DE69125286T2 - Vorrichtung zum neutralisieren elektrisch geladenen materials - Google Patents

Vorrichtung zum neutralisieren elektrisch geladenen materials

Info

Publication number
DE69125286T2
DE69125286T2 DE69125286T DE69125286T DE69125286T2 DE 69125286 T2 DE69125286 T2 DE 69125286T2 DE 69125286 T DE69125286 T DE 69125286T DE 69125286 T DE69125286 T DE 69125286T DE 69125286 T2 DE69125286 T2 DE 69125286T2
Authority
DE
Germany
Prior art keywords
electrically charged
charged materials
neutralizing
neutralizing electrically
materials
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69125286T
Other languages
English (en)
Other versions
DE69125286D1 (de
Inventor
Tadahiro Ohmi
H Inaba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Takasago Thermal Engineering Co Ltd
Original Assignee
Takasago Thermal Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26415050&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69125286(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Takasago Thermal Engineering Co Ltd filed Critical Takasago Thermal Engineering Co Ltd
Publication of DE69125286D1 publication Critical patent/DE69125286D1/de
Application granted granted Critical
Publication of DE69125286T2 publication Critical patent/DE69125286T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05F—STATIC ELECTRICITY; NATURALLY-OCCURRING ELECTRICITY
    • H05F3/00—Carrying-off electrostatic charges
    • H05F3/06—Carrying-off electrostatic charges by means of ionising radiation
DE69125286T 1990-08-31 1991-08-20 Vorrichtung zum neutralisieren elektrisch geladenen materials Expired - Fee Related DE69125286T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP23018490 1990-08-31
JP3073908A JP2977098B2 (ja) 1990-08-31 1991-03-13 帯電物の中和装置
PCT/JP1991/001104 WO1992004810A1 (en) 1990-08-31 1991-08-20 Equipment for neutralizing charged material

Publications (2)

Publication Number Publication Date
DE69125286D1 DE69125286D1 (de) 1997-04-24
DE69125286T2 true DE69125286T2 (de) 1997-10-09

Family

ID=26415050

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69125286T Expired - Fee Related DE69125286T2 (de) 1990-08-31 1991-08-20 Vorrichtung zum neutralisieren elektrisch geladenen materials

Country Status (5)

Country Link
US (1) US5621605A (de)
EP (1) EP0546178B1 (de)
JP (1) JP2977098B2 (de)
DE (1) DE69125286T2 (de)
WO (1) WO1992004810A1 (de)

Families Citing this family (29)

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JP2816037B2 (ja) * 1991-07-25 1998-10-27 忠弘 大見 帯電物体の中和装置
EP1448029A3 (de) * 1992-08-14 2010-01-27 Hamamatsu Photonics K.K. Vorrichtung und Verfahren zur Herstellung von gasförmigen Ionen unter Verwendung von Röntgenstrahlen und deren Anwendung in verschiedenen Geräten und Strukturen
JPH06216060A (ja) * 1993-01-12 1994-08-05 Tokyo Electron Ltd 真空処理方法
US5898268A (en) * 1997-03-07 1999-04-27 Texas Instruments Incorporated Apparatus and method for generating low energy electrons
TW398025B (en) * 1997-03-25 2000-07-11 Tokyo Electron Ltd Processing device and method of the same
US6456480B1 (en) 1997-03-25 2002-09-24 Tokyo Electron Limited Processing apparatus and a processing method
US6433154B1 (en) 1997-06-12 2002-08-13 Bristol-Myers Squibb Company Functional receptor/kinase chimera in yeast cells
JP3406488B2 (ja) * 1997-09-05 2003-05-12 東京エレクトロン株式会社 真空処理装置
US6207006B1 (en) 1997-09-18 2001-03-27 Tokyo Electron Limited Vacuum processing apparatus
WO1999028966A1 (fr) * 1997-11-28 1999-06-10 Ebara Corporation Boite de transfert d'une tranche en semi-conducteur
JP3305647B2 (ja) * 1997-11-28 2002-07-24 株式会社荏原製作所 半導体基板用搬送ボックス
US5992244A (en) * 1998-03-04 1999-11-30 Regents Of The University Of Minnesota Charged particle neutralizing apparatus and method of neutralizing charged particles
DE60135455D1 (de) 2000-05-16 2008-10-02 Univ Minnesota It einer mehrfachdüsenanordnung
WO2002084832A1 (en) * 2001-04-11 2002-10-24 Ion Systems, Inc. Protection of reticles from electrostatic charges
US7247338B2 (en) * 2001-05-16 2007-07-24 Regents Of The University Of Minnesota Coating medical devices
JP4738636B2 (ja) * 2001-05-29 2011-08-03 株式会社テクノ菱和 防爆型無発塵イオナイザー
EP1462801A3 (de) * 2003-03-24 2005-01-05 Tepnel Lifecodes Methoden zur messung der negativkontrolle in mehrfachanalyt-assays
US7038223B2 (en) * 2004-04-05 2006-05-02 Burle Technologies, Inc. Controlled charge neutralization of ion-implanted articles
US8895410B2 (en) * 2005-09-13 2014-11-25 Tadahiro Ohmi Method of manufacturing semiconductor device and semiconductor manufacturing apparatus
CA2637883C (en) * 2006-01-31 2015-07-07 Regents Of The University Of Minnesota Electrospray coating of objects
US9108217B2 (en) 2006-01-31 2015-08-18 Nanocopoeia, Inc. Nanoparticle coating of surfaces
EP2529761B1 (de) * 2006-01-31 2017-06-14 Nanocopoeia, Inc. Oberflächenbeschichtung mit nanoteilchen
US7751170B2 (en) * 2006-06-02 2010-07-06 The Board Of Trustees Of The Leland Stanford Junior University Charge management of electrically isolated objects via modulated photoelectric charge transfer
JP4994749B2 (ja) 2006-09-05 2012-08-08 株式会社アドバンテスト 電子ビーム寸法測定装置及び電子ビーム寸法測定方法
US9040816B2 (en) * 2006-12-08 2015-05-26 Nanocopoeia, Inc. Methods and apparatus for forming photovoltaic cells using electrospray
US7796727B1 (en) 2008-03-26 2010-09-14 Tsi, Incorporated Aerosol charge conditioner
JP4960393B2 (ja) * 2009-01-30 2012-06-27 株式会社荏原製作所 荷電粒子線装置及び該装置を用いたデバイス製造方法
JP6352743B2 (ja) * 2014-09-12 2018-07-04 浜松ホトニクス株式会社 帯電処理装置及び帯電処理方法
JP6346532B2 (ja) * 2014-09-12 2018-06-20 浜松ホトニクス株式会社 電子源ユニット及び帯電処理ユニット

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Publication number Priority date Publication date Assignee Title
DE886180C (de) * 1951-10-19 1953-08-13 Siemens Ag Verfahren und Einrichtung zur Beseitigung elektrostatischer Ladungen auf elektrisch nichtleitenden Stoffen
JPS421353Y1 (de) * 1964-08-19 1967-01-26
CA968445A (en) * 1972-05-29 1975-05-27 Canadian Patents And Development Limited Laser discharge system
US4132567A (en) * 1977-10-13 1979-01-02 Fsi Corporation Apparatus for and method of cleaning and removing static charges from substrates
US4646009A (en) * 1982-05-18 1987-02-24 Ade Corporation Contacts for conductivity-type sensors
US4477263A (en) * 1982-06-28 1984-10-16 Shaver John D Apparatus and method for neutralizing static electric charges in sensitive manufacturing areas
EP0134269B1 (de) * 1983-08-11 1988-01-07 Ibm Deutschland Gmbh Elektronenstrahl-Projektionslithographie
US4542434A (en) * 1984-02-17 1985-09-17 Ion Systems, Inc. Method and apparatus for sequenced bipolar air ionization
US4642728A (en) * 1984-10-01 1987-02-10 At&T Bell Laboratories Suppression of electrostatic charge buildup at a workplace
US4630167A (en) * 1985-03-11 1986-12-16 Cybergen Systems, Inc. Static charge neutralizing system and method
JPS6245125A (ja) * 1985-08-23 1987-02-27 Hitachi Micro Comput Eng Ltd 乾燥装置
JPH0610348B2 (ja) * 1986-07-28 1994-02-09 三菱電機株式会社 イオン注入装置
US4757421A (en) * 1987-05-29 1988-07-12 Honeywell Inc. System for neutralizing electrostatically-charged objects using room air ionization
US4827371A (en) * 1988-04-04 1989-05-02 Ion Systems, Inc. Method and apparatus for ionizing gas with point of use ion flow delivery
US5024968A (en) * 1988-07-08 1991-06-18 Engelsberg Audrey C Removal of surface contaminants by irradiation from a high-energy source
JP2838900B2 (ja) * 1989-08-18 1998-12-16 忠弘 大見 帯電物体の中和方法および中和装置
US5351415A (en) * 1992-05-18 1994-10-04 Convey, Inc. Method and apparatus for maintaining clean articles

Also Published As

Publication number Publication date
JPH04218941A (ja) 1992-08-10
EP0546178B1 (de) 1997-03-19
WO1992004810A1 (en) 1992-03-19
EP0546178A4 (de) 1994-02-23
US5621605A (en) 1997-04-15
EP0546178A1 (de) 1993-06-16
DE69125286D1 (de) 1997-04-24
JP2977098B2 (ja) 1999-11-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee