US5166752A
(en)
*
|
1990-01-11 |
1992-11-24 |
Rudolph Research Corporation |
Simultaneous multiple angle/multiple wavelength ellipsometer and method
|
US5298972A
(en)
*
|
1990-01-22 |
1994-03-29 |
Hewlett-Packard Company |
Method and apparatus for measuring polarization sensitivity of optical devices
|
KR100203345B1
(ko)
*
|
1991-01-11 |
1999-06-15 |
루돌프리서치코퍼레이션 |
동시 다중각/다중파장 타원편광계와 측정방법
|
US5159412A
(en)
*
|
1991-03-15 |
1992-10-27 |
Therma-Wave, Inc. |
Optical measurement device with enhanced sensitivity
|
JPH0518858A
(ja)
*
|
1991-07-12 |
1993-01-26 |
Casio Comput Co Ltd |
薄膜の光学特性測定方法
|
US5181080A
(en)
*
|
1991-12-23 |
1993-01-19 |
Therma-Wave, Inc. |
Method and apparatus for evaluating the thickness of thin films
|
US5227623A
(en)
*
|
1992-01-31 |
1993-07-13 |
Hewlett-Packard Company |
Method and apparatus for measuring polarization mode dispersion in optical devices
|
IL104708A
(en)
*
|
1993-02-12 |
1995-12-31 |
Orbotech Ltd |
Device and method for optical inspection of items
|
US5412473A
(en)
*
|
1993-07-16 |
1995-05-02 |
Therma-Wave, Inc. |
Multiple angle spectroscopic analyzer utilizing interferometric and ellipsometric devices
|
US5764365A
(en)
|
1993-11-09 |
1998-06-09 |
Nova Measuring Instruments, Ltd. |
Two-dimensional beam deflector
|
USRE38153E1
(en)
*
|
1993-11-09 |
2003-06-24 |
Nova Measuring Instruments, Ltd. |
Two-dimensional beam deflector
|
IL107549A
(en)
*
|
1993-11-09 |
1996-01-31 |
Nova Measuring Instr Ltd |
Device for measuring the thickness of thin films
|
US5471303A
(en)
*
|
1994-04-29 |
1995-11-28 |
Wyko Corporation |
Combination of white-light scanning and phase-shifting interferometry for surface profile measurements
|
US5548404A
(en)
*
|
1994-09-23 |
1996-08-20 |
Sunshine Medical Instruments, Inc. |
Multiple wavelength polarization-modulated ellipsometer with phase-generated carrier
|
US5774222A
(en)
*
|
1994-10-07 |
1998-06-30 |
Hitachi, Ltd. |
Manufacturing method of semiconductor substrative and method and apparatus for inspecting defects of patterns on an object to be inspected
|
JPH10507833A
(ja)
*
|
1994-10-21 |
1998-07-28 |
サーマ−ウェイブ・インク |
分光偏光解析装置
|
US6734967B1
(en)
*
|
1995-01-19 |
2004-05-11 |
Kla-Tencor Technologies Corporation |
Focused beam spectroscopic ellipsometry method and system
|
US5608526A
(en)
*
|
1995-01-19 |
1997-03-04 |
Tencor Instruments |
Focused beam spectroscopic ellipsometry method and system
|
JPH10501072A
(ja)
*
|
1995-03-20 |
1998-01-27 |
カンサス ステイト ユニバーシティ リサーチ フアウンデーション |
エリプソメトリー顕微鏡
|
US5706094A
(en)
*
|
1995-08-25 |
1998-01-06 |
Brown University Research Foundation |
Ultrafast optical technique for the characterization of altered materials
|
US6008906A
(en)
*
|
1995-08-25 |
1999-12-28 |
Brown University Research Foundation |
Optical method for the characterization of the electrical properties of semiconductors and insulating films
|
US6321601B1
(en)
*
|
1996-08-06 |
2001-11-27 |
Brown University Research Foundation |
Optical method for the characterization of laterally-patterned samples in integrated circuits
|
US5748318A
(en)
*
|
1996-01-23 |
1998-05-05 |
Brown University Research Foundation |
Optical stress generator and detector
|
US6175416B1
(en)
|
1996-08-06 |
2001-01-16 |
Brown University Research Foundation |
Optical stress generator and detector
|
US5844684A
(en)
*
|
1997-02-28 |
1998-12-01 |
Brown University Research Foundation |
Optical method for determining the mechanical properties of a material
|
DE19733890C2
(de)
*
|
1996-08-04 |
2000-03-16 |
Matsushita Electric Ind Co Ltd |
Verfahren zum Vermessen eines Mediums und Vorrichtung dazu
|
US5748317A
(en)
*
|
1997-01-21 |
