DE69219057T2 - Tunneleffekttransistor - Google Patents
TunneleffekttransistorInfo
- Publication number
- DE69219057T2 DE69219057T2 DE69219057T DE69219057T DE69219057T2 DE 69219057 T2 DE69219057 T2 DE 69219057T2 DE 69219057 T DE69219057 T DE 69219057T DE 69219057 T DE69219057 T DE 69219057T DE 69219057 T2 DE69219057 T2 DE 69219057T2
- Authority
- DE
- Germany
- Prior art keywords
- effect transistor
- tunnel effect
- tunnel
- transistor
- effect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
- H01L29/7391—Gated diode structures
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3265749A JP2773487B2 (ja) | 1991-10-15 | 1991-10-15 | トンネルトランジスタ |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69219057D1 DE69219057D1 (de) | 1997-05-22 |
DE69219057T2 true DE69219057T2 (de) | 1998-02-26 |
Family
ID=17421473
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69219057T Expired - Fee Related DE69219057T2 (de) | 1991-10-15 | 1992-10-15 | Tunneleffekttransistor |
Country Status (4)
Country | Link |
---|---|
US (1) | US5589696A (de) |
EP (1) | EP0538036B1 (de) |
JP (1) | JP2773487B2 (de) |
DE (1) | DE69219057T2 (de) |
Families Citing this family (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69202554T2 (de) * | 1991-12-25 | 1995-10-19 | Nec Corp | Tunneltransistor und dessen Herstellungsverfahren. |
US6693317B2 (en) * | 2001-07-13 | 2004-02-17 | Taiwan Semiconductor Manufacturing Company | Optical sensor by using tunneling diode |
WO2004001801A2 (en) * | 2002-06-19 | 2003-12-31 | The Board Of Trustees Of The Leland Stanford Junior University | Insulated-gate semiconductor device and approach involving junction-induced intermediate region |
CN1762047A (zh) | 2003-03-20 | 2006-04-19 | 松下电器产业株式会社 | 半导体装置及其制造方法 |
US8324660B2 (en) | 2005-05-17 | 2012-12-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lattice-mismatched semiconductor structures with reduced dislocation defect densities and related methods for device fabrication |
US9153645B2 (en) | 2005-05-17 | 2015-10-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lattice-mismatched semiconductor structures with reduced dislocation defect densities and related methods for device fabrication |
CN101268547B (zh) | 2005-07-26 | 2014-07-09 | 琥珀波系统公司 | 包含交替有源区材料的结构及其形成方法 |
US7638842B2 (en) | 2005-09-07 | 2009-12-29 | Amberwave Systems Corporation | Lattice-mismatched semiconductor structures on insulators |
US8441000B2 (en) * | 2006-02-01 | 2013-05-14 | International Business Machines Corporation | Heterojunction tunneling field effect transistors, and methods for fabricating the same |
US7777250B2 (en) | 2006-03-24 | 2010-08-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lattice-mismatched semiconductor structures and related methods for device fabrication |
EP2062290B1 (de) | 2006-09-07 | 2019-08-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Defektreduzierung durch kontrolle des aspektverhältnisses |
US7875958B2 (en) | 2006-09-27 | 2011-01-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Quantum tunneling devices and circuits with lattice-mismatched semiconductor structures |
WO2008039495A1 (en) | 2006-09-27 | 2008-04-03 | Amberwave Systems Corporation | Tri-gate field-effect transistors formed by aspect ratio trapping |
US8502263B2 (en) | 2006-10-19 | 2013-08-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Light-emitter-based devices with lattice-mismatched semiconductor structures |
JP2008252086A (ja) * | 2007-03-12 | 2008-10-16 | Interuniv Micro Electronica Centrum Vzw | ゲートトンネル障壁を持つトンネル電界効果トランジスタ |
US8304805B2 (en) | 2009-01-09 | 2012-11-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor diodes fabricated by aspect ratio trapping with coalesced films |
WO2008124154A2 (en) | 2007-04-09 | 2008-10-16 | Amberwave Systems Corporation | Photovoltaics on silicon |
US8237151B2 (en) | 2009-01-09 | 2012-08-07 | Taiwan Semiconductor Manufacturing Company, Ltd. | Diode-based devices and methods for making the same |
US7825328B2 (en) | 2007-04-09 | 2010-11-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Nitride-based multi-junction solar cell modules and methods for making the same |
