DE60227899D1 - Induktor und Verfahren zu seiner Herstellung - Google Patents

Induktor und Verfahren zu seiner Herstellung

Info

Publication number
DE60227899D1
DE60227899D1 DE60227899T DE60227899T DE60227899D1 DE 60227899 D1 DE60227899 D1 DE 60227899D1 DE 60227899 T DE60227899 T DE 60227899T DE 60227899 T DE60227899 T DE 60227899T DE 60227899 D1 DE60227899 D1 DE 60227899D1
Authority
DE
Germany
Prior art keywords
inductor
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60227899T
Other languages
English (en)
Inventor
Pascal Gardes
Gerard Auriel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STMicroelectronics SA
Original Assignee
STMicroelectronics SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STMicroelectronics SA filed Critical STMicroelectronics SA
Application granted granted Critical
Publication of DE60227899D1 publication Critical patent/DE60227899D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
    • H01L28/10—Inductors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F17/00—Fixed inductances of the signal type 
    • H01F17/0006—Printed inductances
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/04—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
    • H01F41/041—Printed circuit coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10—Bump connectors; Manufacturing methods related thereto
    • H01L2224/11—Manufacturing methods
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155—Manufacturing circuit on or in base
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155—Manufacturing circuit on or in base
    • Y10T29/49165—Manufacturing circuit on or in base by forming conductive walled aperture in base
DE60227899T 2001-10-10 2002-10-09 Induktor und Verfahren zu seiner Herstellung Expired - Fee Related DE60227899D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0113055A FR2830670A1 (fr) 2001-10-10 2001-10-10 Inductance et son procede de fabrication

Publications (1)

Publication Number Publication Date
DE60227899D1 true DE60227899D1 (de) 2008-09-11

Family

ID=8868137

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60227899T Expired - Fee Related DE60227899D1 (de) 2001-10-10 2002-10-09 Induktor und Verfahren zu seiner Herstellung

Country Status (5)

Country Link
US (1) US7404249B2 (de)
EP (1) EP1302955B1 (de)
KR (1) KR100938501B1 (de)
DE (1) DE60227899D1 (de)
FR (1) FR2830670A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0318146D0 (en) * 2003-08-02 2003-09-03 Zetex Plc Bipolar transistor with a low saturation voltage
JP5574639B2 (ja) * 2009-08-21 2014-08-20 三菱電機株式会社 半導体装置およびその製造方法
US8697574B2 (en) 2009-09-25 2014-04-15 Infineon Technologies Ag Through substrate features in semiconductor substrates
US8368174B1 (en) * 2010-07-09 2013-02-05 Altera Corporation Compensation network using an on-die compensation inductor
US9287344B2 (en) 2010-08-23 2016-03-15 The Hong Kong University Of Science And Technology Monolithic magnetic induction device
US10872843B2 (en) 2017-05-02 2020-12-22 Micron Technology, Inc. Semiconductor devices with back-side coils for wireless signal and power coupling
US10121739B1 (en) 2017-05-02 2018-11-06 Micron Technology, Inc. Multi-die inductors with coupled through-substrate via cores
US20180323253A1 (en) * 2017-05-02 2018-11-08 Micron Technology, Inc. Semiconductor devices with through-substrate coils for wireless signal and power coupling
US20180323369A1 (en) 2017-05-02 2018-11-08 Micron Technology, Inc. Inductors with through-substrate via cores
US10134671B1 (en) 2017-05-02 2018-11-20 Micron Technology, Inc. 3D interconnect multi-die inductors with through-substrate via cores

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3415679A (en) * 1965-07-09 1968-12-10 Western Electric Co Metallization of selected regions of surfaces and products so formed
US5363080A (en) 1991-12-27 1994-11-08 Avx Corporation High accuracy surface mount inductor
US5545916A (en) 1994-12-06 1996-08-13 At&T Corp. High Q integrated inductor
US5736749A (en) * 1996-11-19 1998-04-07 Lucent Technologies Inc. Integrated circuit device with inductor incorporated therein
JPH10303037A (ja) * 1997-04-23 1998-11-13 Fuji Electric Co Ltd 薄膜積層型磁気誘導素子およびその製造方法
SG74672A1 (en) * 1997-12-29 2000-08-22 Texas Instruments Inc Integrated circuit and method of using porous silicon to achieve component isolation in radio frequency applications
US6211073B1 (en) * 1998-02-27 2001-04-03 Micron Technology, Inc. Methods for making copper and other metal interconnections in integrated circuits
KR100288776B1 (ko) * 1998-03-16 2001-06-01 이장무 반도체장치의인덕터및그제조방법
FR2793943B1 (fr) * 1999-05-18 2001-07-13 Memscap Micro-composants du type micro-inductance ou micro- transformateur, et procede de fabrication de tels micro- composants
US6307247B1 (en) * 1999-07-12 2001-10-23 Robert Bruce Davies Monolithic low dielectric constant platform for passive components and method
JP2001168289A (ja) * 1999-12-13 2001-06-22 Seiko Epson Corp インダクタ、半導体装置、半導体装置の製造方法
US6531945B1 (en) * 2000-03-10 2003-03-11 Micron Technology, Inc. Integrated circuit inductor with a magnetic core
US6417755B1 (en) * 2000-08-25 2002-07-09 Conexant Systems, Inc. Method for fabrication of high inductance inductors and related structure

Also Published As

Publication number Publication date
KR20030030958A (ko) 2003-04-18
FR2830670A1 (fr) 2003-04-11
US7404249B2 (en) 2008-07-29
US20030066184A1 (en) 2003-04-10
KR100938501B1 (ko) 2010-01-25
EP1302955A1 (de) 2003-04-16
EP1302955B1 (de) 2008-07-30

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Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee