DE69105992T2 - Vorrichtung und verfahren zum aufdampfen. - Google Patents

Vorrichtung und verfahren zum aufdampfen.

Info

Publication number
DE69105992T2
DE69105992T2 DE69105992T DE69105992T DE69105992T2 DE 69105992 T2 DE69105992 T2 DE 69105992T2 DE 69105992 T DE69105992 T DE 69105992T DE 69105992 T DE69105992 T DE 69105992T DE 69105992 T2 DE69105992 T2 DE 69105992T2
Authority
DE
Germany
Prior art keywords
vapor
crucible
charge
pct
nozzles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69105992T
Other languages
English (en)
Other versions
DE69105992D1 (de
Inventor
Alan William Bishop
David John Bray
Robert William Gardiner
Brian William Viney
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Qinetiq Ltd
Original Assignee
UK Secretary of State for Defence
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by UK Secretary of State for Defence filed Critical UK Secretary of State for Defence
Application granted granted Critical
Publication of DE69105992D1 publication Critical patent/DE69105992D1/de
Publication of DE69105992T2 publication Critical patent/DE69105992T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
DE69105992T 1990-10-16 1991-10-11 Vorrichtung und verfahren zum aufdampfen. Expired - Fee Related DE69105992T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB9022449A GB2248852A (en) 1990-10-16 1990-10-16 Vapour deposition
PCT/GB1991/001771 WO1992007103A1 (en) 1990-10-16 1991-10-11 Vapour deposition apparatus and method

Publications (2)

Publication Number Publication Date
DE69105992D1 DE69105992D1 (de) 1995-01-26
DE69105992T2 true DE69105992T2 (de) 1995-05-04

Family

ID=10683800

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69105992T Expired - Fee Related DE69105992T2 (de) 1990-10-16 1991-10-11 Vorrichtung und verfahren zum aufdampfen.

Country Status (8)

Country Link
US (1) US5348703A (de)
EP (1) EP0553228B1 (de)
JP (1) JP3475403B2 (de)
AT (1) ATE115646T1 (de)
CA (1) CA2094132C (de)
DE (1) DE69105992T2 (de)
GB (2) GB2248852A (de)
WO (1) WO1992007103A1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10341914A1 (de) * 2003-09-11 2005-04-14 Forschungszentrum Karlsruhe Gmbh Einrichtung zur Herstellung dünner Schichten und Verfahren zum Betreiben der Einrichtung

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60126779T2 (de) * 2000-03-24 2007-12-13 Cymbet Corp., Elk River Herstellung bei niedriger temperatur von dünnschicht- energiespeichervorrichtungen
SG135026A1 (en) * 2004-03-03 2007-09-28 Yas Co Ltd A nozzle source for thermal evaporation process
US7294209B2 (en) 2003-01-02 2007-11-13 Cymbet Corporation Apparatus and method for depositing material onto a substrate using a roll-to-roll mask
US7603144B2 (en) 2003-01-02 2009-10-13 Cymbet Corporation Active wireless tagging system on peel and stick substrate
US6906436B2 (en) * 2003-01-02 2005-06-14 Cymbet Corporation Solid state activity-activated battery device and method
US7211351B2 (en) 2003-10-16 2007-05-01 Cymbet Corporation Lithium/air batteries with LiPON as separator and protective barrier and method
JP2007518246A (ja) 2004-01-06 2007-07-05 シンベット コーポーレーション 境界を有する１若しくはそれ以上の層を備える層状のバリア構造及び該バリア構造の製造方法
CA2615479A1 (en) 2005-07-15 2007-01-25 Cymbet Corporation Thin-film batteries with polymer and lipon electrolyte layers and methods
US7776478B2 (en) 2005-07-15 2010-08-17 Cymbet Corporation Thin-film batteries with polymer and LiPON electrolyte layers and method
US20070098880A1 (en) * 2005-10-28 2007-05-03 Jean-Pierre Tahon Method of vaporization of phosphor precursor raw materials
US20090162535A1 (en) * 2007-12-21 2009-06-25 Jean-Pierre Tahon Method of forming a phosphor or scintillator material and vapor deposition apparatus used therefor
JP5677785B2 (ja) * 2009-08-27 2015-02-25 三星ディスプレイ株式會社Ｓａｍｓｕｎｇ Ｄｉｓｐｌａｙ Ｃｏ．，Ｌｔｄ． 薄膜蒸着装置及びこれを利用した有機発光表示装置の製造方法
US10658705B2 (en) 2018-03-07 2020-05-19 Space Charge, LLC Thin-film solid-state energy storage devices
US11527774B2 (en) 2011-06-29 2022-12-13 Space Charge, LLC Electrochemical energy storage devices
US10601074B2 (en) 2011-06-29 2020-03-24 Space Charge, LLC Rugged, gel-free, lithium-free, high energy density solid-state electrochemical energy storage devices
US9853325B2 (en) 2011-06-29 2017-12-26 Space Charge, LLC Rugged, gel-free, lithium-free, high energy density solid-state electrochemical energy storage devices
KR20130004830A (ko) 2011-07-04 2013-01-14 삼성디스플레이 주식회사 유기층 증착 장치 및 이를 이용한 유기 발광 표시 장치의 제조 방법
US20160281212A1 (en) 2015-03-24 2016-09-29 Siva Power, Inc. Thermal management of evaporation sources
CN107012432B (zh) * 2017-05-08 2019-01-18 京东方科技集团股份有限公司 一种蒸发源及蒸镀装置
CN112553579B (zh) * 2019-09-26 2023-05-09 宝山钢铁股份有限公司 一种具有过滤及均匀化喷嘴的真空镀膜装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB990288A (en) * 1961-09-05 1965-04-28 Ibm Improved method of depositing silicon monoxide films
GB962868A (en) * 1961-09-29 1964-07-08 Philips Electrical Ind Ltd Improvements in or relating to coating objects with light-absorbing transparent or translucent colour layers
GB1206586A (en) * 1966-09-07 1970-09-23 Mini Of Technology Vacuum deposition process of forming alloys
GB1265965A (de) * 1968-07-26 1972-03-08
US3607222A (en) * 1968-11-26 1971-09-21 Air Reduction Method for evaporating alloy
EP0055542A1 (de) * 1980-12-16 1982-07-07 The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and Verfahren zur Herstellung von Legierungsmengen durch Dampfphasenanbscheidung und Vorrichtung hierfür
JPS5834172A (ja) * 1981-08-26 1983-02-28 Mitsubishi Heavy Ind Ltd 合金蒸着用蒸発源構造
JPS6021345A (ja) * 1983-07-13 1985-02-02 Toyota Motor Corp 金属粒子分散金属マトリツクス複合材料の製造方法
US4548670A (en) * 1984-07-20 1985-10-22 Wedtech Corp. Silicon melting and evaporation method for high purity applications
DE3525747A1 (de) * 1985-07-19 1987-01-29 Pfeiffer Vakuumtechnik Anlage und verfahren zum behandeln von metallen im vakuum
JPS6293368A (ja) * 1985-10-17 1987-04-28 Mitsubishi Electric Corp 蒸発源
JPH02125866A (ja) * 1988-11-04 1990-05-14 Kobe Steel Ltd 合金蒸着めっき装置
GB2230792A (en) * 1989-04-21 1990-10-31 Secr Defence Multiple source physical vapour deposition.

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10341914A1 (de) * 2003-09-11 2005-04-14 Forschungszentrum Karlsruhe Gmbh Einrichtung zur Herstellung dünner Schichten und Verfahren zum Betreiben der Einrichtung
DE10341914B4 (de) * 2003-09-11 2008-08-14 Forschungszentrum Karlsruhe Gmbh Einrichtung zur Herstellung dünner Schichten und Verfahren zum Betreiben der Einrichtung

Also Published As

Publication number Publication date
EP0553228A1 (de) 1993-08-04
GB9022449D0 (en) 1990-11-28
JP3475403B2 (ja) 2003-12-08
JPH06501989A (ja) 1994-03-03
GB2248852A (en) 1992-04-22
GB2264952A (en) 1993-09-15
US5348703A (en) 1994-09-20
WO1992007103A1 (en) 1992-04-30
EP0553228B1 (de) 1994-12-14
ATE115646T1 (de) 1994-12-15
CA2094132A1 (en) 1992-04-17
GB2264952B (en) 1994-04-20
GB9306947D0 (en) 1993-06-02
DE69105992D1 (de) 1995-01-26
CA2094132C (en) 2001-07-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: QINETIQ LTD., LONDON, GB

8339 Ceased/non-payment of the annual fee