DE68916447D1 - Vorrichtung für die Determination der Temperatur von Wafern oder Dünnschichten. - Google Patents
Vorrichtung für die Determination der Temperatur von Wafern oder Dünnschichten.Info
- Publication number
- DE68916447D1 DE68916447D1 DE68916447T DE68916447T DE68916447D1 DE 68916447 D1 DE68916447 D1 DE 68916447D1 DE 68916447 T DE68916447 T DE 68916447T DE 68916447 T DE68916447 T DE 68916447T DE 68916447 D1 DE68916447 D1 DE 68916447D1
- Authority
- DE
- Germany
- Prior art keywords
- wafers
- determination
- temperature
- thin layers
- layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K11/00—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00
- G01K11/12—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00 using changes in colour, translucency or reflectance
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/157,196 US4890933A (en) | 1988-02-17 | 1988-02-17 | Transmission method to determine and control the temperature of wafers or thin layers with special application to semiconductors |
Publications (2)
Publication Number | Publication Date |
---|---|
DE68916447D1 true DE68916447D1 (de) | 1994-08-04 |
DE68916447T2 DE68916447T2 (de) | 1994-10-13 |
Family
ID=22562716
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE68916447T Expired - Fee Related DE68916447T2 (de) | 1988-02-17 | 1989-02-16 | Vorrichtung für die Determination der Temperatur von Wafern oder Dünnschichten. |
Country Status (4)
Country | Link |
---|---|
US (1) | US4890933A (de) |
EP (1) | EP0329447B1 (de) |
JP (1) | JPH0214543A (de) |
DE (1) | DE68916447T2 (de) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5258602A (en) * | 1988-02-17 | 1993-11-02 | Itt Corporation | Technique for precision temperature measurements of a semiconductor layer or wafer, based on its optical properties at selected wavelengths |
US5098199A (en) * | 1988-02-17 | 1992-03-24 | Itt Corporation | Reflectance method to determine and control the temperature of thin layers or wafers and their surfaces with special application to semiconductors |
GB2238868A (en) * | 1989-11-22 | 1991-06-12 | Res Corp Technologies Inc | Silicon wafer temperature measurement by optical transmission monitoring. |
US5118200A (en) * | 1990-06-13 | 1992-06-02 | Varian Associates, Inc. | Method and apparatus for temperature measurements |
US5213985A (en) * | 1991-05-22 | 1993-05-25 | Bell Communications Research, Inc. | Temperature measurement in a processing chamber using in-situ monitoring of photoluminescence |
US5313044A (en) * | 1992-04-28 | 1994-05-17 | Duke University | Method and apparatus for real-time wafer temperature and thin film growth measurement and control in a lamp-heated rapid thermal processor |
KR100255961B1 (ko) * | 1994-03-11 | 2000-05-01 | 아끼구사 나오유끼 | 물리량 측정방법 및 장치, 반도체 장치의 제조방법과 파장측정방법 및 장치 |
US5772323A (en) * | 1994-10-26 | 1998-06-30 | Felice; Ralph A. | Temperature determining device and process |
US6349270B1 (en) * | 1999-05-27 | 2002-02-19 | Emcore Corporation | Method and apparatus for measuring the temperature of objects on a fast moving holder |
US20020147510A1 (en) * | 2001-01-29 | 2002-10-10 | Francis Robert Henry | Process for rapidly controlling a process variable without overshoot using a time domain polynomial feedback controller. |
