-02-10	株式会社日立製作所	集積回路装置の製造方法
US5091979A (en) *	1991-03-22	1992-02-25	At&T Bell Laboratories	Sub-micron imaging

1991
- 1991-03-22 US US07/673,626 patent/US5217831A/en not_active Expired - Lifetime
1992
- 1992-02-21 CA CA002061622A patent/CA2061622C/en not_active Expired - Fee Related
- 1992-03-13 EP EP92302162A patent/EP0505103B1/de not_active Expired - Lifetime
- 1992-03-13 DE DE69221350T patent/DE69221350T2/de not_active Expired - Fee Related
- 1992-03-19 JP JP6270392A patent/JPH0594001A/ja active Pending
- 1992-03-20 KR KR1019920004591A patent/KR100211624B1/ko not_active IP Right Cessation
1998
- 1998-02-05 HK HK98100874A patent/HK1001927A1/xx not_active IP Right Cessation

Also Published As

Publication number	Publication date
EP0505103A1 (de)	1992-09-23
US5217831A (en)	1993-06-08
DE69221350D1 (de)	1997-09-11
CA2061622C (en)	1998-09-22
JPH0594001A (ja)	1993-04-16
HK1001927A1 (en)	1998-07-17
CA2061622A1 (en)	1992-09-23
EP0505103B1 (de)	1997-08-06
KR100211624B1 (ko)	1999-08-02

Legal Events

Date	Code	Title	Description
1998-09-03	8364	No opposition during term of opposition
2003-01-16	8339	Ceased/non-payment of the annual fee

Publication	Publication Date	Title
DE69219929D1 (de)	1997-07-03	Herstellung von submikrometrischen Anordnungen
DE69214499D1 (de)	1996-11-21	Herstellung von Olefinen
DE69323431T2 (de)	1999-09-30	Herstellung von feststoffmaterialien
DE69106866T2 (de)	1995-08-31	Herstellung von Cordieritkörpern.
MA22407A1 (fr)	1992-10-01	Steroides-esters nouveaux
DE69110654T2 (de)	1995-12-14	Herstellung von Kordieritkörpern.
DE69410266D1 (de)	1998-06-18	Herstellung von dimethyl cyclohexandicarboxylaten
DE69207230T2 (de)	1996-05-15	Herstellung von Kohlenwasserstoffderivaten
DE69221350T2 (de)	1997-11-20	Herstellung von submikrometrischen Anordnungen
DE69410456T2 (de)	1998-09-17	Herstellung von difluoromethan
DE69209787D1 (de)	1996-05-15	Herstellung von Pigmentzusammensetzungen
DE69126363D1 (de)	1997-07-10	Herstellung von Polyketonen
DE69514284T2 (de)	2000-05-31	Herstellung von Catechol-Estrogen-Derivaten
DE69213447T2 (de)	1997-02-20	Herstellung von n-acylimidazolen
DE69213862T2 (de)	1997-01-30	Herstellung von Aluminoxanen
DE59405004D1 (de)	1998-02-19	Herstellung von 2-H-Heptafluorpropan
DE69325836T2 (de)	1999-12-23	Herstellung von Cis-Olefinen
DE69213830T2 (de)	1997-03-13	Herstellung von Pigmenten
DE69115737D1 (de)	1996-02-08	Herstellung von Polyketonen
DE69216606D1 (de)	1997-02-20	Herstellung von teigwaren
DE69124245T2 (de)	1997-07-31	Herstellung von Bolzen
DE69331579D1 (de)	2002-03-21	Herstellung von 2d-arrays
DK422689A (da)	1990-03-01	Central akselanhaenger
DE69208998T2 (de)	1996-07-25	Herstellung von Zündkerzen
ATE103271T1 (de)	1994-04-15	Herstellung von prodrogen.