DE69125333T2 - Herstellen von Metallmustern auf einem Substrat - Google Patents
Herstellen von Metallmustern auf einem SubstratInfo
- Publication number
- DE69125333T2 DE69125333T2 DE69125333T DE69125333T DE69125333T2 DE 69125333 T2 DE69125333 T2 DE 69125333T2 DE 69125333 T DE69125333 T DE 69125333T DE 69125333 T DE69125333 T DE 69125333T DE 69125333 T2 DE69125333 T2 DE 69125333T2
- Authority
- DE
- Germany
- Prior art keywords
- substrate
- metal patterns
- making metal
- making
- patterns
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/225—Correcting or repairing of printed circuits
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/22—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming
- H01C17/24—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material
- H01C17/242—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material by laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/027—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed by irradiation, e.g. by photons, alpha or beta particles
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/062—Etching masks consisting of metals or alloys or metallic inorganic compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/02—Iron or ferrous alloys
- B23K2103/04—Steel or steel alloys
- B23K2103/05—Stainless steel
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/08—Non-ferrous metals or alloys
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/08—Non-ferrous metals or alloys
- B23K2103/12—Copper or alloys thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/08—Non-ferrous metals or alloys
- B23K2103/14—Titanium or alloys thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/08—Non-ferrous metals or alloys
- B23K2103/15—Magnesium or alloys thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/16—Composite materials, e.g. fibre reinforced
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/16—Composite materials, e.g. fibre reinforced
- B23K2103/166—Multilayered materials
- B23K2103/172—Multilayered materials wherein at least one of the layers is non-metallic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/18—Dissimilar materials
- B23K2103/26—Alloys of Nickel and Cobalt and Chromium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/30—Organic material
- B23K2103/42—Plastics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/54—Glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0104—Properties and characteristics in general
- H05K2201/0112—Absorbing light, e.g. dielectric layer with carbon filler for laser processing
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0338—Layered conductor, e.g. layered metal substrate, layered finish layer, layered thin film adhesion layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/20—Details of printed circuits not provided for in H05K2201/01 - H05K2201/10
- H05K2201/2081—Compound repelling a metal, e.g. solder
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0361—Stripping a part of an upper metal layer to expose a lower metal layer, e.g. by etching or using a laser
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0384—Etch stop layer, i.e. a buried barrier layer for preventing etching of layers under the etch stop layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/17—Post-manufacturing processes
- H05K2203/173—Adding connections between adjacent pads or conductors, e.g. for modifying or repairing
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/17—Post-manufacturing processes
- H05K2203/175—Configurations of connections suitable for easy deletion, e.g. modifiable circuits or temporary conductors for electroplating; Processes for deleting connections
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/108—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/14—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation
- H05K3/143—Masks therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/381—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the substrate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/388—Improvement of the adhesion between the insulating substrate and the metal by the use of a metallic or inorganic thin film adhesion layer
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/597,255 US5104480A (en) | 1990-10-12 | 1990-10-12 | Direct patterning of metals over a thermally inefficient surface using a laser |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69125333D1 DE69125333D1 (de) | 1997-04-30 |
DE69125333T2 true DE69125333T2 (de) | 1997-10-02 |
Family
ID=24390748
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69125333T Expired - Fee Related DE69125333T2 (de) | 1990-10-12 | 1991-10-09 | Herstellen von Metallmustern auf einem Substrat |
Country Status (4)
Country | Link |
---|---|
US (1) | US5104480A (de) |
EP (1) | EP0480703B1 (de) |
JP (1) | JP3338465B2 (de) |
DE (1) | DE69125333T2 (de) |
Families Citing this family (65)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB9221099D0 (en) * | 1992-10-07 | 1992-11-18 | Ecossensors Ltd | Improvements in and relating to gas permeable membranes for amperometric gas electrodes |
JP3400067B2 (ja) * | 1994-03-16 | 2003-04-28 | 富士通株式会社 | 印刷配線板の導体切断方法及び装置 |
ES2148564T3 (es) * | 1994-09-23 | 2000-10-16 | Siemens Nv | Bloque de matriz con proyecciones de polimero. |
US6518088B1 (en) | 1994-09-23 | 2003-02-11 | Siemens N.V. And Interuniversitair Micro-Electronica Centrum Vzw | Polymer stud grid array |
US5505320A (en) * | 1994-11-22 | 1996-04-09 | International Business Machines Corporation | Method employing laser ablating for providing a pattern on a substrate |
US5567329A (en) * | 1995-01-27 | 1996-10-22 | Martin Marietta Corporation | Method and system for fabricating a multilayer laminate for a printed wiring board, and a printed wiring board formed thereby |
US5821505A (en) * | 1997-04-04 | 1998-10-13 | Unisys Corporation | Temperature control system for an electronic device which achieves a quick response by interposing a heater between the device and a heat sink |
EP0877417A1 (de) * | 1997-05-09 | 1998-11-11 | Lucent Technologies Inc. | Verfahren zur Herstellung von Elektroden und anderen elektrisch leitenden Strukturen |
US6141870A (en) | 1997-08-04 | 2000-11-07 | Peter K. Trzyna | Method for making electrical device |
US6350555B1 (en) | 1998-01-14 | 2002-02-26 | Precision Coatings, Inc. | Direct write imaging medium |
US6261941B1 (en) * | 1998-02-12 | 2001-07-17 | Georgia Tech Research Corp. | Method for manufacturing a multilayer wiring substrate |
DE19913367C1 (de) * | 1999-03-24 | 2000-12-14 | Siemens Ag | Verfahren zur Herstellung einer elektrischen Schaltung |
US6462629B1 (en) | 1999-06-15 | 2002-10-08 | Cts Corporation | Ablative RF ceramic block filters |
FR2795907B1 (fr) * | 1999-07-01 | 2007-02-16 | Gemplus Card Int | Procede pour la fabrication et le test de micromodules electroniques, notamment pour cartes a puce |
US6645359B1 (en) | 2000-10-06 | 2003-11-11 | Roche Diagnostics Corporation | Biosensor |
US7073246B2 (en) | 1999-10-04 | 2006-07-11 | Roche Diagnostics Operations, Inc. | Method of making a biosensor |
US6662439B1 (en) | 1999-10-04 | 2003-12-16 | Roche Diagnostics Corporation | Laser defined features for patterned laminates and electrodes |
US20050103624A1 (en) * | 1999-10-04 | 2005-05-19 | Bhullar Raghbir S. | Biosensor and method of making |
US6388230B1 (en) * | 1999-10-13 | 2002-05-14 | Morton International, Inc. | Laser imaging of thin layer electronic circuitry material |
US6559735B1 (en) | 2000-10-31 | 2003-05-06 | Cts Corporation | Duplexer filter with an alternative signal path |
US6540890B1 (en) * | 2000-11-01 | 2003-04-01 | Roche Diagnostics Corporation | Biosensor |
CN1229763C (zh) * | 2000-11-14 | 2005-11-30 | 东陶机器株式会社 | 标记形成的方法 |
US6534743B2 (en) * | 2001-02-01 | 2003-03-18 | Electro Scientific Industries, Inc. | Resistor trimming with small uniform spot from solid-state UV laser |
WO2002060633A1 (en) * | 2001-02-01 | 2002-08-08 | Electro Scientific Industries, Inc. | Resistor trimming with small uniform spot from solid-state uv laser |
US6571468B1 (en) * | 2001-02-26 | 2003-06-03 | Saturn Electronics & Engineering, Inc. | Traceless flip chip assembly and method |
DE10112023A1 (de) * | 2001-03-07 | 2002-10-02 | Atotech Deutschland Gmbh | Verfahren zum Bilden eines Metallmusters auf einen dielektrischen Substrat |
US6528869B1 (en) | 2001-04-06 | 2003-03-04 | Amkor Technology, Inc. | Semiconductor package with molded substrate and recessed input/output terminals |
US20020170897A1 (en) * | 2001-05-21 | 2002-11-21 | Hall Frank L. | Methods for preparing ball grid array substrates via use of a laser |
US6586826B1 (en) | 2001-06-13 | 2003-07-01 | Amkor Technology, Inc. | Integrated circuit package having posts for connection to other packages and substrates |
US6814844B2 (en) * | 2001-08-29 | 2004-11-09 | Roche Diagnostics Corporation | Biosensor with code pattern |
US20040173894A1 (en) * | 2001-09-27 | 2004-09-09 | Amkor Technology, Inc. | Integrated circuit package including interconnection posts for multiple electrical connections |
JP4155031B2 (ja) * | 2002-03-15 | 2008-09-24 | 株式会社豊田中央研究所 | 基材の表面改質方法及び改質された基材、並びに装置 |
US6866758B2 (en) * | 2002-03-21 | 2005-03-15 | Roche Diagnostics Corporation | Biosensor |
US7563695B2 (en) * | 2002-03-27 | 2009-07-21 | Gsi Group Corporation | Method and system for high-speed precise laser trimming and scan lens for use therein |
US6951995B2 (en) * | 2002-03-27 | 2005-10-04 | Gsi Lumonics Corp. | Method and system for high-speed, precise micromachining an array of devices |
US6822332B2 (en) * | 2002-09-23 | 2004-11-23 | International Business Machines Corporation | Fine line circuitization |
GB0224121D0 (en) * | 2002-10-16 | 2002-11-27 | Microemissive Displays Ltd | Method of patterning a functional material on to a substrate |
US20040091588A1 (en) * | 2002-10-31 | 2004-05-13 | Xiaochun Li | Food processing apparatus and method |
JP2007524816A (ja) | 2003-06-20 | 2007-08-30 | エフ ホフマン−ラ ロッシュ アクチェン ゲゼルシャフト | 細い均一な試薬ストリップの製造方法およびその試薬 |
KR100784497B1 (ko) * | 2004-10-06 | 2007-12-11 | 삼성전자주식회사 | 반도체 패키지용 필름기판 및 그 제조방법 |
WO2006100202A1 (de) * | 2005-03-23 | 2006-09-28 | Technische Universität Ilmenau | Verfahren zur laser-mikrostrukturierung eines materials unter verwendung einer mit reflexions- und absorptionseigenschaften bestimmten schwellintensität aufweisenden schutzschicht |
JP4639975B2 (ja) * | 2005-06-07 | 2011-02-23 | パナソニック電工株式会社 | 立体回路基板の製造方法 |
DE102005030272A1 (de) * | 2005-06-21 | 2007-01-04 | Hansgrohe Ag | Verfahren zur Erzeugung dekorativer Oberflächenstrukturen |
KR20070004373A (ko) * | 2005-07-04 | 2007-01-09 | 삼성전자주식회사 | 휴대 단말기의 내장형 안테나 패턴 및 그 제조 방법 |
US8290239B2 (en) * | 2005-10-21 | 2012-10-16 | Orbotech Ltd. | Automatic repair of electric circuits |
US7510985B1 (en) | 2005-10-26 | 2009-03-31 | Lpkf Laser & Electronics Ag | Method to manufacture high-precision RFID straps and RFID antennas using a laser |
US20070138153A1 (en) * | 2005-12-20 | 2007-06-21 | Redman Dean E | Wide web laser ablation |
WO2008016373A2 (en) * | 2005-12-22 | 2008-02-07 | The Penn State Research Foundation | Method and systems for forming and using nanoengineered sculptured thin films |
US20070215575A1 (en) * | 2006-03-15 | 2007-09-20 | Bo Gu | Method and system for high-speed, precise, laser-based modification of one or more electrical elements |
JP4706690B2 (ja) * | 2007-11-05 | 2011-06-22 | パナソニック電工株式会社 | 回路基板及びその製造方法 |
WO2009149152A1 (en) * | 2008-06-03 | 2009-12-10 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy | Surface enhanced raman detection on metallized nanostructured polymer films |
JP5405916B2 (ja) * | 2008-06-24 | 2014-02-05 | パナソニック株式会社 | バイオセンサ、その製造方法、及びそれを備える検出システム |
US20100294352A1 (en) * | 2009-05-20 | 2010-11-25 | Uma Srinivasan | Metal patterning for electrically conductive structures based on alloy formation |
JP2011233872A (ja) * | 2010-04-08 | 2011-11-17 | Asahi Glass Co Ltd | 金属パターン付き基板の製造方法及び金属積層体付き基板 |
US8593727B2 (en) | 2011-04-25 | 2013-11-26 | Vladimir G. Kozlov | Single-shot laser ablation of a metal film on a polymer membrane |
RU2494492C1 (ru) * | 2012-06-07 | 2013-09-27 | Общество с ограниченной ответственностью "Компания РМТ" | Способ создания токопроводящих дорожек |
US10537027B2 (en) | 2013-08-02 | 2020-01-14 | Orbotech Ltd. | Method producing a conductive path on a substrate |
EP2887418A1 (de) * | 2013-12-19 | 2015-06-24 | The Swatch Group Research and Development Ltd. | Batterie mit strukturierter, nicht leitender Oberfläche |
EP4019256A1 (de) * | 2014-04-16 | 2022-06-29 | Abbott Laboratories | Tropfenaktuatorherstellungsvorrichtung, systeme und zugehörige verfahren |
US10087527B2 (en) * | 2014-04-30 | 2018-10-02 | Wistron Neweb Corp. | Method of fabricating substrate structure and substrate structure fabricated by the same method |
US9842740B2 (en) | 2014-08-29 | 2017-12-12 | Seagate Technology Llc | Ablation for feature recovery |
EP3240634A1 (de) | 2014-12-31 | 2017-11-08 | Abbott Laboratories | Digitaler mikrofluidischer verdünner, systeme und zugehörige verfahren |
KR101810815B1 (ko) * | 2017-04-07 | 2017-12-20 | 김병삼 | 마이크로 크랙 및 레이저 타공홀을 포함하는 전파투과성 센서 커버의 제조 방법 및 이를 이용하여 제조된 전파투과성 센서 커버 |
DE102018115205A1 (de) | 2018-06-25 | 2020-01-02 | Vishay Electronic Gmbh | Verfahren zur Herstellung einer Vielzahl von Widerstandsbaueinheiten |
CN111343793A (zh) * | 2020-03-12 | 2020-06-26 | 电子科技大学 | 一种印制电路复合介质基板表面金属化方法 |
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US3867217A (en) * | 1973-10-29 | 1975-02-18 | Bell Telephone Labor Inc | Methods for making electronic circuits |
DE2521543A1 (de) * | 1974-05-16 | 1975-11-27 | Crosfield Electronics Ltd | Verfahren und vorrichtung zur wiedergabe von bildern |
US4259433A (en) * | 1976-10-22 | 1981-03-31 | Fuji Photo Film Co., Ltd. | Method for producing disk-recording plates |
US4713518A (en) * | 1984-06-08 | 1987-12-15 | Semiconductor Energy Laboratory Co., Ltd. | Electronic device manufacturing methods |
JPS61108195A (ja) * | 1984-11-01 | 1986-05-26 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 基板上に電気的に連続した層を形成する方法 |
US4786358A (en) * | 1986-08-08 | 1988-11-22 | Semiconductor Energy Laboratory Co., Ltd. | Method for forming a pattern of a film on a substrate with a laser beam |
US4826785A (en) * | 1987-01-27 | 1989-05-02 | Inmos Corporation | Metallic fuse with optically absorptive layer |
-
1990
- 1990-10-12 US US07/597,255 patent/US5104480A/en not_active Expired - Lifetime
-
1991
- 1991-10-03 JP JP28202991A patent/JP3338465B2/ja not_active Expired - Fee Related
- 1991-10-09 DE DE69125333T patent/DE69125333T2/de not_active Expired - Fee Related
- 1991-10-09 EP EP91309278A patent/EP0480703B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US5104480A (en) | 1992-04-14 |
JP3338465B2 (ja) | 2002-10-28 |
EP0480703A2 (de) | 1992-04-15 |
EP0480703B1 (de) | 1997-03-26 |
JPH04280494A (ja) | 1992-10-06 |
DE69125333D1 (de) | 1997-04-30 |
EP0480703A3 (en) | 1992-06-03 |
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