US8329541B2 (en) | 2007-06-15 | 2012-12-11 | Taiwan Semiconductor Manufacturing Company, Ltd. | InP-based transistor fabrication |
US8344242B2 (en) | 2007-09-07 | 2013-01-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Multi-junction solar cells |
US8183667B2 (en) | 2008-06-03 | 2012-05-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | Epitaxial growth of crystalline material |
US8274097B2 (en) | 2008-07-01 | 2012-09-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Reduction of edge effects from aspect ratio trapping |
US8981427B2 (en) | 2008-07-15 | 2015-03-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Polishing of small composite semiconductor materials |
US20100072515A1 (en) | 2008-09-19 | 2010-03-25 | Amberwave Systems Corporation | Fabrication and structures of crystalline material |
WO2010033813A2 (en) | 2008-09-19 | 2010-03-25 | Amberwave System Corporation | Formation of devices by epitaxial layer overgrowth |
US8253211B2 (en) | 2008-09-24 | 2012-08-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor sensor structures with reduced dislocation defect densities |
SG171987A1 (en) | 2009-04-02 | 2011-07-28 | Taiwan Semiconductor Mfg | Devices formed from a non-polar plane of a crystalline material and method of making the same |
JP5910965B2 (ja) * | 2012-03-07 | 2016-04-27 | 国立研究開発法人産業技術総合研究所 | トンネル電界効果トランジスタの製造方法及びトンネル電界効果トランジスタ |
EP2674978B1 (de) * | 2012-06-15 | 2020-07-29 | IMEC vzw | Tunnelfeldeffekttransistorvorrichtung und Verfahren zur Herstellung der Vorrichtung |
JP2014053435A (ja) | 2012-09-06 | 2014-03-20 | Toshiba Corp | 半導体装置 |
EP2808897B1 (de) | 2013-05-30 | 2021-06-30 | IMEC vzw | Tunnelfeldeffekttransistor und Verfahren zur Herstellung davon |
US8975123B2 (en) | 2013-07-09 | 2015-03-10 | International Business Machines Corporation | Tunnel field-effect transistors with a gate-swing broken-gap heterostructure |
JP6331375B2 (ja) * | 2013-12-17 | 2018-05-30 | 富士通株式会社 | 電界効果型半導体装置 |
JP6175411B2 (ja) * | 2014-06-16 | 2017-08-02 | 東芝メモリ株式会社 | 半導体装置 |
WO2016168994A1 (zh) * | 2015-04-22 | 2016-10-27 | 华为技术有限公司 | 隧穿晶体管及隧穿晶体管的制备方法 |
CN109065615B (zh) * | 2018-06-12 | 2021-05-07 | 西安电子科技大学 | 一种新型平面InAs/Si异质隧穿场效应晶体管及其制备方法 |
CN110459541B (zh) * | 2019-06-27 | 2022-05-13 | 西安电子科技大学 | 一种平面互补型隧穿场效应晶体管反相器 |
CN111640791A (zh) * | 2020-04-26 | 2020-09-08 | 西安电子科技大学 | 基于InAs/GaSb异质结的量子阱隧穿场效应晶体管及其制备方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3390352A (en) * | 1961-11-06 | 1968-06-25 | Itt | Tunnel-effect semiconductor, used as an oscillator or amplifier, forms part of surface of waveguide or chamber |
JPH0673375B2 (ja) * | 1984-03-19 | 1994-09-14 | 富士通株式会社 | 半導体装置の製造方法 |
EP0181191B1 (de) * | 1984-11-05 | 1996-02-28 | Hitachi, Ltd. | Supraleiteranordnung |
JPS63250855A (ja) * | 1987-04-08 | 1988-10-18 | Hitachi Ltd | バイポ−ラ型トランジスタ |
US4969019A (en) * | 1987-08-27 | 1990-11-06 | Texas Instruments Incorporated | Three-terminal tunnel device |
JPH02268429A (ja) * | 1989-04-11 | 1990-11-02 | Tokyo Electron Ltd | プラズマエッチング装置 |
US5105247A (en) * | 1990-08-03 | 1992-04-14 | Cavanaugh Marion E | Quantum field effect device with source extension region formed under a gate and between the source and drain regions |
EP0480814B1 (de) * | 1990-10-08 | 1996-04-24 | Sumitomo Electric Industries, Ltd. | Supraleitende Einrichtung mit ultradünnem Kanal aus oxydisch supraleitendem Material und Verfahren zu deren Herstellung |
JPH05235057A (ja) * | 1992-02-19 | 1993-09-10 | Sanyo Electric Co Ltd | 半導体装置 |
-
1991
- 1991-10-15 JP JP3265749A patent/JP2773487B2/ja not_active Expired - Lifetime
-
1992
- 1992-10-14 US US07/960,863 patent/US5589696A/en not_active Expired - Fee Related
- 1992-10-15 DE DE69219057T patent/DE69219057T2/de not_active Expired - Fee Related
- 1992-10-15 EP EP92309417A patent/EP0538036B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0538036A2 (de) | 1993-04-21 |
DE69219057D1 (de) | 1997-05-22 |
EP0538036A3 (de) | 1995-03-22 |
JPH05110086A (ja) | 1993-04-30 |
JP2773487B2 (ja) | 1998-07-09 |
US5589696A (en) | 1996-12-31 |
EP0538036B1 (de) | 1997-04-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8332 | No legal effect for de | ||
8370 | Indication of lapse of patent is to be deleted | ||
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |