DE69105992T2 - Vorrichtung und verfahren zum aufdampfen. - Google Patents
Vorrichtung und verfahren zum aufdampfen.Info
- Publication number
- DE69105992T2 DE69105992T2 DE69105992T DE69105992T DE69105992T2 DE 69105992 T2 DE69105992 T2 DE 69105992T2 DE 69105992 T DE69105992 T DE 69105992T DE 69105992 T DE69105992 T DE 69105992T DE 69105992 T2 DE69105992 T2 DE 69105992T2
- Authority
- DE
- Germany
- Prior art keywords
- vapor
- crucible
- charge
- pct
- nozzles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9022449A GB2248852A (en) | 1990-10-16 | 1990-10-16 | Vapour deposition |
PCT/GB1991/001771 WO1992007103A1 (en) | 1990-10-16 | 1991-10-11 | Vapour deposition apparatus and method |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69105992D1 DE69105992D1 (de) | 1995-01-26 |
DE69105992T2 true DE69105992T2 (de) | 1995-05-04 |
Family
ID=10683800
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69105992T Expired - Fee Related DE69105992T2 (de) | 1990-10-16 | 1991-10-11 | Vorrichtung und verfahren zum aufdampfen. |
Country Status (8)
Country | Link |
---|---|
US (1) | US5348703A (de) |
EP (1) | EP0553228B1 (de) |
JP (1) | JP3475403B2 (de) |
AT (1) | ATE115646T1 (de) |
CA (1) | CA2094132C (de) |
DE (1) | DE69105992T2 (de) |
GB (2) | GB2248852A (de) |
WO (1) | WO1992007103A1 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10341914A1 (de) * | 2003-09-11 | 2005-04-14 | Forschungszentrum Karlsruhe Gmbh | Einrichtung zur Herstellung dünner Schichten und Verfahren zum Betreiben der Einrichtung |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7194801B2 (en) * | 2000-03-24 | 2007-03-27 | Cymbet Corporation | Thin-film battery having ultra-thin electrolyte and associated method |
SG135026A1 (en) * | 2004-03-03 | 2007-09-28 | Yas Co Ltd | A nozzle source for thermal evaporation process |
US7294209B2 (en) | 2003-01-02 | 2007-11-13 | Cymbet Corporation | Apparatus and method for depositing material onto a substrate using a roll-to-roll mask |
US6906436B2 (en) * | 2003-01-02 | 2005-06-14 | Cymbet Corporation | Solid state activity-activated battery device and method |
US7603144B2 (en) | 2003-01-02 | 2009-10-13 | Cymbet Corporation | Active wireless tagging system on peel and stick substrate |
US7211351B2 (en) | 2003-10-16 | 2007-05-01 | Cymbet Corporation | Lithium/air batteries with LiPON as separator and protective barrier and method |
WO2005067645A2 (en) | 2004-01-06 | 2005-07-28 | Cymbet Corporation | Layered barrier structure having one or more definable layers and method |
KR101387855B1 (ko) | 2005-07-15 | 2014-04-22 | 사임베트 코퍼레이션 | 연질 및 경질 전해질층을 가진 박막 배터리 및 그 제조방법 |
US7776478B2 (en) | 2005-07-15 | 2010-08-17 | Cymbet Corporation | Thin-film batteries with polymer and LiPON electrolyte layers and method |
US20070098880A1 (en) * | 2005-10-28 | 2007-05-03 | Jean-Pierre Tahon | Method of vaporization of phosphor precursor raw materials |
US20090162535A1 (en) * | 2007-12-21 | 2009-06-25 | Jean-Pierre Tahon | Method of forming a phosphor or scintillator material and vapor deposition apparatus used therefor |
JP5677785B2 (ja) * | 2009-08-27 | 2015-02-25 | 三星ディスプレイ株式會社Samsung Display Co.,Ltd. | 薄膜蒸着装置及びこれを利用した有機発光表示装置の製造方法 |
US10601074B2 (en) | 2011-06-29 | 2020-03-24 | Space Charge, LLC | Rugged, gel-free, lithium-free, high energy density solid-state electrochemical energy storage devices |
US9853325B2 (en) | 2011-06-29 | 2017-12-26 | Space Charge, LLC | Rugged, gel-free, lithium-free, high energy density solid-state electrochemical energy storage devices |
US11527774B2 (en) | 2011-06-29 | 2022-12-13 | Space Charge, LLC | Electrochemical energy storage devices |
KR20130004830A (ko) | 2011-07-04 | 2013-01-14 | 삼성디스플레이 주식회사 | 유기층 증착 장치 및 이를 이용한 유기 발광 표시 장치의 제조 방법 |
