DE60221180D1 - Lithographischer Apparat - Google Patents
Lithographischer ApparatInfo
- Publication number
- DE60221180D1 DE60221180D1 DE60221180T DE60221180T DE60221180D1 DE 60221180 D1 DE60221180 D1 DE 60221180D1 DE 60221180 T DE60221180 T DE 60221180T DE 60221180 T DE60221180 T DE 60221180T DE 60221180 D1 DE60221180 D1 DE 60221180D1
- Authority
- DE
- Germany
- Prior art keywords
- lithographic apparatus
- lithographic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP01304075 | 2001-05-04 | ||
EP01304075A EP1255162A1 (de) | 2001-05-04 | 2001-05-04 | Lithographischer Apparat |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60221180D1 true DE60221180D1 (de) | 2007-08-30 |
DE60221180T2 DE60221180T2 (de) | 2008-04-03 |
Family
ID=8181946
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60221180T Expired - Lifetime DE60221180T2 (de) | 2001-05-04 | 2002-05-03 | Lithographischer Apparat |
Country Status (5)
Country | Link |
---|---|
US (1) | US6819405B2 (de) |
EP (1) | EP1255162A1 (de) |
JP (1) | JP3949517B2 (de) |
KR (1) | KR100586912B1 (de) |
DE (1) | DE60221180T2 (de) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6553562B2 (en) * | 2001-05-04 | 2003-04-22 | Asml Masktools B.V. | Method and apparatus for generating masks utilized in conjunction with dipole illumination techniques |
TWI247339B (en) * | 2003-02-21 | 2006-01-11 | Asml Holding Nv | Lithographic printing with polarized light |
US7221812B2 (en) * | 2004-02-28 | 2007-05-22 | Magiq Technologies, Inc. | Compact optics assembly for a QKD station |
DE102004013886A1 (de) | 2004-03-16 | 2005-10-06 | Carl Zeiss Smt Ag | Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem |
KR100598981B1 (ko) * | 2004-10-01 | 2006-07-12 | 주식회사 하이닉스반도체 | 노광 장치 |
US7271874B2 (en) * | 2004-11-02 | 2007-09-18 | Asml Holding N.V. | Method and apparatus for variable polarization control in a lithography system |
JP4488926B2 (ja) * | 2005-02-21 | 2010-06-23 | 株式会社東芝 | マスクパターンデータ形成方法、フォトマスク、及び半導体デバイスの製造方法 |
US7548302B2 (en) * | 2005-03-29 | 2009-06-16 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7317506B2 (en) * | 2005-03-29 | 2008-01-08 | Asml Netherlands B.V. | Variable illumination source |
US7209217B2 (en) * | 2005-04-08 | 2007-04-24 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method utilizing plural patterning devices |
US7782442B2 (en) * | 2005-12-06 | 2010-08-24 | Nikon Corporation | Exposure apparatus, exposure method, projection optical system and device producing method |
EP1970944A4 (de) * | 2005-12-06 | 2010-04-28 | Nikon Corp | Belichtungsvorrichtung, belichtungsverfahren, optisches projektionssystem und bauelementeherstellungsverfahren |
EP1978546A4 (de) * | 2005-12-28 | 2010-08-04 | Nikon Corp | Belichtungsvorrichtung, belichtungsverfahren und bauelemente-herstellungsverfahren |
WO2007094470A1 (ja) * | 2006-02-16 | 2007-08-23 | Nikon Corporation | 露光装置、露光方法及びデバイス製造方法 |
EP1986222A4 (de) * | 2006-02-16 | 2010-09-01 | Nikon Corp | Belichtungsvorrichtung, belichtungsverfahren und bauelementeherstellungsverfahren |
WO2007094414A1 (ja) * | 2006-02-16 | 2007-08-23 | Nikon Corporation | 露光装置、露光方法及びデバイス製造方法 |
EP1986224A4 (de) * | 2006-02-16 | 2012-01-25 | Nikon Corp | Belichtungsvorrichtung, belichtungsverfahren und bauelementeherstellungsverfahren |
JP4957281B2 (ja) * | 2006-02-16 | 2012-06-20 | 株式会社ニコン | 露光装置、露光方法及びデバイス製造方法 |
EP1993121A4 (de) * | 2006-03-03 | 2011-12-07 | Nikon Corp | Belichtungsvorrichtung und bauelementeherstellungsverfahren |
US8023103B2 (en) * | 2006-03-03 | 2011-09-20 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
US20070242254A1 (en) * | 2006-03-17 | 2007-10-18 | Nikon Corporation | Exposure apparatus and device manufacturing method |
KR101486589B1 (ko) * | 2006-04-17 | 2015-01-26 | 가부시키가이샤 니콘 | 조명 광학 장치, 노광 장치, 및 디바이스 제조 방법 |
JP4947269B2 (ja) * | 2006-04-27 | 2012-06-06 | 株式会社ニコン | 測定検査方法、測定検査装置、露光装置及びデバイス製造処理装置 |
WO2008007633A1 (fr) * | 2006-07-12 | 2008-01-17 | Nikon Corporation | Appareil optique d'éclairage, appareil d'exposition, et procédé de fabrication du dispositif |
WO2008007632A1 (fr) | 2006-07-12 | 2008-01-17 | Nikon Corporation | Appareil optique d'éclairage, appareil d'exposition, et procédé de fabrication du dispositif |
KR101509553B1 (ko) * | 2007-11-08 | 2015-04-06 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 투영 장치 및 섭동 인자들을 보상하는 방법 |
US20090303454A1 (en) * | 2008-06-10 | 2009-12-10 | Nikon Corporation | Exposure apparatus with a scanning illumination beam |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4456371A (en) * | 1982-06-30 | 1984-06-26 | International Business Machines Corporation | Optical projection printing threshold leveling arrangement |
JPS6035516A (ja) * | 1983-08-08 | 1985-02-23 | Hitachi Ltd | 露光方法及び装置 |
JPS60107835A (ja) * | 1983-11-17 | 1985-06-13 | Hitachi Ltd | 投影露光装置 |
US4878086A (en) * | 1985-04-01 | 1989-10-31 | Canon Kabushiki Kaisha | Flat panel display device and manufacturing of the same |
US5298365A (en) * | 1990-03-20 | 1994-03-29 | Hitachi, Ltd. | Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process |
JPH0635516A (ja) * | 1992-07-17 | 1994-02-10 | Yaskawa Electric Corp | プログラマブル・コントローラにおける複数プログラムの一括イネーブル・ディセーブル処理方法 |
KR100300618B1 (ko) * | 1992-12-25 | 2001-11-22 | 오노 시게오 | 노광방법,노광장치,및그장치를사용하는디바이스제조방법 |
US5447304A (en) * | 1993-11-15 | 1995-09-05 | Vargas; Florencio A. | Removable basketball net assembly |
JPH1032156A (ja) * | 1996-07-15 | 1998-02-03 | Mitsubishi Electric Corp | 位相シフトマスクを用いた露光装置およびパターン形成方法 |
TW440925B (en) * | 1997-01-21 | 2001-06-16 | Univ New Mexico | Methods and apparatus for integrating optical and interferometric lithography to produce complex patterns |
US5923403A (en) * | 1997-07-08 | 1999-07-13 | Anvik Corporation | Simultaneous, two-sided projection lithography system |
US6611316B2 (en) | 2001-02-27 | 2003-08-26 | Asml Holding N.V. | Method and system for dual reticle image exposure |
-
2001
- 2001-05-04 EP EP01304075A patent/EP1255162A1/de not_active Withdrawn
-
2002
- 2002-05-03 KR KR1020020024403A patent/KR100586912B1/ko not_active IP Right Cessation
- 2002-05-03 DE DE60221180T patent/DE60221180T2/de not_active Expired - Lifetime
- 2002-05-03 US US10/136,620 patent/US6819405B2/en not_active Expired - Fee Related
- 2002-05-07 JP JP2002169284A patent/JP3949517B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR20030006953A (ko) | 2003-01-23 |
DE60221180T2 (de) | 2008-04-03 |
US20020180943A1 (en) | 2002-12-05 |
US6819405B2 (en) | 2004-11-16 |
EP1255162A1 (de) | 2002-11-06 |
JP3949517B2 (ja) | 2007-07-25 |
JP2003045797A (ja) | 2003-02-14 |
KR100586912B1 (ko) | 2006-06-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |