DE69021245T2 - Methode zur Erzeugung dreidimensionaler Körper unter Verwendung von lichthärtbaren Zusammensetzungen von selbstregulierender Schichtdichte durch Phasentrennung. - Google Patents

Methode zur Erzeugung dreidimensionaler Körper unter Verwendung von lichthärtbaren Zusammensetzungen von selbstregulierender Schichtdichte durch Phasentrennung.

Info

Publication number
DE69021245T2
DE69021245T2 DE69021245T DE69021245T DE69021245T2 DE 69021245 T2 DE69021245 T2 DE 69021245T2 DE 69021245 T DE69021245 T DE 69021245T DE 69021245 T DE69021245 T DE 69021245T DE 69021245 T2 DE69021245 T2 DE 69021245T2
Authority
DE
Germany
Prior art keywords
self
producing
light
phase separation
curable compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69021245T
Other languages
English (en)
Other versions
DE69021245D1 (de
Inventor
Mario Grossa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DSM IP Assets BV
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of DE69021245D1 publication Critical patent/DE69021245D1/de
Application granted granted Critical
Publication of DE69021245T2 publication Critical patent/DE69021245T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C9/00—Stereo-photographic or similar processes
    • G03C9/08—Producing three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/148—Light sensitive titanium compound containing
DE69021245T 1989-04-21 1990-04-19 Methode zur Erzeugung dreidimensionaler Körper unter Verwendung von lichthärtbaren Zusammensetzungen von selbstregulierender Schichtdichte durch Phasentrennung. Expired - Lifetime DE69021245T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/341,611 US4942060A (en) 1989-04-21 1989-04-21 Solid imaging method utilizing photohardenable compositions of self limiting thickness by phase separation

Publications (2)

Publication Number Publication Date
DE69021245D1 DE69021245D1 (de) 1995-09-07
DE69021245T2 true DE69021245T2 (de) 1996-02-15

Family

ID=23338279

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69021245T Expired - Lifetime DE69021245T2 (de) 1989-04-21 1990-04-19 Methode zur Erzeugung dreidimensionaler Körper unter Verwendung von lichthärtbaren Zusammensetzungen von selbstregulierender Schichtdichte durch Phasentrennung.

Country Status (9)

Country Link
US (1) US4942060A (de)
EP (1) EP0393674B1 (de)
JP (1) JPH0767745B2 (de)
KR (1) KR900016808A (de)
CN (1) CN1046613A (de)
AU (1) AU623004B2 (de)
CA (1) CA2014807A1 (de)
DE (1) DE69021245T2 (de)
HK (1) HK53997A (de)

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US7332537B2 (en) 1996-09-04 2008-02-19 Z Corporation Three dimensional printing material system and method
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WO1998034987A1 (fr) 1997-02-05 1998-08-13 Teijin Seiki Co., Ltd. Composition de resine stereolithographique
JP4007704B2 (ja) 1998-11-10 2007-11-14 ナブテスコ株式会社 光学的立体造形用の光硬化性樹脂組成物
US6932145B2 (en) 1998-11-20 2005-08-23 Rolls-Royce Corporation Method and apparatus for production of a cast component
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US6545064B1 (en) 1999-11-24 2003-04-08 Avery Dennison Corporation Coating composition comprising ethoxylated diacrylates
US7300619B2 (en) 2000-03-13 2007-11-27 Objet Geometries Ltd. Compositions and methods for use in three dimensional model printing
US20030207959A1 (en) 2000-03-13 2003-11-06 Eduardo Napadensky Compositions and methods for use in three dimensional model printing
US8481241B2 (en) 2000-03-13 2013-07-09 Stratasys Ltd. Compositions and methods for use in three dimensional model printing
US20010050031A1 (en) 2000-04-14 2001-12-13 Z Corporation Compositions for three-dimensional printing of solid objects
FR2813609A1 (fr) * 2000-09-01 2002-03-08 Optoform Sarl Procedes De Prot Composition de mousse photopolymerisable, procede d'obtention de pieces tridimensionnelles par prototypage rapide, dispositif de mise en oeuvre, piece obtenue et utilisation
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JP5280610B2 (ja) 2003-06-25 2013-09-04 シーメット株式会社 安定性の向上した活性エネルギー線硬化性の光学的立体造形用樹脂組成物
US7232850B2 (en) 2003-10-03 2007-06-19 Huntsman Advanced Materials Americas Inc. Photocurable compositions for articles having stable tensile properties
FR2865960B1 (fr) * 2004-02-06 2006-05-05 Nicolas Marsac Procede et machine pour realiser des objets en trois dimensions par depot de couches successives
US7261542B2 (en) 2004-03-18 2007-08-28 Desktop Factory, Inc. Apparatus for three dimensional printing using image layers
DE102004034416A1 (de) * 2004-07-15 2006-02-02 "Stiftung Caesar" (Center Of Advanced European Studies And Research) Flüssige, strahlunghärtende Zusammensetzungen
EP1820215A4 (de) * 2004-12-07 2008-11-12 Semiconductor Energy Lab Speicherbaustein und halbleiterbaustein
JP4744200B2 (ja) 2005-06-20 2011-08-10 シーメット株式会社 平滑化した造形端面を有する立体造形物
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US8293810B2 (en) * 2005-08-29 2012-10-23 Cmet Inc. Rapid prototyping resin compositions
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Also Published As

Publication number Publication date
CN1046613A (zh) 1990-10-31
EP0393674B1 (de) 1995-08-02
CA2014807A1 (en) 1990-10-21
HK53997A (en) 1997-05-02
AU623004B2 (en) 1992-04-30
AU5376290A (en) 1990-10-25
KR900016808A (ko) 1990-11-14
EP0393674A1 (de) 1990-10-24
JPH0767745B2 (ja) 1995-07-26
JPH0341126A (ja) 1991-02-21
DE69021245D1 (de) 1995-09-07
US4942060A (en) 1990-07-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: DSM N.V., HEERLEN, NL

8327 Change in the person/name/address of the patent owner

Owner name: DSM IP ASSETS B.V., HEERLEN, NL