DE60221180D1 - Lithographischer Apparat - Google Patents

Lithographischer Apparat

Info

Publication number
DE60221180D1
DE60221180D1 DE60221180T DE60221180T DE60221180D1 DE 60221180 D1 DE60221180 D1 DE 60221180D1 DE 60221180 T DE60221180 T DE 60221180T DE 60221180 T DE60221180 T DE 60221180T DE 60221180 D1 DE60221180 D1 DE 60221180D1
Authority
DE
Germany
Prior art keywords
lithographic apparatus
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60221180T
Other languages
English (en)
Other versions
DE60221180T2 (de
Inventor
Johannes Catharinus Hu Mulkens
Marco Hugo Petrus Moers
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE60221180D1 publication Critical patent/DE60221180D1/de
Application granted granted Critical
Publication of DE60221180T2 publication Critical patent/DE60221180T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558Dose control, i.e. achievement of a desired dose
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • G03F7/70208Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566Polarisation control
DE60221180T 2001-05-04 2002-05-03 Lithographischer Apparat Expired - Lifetime DE60221180T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP01304075 2001-05-04
EP01304075A EP1255162A1 (de) 2001-05-04 2001-05-04 Lithographischer Apparat

Publications (2)

Publication Number Publication Date
DE60221180D1 true DE60221180D1 (de) 2007-08-30
DE60221180T2 DE60221180T2 (de) 2008-04-03

Family

ID=8181946

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60221180T Expired - Lifetime DE60221180T2 (de) 2001-05-04 2002-05-03 Lithographischer Apparat

Country Status (5)

Country Link
US (1) US6819405B2 (de)
EP (1) EP1255162A1 (de)
JP (1) JP3949517B2 (de)
KR (1) KR100586912B1 (de)
DE (1) DE60221180T2 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6553562B2 (en) * 2001-05-04 2003-04-22 Asml Masktools B.V. Method and apparatus for generating masks utilized in conjunction with dipole illumination techniques
TWI247339B (en) * 2003-02-21 2006-01-11 Asml Holding Nv Lithographic printing with polarized light
US7221812B2 (en) * 2004-02-28 2007-05-22 Magiq Technologies, Inc. Compact optics assembly for a QKD station
DE102004013886A1 (de) 2004-03-16 2005-10-06 Carl Zeiss Smt Ag Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem
KR100598981B1 (ko) * 2004-10-01 2006-07-12 주식회사 하이닉스반도체 노광 장치
US7271874B2 (en) * 2004-11-02 2007-09-18 Asml Holding N.V. Method and apparatus for variable polarization control in a lithography system
JP4488926B2 (ja) * 2005-02-21 2010-06-23 株式会社東芝 マスクパターンデータ形成方法、フォトマスク、及び半導体デバイスの製造方法
US7548302B2 (en) * 2005-03-29 2009-06-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7317506B2 (en) * 2005-03-29 2008-01-08 Asml Netherlands B.V. Variable illumination source
US7209217B2 (en) * 2005-04-08 2007-04-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing plural patterning devices
US7782442B2 (en) * 2005-12-06 2010-08-24 Nikon Corporation Exposure apparatus, exposure method, projection optical system and device producing method
EP1970944A4 (de) * 2005-12-06 2010-04-28 Nikon Corp Belichtungsvorrichtung, belichtungsverfahren, optisches projektionssystem und bauelementeherstellungsverfahren
EP1978546A4 (de) * 2005-12-28 2010-08-04 Nikon Corp Belichtungsvorrichtung, belichtungsverfahren und bauelemente-herstellungsverfahren
WO2007094470A1 (ja) * 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
EP1986222A4 (de) * 2006-02-16 2010-09-01 Nikon Corp Belichtungsvorrichtung, belichtungsverfahren und bauelementeherstellungsverfahren
WO2007094414A1 (ja) * 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
EP1986224A4 (de) * 2006-02-16 2012-01-25 Nikon Corp Belichtungsvorrichtung, belichtungsverfahren und bauelementeherstellungsverfahren
JP4957281B2 (ja) * 2006-02-16 2012-06-20 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
EP1993121A4 (de) * 2006-03-03 2011-12-07 Nikon Corp Belichtungsvorrichtung und bauelementeherstellungsverfahren
US8023103B2 (en) * 2006-03-03 2011-09-20 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US20070242254A1 (en) * 2006-03-17 2007-10-18 Nikon Corporation Exposure apparatus and device manufacturing method
KR101486589B1 (ko) * 2006-04-17 2015-01-26 가부시키가이샤 니콘 조명 광학 장치, 노광 장치, 및 디바이스 제조 방법
JP4947269B2 (ja) * 2006-04-27 2012-06-06 株式会社ニコン 測定検査方法、測定検査装置、露光装置及びデバイス製造処理装置
WO2008007633A1 (fr) * 2006-07-12 2008-01-17 Nikon Corporation Appareil optique d'éclairage, appareil d'exposition, et procédé de fabrication du dispositif
WO2008007632A1 (fr) 2006-07-12 2008-01-17 Nikon Corporation Appareil optique d'éclairage, appareil d'exposition, et procédé de fabrication du dispositif
KR101509553B1 (ko) * 2007-11-08 2015-04-06 에이에스엠엘 네델란즈 비.브이. 리소그래피 투영 장치 및 섭동 인자들을 보상하는 방법
US20090303454A1 (en) * 2008-06-10 2009-12-10 Nikon Corporation Exposure apparatus with a scanning illumination beam

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4456371A (en) * 1982-06-30 1984-06-26 International Business Machines Corporation Optical projection printing threshold leveling arrangement
JPS6035516A (ja) * 1983-08-08 1985-02-23 Hitachi Ltd 露光方法及び装置
JPS60107835A (ja) * 1983-11-17 1985-06-13 Hitachi Ltd 投影露光装置
US4878086A (en) * 1985-04-01 1989-10-31 Canon Kabushiki Kaisha Flat panel display device and manufacturing of the same
US5298365A (en) * 1990-03-20 1994-03-29 Hitachi, Ltd. Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process
JPH0635516A (ja) * 1992-07-17 1994-02-10 Yaskawa Electric Corp プログラマブル・コントローラにおける複数プログラムの一括イネーブル・ディセーブル処理方法
KR100300618B1 (ko) * 1992-12-25 2001-11-22 오노 시게오 노광방법,노광장치,및그장치를사용하는디바이스제조방법
US5447304A (en) * 1993-11-15 1995-09-05 Vargas; Florencio A. Removable basketball net assembly
JPH1032156A (ja) * 1996-07-15 1998-02-03 Mitsubishi Electric Corp 位相シフトマスクを用いた露光装置およびパターン形成方法
TW440925B (en) * 1997-01-21 2001-06-16 Univ New Mexico Methods and apparatus for integrating optical and interferometric lithography to produce complex patterns
US5923403A (en) * 1997-07-08 1999-07-13 Anvik Corporation Simultaneous, two-sided projection lithography system
US6611316B2 (en) 2001-02-27 2003-08-26 Asml Holding N.V. Method and system for dual reticle image exposure

Also Published As

Publication number Publication date
KR20030006953A (ko) 2003-01-23
DE60221180T2 (de) 2008-04-03
US20020180943A1 (en) 2002-12-05
US6819405B2 (en) 2004-11-16
EP1255162A1 (de) 2002-11-06
JP3949517B2 (ja) 2007-07-25
JP2003045797A (ja) 2003-02-14
KR100586912B1 (ko) 2006-06-07

Similar Documents

Publication Publication Date Title
DE60134922D1 (de) Lithographischer Apparat
DE60221180D1 (de) Lithographischer Apparat
DE602004010961D1 (de) Lithographischer Apparat
DE60116967D1 (de) Lithographischer Apparat
DE60128879D1 (de) Belichtungsapparat
DE60232568D1 (de) Belichtungsapparat
DE60118669D1 (de) Lithographischer Projektionsapparat
DE69931690D1 (de) Lithographischer Apparat
DE60020638D1 (de) Lithographischer Projektionsapparat
DE60020620D1 (de) Lithographischer Projektionsapparat
DE60026461D1 (de) Lithographischer Projektionsapparat
DE60127050D1 (de) Lithographischer Projektionsapparat
DE602004008009D1 (de) Lithographischer Apparat
DE60128975D1 (de) Mikrolithographischer Projektionsapparat
DE69938885D1 (de) Lithographischer Apparat
DE602004017411D1 (de) Lithographischer Apparat
DE60025303D1 (de) Lithographischer Projektionsapparat
DE60030204D1 (de) Lithographischer Projektionsapparat
DE60214792D1 (de) Lithographischer Projektionsapparat
DE60221318D1 (de) Lithographischer Apparat mit Spülgassystem
DE60127212D1 (de) Lithographischer Projektionsapparat
ITMO20010226A0 (it) Apparato
SE0100120D0 (sv) Apparat
SE0103777D0 (sv) Apparat
SE0001807D0 (sv) Apparat

Legal Events

Date Code Title Description
8364 No opposition during term of opposition