US6563092B1 (en) | 2001-11-28 | 2003-05-13 | Novellus Systems, Inc. | Measurement of substrate temperature in a process chamber using non-contact filtered infrared pyrometry |
US7734439B2 (en) * | 2002-06-24 | 2010-06-08 | Mattson Technology, Inc. | System and process for calibrating pyrometers in thermal processing chambers |
US7543981B2 (en) * | 2006-06-29 | 2009-06-09 | Mattson Technology, Inc. | Methods for determining wafer temperature |
DE102007035609B4 (de) * | 2007-07-30 | 2021-09-16 | Ivoclar Vivadent Ag | Verfahren zur optischen Kontrolle des Verlaufs von einem auf einer Oberfläche eines Körpers erfolgenden physikalischen und/oder chemischen Prozesses |
DE102007042779B4 (de) | 2007-09-07 | 2009-07-09 | Mattson Thermal Products Gmbh | Kalibrationssubstrat und -verfahren |
US7976216B2 (en) * | 2007-12-20 | 2011-07-12 | Mattson Technology, Inc. | Determining the temperature of silicon at high temperatures |
JP5195905B2 (ja) * | 2008-03-28 | 2013-05-15 | コニカミノルタオプティクス株式会社 | 分光特性測定システム |
EP2372752B1 (de) * | 2008-12-26 | 2017-01-18 | Y Systems Ltd. | Verfahren und einrichtung zur temperaturmessung während der abscheidung von halbleiter |
CN102484085B (zh) * | 2009-06-19 | 2014-08-20 | K-空间协会公司 | 利用光学吸收边波长测量薄膜的温度 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1811022C3 (de) * | 1968-11-26 | 1978-04-27 | Institut Metallurgii Im. A.A. Bajkowa, Moskau | Einrichtung zur Regelung der Farbtemperatur eines Objektes mittels zwei Strahlungsstromen |
US3672221A (en) * | 1969-12-19 | 1972-06-27 | Monsanto Co | Temperature sensor |
US4302970A (en) * | 1980-05-09 | 1981-12-01 | United Technologies Corporation | Optical temperature probe employing rare earth absorption |
SE423752B (sv) * | 1980-09-29 | 1982-05-24 | Asea Ab | Optiskt sensorelement |
DE3202981A1 (de) * | 1982-01-29 | 1983-08-11 | Eugen 7547 Wildbad Riexinger | Vorrichtung zum aufheizen des endes eines kunststoffrohres, insbesondere aus vernetztem polyaethylen |
JPS59111027A (ja) * | 1982-12-17 | 1984-06-27 | Fuji Electric Corp Res & Dev Ltd | 温度測定方法 |
JPS59160725A (ja) * | 1983-03-04 | 1984-09-11 | Canon Inc | 光学温度計 |
JPS59170738A (ja) * | 1983-03-16 | 1984-09-27 | Mitsubishi Electric Corp | 温度測定装置 |
GB8418063D0 (en) * | 1984-07-16 | 1984-08-22 | Atomic Energy Authority Uk | Temperature control in vacuum |
JPS6154184A (ja) * | 1984-08-22 | 1986-03-18 | 株式会社チノー | 加熱処理装置 |
KR900005778B1 (ko) * | 1984-10-17 | 1990-08-11 | 미쓰비시전기 주식회사 | 온도측정장치 |
JPS61228637A (ja) * | 1985-04-01 | 1986-10-11 | Dainippon Screen Mfg Co Ltd | 温度測定装置を付設した加熱装置 |
US4708677A (en) * | 1985-12-27 | 1987-11-24 | Itt Electro Optical Products, A Division Of Itt Corporation | Method of measuring the temperature of a photocathode |
US4790669A (en) * | 1986-04-08 | 1988-12-13 | Cv Technology, Inc. | Spectroscopic method and apparatus for optically measuring temperature |
-
1988
- 1988-02-17 US US07/157,196 patent/US4890933A/en not_active Expired - Fee Related
-
1989
- 1989-02-16 DE DE68916447T patent/DE68916447T2/de not_active Expired - Fee Related
- 1989-02-16 JP JP1035184A patent/JPH0214543A/ja active Pending
- 1989-02-16 EP EP89301517A patent/EP0329447B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0329447A2 (de) | 1989-08-23 |
EP0329447B1 (de) | 1994-06-29 |
DE68916447T2 (de) | 1994-10-13 |
EP0329447A3 (en) | 1990-05-16 |
JPH0214543A (ja) | 1990-01-18 |
US4890933A (en) | 1990-01-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |