DE69125328T2 - Feldkompensierte Linse - Google Patents

Feldkompensierte Linse

Info

Publication number
DE69125328T2
DE69125328T2 DE69125328T DE69125328T DE69125328T2 DE 69125328 T2 DE69125328 T2 DE 69125328T2 DE 69125328 T DE69125328 T DE 69125328T DE 69125328 T DE69125328 T DE 69125328T DE 69125328 T2 DE69125328 T2 DE 69125328T2
Authority
DE
Germany
Prior art keywords
field compensated
compensated lens
lens
field
compensated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69125328T
Other languages
English (en)
Other versions
DE69125328D1 (de
Inventor
Rama Nand Singh
Janusz Stanislaw Wilczynski
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of DE69125328D1 publication Critical patent/DE69125328D1/de
Application granted granted Critical
Publication of DE69125328T2 publication Critical patent/DE69125328T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G02B13/26—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances for reproducing with unit magnification
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/008—Systems specially adapted to form image relays or chained systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
DE69125328T 1990-08-28 1991-07-18 Feldkompensierte Linse Expired - Fee Related DE69125328T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/575,043 US5052763A (en) 1990-08-28 1990-08-28 Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations

Publications (2)

Publication Number Publication Date
DE69125328D1 DE69125328D1 (de) 1997-04-30
DE69125328T2 true DE69125328T2 (de) 1997-09-25

Family

ID=24298700

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69125328T Expired - Fee Related DE69125328T2 (de) 1990-08-28 1991-07-18 Feldkompensierte Linse

Country Status (5)

Country Link
US (1) US5052763A (de)
EP (1) EP0475020B1 (de)
JP (1) JPH07111512B2 (de)
CA (1) CA2045944C (de)
DE (1) DE69125328T2 (de)

Families Citing this family (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0519162A (ja) * 1991-05-02 1993-01-29 Asahi Optical Co Ltd 対物レンズ及び対物レンズの測定方法
US5636066A (en) * 1993-03-12 1997-06-03 Nikon Corporation Optical apparatus
JP3747951B2 (ja) * 1994-11-07 2006-02-22 株式会社ニコン 反射屈折光学系
JPH09311278A (ja) * 1996-05-20 1997-12-02 Nikon Corp 反射屈折光学系
JP3747958B2 (ja) * 1995-04-07 2006-02-22 株式会社ニコン 反射屈折光学系
GB2302601B (en) * 1993-07-27 1997-08-13 Asahi Optical Co Ltd Aberration correcting means for interchangeable lens
JPH07128590A (ja) * 1993-10-29 1995-05-19 Olympus Optical Co Ltd 縮小投影レンズ
JP3395801B2 (ja) * 1994-04-28 2003-04-14 株式会社ニコン 反射屈折投影光学系、走査型投影露光装置、及び走査投影露光方法
DE4417489A1 (de) * 1994-05-19 1995-11-23 Zeiss Carl Fa Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie
USRE38438E1 (en) 1994-08-23 2004-02-24 Nikon Corporation Catadioptric reduction projection optical system and exposure apparatus having the same
JPH08179204A (ja) 1994-11-10 1996-07-12 Nikon Corp 投影光学系及び投影露光装置
JP3454390B2 (ja) 1995-01-06 2003-10-06 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
JPH08203812A (ja) * 1995-01-30 1996-08-09 Nikon Corp 反射屈折縮小投影光学系及び露光装置
US6512631B2 (en) * 1996-07-22 2003-01-28 Kla-Tencor Corporation Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
JP3750123B2 (ja) † 1996-04-25 2006-03-01 株式会社ニコン 投影光学系
US6157498A (en) 1996-06-19 2000-12-05 Nikon Corporation Dual-imaging optical system
JPH1020197A (ja) * 1996-06-28 1998-01-23 Nikon Corp 反射屈折光学系及びその調整方法
US5717518A (en) 1996-07-22 1998-02-10 Kla Instruments Corporation Broad spectrum ultraviolet catadioptric imaging system
US5844727A (en) * 1997-09-02 1998-12-01 Cymer, Inc. Illumination design for scanning microlithography systems
WO1999052004A1 (fr) * 1998-04-07 1999-10-14 Nikon Corporation Appareil et procede d'exposition a projection, et systeme optique reflechissant a refraction
US7112772B2 (en) * 1998-05-29 2006-09-26 Carl Zeiss Smt Ag Catadioptric projection objective with adaptive mirror and projection exposure method
EP1293832A1 (de) 1998-06-08 2003-03-19 Nikon Corporation Verfahren und Vorrichtung zur Projektionsbelichtung
JP3985346B2 (ja) 1998-06-12 2007-10-03 株式会社ニコン 投影露光装置、投影露光装置の調整方法、及び投影露光方法
EP0989434B1 (de) * 1998-07-29 2006-11-15 Carl Zeiss SMT AG Catadioptrisches System und dieses verwendender Belichtungsapparat
EP1102100A3 (de) 1999-11-12 2003-12-10 Carl Zeiss Katadioptrisches Objektiv mit physikalischem Strahlteiler
US6995930B2 (en) * 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
TW538256B (en) 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
WO2002044786A2 (en) * 2000-11-28 2002-06-06 Carl Zeiss Smt Ag Catadioptric projection system for 157 nm lithography
JP2001228401A (ja) * 2000-02-16 2001-08-24 Canon Inc 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法
US7136234B2 (en) * 2000-09-12 2006-11-14 Kla-Tencor Technologies Corporation Broad band DUV, VUV long-working distance catadioptric imaging system
US6842298B1 (en) 2000-09-12 2005-01-11 Kla-Tencor Technologies Corporation Broad band DUV, VUV long-working distance catadioptric imaging system
DE10104177A1 (de) 2001-01-24 2002-08-01 Zeiss Carl Katadioptrisches Reduktionsobjektiv
RU2192028C1 (ru) * 2001-04-04 2002-10-27 Общество С Ограниченной Ответственностью "Инсмат Технология" Катадиоптрическая система
DE10117481A1 (de) 2001-04-07 2002-10-10 Zeiss Carl Katadioptrisches Projektionsobjektiv
DE10127227A1 (de) 2001-05-22 2002-12-05 Zeiss Carl Katadioptrisches Reduktionsobjektiv
TW575904B (en) * 2001-08-21 2004-02-11 Asml Us Inc Optical projection for microlithography
US7136220B2 (en) * 2001-08-21 2006-11-14 Carl Zeiss Smt Ag Catadioptric reduction lens
US20040075894A1 (en) * 2001-12-10 2004-04-22 Shafer David R. Catadioptric reduction objective
US7180658B2 (en) * 2003-02-21 2007-02-20 Kla-Tencor Technologies Corporation High performance catadioptric imaging system
US7085075B2 (en) * 2003-08-12 2006-08-01 Carl Zeiss Smt Ag Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20050185269A1 (en) * 2003-12-19 2005-08-25 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
JP5102492B2 (ja) * 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101376931B1 (ko) 2004-05-17 2014-03-25 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
WO2006013100A2 (en) 2004-08-06 2006-02-09 Carl Zeiss Smt Ag Projection objective for microlithography
US7511890B2 (en) * 2005-02-04 2009-03-31 Carl Zeiss Smt Ag Refractive optical imaging system, in particular projection objective for microlithography
US20060198018A1 (en) * 2005-02-04 2006-09-07 Carl Zeiss Smt Ag Imaging system
US7218453B2 (en) * 2005-02-04 2007-05-15 Carl Zeiss Smt Ag Projection system, in particular for a microlithographic projection exposure apparatus
DE102005024678B3 (de) * 2005-05-30 2006-08-31 Schott Ag Verfahren zur Bestimmung von irreversiblen Strahlenschäden von optischem Material
EP1959289A1 (de) * 2007-02-13 2008-08-20 Carl Zeiss SMT AG Projektionsobjektiv zur Vergrößerung von Einheiten
US7929115B2 (en) * 2007-06-01 2011-04-19 Carl Zeiss Smt Gmbh Projection objective and projection exposure apparatus for microlithography
US20130169707A1 (en) * 2011-12-30 2013-07-04 Lin Li Advanced Ultra-Compact High Performance Projector System and Imaging Lens Arrangement for Use Therein
CN103399390B (zh) * 2013-05-10 2015-12-02 无锡国盛生物工程有限公司 生物芯片扫描仪荧光收集物镜
CN103278913B (zh) * 2013-05-15 2015-07-01 中国科学院光电技术研究所 一种非球面光刻耦合物镜

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU553569A1 (ru) * 1955-07-23 1977-04-05 Концентрический светосильный безаберрационный симметричный репродукционный зеркально-линзовый объектив дл фототелеграфных аппаратов
GB1443271A (en) * 1974-01-02 1976-07-21 Rank Organisation Ltd Reflex lens systems
SU540241A1 (ru) * 1975-10-10 1976-12-25 Предприятие П/Я Р-6681 Проекционна система
FR2456960A1 (fr) * 1979-05-18 1980-12-12 Labo Electronique Physique Objectif catadioptrique a champ plan et grande ouverture et application dudit objectif dans un projecteur d'image notamment en couleur
US4469414A (en) * 1982-06-01 1984-09-04 The Perkin-Elmer Corporation Restrictive off-axis field optical system
JPS612124A (ja) * 1984-06-14 1986-01-08 Canon Inc 結像光学系
US4812028A (en) * 1984-07-23 1989-03-14 Nikon Corporation Reflection type reduction projection optical system
JPS6129815A (ja) * 1984-07-23 1986-02-10 Nippon Kogaku Kk <Nikon> 反射縮小投影光学系
JPS6147915A (ja) * 1984-08-14 1986-03-08 Canon Inc 反射光学系
JPS6147917A (ja) * 1984-08-14 1986-03-08 Canon Inc 反射光学系
US4779966A (en) * 1984-12-21 1988-10-25 The Perkin-Elmer Corporation Single mirror projection optical system
US4854688A (en) * 1988-04-14 1989-08-08 Honeywell Inc. Optical arrangement
US4896952A (en) * 1988-04-22 1990-01-30 International Business Machines Corporation Thin film beamsplitter optical element for use in an image-forming lens system

Also Published As

Publication number Publication date
JPH04234722A (ja) 1992-08-24
CA2045944C (en) 1995-06-13
DE69125328D1 (de) 1997-04-30
US5052763A (en) 1991-10-01
EP0475020A3 (en) 1992-05-06
JPH07111512B2 (ja) 1995-11-29
EP0475020A2 (de) 1992-03-18
EP0475020B1 (de) 1997-03-26
CA2045944A1 (en) 1992-03-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee