DE60217206D1 - Gasgekühlte elektrostatische Halteplatte mit stiftförmigen Distanzhaltern für Vakuumanwendungen - Google Patents
Gasgekühlte elektrostatische Halteplatte mit stiftförmigen Distanzhaltern für VakuumanwendungenInfo
- Publication number
- DE60217206D1 DE60217206D1 DE60217206T DE60217206T DE60217206D1 DE 60217206 D1 DE60217206 D1 DE 60217206D1 DE 60217206 T DE60217206 T DE 60217206T DE 60217206 T DE60217206 T DE 60217206T DE 60217206 D1 DE60217206 D1 DE 60217206D1
- Authority
- DE
- Germany
- Prior art keywords
- pin
- gas
- holding plate
- shaped spacers
- electrostatic holding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
- G03F7/70708—Chucks, e.g. chucking or un-chucking operations or structural details being electrostatic; Electrostatically deformable vacuum chucks
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
- H01L21/6833—Details of electrostatic chucks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/46—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements involving the transfer of heat by flowing fluids
- H01L23/467—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements involving the transfer of heat by flowing fluids by flowing gases, e.g. air
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/808,210 US6628503B2 (en) | 2001-03-13 | 2001-03-13 | Gas cooled electrostatic pin chuck for vacuum applications |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60217206D1 true DE60217206D1 (de) | 2007-02-15 |
Family
ID=25198184
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60217206T Expired - Lifetime DE60217206D1 (de) | 2001-03-13 | 2002-03-13 | Gasgekühlte elektrostatische Halteplatte mit stiftförmigen Distanzhaltern für Vakuumanwendungen |
Country Status (5)
Country | Link |
---|---|
US (1) | US6628503B2 (de) |
EP (1) | EP1241706B1 (de) |
JP (1) | JP4218248B2 (de) |
KR (1) | KR20020073273A (de) |
DE (1) | DE60217206D1 (de) |
Families Citing this family (89)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5914613A (en) | 1996-08-08 | 1999-06-22 | Cascade Microtech, Inc. | Membrane probing system with local contact scrub |
US6256882B1 (en) | 1998-07-14 | 2001-07-10 | Cascade Microtech, Inc. | Membrane probing system |
US6965226B2 (en) | 2000-09-05 | 2005-11-15 | Cascade Microtech, Inc. | Chuck for holding a device under test |
US6914423B2 (en) | 2000-09-05 | 2005-07-05 | Cascade Microtech, Inc. | Probe station |
DE10143173A1 (de) | 2000-12-04 | 2002-06-06 | Cascade Microtech Inc | Wafersonde |
TWI272689B (en) * | 2001-02-16 | 2007-02-01 | Tokyo Electron Ltd | Method and apparatus for transferring heat from a substrate to a chuck |
US6970634B2 (en) * | 2001-05-04 | 2005-11-29 | Cascade Microtech, Inc. | Fiber optic wafer probe |
AU2002327490A1 (en) | 2001-08-21 | 2003-06-30 | Cascade Microtech, Inc. | Membrane probing system |
JP2003174077A (ja) * | 2001-12-04 | 2003-06-20 | Lintec Corp | 吸着保持装置 |
DE10216786C5 (de) * | 2002-04-15 | 2009-10-15 | Ers Electronic Gmbh | Verfahren und Vorrichtung zur Konditionierung von Halbleiterwafern und/oder Hybriden |
JP2004228456A (ja) * | 2003-01-27 | 2004-08-12 | Canon Inc | 露光装置 |
EP1447715A3 (de) * | 2003-02-12 | 2009-09-02 | ASML Netherlands B.V. | Lithographischer Apparat und Verfahren zur Feststellung der korrekten Festklemmung eines Objekts |
JP2004363559A (ja) * | 2003-05-14 | 2004-12-24 | Canon Inc | 光学部材保持装置 |
US7057404B2 (en) | 2003-05-23 | 2006-06-06 | Sharp Laboratories Of America, Inc. | Shielded probe for testing a device under test |
US7492172B2 (en) | 2003-05-23 | 2009-02-17 | Cascade Microtech, Inc. | Chuck for holding a device under test |
JP4470199B2 (ja) * | 2003-09-25 | 2010-06-02 | Smc株式会社 | 半導体基板の温度調節装置 |
US7250626B2 (en) | 2003-10-22 | 2007-07-31 | Cascade Microtech, Inc. | Probe testing structure |
US7198276B2 (en) * | 2003-10-24 | 2007-04-03 | International Business Machines Corporation | Adaptive electrostatic pin chuck |
US7019820B2 (en) * | 2003-12-16 | 2006-03-28 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
EP2267535A1 (de) | 2003-11-05 | 2010-12-29 | ASML Netherlands BV | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung |
EP1530088B1 (de) * | 2003-11-05 | 2007-08-08 | ASML Netherlands B.V. | Lithographischer Apparat |
US7663860B2 (en) | 2003-12-05 | 2010-02-16 | Tokyo Electron Limited | Electrostatic chuck |
US6897945B1 (en) * | 2003-12-15 | 2005-05-24 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7088431B2 (en) * | 2003-12-17 | 2006-08-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7427868B2 (en) | 2003-12-24 | 2008-09-23 | Cascade Microtech, Inc. | Active wafer probe |
US7187188B2 (en) | 2003-12-24 | 2007-03-06 | Cascade Microtech, Inc. | Chuck with integrated wafer support |
JP4636807B2 (ja) * | 2004-03-18 | 2011-02-23 | キヤノン株式会社 | 基板保持装置およびそれを用いた露光装置 |
US7133120B2 (en) | 2004-05-04 | 2006-11-07 | Asml Netherlands B.V. | Lithographic apparatus, article support member, and method |
US8749762B2 (en) | 2004-05-11 | 2014-06-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7737412B2 (en) * | 2004-07-12 | 2010-06-15 | The Regents Of The University Of California | Electron microscope phase enhancement |
US7548303B2 (en) * | 2004-09-04 | 2009-06-16 | Nikon Corporation | Cooling assembly for a stage |
US7420381B2 (en) | 2004-09-13 | 2008-09-02 | Cascade Microtech, Inc. | Double sided probing structures |
JP2006105789A (ja) * | 2004-10-05 | 2006-04-20 | Canon Inc | 温度計測装置及び露光装置 |
US20060090855A1 (en) * | 2004-10-29 | 2006-05-04 | Tokyo Electron Limited | Substrate mounting table, substrate processing apparatus and substrate temperature control method |
CN100382275C (zh) * | 2004-10-29 | 2008-04-16 | 东京毅力科创株式会社 | 基板载置台、基板处理装置及基板的温度控制方法 |
KR101939525B1 (ko) * | 2004-12-15 | 2019-01-16 | 가부시키가이샤 니콘 | 기판 유지 장치, 노광 장치 및 디바이스 제조방법 |
US7656172B2 (en) | 2005-01-31 | 2010-02-02 | Cascade Microtech, Inc. | System for testing semiconductors |
US7535247B2 (en) | 2005-01-31 | 2009-05-19 | Cascade Microtech, Inc. | Interface for testing semiconductors |
US20060271302A1 (en) * | 2005-05-27 | 2006-11-30 | Ehrlich James L | Method of Assessing Productivity of Lactating Animals Using Fitted Parameters to a Mechanistic Lactation Model |
US7372549B2 (en) * | 2005-06-24 | 2008-05-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7802917B2 (en) * | 2005-08-05 | 2010-09-28 | Lam Research Corporation | Method and apparatus for chuck thermal calibration |
JP4125315B2 (ja) * | 2005-10-11 | 2008-07-30 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
US7432513B2 (en) * | 2005-10-21 | 2008-10-07 | Asml Netherlands B.V. | Gas shower, lithographic apparatus and use of a gas shower |
CN100419989C (zh) * | 2005-12-05 | 2008-09-17 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 静电卡盘 |
KR100689843B1 (ko) * | 2006-01-03 | 2007-03-08 | 삼성전자주식회사 | 웨이퍼 스테이지 및 이를 이용한 웨이퍼 안착방법 |
KR100842739B1 (ko) | 2006-05-02 | 2008-07-01 | 주식회사 하이닉스반도체 | 고밀도 플라즈마 증착 장치의 정전척 |
US7978308B2 (en) * | 2006-05-15 | 2011-07-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7593096B2 (en) * | 2006-05-15 | 2009-09-22 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7723999B2 (en) | 2006-06-12 | 2010-05-25 | Cascade Microtech, Inc. | Calibration structures for differential signal probing |
US7403028B2 (en) | 2006-06-12 | 2008-07-22 | Cascade Microtech, Inc. | Test structure and probe for differential signals |
US7764072B2 (en) | 2006-06-12 | 2010-07-27 | Cascade Microtech, Inc. | Differential signal probing system |
DE102006042026B4 (de) | 2006-09-07 | 2016-08-04 | Infineon Technologies Ag | Vorrichtung zum Halten eines Substrats und Verfahren zur Behandlung eines Substrats |
JP4899879B2 (ja) * | 2007-01-17 | 2012-03-21 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法及び記憶媒体 |
US20080316461A1 (en) * | 2007-06-21 | 2008-12-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR101232234B1 (ko) * | 2007-06-21 | 2013-02-12 | 에이에스엠엘 네델란즈 비.브이. | 클램핑 디바이스 및 대상물 로딩 방법 |
US8446566B2 (en) | 2007-09-04 | 2013-05-21 | Asml Netherlands B.V. | Method of loading a substrate on a substrate table and lithographic apparatus and device manufacturing method |
US9013682B2 (en) * | 2007-06-21 | 2015-04-21 | Asml Netherlands B.V. | Clamping device and object loading method |
US7876114B2 (en) | 2007-08-08 | 2011-01-25 | Cascade Microtech, Inc. | Differential waveguide probe |
US20090086187A1 (en) * | 2007-08-09 | 2009-04-02 | Asml Netherlands | Lithographic Apparatus and Device Manufacturing Method |
US9036326B2 (en) * | 2008-04-30 | 2015-05-19 | Axcelis Technologies, Inc. | Gas bearing electrostatic chuck |
TWI475594B (zh) | 2008-05-19 | 2015-03-01 | Entegris Inc | 靜電夾頭 |
US8596336B2 (en) * | 2008-06-03 | 2013-12-03 | Applied Materials, Inc. | Substrate support temperature control |
US7888957B2 (en) | 2008-10-06 | 2011-02-15 | Cascade Microtech, Inc. | Probing apparatus with impedance optimized interface |
US8410806B2 (en) | 2008-11-21 | 2013-04-02 | Cascade Microtech, Inc. | Replaceable coupon for a probing apparatus |
US8319503B2 (en) | 2008-11-24 | 2012-11-27 | Cascade Microtech, Inc. | Test apparatus for measuring a characteristic of a device under test |
JP2010129929A (ja) * | 2008-11-28 | 2010-06-10 | Canon Inc | 基板保持装置、基板保持方法、露光装置およびデバイス製造方法 |
US8851133B2 (en) * | 2009-03-31 | 2014-10-07 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method and apparatus of holding a device |
WO2010132640A2 (en) | 2009-05-15 | 2010-11-18 | Entegris, Inc. | Electrostatic chuck with polymer protrusions |
US8861170B2 (en) | 2009-05-15 | 2014-10-14 | Entegris, Inc. | Electrostatic chuck with photo-patternable soft protrusion contact surface |
JP5195711B2 (ja) * | 2009-10-13 | 2013-05-15 | 東京エレクトロン株式会社 | 基板冷却装置、基板冷却方法及び記憶媒体 |
JP6014587B2 (ja) | 2010-05-28 | 2016-10-25 | インテグリス・インコーポレーテッド | 高表面抵抗率の静電チャック |
CN102736429B (zh) * | 2011-04-07 | 2015-06-17 | 上海微电子装备有限公司 | 硅片温度稳定装置 |
JP5550602B2 (ja) * | 2011-04-28 | 2014-07-16 | パナソニック株式会社 | 静電チャックおよびこれを備えるドライエッチング装置 |
CN102914951B (zh) * | 2011-08-04 | 2014-11-12 | 上海微电子装备有限公司 | 用于光刻设备的预对准装置 |
CN102445857B (zh) * | 2011-10-12 | 2013-10-02 | 上海华力微电子有限公司 | 一种光刻机温控硅片载物台 |
CN102445856B (zh) * | 2011-10-12 | 2014-12-10 | 上海华力微电子有限公司 | 一种光刻机硅片载物台温度控制系统及其控制方法 |
TWI448706B (zh) * | 2012-12-24 | 2014-08-11 | Chroma Ate Inc | 具有乾燥環境之測試平台 |
CN103901359B (zh) * | 2012-12-31 | 2016-06-29 | 致茂电子(苏州)有限公司 | 具有干燥环境的测试平台 |
JP2014216503A (ja) * | 2013-04-25 | 2014-11-17 | キヤノン株式会社 | 保持部材、処理装置及び物品の製造方法 |
US10236202B2 (en) * | 2013-11-11 | 2019-03-19 | Diablo Capital, Inc. | System and method for adhering a semiconductive wafer to a mobile electrostatic carrier through a vacuum |
WO2016135565A1 (en) | 2015-02-23 | 2016-09-01 | M Cubed Technologies, Inc. | Film electrode for electrostatic chuck |
JP6510461B2 (ja) * | 2016-05-25 | 2019-05-08 | 日本特殊陶業株式会社 | 基板保持装置 |
US10867816B2 (en) * | 2016-12-13 | 2020-12-15 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method and apparatus for wafer backside cooling |
US11201078B2 (en) * | 2017-02-14 | 2021-12-14 | Applied Materials, Inc. | Substrate position calibration for substrate supports in substrate processing systems |
JP7239560B2 (ja) * | 2018-03-26 | 2023-03-14 | 日本碍子株式会社 | 静電チャックヒータ |
CN110323150B (zh) * | 2018-03-30 | 2021-12-31 | 上海微电子装备(集团)股份有限公司 | 温度控制装置 |
CN110896045B (zh) | 2018-09-12 | 2022-12-30 | 中微半导体设备(上海)股份有限公司 | 一种升举顶针组件,静电夹盘及其所在的处理装置 |
EP4134748A1 (de) * | 2021-08-12 | 2023-02-15 | ASML Netherlands B.V. | Elektrostatischer halter, objekttisch und lithografische vorrichtung |
WO2023016738A1 (en) * | 2021-08-12 | 2023-02-16 | Asml Netherlands B.V. | Electrostatic holder, object table and lithographic apparatus |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4213698A (en) | 1978-12-01 | 1980-07-22 | Bell Telephone Laboratories, Incorporated | Apparatus and method for holding and planarizing thin workpieces |
US4551192A (en) | 1983-06-30 | 1985-11-05 | International Business Machines Corporation | Electrostatic or vacuum pinchuck formed with microcircuit lithography |
JPS6060060A (ja) | 1983-09-12 | 1985-04-06 | 株式会社日立製作所 | 鉄道車両の扉開閉装置 |
US4603466A (en) | 1984-02-17 | 1986-08-05 | Gca Corporation | Wafer chuck |
US4544446A (en) | 1984-07-24 | 1985-10-01 | J. T. Baker Chemical Co. | VLSI chemical reactor |
US4676649A (en) * | 1985-11-27 | 1987-06-30 | Compact Spindle Bearing Corp. | Multi-axis gas bearing stage assembly |
DE3943478C2 (de) | 1989-05-08 | 1995-11-16 | Philips Electronics Nv | Werkstückträger für ein scheibenförmiges Werkstück, sowie Vakuumbehandlungsanlage |
US5197089A (en) * | 1990-05-21 | 1993-03-23 | Hampshire Instruments, Inc. | Pin chuck for lithography system |
US5230741A (en) | 1990-07-16 | 1993-07-27 | Novellus Systems, Inc. | Gas-based backside protection during substrate processing |
JPH07110455B2 (ja) | 1992-10-27 | 1995-11-29 | 住友電気工業株式会社 | ウェハ固定装置 |
JPH0758191A (ja) | 1993-08-13 | 1995-03-03 | Toshiba Corp | ウェハステージ装置 |
JPH07153825A (ja) * | 1993-11-29 | 1995-06-16 | Toto Ltd | 静電チャック及びこの静電チャックを用いた被吸着体の処理方法 |
US5885469B1 (en) | 1996-11-05 | 2000-08-08 | Applied Materials Inc | Topographical structure of an electrostatic chuck and method of fabricating same |
US6278600B1 (en) * | 1994-01-31 | 2001-08-21 | Applied Materials, Inc. | Electrostatic chuck with improved temperature control and puncture resistance |
US5548470A (en) | 1994-07-19 | 1996-08-20 | International Business Machines Corporation | Characterization, modeling, and design of an electrostatic chuck with improved wafer temperature uniformity |
TW286414B (en) | 1995-07-10 | 1996-09-21 | Watkins Johnson Co | Electrostatic chuck assembly |
US5810933A (en) * | 1996-02-16 | 1998-09-22 | Novellus Systems, Inc. | Wafer cooling device |
JP2002009139A (ja) | 2000-06-20 | 2002-01-11 | Nikon Corp | 静電チャック |
-
2001
- 2001-03-13 US US09/808,210 patent/US6628503B2/en not_active Expired - Lifetime
-
2002
- 2002-03-05 JP JP2002058101A patent/JP4218248B2/ja not_active Expired - Lifetime
- 2002-03-12 KR KR1020020013205A patent/KR20020073273A/ko not_active Application Discontinuation
- 2002-03-13 DE DE60217206T patent/DE60217206D1/de not_active Expired - Lifetime
- 2002-03-13 EP EP02005780A patent/EP1241706B1/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP1241706A2 (de) | 2002-09-18 |
EP1241706A3 (de) | 2004-02-18 |
JP4218248B2 (ja) | 2009-02-04 |
US20020130276A1 (en) | 2002-09-19 |
US6628503B2 (en) | 2003-09-30 |
KR20020073273A (ko) | 2002-09-23 |
EP1241706B1 (de) | 2007-01-03 |
JP2002305238A (ja) | 2002-10-18 |
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