DE60323726D1 - Bebilderbare, positiv arbeitende reflexvermindernde unterschicht - Google Patents
Bebilderbare, positiv arbeitende reflexvermindernde unterschichtInfo
- Publication number
- DE60323726D1 DE60323726D1 DE60323726T DE60323726T DE60323726D1 DE 60323726 D1 DE60323726 D1 DE 60323726D1 DE 60323726 T DE60323726 T DE 60323726T DE 60323726 T DE60323726 T DE 60323726T DE 60323726 D1 DE60323726 D1 DE 60323726D1
- Authority
- DE
- Germany
- Prior art keywords
- relates
- antireflective coating
- photoimageable
- composition
- novel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000203 mixture Substances 0.000 abstract 7
- 239000006117 anti-reflective coating Substances 0.000 abstract 5
- 238000000034 method Methods 0.000 abstract 4
- 239000002253 acid Substances 0.000 abstract 3
- 229920000642 polymer Polymers 0.000 abstract 3
- 239000003513 alkali Substances 0.000 abstract 1
- 238000003384 imaging method Methods 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61P—SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
- A61P29/00—Non-central analgesic, antipyretic or antiinflammatory agents, e.g. antirheumatic agents; Non-steroidal antiinflammatory drugs [NSAID]
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/042,532 US6844131B2 (en) | 2002-01-09 | 2002-01-09 | Positive-working photoimageable bottom antireflective coating |
| PCT/EP2003/000022 WO2003057678A1 (en) | 2002-01-09 | 2003-01-03 | Positive-working photoimageable bottom antireflective coating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE60323726D1 true DE60323726D1 (de) | 2008-11-06 |
Family
ID=21922430
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60323726T Expired - Lifetime DE60323726D1 (de) | 2002-01-09 | 2003-01-03 | Bebilderbare, positiv arbeitende reflexvermindernde unterschicht |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US6844131B2 (de) |
| EP (1) | EP1465877B1 (de) |
| JP (1) | JP2005517972A (de) |
| KR (3) | KR101020685B1 (de) |
| CN (2) | CN100526982C (de) |
| AT (1) | ATE409183T1 (de) |
| DE (1) | DE60323726D1 (de) |
| MY (1) | MY132774A (de) |
| TW (1) | TWI295412B (de) |
| WO (1) | WO2003057678A1 (de) |
Families Citing this family (116)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6824879B2 (en) | 1999-06-10 | 2004-11-30 | Honeywell International Inc. | Spin-on-glass anti-reflective coatings for photolithography |
| KR100804873B1 (ko) * | 1999-06-10 | 2008-02-20 | 얼라이드시그날 인코퍼레이티드 | 포토리소그래피용 ｓｏｇ 반사방지 코팅 |
| JP4694686B2 (ja) * | 2000-08-31 | 2011-06-08 | 東京応化工業株式会社 | 半導体素子製造方法 |
| TW591341B (en) | 2001-09-26 | 2004-06-11 | Shipley Co Llc | Coating compositions for use with an overcoated photoresist |
| KR20040066124A (ko) * | 2001-11-15 | 2004-07-23 | 허니웰 인터내셔널 인코포레이티드 | 포토리소그라피용 스핀온 반사 방지 피막 |
| US20030215736A1 (en) * | 2002-01-09 | 2003-11-20 | Oberlander Joseph E. | Negative-working photoimageable bottom antireflective coating |
| US7070914B2 (en) * | 2002-01-09 | 2006-07-04 | Az Electronic Materials Usa Corp. | Process for producing an image using a first minimum bottom antireflective coating composition |
| US8012670B2 (en) | 2002-04-11 | 2011-09-06 | Rohm And Haas Electronic Materials Llc | Photoresist systems |
| US7265431B2 (en) * | 2002-05-17 | 2007-09-04 | Intel Corporation | Imageable bottom anti-reflective coating for high resolution lithography |
| US7108958B2 (en) | 2002-07-31 | 2006-09-19 | Brewer Science Inc. | Photosensitive bottom anti-reflective coatings |
| AU2002357645A1 (en) * | 2002-09-20 | 2004-04-08 | Honeywell International, Inc. | Interlayer adhesion promoter for low k materials |
| US20040067437A1 (en) * | 2002-10-06 | 2004-04-08 | Shipley Company, L.L.C. | Coating compositions for use with an overcoated photoresist |
| JP2004206082A (ja) * | 2002-11-20 | 2004-07-22 | Rohm & Haas Electronic Materials Llc | 多層フォトレジスト系 |
| KR20040044368A (ko) * | 2002-11-20 | 2004-05-28 | 쉬플리 캄파니, 엘.엘.씨. | 다층 포토레지스트 시스템 |
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| US7384727B2 (en) * | 2003-06-26 | 2008-06-10 | Micron Technology, Inc. | Semiconductor processing patterning methods |
| TWI358612B (en) | 2003-08-28 | 2012-02-21 | Nissan Chemical Ind Ltd | Polyamic acid-containing composition for forming a |
| US7115532B2 (en) | 2003-09-05 | 2006-10-03 | Micron Technolgoy, Inc. | Methods of forming patterned photoresist layers over semiconductor substrates |
| US7364835B2 (en) * | 2003-10-15 | 2008-04-29 | Brewer Science Inc. | Developer-soluble materials and methods of using the same in via-first dual damascene applications |
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| US7026243B2 (en) * | 2003-10-20 | 2006-04-11 | Micron Technology, Inc. | Methods of forming conductive material silicides by reaction of metal with silicon |
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| US20070207406A1 (en) * | 2004-04-29 | 2007-09-06 | Guerrero Douglas J | Anti-reflective coatings using vinyl ether crosslinkers |
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| US20060255315A1 (en) * | 2004-11-19 | 2006-11-16 | Yellowaga Deborah L | Selective removal chemistries for semiconductor applications, methods of production and uses thereof |
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| KR100662542B1 (ko) * | 2005-06-17 | 2006-12-28 | 제일모직주식회사 | 반사방지 하드마스크 조성물 및 이를 이용하여 기판 상에패턴화된 재료 형상을 형성시키는 방법 |
| EP1742108B1 (de) * | 2005-07-05 | 2015-10-28 | Rohm and Haas Electronic Materials, L.L.C. | Beschichtungszusammensetzungen zur Verwendung mit einem beschichteten Fotolack |
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-
2002
- 2002-01-09 US US10/042,532 patent/US6844131B2/en not_active Expired - Lifetime
- 2002-11-22 TW TW091134076A patent/TWI295412B/zh not_active IP Right Cessation
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2003
- 2003-01-03 KR KR1020107004715A patent/KR101020685B1/ko not_active IP Right Cessation
- 2003-01-03 JP JP2003557995A patent/JP2005517972A/ja active Pending
- 2003-01-03 KR KR1020047010600A patent/KR100970181B1/ko active IP Right Grant
- 2003-01-03 WO PCT/EP2003/000022 patent/WO2003057678A1/en active Application Filing
- 2003-01-03 DE DE60323726T patent/DE60323726D1/de not_active Expired - Lifetime
- 2003-01-03 EP EP03706347A patent/EP1465877B1/de not_active Expired - Lifetime
- 2003-01-03 KR KR1020107004713A patent/KR100970182B1/ko active IP Right Grant
- 2003-01-03 AT AT03706347T patent/ATE409183T1/de not_active IP Right Cessation
- 2003-01-03 CN CNB038020653A patent/CN100526982C/zh not_active Expired - Fee Related
- 2003-01-03 CN CNA2008102100085A patent/CN101408729A/zh active Pending
- 2003-01-07 MY MYPI20030039A patent/MY132774A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| EP1465877A1 (de) | 2004-10-13 |
| CN1615302A (zh) | 2005-05-11 |
| KR100970181B1 (ko) | 2010-07-14 |
| KR100970182B1 (ko) | 2010-07-14 |
| TW200301847A (en) | 2003-07-16 |
| TWI295412B (en) | 2008-04-01 |
| KR20040078120A (ko) | 2004-09-08 |
| ATE409183T1 (de) | 2008-10-15 |
| EP1465877B1 (de) | 2008-09-24 |
| KR20100039436A (ko) | 2010-04-15 |
| JP2005517972A (ja) | 2005-06-16 |
| MY132774A (en) | 2007-10-31 |
| WO2003057678A1 (en) | 2003-07-17 |
| WO2003057678A8 (en) | 2004-12-29 |
| US6844131B2 (en) | 2005-01-18 |
| KR101020685B1 (ko) | 2011-03-11 |
| US20030129531A1 (en) | 2003-07-10 |
| KR20100039437A (ko) | 2010-04-15 |
| CN101408729A (zh) | 2009-04-15 |
| CN100526982C (zh) | 2009-08-12 |
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