DE69012373T2 - Verfahren und Vorrichtung zum Trocknen von Substraten nach Behandlung in einer Flüssigkeit. - Google Patents

Verfahren und Vorrichtung zum Trocknen von Substraten nach Behandlung in einer Flüssigkeit.

Info

Publication number
DE69012373T2
DE69012373T2 DE69012373T DE69012373T DE69012373T2 DE 69012373 T2 DE69012373 T2 DE 69012373T2 DE 69012373 T DE69012373 T DE 69012373T DE 69012373 T DE69012373 T DE 69012373T DE 69012373 T2 DE69012373 T2 DE 69012373T2
Authority
DE
Germany
Prior art keywords
treatment
liquid
drying substrates
substrates
drying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69012373T
Other languages
English (en)
Other versions
DE69012373D1 (de
Inventor
Adriaan Franciscus Ma Leenaars
Oekel Jacques Jules Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NXP BV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of DE69012373D1 publication Critical patent/DE69012373D1/de
Application granted granted Critical
Publication of DE69012373T2 publication Critical patent/DE69012373T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67023Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00Cleaning and liquid contact with solids
    • Y10S134/902Semiconductor wafer
DE69012373T 1989-02-27 1990-02-21 Verfahren und Vorrichtung zum Trocknen von Substraten nach Behandlung in einer Flüssigkeit. Expired - Lifetime DE69012373T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL8900480A NL8900480A (nl) 1989-02-27 1989-02-27 Werkwijze en inrichting voor het drogen van substraten na behandeling in een vloeistof.

Publications (2)

Publication Number Publication Date
DE69012373D1 DE69012373D1 (de) 1994-10-20
DE69012373T2 true DE69012373T2 (de) 1995-04-20

Family

ID=19854214

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69012373T Expired - Lifetime DE69012373T2 (de) 1989-02-27 1990-02-21 Verfahren und Vorrichtung zum Trocknen von Substraten nach Behandlung in einer Flüssigkeit.

Country Status (7)

Country Link
US (4) US6012472A (de)
EP (1) EP0385536B1 (de)
JP (1) JP3009699B2 (de)
KR (1) KR0173449B1 (de)
CN (1) CN1023450C (de)
DE (1) DE69012373T2 (de)
NL (1) NL8900480A (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013102545A1 (de) 2012-04-27 2013-10-31 Awt Advanced Wet Technologies Gmbh Verfahren zum Behandeln von zumindest einem Substrat in einem flüssigen Medium

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013102545A1 (de) 2012-04-27 2013-10-31 Awt Advanced Wet Technologies Gmbh Verfahren zum Behandeln von zumindest einem Substrat in einem flüssigen Medium
WO2013160428A1 (de) 2012-04-27 2013-10-31 Awt Advanced Wet Technologies Gmbh Verfahren zum behandeln von zumindest einem substrat in einem flüssigen medium

Also Published As

Publication number Publication date
CN1023450C (zh) 1994-01-12
CN1045539A (zh) 1990-09-26
US6533872B1 (en) 2003-03-18
EP0385536A1 (de) 1990-09-05
US6170495B1 (en) 2001-01-09
DE69012373D1 (de) 1994-10-20
KR900013597A (ko) 1990-09-06
KR0173449B1 (ko) 1999-04-01
EP0385536B1 (de) 1994-09-14
NL8900480A (nl) 1990-09-17
US6012472A (en) 2000-01-11
JPH02291128A (ja) 1990-11-30
JP3009699B2 (ja) 2000-02-14
US6139645A (en) 2000-10-31

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