1998-05-05 |
Brown University Research Foundation |
Apparatus and method for characterizing thin film and interfaces using an optical heat generator and detector
|
US5889593A
(en)
*
|
1997-02-26 |
1999-03-30 |
Kla Instruments Corporation |
Optical system and method for angle-dependent reflection or transmission measurement
|
DE19708036C2
(de)
*
|
1997-02-27 |
2000-06-29 |
Gunther Elender |
Ellipsometrisches Mikroskop
|
US5838448A
(en)
*
|
1997-03-11 |
1998-11-17 |
Nikon Corporation |
CMP variable angle in situ sensor
|
US5978074A
(en)
|
1997-07-03 |
1999-11-02 |
Therma-Wave, Inc. |
Apparatus for evaluating metalized layers on semiconductors
|
US6278519B1
(en)
|
1998-01-29 |
2001-08-21 |
Therma-Wave, Inc. |
Apparatus for analyzing multi-layer thin film stacks on semiconductors
|
WO1999002970A1
(en)
*
|
1997-07-11 |
1999-01-21 |
Therma-Wave, Inc. |
An apparatus for analyzing multi-layer thin film stacks on semiconductors
|
US5798837A
(en)
|
1997-07-11 |
1998-08-25 |
Therma-Wave, Inc. |
Thin film optical measurement system and method with calibrating ellipsometer
|
US5864393A
(en)
*
|
1997-07-30 |
1999-01-26 |
Brown University Research Foundation |
Optical method for the determination of stress in thin films
|
DE19734646A1
(de)
*
|
1997-08-11 |
1999-03-04 |
Bosch Gmbh Robert |
Ellipsometer-Meßvorrichtung
|
IL123575A
(en)
*
|
1998-03-05 |
2001-08-26 |
Nova Measuring Instr Ltd |
Method and apparatus for alignment of a wafer
|
US6483580B1
(en)
*
|
1998-03-06 |
2002-11-19 |
Kla-Tencor Technologies Corporation |
Spectroscopic scatterometer system
|
US6836324B2
(en)
*
|
1998-03-18 |
2004-12-28 |
Nova Measuring Instruments Ltd. |
Method and apparatus for measurements of patterned structures
|
IL123727A
(en)
*
|
1998-03-18 |
2002-05-23 |
Nova Measuring Instr Ltd |
Method and apparatus for measurement of patterned structures
|
US6476920B1
(en)
|
1998-03-18 |
2002-11-05 |
Nova Measuring Instruments, Ltd. |
Method and apparatus for measurements of patterned structures
|
US6753972B1
(en)
*
|
1998-04-21 |
2004-06-22 |
Hitachi, Ltd. |
Thin film thickness measuring method and apparatus, and method and apparatus for manufacturing a thin film device using the same
|
US6025918A
(en)
|
1998-07-07 |
2000-02-15 |
Brown University Research Foundation |
Apparatus and method for measurement of the mechanical properties and electromigration of thin films
|
US6038026A
(en)
*
|
1998-07-07 |
2000-03-14 |
Brown University Research Foundation |
Apparatus and method for the determination of grain size in thin films
|
EP0973069A3
(de)
*
|
1998-07-14 |
2006-10-04 |
Nova Measuring Instruments Limited |
Kontrollgerät und photolithographisches Verfahren zur Behandlung von Substraten
|
US6212961B1
(en)
|
1999-02-11 |
2001-04-10 |
Nova Measuring Instruments Ltd. |
Buffer system for a wafer handling system
|
JP2000311334A
(ja)
*
|
1999-04-27 |
2000-11-07 |
Victor Co Of Japan Ltd |
磁気記録媒体の特性評価方法及び磁気記録媒体
|
US8531678B2
(en)
|
1999-07-09 |
2013-09-10 |
Nova Measuring Instruments, Ltd. |
Method and system for measuring patterned structures
|
IL130874A
(en)
|
1999-07-09 |
2002-12-01 |
Nova Measuring Instr Ltd |
System and method for measuring pattern structures
|
US6340602B1
(en)
*
|
1999-12-10 |
2002-01-22 |
Sensys Instruments |
Method of measuring meso-scale structures on wafers
|
US7049633B2
(en)
*
|
1999-12-10 |
2006-05-23 |
Tokyo Electron Limited |
Method of measuring meso-scale structures on wafers
|
US6317216B1
(en)
|
1999-12-13 |
2001-11-13 |
Brown University Research Foundation |
Optical method for the determination of grain orientation in films
|
WO2001055671A1
(en)
*
|
2000-01-31 |
2001-08-02 |
Therma-Wave, Inc. |
Fiber-filtered laser system for use in measuring thin film thicknesses
|
US6535285B1
(en)
*
|
2000-02-08 |
2003-03-18 |
Therma-Wave, Inc. |
Combination thermal wave and optical spectroscopy measurement system
|
US6408048B2
(en)
|
2000-03-14 |
2002-06-18 |
Therma-Wave, Inc. |
Apparatus for analyzing samples using combined thermal wave and X-ray reflectance measurements
|
US6429943B1
(en)
|
2000-03-29 |
2002-08-06 |
Therma-Wave, Inc. |
Critical dimension analysis with simultaneous multiple angle of incidence measurements
|
US6532076B1
(en)
*
|
2000-04-04 |
2003-03-11 |
Therma-Wave, Inc. |
Method and apparatus for multidomain data analysis
|
US6689519B2
(en)
*
|
2000-05-04 |
2004-02-10 |
Kla-Tencor Technologies Corp. |
Methods and systems for lithography process control
|
US20060141376A1
(en)
*
|
2004-12-22 |
2006-06-29 |
Ady Levy |
Methods and systems for controlling variation in dimensions of patterned features across a wafer
|
US6462817B1
(en)
|
2000-05-12 |
2002-10-08 |
Carlos Strocchia-Rivera |
Method of monitoring ion implants by examination of an overlying masking material
|
US6532070B1
(en)
*
|
2000-07-17 |
2003-03-11 |
Therma-Wave, Inc. |
Method for determining ion concentration and energy of shallow junction implants
|
US6510395B2
(en)
|
2000-08-11 |
2003-01-21 |
Sensys Instruments Corporation |
Method of detecting residue on a polished wafer
|
US6307628B1
(en)
*
|
2000-08-18 |
2001-10-23 |
Taiwan Semiconductor Manufacturing Company, Ltd |
Method and apparatus for CMP end point detection using confocal optics
|
US6781692B1
(en)
|
2000-08-28 |
2004-08-24 |
Therma-Wave, Inc. |
Method of monitoring the fabrication of thin film layers forming a DWDM filter
|
US7317531B2
(en)
*
|
2002-12-05 |
2008-01-08 |
Kla-Tencor Technologies Corporation |
Apparatus and methods for detecting overlay errors using scatterometry
|
US7541201B2
(en)
|
2000-08-30 |
2009-06-02 |
Kla-Tencor Technologies Corporation |
Apparatus and methods for determining overlay of structures having rotational or mirror symmetry
|
US7106425B1
(en)
|
2000-09-20 |
2006-09-12 |
Kla-Tencor Technologies Corp. |
Methods and systems for determining a presence of defects and a thin film characteristic of a specimen
|
US6891627B1
(en)
*
|
2000-09-20 |
2005-05-10 |
Kla-Tencor Technologies Corp. |
Methods and systems for determining a critical dimension and overlay of a specimen
|
US20020190207A1
(en)
*
|
2000-09-20 |
2002-12-19 |
Ady Levy |
Methods and systems for determining a characteristic of micro defects on a specimen
|
US7130029B2
(en)
|
2000-09-20 |
2006-10-31 |
Kla-Tencor Technologies Corp. |
Methods and systems for determining an adhesion characteristic and a thickness of a specimen
|
US6812045B1
(en)
|
2000-09-20 |
2004-11-02 |
Kla-Tencor, Inc. |
Methods and systems for determining a characteristic of a specimen prior to, during, or subsequent to ion implantation
|
US6919957B2
(en)
|
2000-09-20 |
2005-07-19 |
Kla-Tencor Technologies Corp. |
Methods and systems for determining a critical dimension, a presence of defects, and a thin film characteristic of a specimen
|
US6694284B1
(en)
|
2000-09-20 |
2004-02-17 |
Kla-Tencor Technologies Corp. |
Methods and systems for determining at least four properties of a specimen
|
US7349090B2
(en)
*
|
2000-09-20 |
2008-03-25 |
Kla-Tencor Technologies Corp. |
Methods and systems for determining a property of a specimen prior to, during, or subsequent to lithography
|
US6673637B2
(en)
*
|
2000-09-20 |
2004-01-06 |
Kla-Tencor Technologies |
Methods and systems for determining a presence of macro defects and overlay of a specimen
|
US6782337B2
(en)
*
|
2000-09-20 |
2004-08-24 |
Kla-Tencor Technologies Corp. |
Methods and systems for determining a critical dimension an a presence of defects on a specimen
|
US6678062B2
(en)
*
|
2000-12-08 |
2004-01-13 |
Cyberoptics Corporation |
Automated system with improved height sensing
|
US6731386B2
(en)
|
2001-01-04 |
2004-05-04 |
Agere Systems Inc. |
Measurement technique for ultra-thin oxides
|
US20030002043A1
(en)
*
|
2001-04-10 |
2003-01-02 |
Kla-Tencor Corporation |
Periodic patterns and technique to control misalignment
|
US6677170B1
(en)
*
|
2001-05-23 |
2004-01-13 |
Advanced Micro Devices, Inc. |
Method for determining process layer thickness using scatterometry measurements
|
US6704661B1
(en)
*
|
2001-07-16 |
2004-03-09 |
Therma-Wave, Inc. |
Real time analysis of periodic structures on semiconductors
|
US6678046B2
(en)
*
|
2001-08-28 |
2004-01-13 |
Therma-Wave, Inc. |
Detector configurations for optical metrology
|
CN1556914A
(zh)
*
|
2001-09-21 |
2004-12-22 |
Kmac株式会社 |
利用二维反射计测量多层薄膜的厚度轮廓和折射率分布的装置及其测量方法
|
JP4938219B2
(ja)
*
|
2001-12-19 |
2012-05-23 |
ケーエルエー−テンカー コーポレイション |
光学分光システムを使用するパラメトリック・プロフィーリング
|
US6813034B2
(en)
*
|
2002-02-05 |
2004-11-02 |
Therma-Wave, Inc. |
Analysis of isolated and aperiodic structures with simultaneous multiple angle of incidence measurements
|
US7061627B2
(en)
*
|
2002-03-13 |
2006-06-13 |
Therma-Wave, Inc. |
Optical scatterometry of asymmetric lines and structures
|
US7079249B2
(en)
*
|
2002-06-21 |
2006-07-18 |
Therma-Wave, Inc. |
Modulated reflectance measurement system with fiber laser technology
|
US7046376B2
(en)
*
|
2002-07-05 |
2006-05-16 |
Therma-Wave, Inc. |
Overlay targets with isolated, critical-dimension features and apparatus to measure overlay
|
JP4563811B2
(ja)
*
|
2002-09-09 |
2010-10-13 |
ザイゴ コーポレーション |
薄膜構造の特性評価を含む、偏光解析、反射光測定および散乱光測定のための干渉計法および走査式干渉計
|
US7139081B2
(en)
*
|
2002-09-09 |
2006-11-21 |
Zygo Corporation |
Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures
|
US7869057B2
(en)
*
|
2002-09-09 |
2011-01-11 |
Zygo Corporation |
Multiple-angle multiple-wavelength interferometer using high-NA imaging and spectral analysis
|
AU2003302049A1
(en)
*
|
2002-11-20 |
2004-06-15 |
Mehrdad Nikoohahad |
System and method for characterizing three-dimensional structures
|
JP4746987B2
(ja)
|
2002-12-05 |
2011-08-10 |
ケーエルエー−テンカー コーポレイション |
散乱計測を用いてオーバレイ誤差を検出する装置および方法
|
US7440105B2
(en)
*
|
2002-12-05 |
2008-10-21 |
Kla-Tencor Technologies Corporation |
Continuously varying offset mark and methods of determining overlay
|
US6859119B2
(en)
*
|
2002-12-26 |
2005-02-22 |
Motorola, Inc. |
Meso-microelectromechanical system package
|
US7116429B1
(en)
*
|
2003-01-18 |
2006-10-03 |
Walecki Wojciech J |
Determining thickness of slabs of materials by inventors
|
US7324214B2
(en)
*
|
2003-03-06 |
2008-01-29 |
Zygo Corporation |
Interferometer and method for measuring characteristics of optically unresolved surface features
|
US7106454B2
(en)
*
|
2003-03-06 |
2006-09-12 |
Zygo Corporation |
Profiling complex surface structures using scanning interferometry
|
US7271918B2
(en)
*
|
2003-03-06 |
2007-09-18 |
Zygo Corporation |
Profiling complex surface structures using scanning interferometry
|
US7054006B2
(en)
*
|
2003-05-20 |
2006-05-30 |
Therma-Wave, Inc. |
Self-calibrating beam profile ellipsometer
|
US7349107B2
(en)
*
|
2003-07-07 |
2008-03-25 |
Lockheed Martin Corporation |
System and method for correction for angular spread in determining optical properties of materials
|
WO2005029193A2
(en)
*
|
2003-09-15 |
2005-03-31 |
Zygo Corporation |
Interferometric analysis of surfaces.
|
FR2859781B1
(fr)
*
|
2003-09-17 |
2007-07-06 |
Commissariat Energie Atomique |
Utilisation de la transformee de fourier optique pour le controle dimensionnel en microelectronique
|
US7280215B2
(en)
*
|
2003-09-24 |
2007-10-09 |
Therma-Wave, Inc. |
Photothermal system with spectroscopic pump and probe
|
FR2860298B1
(fr)
*
|
2003-09-25 |
2007-06-15 |
Robert Andre Marcel Stehle |
Ellipsometre spectroscopique a polarisation incidente et analyseur fixes
|
TWI335417B
(en)
|
2003-10-27 |
2011-01-01 |
Zygo Corp |
Method and apparatus for thin film measurement
|
US7821655B2
(en)
|
2004-02-09 |
2010-10-26 |
Axcelis Technologies, Inc. |
In-situ absolute measurement process and apparatus for film thickness, film removal rate, and removal endpoint prediction
|
US7215431B2
(en)
*
|
2004-03-04 |
2007-05-08 |
Therma-Wave, Inc. |
Systems and methods for immersion metrology
|
US7492463B2
(en)
|
2004-04-15 |
2009-02-17 |
Davidson Instruments Inc. |
Method and apparatus for continuous readout of Fabry-Perot fiber optic sensor
|
JP2007532931A
(ja)
*
|
2004-04-19 |
2007-11-15 |
アリスト インストルメンツ インコーポレイテッド |
薄膜及び限界寸法測定のためのビーム・プロファイル式複合反射率システム及び方法
|
US7359052B2
(en)
*
|
2004-05-14 |
2008-04-15 |
Kla-Tencor Technologies Corp. |
Systems and methods for measurement of a specimen with vacuum ultraviolet light
|
US7067819B2
(en)
*
|
2004-05-14 |
2006-06-27 |
Kla-Tencor Technologies Corp. |
Systems and methods for measurement or analysis of a specimen using separated spectral peaks in light
|
US7349079B2
(en)
*
|
2004-05-14 |
2008-03-25 |
Kla-Tencor Technologies Corp. |
Methods for measurement or analysis of a nitrogen concentration of a specimen
|
US7564552B2
(en)
*
|
2004-05-14 |
2009-07-21 |
Kla-Tencor Technologies Corp. |
Systems and methods for measurement of a specimen with vacuum ultraviolet light
|
US20060012582A1
(en)
*
|
2004-07-15 |
2006-01-19 |
De Lega Xavier C |
Transparent film measurements
|
US20080144036A1
(en)
*
|
2006-12-19 |
2008-06-19 |
Asml Netherlands B.V. |
Method of measurement, an inspection apparatus and a lithographic apparatus
|
US7791727B2
(en)
|
2004-08-16 |
2010-09-07 |
Asml Netherlands B.V. |
Method and apparatus for angular-resolved spectroscopic lithography characterization
|
US7489399B1
(en)
|
2004-08-20 |
2009-02-10 |
Kla-Tencor Corporation |
Spectroscopic multi angle ellipsometry
|
US7345761B1
(en)
*
|
2004-09-20 |
2008-03-18 |
Kla-Tencor Technologies Corporation |
Film measurement
|
US7190453B1
(en)
*
|
2004-09-20 |
2007-03-13 |
Kla-Tencor Technologies Corporation |
Film measurement
|
US7206070B2
(en)
*
|
2004-11-15 |
2007-04-17 |
Therma-Wave, Inc. |
Beam profile ellipsometer with rotating compensator
|
EP1681540A1
(de)
|
2004-12-21 |
2006-07-19 |
Davidson Instruments, Inc. |
Mehrkanalarrayprozessor
|
EP1674833A3
(de)
|
2004-12-21 |
2007-05-30 |
Davidson Instruments, Inc. |
Faseroptisches Sensorsystem
|
US7515253B2
(en)
|
2005-01-12 |
2009-04-07 |
Kla-Tencor Technologies Corporation |
System for measuring a sample with a layer containing a periodic diffracting structure
|
US7884947B2
(en)
*
|
2005-01-20 |
2011-02-08 |
Zygo Corporation |
Interferometry for determining characteristics of an object surface, with spatially coherent illumination
|
TWI409451B
(zh)
*
|
2005-01-20 |
2013-09-21 |
Zygo Corp |
用於檢測物體表面之特性的干涉系統、干涉裝置以及干涉方法
|
US7408641B1
(en)
|
2005-02-14 |
2008-08-05 |
Kla-Tencor Technologies Corp. |
Measurement systems configured to perform measurements of a specimen and illumination subsystems configured to provide illumination for a measurement system
|
WO2006091913A1
(en)
*
|
2005-02-25 |
2006-08-31 |
Nanometrics Incorporated |
Apparatus and method for enhanced critical dimension scatterometry
|
EP1869737B1
(de)
|
2005-03-16 |
2021-05-12 |
Davidson Instruments, Inc. |
Hochintensitäts-fabry-perot-sensor
|
US7321431B2
(en)
*
|
2005-05-19 |
2008-01-22 |
Zygo Corporation |
Method and system for analyzing low-coherence interferometry signals for information about thin film structures
|
US7742705B2
(en)
|
2005-05-23 |
2010-06-22 |
Futurewei Technologies, Inc. |
System and method for chirped light source
|
JP4084817B2
(ja)
*
|
2005-09-16 |
2008-04-30 |
テクノス株式会社 |
膜厚測定方法及び膜厚測定装置
|
US7636168B2
(en)
*
|
2005-10-11 |
2009-12-22 |
Zygo Corporation |
Interferometry method and system including spectral decomposition
|
US7567351B2
(en)
*
|
2006-02-02 |
2009-07-28 |
Kla-Tencor Corporation |
High resolution monitoring of CD variations
|
WO2007144777A2
(en)
*
|
2006-03-30 |
2007-12-21 |
Orbotech, Ltd. |
Inspection system employing illumination that is selectable over a continuous range angles
|
US7684051B2
(en)
|
2006-04-18 |
2010-03-23 |
Halliburton Energy Services, Inc. |
Fiber optic seismic sensor based on MEMS cantilever
|
US7743661B2
(en)
|
2006-04-26 |
2010-06-29 |
Halliburton Energy Services, Inc. |
Fiber optic MEMS seismic sensor with mass supported by hinged beams
|
KR100742982B1
(ko)
*
|
2006-06-22 |
2007-07-26 |
케이맥(주) |
초점 타원계측기
|
WO2008011510A2
(en)
*
|
2006-07-21 |
2008-01-24 |
Zygo Corporation |
Compensation of systematic effects in low coherence interferometry
|
US7502104B2
(en)
*
|
2006-08-10 |
2009-03-10 |
Kla-Tencor Corporation |
Probe beam profile modulated optical reflectance system and methods
|
US8115937B2
(en)
|
2006-08-16 |
2012-02-14 |
Davidson Instruments |
Methods and apparatus for measuring multiple Fabry-Perot gaps
|
DE102007043937B4
(de)
*
|
2006-09-13 |
2010-10-07 |
Innovent E.V. |
Verfahren zur Bestimmung der Dicke und des Brechungsindex von optisch transparenten Schichten auf optisch transparenten planparallelen Substraten
|
US7924435B2
(en)
*
|
2006-12-22 |
2011-04-12 |
Zygo Corporation |
Apparatus and method for measuring characteristics of surface features
|
US7787128B2
(en)
|
2007-01-24 |
2010-08-31 |
Halliburton Energy Services, Inc. |
Transducer for measuring environmental parameters
|
US7889355B2
(en)
*
|
2007-01-31 |
2011-02-15 |
Zygo Corporation |
Interferometry for lateral metrology
|
GB0706288D0
(en)
|
2007-03-30 |
2007-05-09 |
Nightingale Eos Ltd |
Method for measuring the thickness or curvature of thin films
|
US7619746B2
(en)
*
|
2007-07-19 |
2009-11-17 |
Zygo Corporation |
Generating model signals for interferometry
|
US8072611B2
(en)
*
|
2007-10-12 |
2011-12-06 |
Zygo Corporation |
Interferometric analysis of under-resolved features
|
US7978337B2
(en)
*
|
2007-11-13 |
2011-07-12 |
Zygo Corporation |
Interferometer utilizing polarization scanning
|
WO2009079334A2
(en)
*
|
2007-12-14 |
2009-06-25 |
Zygo Corporation |
Analyzing surface structure using scanning interferometry
|
NL1036245A1
(nl)
|
2007-12-17 |
2009-06-18 |
Asml Netherlands Bv |
Diffraction based overlay metrology tool and method of diffraction based overlay metrology.
|
JP2009182046A
(ja)
*
|
2008-01-29 |
2009-08-13 |
Tokyo Electron Ltd |
基板周縁部処理装置の検査方法
|
KR101652133B1
(ko)
|
2008-09-29 |
2016-08-29 |
케이엘에이-텐코어 코오포레이션 |
계측 시스템의 조명 서브시스템들, 계측 시스템들 및 계측 측정들을 위한 표본을 조명하기 위한 방법들
|
US9080991B2
(en)
*
|
2008-09-29 |
2015-07-14 |
Kla-Tencor Corp. |
Illuminating a specimen for metrology or inspection
|
US8120781B2
(en)
*
|
2008-11-26 |
2012-02-21 |
Zygo Corporation |
Interferometric systems and methods featuring spectral analysis of unevenly sampled data
|
US8125641B2
(en)
*
|
2009-03-27 |
2012-02-28 |
N&K Technology, Inc. |
Method and apparatus for phase-compensated sensitivity-enhanced spectroscopy (PCSES)
|
US7985188B2
(en)
*
|
2009-05-13 |
2011-07-26 |
Cv Holdings Llc |
Vessel, coating, inspection and processing apparatus
|
ES2452519T3
(es)
|
2009-05-13 |
2014-04-01 |
Sio2 Medical Products, Inc. |
Soporte de recipientes
|
US9458536B2
(en)
|
2009-07-02 |
2016-10-04 |
Sio2 Medical Products, Inc. |
PECVD coating methods for capped syringes, cartridges and other articles
|
US8441639B2
(en)
*
|
2009-09-03 |
2013-05-14 |
Kla-Tencor Corp. |
Metrology systems and methods
|
US11624115B2
(en)
|
2010-05-12 |
2023-04-11 |
Sio2 Medical Products, Inc. |
Syringe with PECVD lubrication
|
GB201009040D0
(en)
|
2010-05-28 |
2010-07-14 |
Nightingale Eos Ltd |
Apparatus and method for locating the centre of a beam profile
|
GB201009039D0
(en)
|
2010-05-28 |
2010-07-14 |
Nightingale Eos Ltd |
Apparatus and method for compensating for sample misalignment
|
US9878101B2
(en)
|
2010-11-12 |
2018-01-30 |
Sio2 Medical Products, Inc. |
Cyclic olefin polymer vessels and vessel coating methods
|
US9272095B2
(en)
|
2011-04-01 |
2016-03-01 |
Sio2 Medical Products, Inc. |
Vessels, contact surfaces, and coating and inspection apparatus and methods
|
US9793673B2
(en)
|
2011-06-13 |
2017-10-17 |
Kla-Tencor Corporation |
Semiconductor inspection and metrology system using laser pulse multiplier
|
TWI414385B
(zh)
*
|
2011-08-05 |
2013-11-11 |
Ind Tech Res Inst |
應用於雷射加工之深度即時監控系統及其方法
|
CN103930595A
(zh)
|
2011-11-11 |
2014-07-16 |
Sio2医药产品公司 |
用于药物包装的钝化、pH保护性或润滑性涂层、涂布方法以及设备
|
US11116695B2
(en)
|
2011-11-11 |
2021-09-14 |
Sio2 Medical Products, Inc. |
Blood sample collection tube
|
US8675188B2
(en)
|
2012-01-09 |
2014-03-18 |
Kla-Tencor Corporation |
Method and system for determining one or more optical characteristics of structure of a semiconductor wafer
|
US8879073B2
(en)
|
2012-02-24 |
2014-11-04 |
Kla-Tencor Corporation |
Optical metrology using targets with field enhancement elements
|
DE102012102756A1
(de)
|
2012-03-30 |
2013-10-02 |
Hseb Dresden Gmbh |
Verfahren zur Detektion vergrabener Schichten
|
CA2887352A1
(en)
|
2012-05-09 |
2013-11-14 |
Sio2 Medical Products, Inc. |
Saccharide protective coating for pharmaceutical package
|
KR101383652B1
(ko)
*
|
2012-10-15 |
2014-04-09 |
한국표준과학연구원 |
분자접합특성 및 완충용액 굴절률 동시 측정장치 및 측정방법
|
CN104854257B
(zh)
|
2012-11-01 |
2018-04-13 |
Sio2医药产品公司 |
涂层检查方法
|
US9903782B2
(en)
|
2012-11-16 |
2018-02-27 |
Sio2 Medical Products, Inc. |
Method and apparatus for detecting rapid barrier coating integrity characteristics
|
WO2014085348A2
(en)
|
2012-11-30 |
2014-06-05 |
Sio2 Medical Products, Inc. |
Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like
|
US9764093B2
(en)
|
2012-11-30 |
2017-09-19 |
Sio2 Medical Products, Inc. |
Controlling the uniformity of PECVD deposition
|
US9151940B2
(en)
|
2012-12-05 |
2015-10-06 |
Kla-Tencor Corporation |
Semiconductor inspection and metrology system using laser pulse multiplier
|
US20160015898A1
(en)
|
2013-03-01 |
2016-01-21 |
Sio2 Medical Products, Inc. |
Plasma or cvd pre-treatment for lubricated pharmaceutical package, coating process and apparatus
|
KR102336796B1
(ko)
|
2013-03-11 |
2021-12-10 |
에스아이오2 메디컬 프로덕츠, 인크. |
코팅된 패키징
|
US9937099B2
(en)
|
2013-03-11 |
2018-04-10 |
Sio2 Medical Products, Inc. |
Trilayer coated pharmaceutical packaging with low oxygen transmission rate
|
KR20140112230A
(ko)
*
|
2013-03-13 |
2014-09-23 |
삼성전자주식회사 |
막의 불균일도 검출 방법 및 이를 수행하기 위한 장치
|
WO2014144926A1
(en)
|
2013-03-15 |
2014-09-18 |
Sio2 Medical Products, Inc. |
Coating method
|
US9804101B2
(en)
|
2014-03-20 |
2017-10-31 |
Kla-Tencor Corporation |
System and method for reducing the bandwidth of a laser and an inspection system and method using a laser
|
EP3693493A1
(de)
|
2014-03-28 |
2020-08-12 |
SiO2 Medical Products, Inc. |
Antistatische beschichtungen für kunststoffbehälter
|
US9525265B2
(en)
|
2014-06-20 |
2016-12-20 |
Kla-Tencor Corporation |
Laser repetition rate multiplier and flat-top beam profile generators using mirrors and/or prisms
|
CN107003118B
(zh)
|
2014-12-02 |
2019-09-24 |
三菱电机株式会社 |
位移传感器、位移检测装置及位移检测方法
|
US9860466B2
(en)
|
2015-05-14 |
2018-01-02 |
Kla-Tencor Corporation |
Sensor with electrically controllable aperture for inspection and metrology systems
|
CA3204930A1
(en)
|
2015-08-18 |
2017-02-23 |
Sio2 Medical Products, Inc. |
Pharmaceutical and other packaging with low oxygen transmission rate
|
US9865447B2
(en)
|
2016-03-28 |
2018-01-09 |
Kla-Tencor Corporation |
High brightness laser-sustained plasma broadband source
|
US10313622B2
(en)
|
2016-04-06 |
2019-06-04 |
Kla-Tencor Corporation |
Dual-column-parallel CCD sensor and inspection systems using a sensor
|
US10778925B2
(en)
|
2016-04-06 |
2020-09-15 |
Kla-Tencor Corporation |
Multiple column per channel CCD sensor architecture for inspection and metrology
|
US10451412B2
(en)
|
2016-04-22 |
2019-10-22 |
Kla-Tencor Corporation |
Apparatus and methods for detecting overlay errors using scatterometry
|
RU2641639C2
(ru)
*
|
2016-05-16 |
2018-01-18 |
Федеральное государственное бюджетное образовательное учреждение высшего образования "Саратовский государственный технический университет имени Гагарина Ю.А." (СГТУ имени Гагарина Ю.А.) |
Способ измерения толщины тонкой пленки и картирования топографии ее поверхности с помощью интерферометра белого света
|
US10495287B1
(en)
|
2017-01-03 |
2019-12-03 |
Kla-Tencor Corporation |
Nanocrystal-based light source for sample characterization
|
US11662646B2
(en)
|
2017-02-05 |
2023-05-30 |
Kla Corporation |
Inspection and metrology using broadband infrared radiation
|
US11067389B2
(en)
|
2018-03-13 |
2021-07-20 |
Kla Corporation |
Overlay metrology system and method
|
CN111912785B
(zh)
*
|
2020-07-22 |
2023-06-23 |
深圳信息职业技术学院 |
一种光学常数测量方法与光学常数测量设备
|