US10458014B2 (en) | 2015-03-24 | 2019-10-29 | Siva Power, Inc. | Thin-film deposition methods with thermal management of evaporation sources |
CN107012432B (zh) * | 2017-05-08 | 2019-01-18 | 京东方科技集团股份有限公司 | 一种蒸发源及蒸镀装置 |
EP3762989A4 (de) | 2018-03-07 | 2021-12-15 | Space Charge, LLC | Dünnfilm-festkörper-energiespeichervorrichtungen |
CN112553579B (zh) * | 2019-09-26 | 2023-05-09 | 宝山钢铁股份有限公司 | 一种具有过滤及均匀化喷嘴的真空镀膜装置 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB990288A (en) * | 1961-09-05 | 1965-04-28 | Ibm | Improved method of depositing silicon monoxide films |
CH430073A (de) * | 1961-09-29 | 1967-02-15 | Philips Nv | Verfahren zur Herstellung lichtabsorbierender, farbiger, durchsichtiger Schichten auf Gegenständen |
GB1206586A (en) * | 1966-09-07 | 1970-09-23 | Mini Of Technology | Vacuum deposition process of forming alloys |
GB1265965A (de) * | 1968-07-26 | 1972-03-08 | ||
US3607222A (en) * | 1968-11-26 | 1971-09-21 | Air Reduction | Method for evaporating alloy |
EP0055542A1 (de) * | 1980-12-16 | 1982-07-07 | The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and | Verfahren zur Herstellung von Legierungsmengen durch Dampfphasenanbscheidung und Vorrichtung hierfür |
JPS5834172A (ja) * | 1981-08-26 | 1983-02-28 | Mitsubishi Heavy Ind Ltd | 合金蒸着用蒸発源構造 |
JPS6021345A (ja) * | 1983-07-13 | 1985-02-02 | Toyota Motor Corp | 金属粒子分散金属マトリツクス複合材料の製造方法 |
US4548670A (en) * | 1984-07-20 | 1985-10-22 | Wedtech Corp. | Silicon melting and evaporation method for high purity applications |
DE3525747A1 (de) * | 1985-07-19 | 1987-01-29 | Pfeiffer Vakuumtechnik | Anlage und verfahren zum behandeln von metallen im vakuum |
JPS6293368A (ja) * | 1985-10-17 | 1987-04-28 | Mitsubishi Electric Corp | 蒸発源 |
JPH02125866A (ja) * | 1988-11-04 | 1990-05-14 | Kobe Steel Ltd | 合金蒸着めっき装置 |
GB2230792A (en) * | 1989-04-21 | 1990-10-31 | Secr Defence | Multiple source physical vapour deposition. |
-
1990
- 1990-10-16 GB GB9022449A patent/GB2248852A/en not_active Withdrawn
-
1991
- 1991-10-11 EP EP91919320A patent/EP0553228B1/de not_active Expired - Lifetime
- 1991-10-11 DE DE69105992T patent/DE69105992T2/de not_active Expired - Fee Related
- 1991-10-11 CA CA002094132A patent/CA2094132C/en not_active Expired - Fee Related
- 1991-10-11 AT AT91919320T patent/ATE115646T1/de not_active IP Right Cessation
- 1991-10-11 JP JP51647291A patent/JP3475403B2/ja not_active Expired - Fee Related
- 1991-10-11 US US08/039,409 patent/US5348703A/en not_active Expired - Lifetime
- 1991-10-11 WO PCT/GB1991/001771 patent/WO1992007103A1/en active IP Right Grant
-
1993
- 1993-04-02 GB GB9306947A patent/GB2264952B/en not_active Revoked
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10341914A1 (de) * | 2003-09-11 | 2005-04-14 | Forschungszentrum Karlsruhe Gmbh | Einrichtung zur Herstellung dünner Schichten und Verfahren zum Betreiben der Einrichtung |
DE10341914B4 (de) * | 2003-09-11 | 2008-08-14 | Forschungszentrum Karlsruhe Gmbh | Einrichtung zur Herstellung dünner Schichten und Verfahren zum Betreiben der Einrichtung |
Also Published As
Publication number | Publication date |
---|---|
GB2264952B (en) | 1994-04-20 |
GB2264952A (en) | 1993-09-15 |
JP3475403B2 (ja) | 2003-12-08 |
JPH06501989A (ja) | 1994-03-03 |
DE69105992D1 (de) | 1995-01-26 |
GB9022449D0 (en) | 1990-11-28 |
CA2094132A1 (en) | 1992-04-17 |
GB9306947D0 (en) | 1993-06-02 |
GB2248852A (en) | 1992-04-22 |
CA2094132C (en) | 2001-07-10 |
EP0553228A1 (de) | 1993-08-04 |
ATE115646T1 (de) | 1994-12-15 |
US5348703A (en) | 1994-09-20 |
WO1992007103A1 (en) | 1992-04-30 |
EP0553228B1 (de) | 1994-12-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: QINETIQ LTD., LONDON, GB |
|
8339 | Ceased/non-payment of the annual fee |