DE60230680D1 - Verfahren zum herstellen einer struktur für eine einrichtung für mikroelektromechanische systeme (mems) - Google Patents

Verfahren zum herstellen einer struktur für eine einrichtung für mikroelektromechanische systeme (mems)

Info

Publication number
DE60230680D1
DE60230680D1 DE60230680T DE60230680T DE60230680D1 DE 60230680 D1 DE60230680 D1 DE 60230680D1 DE 60230680 T DE60230680 T DE 60230680T DE 60230680 T DE60230680 T DE 60230680T DE 60230680 D1 DE60230680 D1 DE 60230680D1
Authority
DE
Germany
Prior art keywords
layer
stack
layers
mems
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60230680T
Other languages
English (en)
Inventor
Mark W Miles
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Qualcomm MEMS Technologies Inc
Original Assignee
IDC LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by IDC LLC filed Critical IDC LLC
Application granted granted Critical
Publication of DE60230680D1 publication Critical patent/DE60230680D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/001—Optical devices or arrangements for the control of light using movable or deformable optical elements based on interference in an adjustable optical cavity
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
    • B81B7/02—Microstructural systems; Auxiliary parts of microstructural devices or systems containing distinct electrical or optical devices of particular relevance for their function, e.g. microelectro-mechanical systems [MEMS]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00388—Etch mask forming
    • B81C1/00396—Mask characterised by its composition, e.g. multilayer masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/04—Optical MEMS
    • B81B2201/042—Micromirrors, not used as optical switches
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/03—Static structures
    • B81B2203/0315—Cavities
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0102—Surface micromachining
    • B81C2201/0105—Sacrificial layer
    • B81C2201/0109—Sacrificial layers not provided for in B81C2201/0107 - B81C2201/0108
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00—Forming microstructural systems
    • B81C2203/01—Packaging MEMS
    • B81C2203/0136—Growing or depositing of a covering layer
DE60230680T 2002-02-12 2002-04-29 Verfahren zum herstellen einer struktur für eine einrichtung für mikroelektromechanische systeme (mems) Expired - Lifetime DE60230680D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/074,562 US6794119B2 (en) 2002-02-12 2002-02-12 Method for fabricating a structure for a microelectromechanical systems (MEMS) device
PCT/US2002/013442 WO2003069413A1 (en) 2002-02-12 2002-04-29 A method for fabricating a structure for a microelectromechanical systems (mems) device

Publications (1)

Publication Number Publication Date
DE60230680D1 true DE60230680D1 (de) 2009-02-12

Family

ID=27659905

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60230680T Expired - Lifetime DE60230680D1 (de) 2002-02-12 2002-04-29 Verfahren zum herstellen einer struktur für eine einrichtung für mikroelektromechanische systeme (mems)

Country Status (9)

Country Link
US (3) US6794119B2 (de)
EP (2) EP2042466A3 (de)
JP (2) JP4633362B2 (de)
KR (1) KR100947813B1 (de)
CN (2) CN101284643B (de)
AT (1) ATE419561T1 (de)
AU (1) AU2002256386A1 (de)
DE (1) DE60230680D1 (de)
WO (1) WO2003069413A1 (de)

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US20050142684A1 (en) 2005-06-30
CN101284643A (zh) 2008-10-15
JP5031693B2 (ja) 2012-09-19
WO2003069413A1 (en) 2003-08-21
JP2005520694A (ja) 2005-07-14
JP2008290243A (ja) 2008-12-04
EP1485758A4 (de) 2006-09-13
CN100401192C (zh) 2008-07-09
JP4633362B2 (ja) 2011-02-16
KR100947813B1 (ko) 2010-03-15
CN1623122A (zh) 2005-06-01
EP2042466A2 (de) 2009-04-01
EP1485758A1 (de) 2004-12-15
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US20080026328A1 (en) 2008-01-31
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KR20040091034A (ko) 2004-10-27
US7250315B2 (en) 2007-07-31
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US6794119B2 (en) 2004-09-21
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EP2042466A3 (de) 2009-11-11
US7642110B2 (en) 2010-01-05

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