DE60232857D1 - Befestigen von schutzkappen auf wafer-ebene - Google Patents

Befestigen von schutzkappen auf wafer-ebene

Info

Publication number
DE60232857D1
DE60232857D1 DE60232857T DE60232857T DE60232857D1 DE 60232857 D1 DE60232857 D1 DE 60232857D1 DE 60232857 T DE60232857 T DE 60232857T DE 60232857 T DE60232857 T DE 60232857T DE 60232857 D1 DE60232857 D1 DE 60232857D1
Authority
DE
Germany
Prior art keywords
wafer level
tool
array
caps
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60232857T
Other languages
English (en)
Inventor
Kia Silverbrook
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Silverbrook Research Pty Ltd
Original Assignee
Silverbrook Research Pty Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Silverbrook Research Pty Ltd filed Critical Silverbrook Research Pty Ltd
Application granted granted Critical
Publication of DE60232857D1 publication Critical patent/DE60232857D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00261Processes for packaging MEMS devices
    • B81C1/00333Aspects relating to packaging of MEMS devices, not covered by groups B81C1/00269 - B81C1/00325
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32Component parts, details or accessories; Auxiliary operations
    • B29C43/36Moulds for making articles of definite length, i.e. discrete articles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0822Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using IR radiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32Component parts, details or accessories; Auxiliary operations
    • B29C43/50Removing moulded articles
    • B29C2043/503Removing moulded articles using ejector pins, rods
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/0022Multi-cavity moulds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/38Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B29C33/3842Manufacturing moulds, e.g. shaping the mould surface by machining
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00Forming microstructural systems
    • B81C2203/01Packaging MEMS
    • B81C2203/0109Bonding an individual cap on the substrate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00Forming microstructural systems
    • B81C2203/01Packaging MEMS
    • B81C2203/0127Using a carrier for applying a plurality of packaging lids to the system wafer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/146Mixed devices
    • H01L2924/1461MEMS
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S257/00Active solid-state devices, e.g. transistors, solid-state diodes
    • Y10S257/924Active solid-state devices, e.g. transistors, solid-state diodes with passive device, e.g. capacitor, or battery, as integral part of housing or housing element, e.g. cap
DE60232857T 2001-01-10 2002-01-08 Befestigen von schutzkappen auf wafer-ebene Expired - Lifetime DE60232857D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
AUPR2448A AUPR244801A0 (en) 2001-01-10 2001-01-10 A method and apparatus (WSM01)
PCT/AU2002/000008 WO2002056367A1 (en) 2001-01-10 2002-01-08 Wafer scale molding of protective caps

Publications (1)

Publication Number Publication Date
DE60232857D1 true DE60232857D1 (de) 2009-08-20

Family

ID=3826483

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60232857T Expired - Lifetime DE60232857D1 (de) 2001-01-10 2002-01-08 Befestigen von schutzkappen auf wafer-ebene

Country Status (7)

Country Link
US (11) US6716666B2 (de)
EP (1) EP1356510B1 (de)
JP (1) JP3962688B2 (de)
AT (1) ATE436091T1 (de)
AU (1) AUPR244801A0 (de)
DE (1) DE60232857D1 (de)
WO (1) WO2002056367A1 (de)

Families Citing this family (74)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AUPR244801A0 (en) * 2001-01-10 2001-02-01 Silverbrook Research Pty Ltd A method and apparatus (WSM01)
US6890834B2 (en) 2001-06-11 2005-05-10 Matsushita Electric Industrial Co., Ltd. Electronic device and method for manufacturing the same
US6952046B2 (en) 2002-06-19 2005-10-04 Foster-Miller, Inc. Electronic and optoelectronic component packaging technique
US20050077603A1 (en) * 2003-10-08 2005-04-14 Dylan Yu Method and structure for a wafer level packaging
DE102004004476B3 (de) * 2004-01-28 2005-07-07 Infineon Technologies Ag Verfahren zum Aufbringen von Deckelstrukturen mittels eines biegsamen Trägers
US7109580B2 (en) * 2004-03-03 2006-09-19 Hymite A/S Hermetically sealed package for optical, electronic, opto-electronic and other devices
US7300812B2 (en) 2004-10-29 2007-11-27 Hewlett-Packard Development Coompany, L.P. Micro electrical mechanical system
KR101313391B1 (ko) 2004-11-03 2013-10-01 테세라, 인코포레이티드 적층형 패키징
JP2007139576A (ja) * 2005-11-18 2007-06-07 Denso Corp 半導体力学量センサの製造方法
US8058101B2 (en) 2005-12-23 2011-11-15 Tessera, Inc. Microelectronic packages and methods therefor
JP4893281B2 (ja) * 2006-04-03 2012-03-07 株式会社デンソー カバーキャップの取付構造
US7763488B2 (en) * 2006-06-05 2010-07-27 Akustica, Inc. Method of fabricating MEMS device
US20070284681A1 (en) * 2006-06-12 2007-12-13 Intermec Ip Corp. Apparatus and method for protective covering of microelectromechanical system (mems) devices
KR100773563B1 (ko) * 2006-11-14 2007-11-07 삼성전자주식회사 미세유체 처리 소자를 포함한 미세유체 처리 장치 및 이의제조방법
US20080128620A1 (en) * 2006-12-04 2008-06-05 Krellner Theodore J Method of making a thermopile detector and package
US7851333B2 (en) * 2007-03-15 2010-12-14 Infineon Technologies Ag Apparatus comprising a device and method for producing it
EP2098478A1 (de) 2008-03-07 2009-09-09 Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO Herstellung von Mikrokomponenten mit einer Abdeckungsstruktur
KR101102684B1 (ko) * 2009-11-27 2012-01-05 주식회사 하이닉스반도체 웨이퍼 및 그 형성 방법
KR101102685B1 (ko) * 2009-11-27 2012-01-05 주식회사 하이닉스반도체 웨이퍼 및 그 형성 방법
US9159708B2 (en) 2010-07-19 2015-10-13 Tessera, Inc. Stackable molded microelectronic packages with area array unit connectors
US8482111B2 (en) 2010-07-19 2013-07-09 Tessera, Inc. Stackable molded microelectronic packages
KR101075241B1 (ko) 2010-11-15 2011-11-01 테세라, 인코포레이티드 유전체 부재에 단자를 구비하는 마이크로전자 패키지
US20120146206A1 (en) 2010-12-13 2012-06-14 Tessera Research Llc Pin attachment
US8618659B2 (en) 2011-05-03 2013-12-31 Tessera, Inc. Package-on-package assembly with wire bonds to encapsulation surface
KR101128063B1 (ko) 2011-05-03 2012-04-23 테세라, 인코포레이티드 캡슐화 층의 표면에 와이어 본드를 구비하는 패키지 적층형 어셈블리
TWI417973B (zh) * 2011-07-11 2013-12-01 矽品精密工業股份有限公司 具微機電元件之封裝結構之製法
US9105483B2 (en) 2011-10-17 2015-08-11 Invensas Corporation Package-on-package assembly with wire bond vias
US9412717B2 (en) * 2011-11-04 2016-08-09 Taiwan Semiconductor Manufacturing Company, Ltd. Apparatus and methods for molded underfills in flip chip packaging
US8946757B2 (en) 2012-02-17 2015-02-03 Invensas Corporation Heat spreading substrate with embedded interconnects
US8372741B1 (en) 2012-02-24 2013-02-12 Invensas Corporation Method for package-on-package assembly with wire bonds to encapsulation surface
US9349706B2 (en) 2012-02-24 2016-05-24 Invensas Corporation Method for package-on-package assembly with wire bonds to encapsulation surface
US9202754B2 (en) 2012-04-23 2015-12-01 Seagate Technology Llc Laser submounts formed using etching process
US8835228B2 (en) 2012-05-22 2014-09-16 Invensas Corporation Substrate-less stackable package with wire-bond interconnect
US9391008B2 (en) 2012-07-31 2016-07-12 Invensas Corporation Reconstituted wafer-level package DRAM
US9502390B2 (en) 2012-08-03 2016-11-22 Invensas Corporation BVA interposer
US8975738B2 (en) 2012-11-12 2015-03-10 Invensas Corporation Structure for microelectronic packaging with terminals on dielectric mass
US8878353B2 (en) 2012-12-20 2014-11-04 Invensas Corporation Structure for microelectronic packaging with bond elements to encapsulation surface
US9136254B2 (en) 2013-02-01 2015-09-15 Invensas Corporation Microelectronic package having wire bond vias and stiffening layer
US9023691B2 (en) 2013-07-15 2015-05-05 Invensas Corporation Microelectronic assemblies with stack terminals coupled by connectors extending through encapsulation
US8883563B1 (en) 2013-07-15 2014-11-11 Invensas Corporation Fabrication of microelectronic assemblies having stack terminals coupled by connectors extending through encapsulation
US9034696B2 (en) 2013-07-15 2015-05-19 Invensas Corporation Microelectronic assemblies having reinforcing collars on connectors extending through encapsulation
US9167710B2 (en) 2013-08-07 2015-10-20 Invensas Corporation Embedded packaging with preformed vias
US9685365B2 (en) 2013-08-08 2017-06-20 Invensas Corporation Method of forming a wire bond having a free end
US20150076714A1 (en) 2013-09-16 2015-03-19 Invensas Corporation Microelectronic element with bond elements to encapsulation surface
US9530752B2 (en) * 2013-11-11 2016-12-27 Infineon Technologies Ag Method for forming electronic components
US9087815B2 (en) 2013-11-12 2015-07-21 Invensas Corporation Off substrate kinking of bond wire
US9082753B2 (en) 2013-11-12 2015-07-14 Invensas Corporation Severing bond wire by kinking and twisting
US9263394B2 (en) 2013-11-22 2016-02-16 Invensas Corporation Multiple bond via arrays of different wire heights on a same substrate
US9379074B2 (en) 2013-11-22 2016-06-28 Invensas Corporation Die stacks with one or more bond via arrays of wire bond wires and with one or more arrays of bump interconnects
US9583456B2 (en) 2013-11-22 2017-02-28 Invensas Corporation Multiple bond via arrays of different wire heights on a same substrate
US9583411B2 (en) 2014-01-17 2017-02-28 Invensas Corporation Fine pitch BVA using reconstituted wafer with area array accessible for testing
US9214454B2 (en) 2014-03-31 2015-12-15 Invensas Corporation Batch process fabrication of package-on-package microelectronic assemblies
US10381326B2 (en) 2014-05-28 2019-08-13 Invensas Corporation Structure and method for integrated circuits packaging with increased density
US9646917B2 (en) 2014-05-29 2017-05-09 Invensas Corporation Low CTE component with wire bond interconnects
US9412714B2 (en) 2014-05-30 2016-08-09 Invensas Corporation Wire bond support structure and microelectronic package including wire bonds therefrom
US9735084B2 (en) 2014-12-11 2017-08-15 Invensas Corporation Bond via array for thermal conductivity
US9888579B2 (en) 2015-03-05 2018-02-06 Invensas Corporation Pressing of wire bond wire tips to provide bent-over tips
US9502372B1 (en) 2015-04-30 2016-11-22 Invensas Corporation Wafer-level packaging using wire bond wires in place of a redistribution layer
US9761554B2 (en) 2015-05-07 2017-09-12 Invensas Corporation Ball bonding metal wire bond wires to metal pads
US9490222B1 (en) 2015-10-12 2016-11-08 Invensas Corporation Wire bond wires for interference shielding
US10490528B2 (en) 2015-10-12 2019-11-26 Invensas Corporation Embedded wire bond wires
US10332854B2 (en) 2015-10-23 2019-06-25 Invensas Corporation Anchoring structure of fine pitch bva
US10181457B2 (en) 2015-10-26 2019-01-15 Invensas Corporation Microelectronic package for wafer-level chip scale packaging with fan-out
US9911718B2 (en) 2015-11-17 2018-03-06 Invensas Corporation ‘RDL-First’ packaged microelectronic device for a package-on-package device
US9659848B1 (en) 2015-11-18 2017-05-23 Invensas Corporation Stiffened wires for offset BVA
US9984992B2 (en) 2015-12-30 2018-05-29 Invensas Corporation Embedded wire bond wires for vertical integration with separate surface mount and wire bond mounting surfaces
DE102016113347A1 (de) 2016-07-20 2018-01-25 Infineon Technologies Ag Verfahren zum produzieren eines halbleitermoduls
US9935075B2 (en) 2016-07-29 2018-04-03 Invensas Corporation Wire bonding method and apparatus for electromagnetic interference shielding
US10299368B2 (en) 2016-12-21 2019-05-21 Invensas Corporation Surface integrated waveguides and circuit structures therefor
JP6973922B2 (ja) * 2017-09-08 2021-12-01 株式会社ディスコ ウェーハの加工方法
JP7098223B2 (ja) * 2017-09-19 2022-07-11 株式会社ディスコ ウェーハの加工方法
JP7098224B2 (ja) * 2017-09-19 2022-07-11 株式会社ディスコ ウェーハの加工方法
JP7098222B2 (ja) * 2017-09-19 2022-07-11 株式会社ディスコ ウェーハの加工方法
US11935777B2 (en) * 2021-12-01 2024-03-19 STATS ChipPAC Pte Ltd. Semiconductor manufacturing equipment and method of providing support base with filling material disposed into openings in semiconductor wafer for support

Family Cites Families (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1145009B (it) * 1981-01-23 1986-11-05 Ima Spa Stampo per macchine confezionatrici di confezioni "blisters"
CH642461A5 (fr) * 1981-07-02 1984-04-13 Centre Electron Horloger Accelerometre.
JPS59127842A (ja) * 1983-01-13 1984-07-23 Toshiba Corp 樹脂モ−ルド装置
US4701999A (en) * 1985-12-17 1987-10-27 Pnc, Inc. Method of making sealed housings containing delicate structures
JPH0810170B2 (ja) * 1987-03-06 1996-01-31 株式会社日立製作所 半導体絶対圧力センサの製造方法
US5179039A (en) * 1988-02-05 1993-01-12 Citizen Watch Co., Ltd. Method of making a resin encapsulated pin grid array with integral heatsink
JPH0623782B2 (ja) * 1988-11-15 1994-03-30 株式会社日立製作所 静電容量式加速度センサ及び半導体圧力センサ
JP2530056B2 (ja) * 1989-09-14 1996-09-04 株式会社東芝 樹脂封止型半導体装置及びその製造方法
US5056296A (en) * 1990-03-30 1991-10-15 R. J. R. Polymers, Inc. Iso-thermal seal process for electronic devices
JP2648638B2 (ja) * 1990-11-30 1997-09-03 三菱マテリアル株式会社 ウェーハの接着方法およびその装置
US5397897A (en) * 1992-04-17 1995-03-14 Terumo Kabushiki Kaisha Infrared sensor and method for production thereof
US5362681A (en) * 1992-07-22 1994-11-08 Anaglog Devices, Inc. Method for separating circuit dies from a wafer
JPH06169197A (ja) * 1992-12-01 1994-06-14 Nec Ibaraki Ltd 回路基板に対するキャップの位置決め方法
US5485037A (en) * 1993-04-12 1996-01-16 Amkor Electronics, Inc. Semiconductor device having a thermal dissipator and electromagnetic shielding
US5388443A (en) * 1993-06-24 1995-02-14 Manaka; Junji Atmosphere sensor and method for manufacturing the sensor
JP3479121B2 (ja) * 1994-08-05 2003-12-15 アピックヤマダ株式会社 Bgaパッケージの樹脂モールド方法
US5597767A (en) * 1995-01-06 1997-01-28 Texas Instruments Incorporated Separation of wafer into die with wafer-level processing
JP3613838B2 (ja) * 1995-05-18 2005-01-26 株式会社デンソー 半導体装置の製造方法
JP3496347B2 (ja) * 1995-07-13 2004-02-09 株式会社デンソー 半導体装置及びその製造方法
US5674785A (en) * 1995-11-27 1997-10-07 Micron Technology, Inc. Method of producing a single piece package for semiconductor die
DE19604405C2 (de) * 1996-02-07 2002-10-10 Micronas Gmbh Verfahren zum Vereinzeln von in einem Körper enthaltenen elektronischen Elementen
JP3357237B2 (ja) * 1996-02-17 2002-12-16 株式会社リコー テスティングマシン
US5798557A (en) * 1996-08-29 1998-08-25 Harris Corporation Lid wafer bond packaging and micromachining
JP3584635B2 (ja) * 1996-10-04 2004-11-04 株式会社デンソー 半導体装置及びその製造方法
US5899443A (en) * 1996-10-22 1999-05-04 The United States Of America As Represented By The Secretary Of The Navy Passive-active vibration isolation
DE19700734B4 (de) * 1997-01-11 2006-06-01 Robert Bosch Gmbh Verfahren zur Herstellung von Sensoren sowie nicht-vereinzelter Waferstapel
US6156273A (en) * 1997-05-27 2000-12-05 Purdue Research Corporation Separation columns and methods for manufacturing the improved separation columns
JP3017470B2 (ja) * 1997-07-11 2000-03-06 アピックヤマダ株式会社 樹脂モールド方法及び樹脂モールド装置
JP3846094B2 (ja) * 1998-03-17 2006-11-15 株式会社デンソー 半導体装置の製造方法
US6136128A (en) * 1998-06-23 2000-10-24 Amerasia International Technology, Inc. Method of making an adhesive preform lid for electronic devices
EP0971401B1 (de) * 1998-07-10 2010-06-09 Apic Yamada Corporation Verfahren zur Herstellung einer Halbleitervorrichtung und Harzformmaschine zu diesem Zweck
JP4151164B2 (ja) * 1999-03-19 2008-09-17 株式会社デンソー 半導体装置の製造方法
WO2000059036A1 (en) * 1999-03-26 2000-10-05 Hitachi, Ltd. Semiconductor module and method of mounting
JP3533984B2 (ja) * 1999-03-26 2004-06-07 松下電工株式会社 半導体加速度センサおよびその製造方法
JP3494586B2 (ja) * 1999-03-26 2004-02-09 アピックヤマダ株式会社 樹脂封止装置及び樹脂封止方法
US6390439B1 (en) * 1999-04-07 2002-05-21 International Business Machines Corporation Hybrid molds for molten solder screening process
KR100331165B1 (ko) * 1999-08-05 2002-04-01 김도열 소자 일괄 제조용 지그 및 이를 이용한 소자 일괄 제조방법
US6452238B1 (en) * 1999-10-04 2002-09-17 Texas Instruments Incorporated MEMS wafer level package
JP2001170721A (ja) * 1999-10-08 2001-06-26 Shinko Electric Ind Co Ltd 凹部を具備する板状体及びその製造方法ならびに凹部形成用プレス金型
US6514789B2 (en) * 1999-10-26 2003-02-04 Motorola, Inc. Component and method for manufacture
JP2001135659A (ja) * 1999-11-09 2001-05-18 Towa Corp 電子部品の樹脂封止成形用金型
US6415505B1 (en) * 1999-11-15 2002-07-09 Amkor Technology, Inc. Micromachine package fabrication method
US6483030B1 (en) * 1999-12-08 2002-11-19 Amkor Technology, Inc. Snap lid image sensor package
US6401545B1 (en) * 2000-01-25 2002-06-11 Motorola, Inc. Micro electro-mechanical system sensor with selective encapsulation and method therefor
US6441481B1 (en) * 2000-04-10 2002-08-27 Analog Devices, Inc. Hermetically sealed microstructure package
JP2002043343A (ja) * 2000-07-25 2002-02-08 Mitsubishi Electric Corp 半導体装置の樹脂封止金型及び半導体装置の樹脂封止方法、並びに樹脂封止半導体装置の離型方法
US6448109B1 (en) * 2000-11-15 2002-09-10 Analog Devices, Inc. Wafer level method of capping multiple MEMS elements
US6946366B2 (en) * 2000-12-05 2005-09-20 Analog Devices, Inc. Method and device for protecting micro electromechanical systems structures during dicing of a wafer
AUPR244801A0 (en) * 2001-01-10 2001-02-01 Silverbrook Research Pty Ltd A method and apparatus (WSM01)
JP2002277753A (ja) 2001-03-21 2002-09-25 Olympus Optical Co Ltd 検査装置
JP2002368028A (ja) * 2001-06-13 2002-12-20 Nec Corp 半導体パッケージ及びその製造方法
US6824674B2 (en) * 2002-05-30 2004-11-30 Equistar Chemicals, Lp Pyrolysis gasoline stabilization

Also Published As

Publication number Publication date
AUPR244801A0 (en) 2001-02-01
US7126216B2 (en) 2006-10-24
US20040082119A1 (en) 2004-04-29
EP1356510A4 (de) 2006-10-11
US6982189B2 (en) 2006-01-03
US6979599B2 (en) 2005-12-27
US20040082104A1 (en) 2004-04-29
WO2002056367A1 (en) 2002-07-18
US20040082105A1 (en) 2004-04-29
US20040101992A1 (en) 2004-05-27
US7008819B2 (en) 2006-03-07
US6812062B2 (en) 2004-11-02
US7026176B2 (en) 2006-04-11
EP1356510A1 (de) 2003-10-29
US6977189B2 (en) 2005-12-20
US6989292B2 (en) 2006-01-24
US20040082115A1 (en) 2004-04-29
US20040121517A1 (en) 2004-06-24
US6716666B2 (en) 2004-04-06
US20040082110A1 (en) 2004-04-29
ATE436091T1 (de) 2009-07-15
US7173332B2 (en) 2007-02-06
US20050042802A1 (en) 2005-02-24
JP3962688B2 (ja) 2007-08-22
US20030092245A1 (en) 2003-05-15
EP1356510B1 (de) 2009-07-08
JP2004523106A (ja) 2004-07-29
US20040079862A1 (en) 2004-04-29
US20020088537A1 (en) 2002-07-11

Similar Documents

Publication Publication Date Title
DE60232857D1 (de) Befestigen von schutzkappen auf wafer-ebene
DE60310222D1 (de) Halbleiterkapselung und verfahren zu ihrer herstellung
ATE533186T1 (de) Halbleiteranordnung und optische vorrichtung
DE50100024D1 (de) Verfahren zur Herstellung einer epitaxierten Halbleiterscheibe
DE69431385T2 (de) Verfahren zur Herstellung von Silizium-Halbleiterplättchen
ATE355933T1 (de) Schleifartikel zur modifizierung einer halbleiterscheibe
AU2002311863A1 (en) Silicon fixtures useful for high temperature wafer processing
WO2005010956A3 (en) Endeffectors for handling semiconductor wafers
DE60234590D1 (de) Nitridhalbleiterlaser
FI970430A0 (fi) Atsa-asparaziinihappo analogeja 1-beta-interleukiinia muuttavan entsyymin inhibiittoreina
ATE86428T1 (de) Substrat fuer erdlose kultur.
DE69824372D1 (de) Vorrichtung zur Exposition der peripheren Fläche eines Halbleiter-Wafers
DE69414534T2 (de) Bonding-Verfahren für Silizium-Wafer
ITRE20020085A1 (it) Impianto per il taglio di lastre ceramiche piane compattate.
DE60333085D1 (de) Leitkörpern
DE3786701D1 (de) Silizium-packungen fuer leistungshalbleiteranordnungen.
DE68909481D1 (de) Siliciumcarbid-diffusionsrohr fuer halbleiter.
KR970702830A (ko) 신규한 탄화규소 더미 웨이퍼(Novel silicon carbide dummy wafer)
IT1192228B (it) Procedimento per la fabbricazione di articoli di nitruro di silicio
DE3671812D1 (de) Verfahren zum einebnen der oberflaeche einer halbleitervorrichtung, die siliziumnitrid als isolierendes material verwendet.
IT7922131A0 (it) Procedimento per la fabbricazione di oggetti di nitruro di silicio.
DE9315056U1 (de) Kühlkörper für Halbleiterbauelemente
ITVR20040049A1 (it) Elemento di protezione per cassoni di veicoli indstriali
AU2002339183A1 (en) Optical probe for wafer scale testing of light-electrical (l-i-v) performance of optoelectronic devices
KR950015661U (ko) 반도체 웨이퍼의 측정장치

Legal Events

Date Code Title Description
8364 No opposition during term of opposition