DE68916447T2 - Vorrichtung für die Determination der Temperatur von Wafern oder Dünnschichten. - Google Patents

Vorrichtung für die Determination der Temperatur von Wafern oder Dünnschichten.

Info

Publication number
DE68916447T2
DE68916447T2 DE68916447T DE68916447T DE68916447T2 DE 68916447 T2 DE68916447 T2 DE 68916447T2 DE 68916447 T DE68916447 T DE 68916447T DE 68916447 T DE68916447 T DE 68916447T DE 68916447 T2 DE68916447 T2 DE 68916447T2
Authority
DE
Germany
Prior art keywords
wafers
determination
temperature
thin layers
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68916447T
Other languages
English (en)
Other versions
DE68916447D1 (de
Inventor
Avraham Amith
Charles Naselli
C Scott Nevin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Standard Electric Corp
Original Assignee
International Standard Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Standard Electric Corp filed Critical International Standard Electric Corp
Application granted granted Critical
Publication of DE68916447D1 publication Critical patent/DE68916447D1/de
Publication of DE68916447T2 publication Critical patent/DE68916447T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
    • G01K11/00—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00
    • G01K11/12—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00 using changes in colour, translucency or reflectance
DE68916447T 1988-02-17 1989-02-16 Vorrichtung für die Determination der Temperatur von Wafern oder Dünnschichten. Expired - Fee Related DE68916447T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/157,196 US4890933A (en) 1988-02-17 1988-02-17 Transmission method to determine and control the temperature of wafers or thin layers with special application to semiconductors

Publications (2)

Publication Number Publication Date
DE68916447D1 DE68916447D1 (de) 1994-08-04
DE68916447T2 true DE68916447T2 (de) 1994-10-13

Family

ID=22562716

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68916447T Expired - Fee Related DE68916447T2 (de) 1988-02-17 1989-02-16 Vorrichtung für die Determination der Temperatur von Wafern oder Dünnschichten.

Country Status (4)

Country Link
US (1) US4890933A (de)
EP (1) EP0329447B1 (de)
JP (1) JPH0214543A (de)
DE (1) DE68916447T2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007035609A1 (de) * 2007-07-30 2009-02-05 Ivoclar Vivadent Ag Verfahren zur optischen Kontrolle des Verlaufs von einem auf einer Oberfläche eines Körpers erfolgenden physikalischen und/oder chemischen Prozesses

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5098199A (en) * 1988-02-17 1992-03-24 Itt Corporation Reflectance method to determine and control the temperature of thin layers or wafers and their surfaces with special application to semiconductors
US5258602A (en) * 1988-02-17 1993-11-02 Itt Corporation Technique for precision temperature measurements of a semiconductor layer or wafer, based on its optical properties at selected wavelengths
GB2238868A (en) * 1989-11-22 1991-06-12 Res Corp Technologies Inc Silicon wafer temperature measurement by optical transmission monitoring.
US5118200A (en) * 1990-06-13 1992-06-02 Varian Associates, Inc. Method and apparatus for temperature measurements
US5213985A (en) * 1991-05-22 1993-05-25 Bell Communications Research, Inc. Temperature measurement in a processing chamber using in-situ monitoring of photoluminescence
US5313044A (en) * 1992-04-28 1994-05-17 Duke University Method and apparatus for real-time wafer temperature and thin film growth measurement and control in a lamp-heated rapid thermal processor
KR100255961B1 (ko) * 1994-03-11 2000-05-01 아끼구사 나오유끼 물리량 측정방법 및 장치, 반도체 장치의 제조방법과 파장측정방법 및 장치
US5772323A (en) * 1994-10-26 1998-06-30 Felice; Ralph A. Temperature determining device and process
US6349270B1 (en) * 1999-05-27 2002-02-19 Emcore Corporation Method and apparatus for measuring the temperature of objects on a fast moving holder
US20020147510A1 (en) * 2001-01-29 2002-10-10 Francis Robert Henry Process for rapidly controlling a process variable without overshoot using a time domain polynomial feedback controller.
US6563092B1 (en) 2001-11-28 2003-05-13 Novellus Systems, Inc. Measurement of substrate temperature in a process chamber using non-contact filtered infrared pyrometry
US7734439B2 (en) 2002-06-24 2010-06-08 Mattson Technology, Inc. System and process for calibrating pyrometers in thermal processing chambers
US7543981B2 (en) * 2006-06-29 2009-06-09 Mattson Technology, Inc. Methods for determining wafer temperature
DE102007042779B4 (de) * 2007-09-07 2009-07-09 Mattson Thermal Products Gmbh Kalibrationssubstrat und -verfahren
US7976216B2 (en) * 2007-12-20 2011-07-12 Mattson Technology, Inc. Determining the temperature of silicon at high temperatures
JP5195905B2 (ja) * 2008-03-28 2013-05-15 コニカミノルタオプティクス株式会社 分光特性測定システム
JP5232250B2 (ja) * 2008-12-26 2013-07-10 有限会社ワイ・システムズ 半導体成膜時の温度測定方法
CN102484085B (zh) * 2009-06-19 2014-08-20 K-空间协会公司 利用光学吸收边波长测量薄膜的温度

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1811022C3 (de) * 1968-11-26 1978-04-27 Institut Metallurgii Im. A.A. Bajkowa, Moskau Einrichtung zur Regelung der Farbtemperatur eines Objektes mittels zwei Strahlungsstromen
US3672221A (en) * 1969-12-19 1972-06-27 Monsanto Co Temperature sensor
US4302970A (en) * 1980-05-09 1981-12-01 United Technologies Corporation Optical temperature probe employing rare earth absorption
SE423752B (sv) * 1980-09-29 1982-05-24 Asea Ab Optiskt sensorelement
DE3202981A1 (de) * 1982-01-29 1983-08-11 Eugen 7547 Wildbad Riexinger Vorrichtung zum aufheizen des endes eines kunststoffrohres, insbesondere aus vernetztem polyaethylen
JPS59111027A (ja) * 1982-12-17 1984-06-27 Fuji Electric Corp Res & Dev Ltd 温度測定方法
JPS59160725A (ja) * 1983-03-04 1984-09-11 Canon Inc 光学温度計
JPS59170738A (ja) * 1983-03-16 1984-09-27 Mitsubishi Electric Corp 温度測定装置
GB8418063D0 (en) * 1984-07-16 1984-08-22 Atomic Energy Authority Uk Temperature control in vacuum
JPS6154184A (ja) * 1984-08-22 1986-03-18 株式会社チノー 加熱処理装置
KR900005778B1 (ko) * 1984-10-17 1990-08-11 미쓰비시전기 주식회사 온도측정장치
JPS61228637A (ja) * 1985-04-01 1986-10-11 Dainippon Screen Mfg Co Ltd 温度測定装置を付設した加熱装置
US4708677A (en) * 1985-12-27 1987-11-24 Itt Electro Optical Products, A Division Of Itt Corporation Method of measuring the temperature of a photocathode
US4790669A (en) * 1986-04-08 1988-12-13 Cv Technology, Inc. Spectroscopic method and apparatus for optically measuring temperature

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007035609A1 (de) * 2007-07-30 2009-02-05 Ivoclar Vivadent Ag Verfahren zur optischen Kontrolle des Verlaufs von einem auf einer Oberfläche eines Körpers erfolgenden physikalischen und/oder chemischen Prozesses
US7995195B2 (en) 2007-07-30 2011-08-09 Ivoclar Vivadent Ag Method of optically monitoring the progression of a physical and/or chemical process taking place on a surface of a body
DE102007035609B4 (de) 2007-07-30 2021-09-16 Ivoclar Vivadent Ag Verfahren zur optischen Kontrolle des Verlaufs von einem auf einer Oberfläche eines Körpers erfolgenden physikalischen und/oder chemischen Prozesses

Also Published As

Publication number Publication date
EP0329447B1 (de) 1994-06-29
DE68916447D1 (de) 1994-08-04
EP0329447A2 (de) 1989-08-23
JPH0214543A (ja) 1990-01-18
US4890933A (en) 1990-01-02
EP0329447A3 (en) 1990-05-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee