DE602005005302D1 - Vertikal-feldeffekttransistoren mit in einem abstandsschichtdefinierten durchgang aufgewachsenen halbleitenden nanoröhren - Google Patents
Vertikal-feldeffekttransistoren mit in einem abstandsschichtdefinierten durchgang aufgewachsenen halbleitenden nanoröhrenInfo
- Publication number
- DE602005005302D1 DE602005005302D1 DE602005005302T DE602005005302T DE602005005302D1 DE 602005005302 D1 DE602005005302 D1 DE 602005005302D1 DE 602005005302 T DE602005005302 T DE 602005005302T DE 602005005302 T DE602005005302 T DE 602005005302T DE 602005005302 D1 DE602005005302 D1 DE 602005005302D1
- Authority
- DE
- Germany
- Prior art keywords
- field effect
- effect transistors
- vertical field
- spacer
- nanotube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K19/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00
- H10K19/10—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00 comprising field-effect transistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having a potential-jump barrier or a surface barrier
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having a potential-jump barrier or a surface barrier
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/491—Vertical transistors, e.g. vertical carbon nanotube field effect transistors [CNT-FETs]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
- H10K85/221—Carbon nanotubes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/701—Integrated with dissimilar structures on a common substrate
- Y10S977/707—Integrated with dissimilar structures on a common substrate having different types of nanoscale structures or devices on a common substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/701—Integrated with dissimilar structures on a common substrate
- Y10S977/72—On an electrically conducting, semi-conducting, or semi-insulating substrate
- Y10S977/721—On a silicon substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/724—Devices having flexible or movable element
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US767039 | 1985-08-19 | ||
US10/767,039 US7211844B2 (en) | 2004-01-29 | 2004-01-29 | Vertical field effect transistors incorporating semiconducting nanotubes grown in a spacer-defined passage |
PCT/EP2005/050128 WO2005076382A1 (en) | 2004-01-29 | 2005-01-13 | Vertical field effect transistors incorporating semiconducting nanotubes grown in a spacer-defined passage |
Publications (2)
Publication Number | Publication Date |
---|---|
DE602005005302D1 true DE602005005302D1 (de) | 2008-04-24 |
DE602005005302T2 DE602005005302T2 (de) | 2009-03-12 |
Family
ID=34807627
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602005005302T Active DE602005005302T2 (de) | 2004-01-29 | 2005-01-13 | Vertikal-feldeffekttransistoren mit in einem abstandsschichtdefinierten durchgang aufgewachsenen halbleitenden nanoröhren |
Country Status (11)
Country | Link |
---|---|
US (2) | US7211844B2 (de) |
EP (1) | EP1709700B1 (de) |
JP (1) | JP4521409B2 (de) |
KR (1) | KR100974162B1 (de) |
CN (1) | CN100568573C (de) |
AT (1) | ATE389242T1 (de) |
DE (1) | DE602005005302T2 (de) |
IL (1) | IL177126A (de) |
RU (1) | RU2338683C2 (de) |
TW (1) | TWI335669B (de) |
WO (1) | WO2005076382A1 (de) |
Families Citing this family (47)
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US7374793B2 (en) * | 2003-12-11 | 2008-05-20 | International Business Machines Corporation | Methods and structures for promoting stable synthesis of carbon nanotubes |
US7038299B2 (en) | 2003-12-11 | 2006-05-02 | International Business Machines Corporation | Selective synthesis of semiconducting carbon nanotubes |
US20050167655A1 (en) * | 2004-01-29 | 2005-08-04 | International Business Machines Corporation | Vertical nanotube semiconductor device structures and methods of forming the same |
US7211844B2 (en) | 2004-01-29 | 2007-05-01 | International Business Machines Corporation | Vertical field effect transistors incorporating semiconducting nanotubes grown in a spacer-defined passage |
US7829883B2 (en) | 2004-02-12 | 2010-11-09 | International Business Machines Corporation | Vertical carbon nanotube field effect transistors and arrays |
US8075863B2 (en) * | 2004-05-26 | 2011-12-13 | Massachusetts Institute Of Technology | Methods and devices for growth and/or assembly of nanostructures |
US7109546B2 (en) | 2004-06-29 | 2006-09-19 | International Business Machines Corporation | Horizontal memory gain cells |
US7233071B2 (en) | 2004-10-04 | 2007-06-19 | International Business Machines Corporation | Low-k dielectric layer based upon carbon nanostructures |
US7268077B2 (en) * | 2005-12-02 | 2007-09-11 | Intel Corporation | Carbon nanotube reinforced metallic layer |
US7713858B2 (en) * | 2006-03-31 | 2010-05-11 | Intel Corporation | Carbon nanotube-solder composite structures for interconnects, process of making same, packages containing same, and systems containing same |
US8785058B2 (en) * | 2006-04-07 | 2014-07-22 | New Jersey Institute Of Technology | Integrated biofuel cell with aligned nanotube electrodes and method of use thereof |
CN101573797B (zh) * | 2006-09-04 | 2011-01-26 | 皇家飞利浦电子股份有限公司 | 互连结构中的碳纳米结构生长的控制 |
US7964143B2 (en) | 2007-06-20 | 2011-06-21 | New Jersey Institute Of Technology | Nanotube device and method of fabrication |
US8546027B2 (en) * | 2007-06-20 | 2013-10-01 | New Jersey Institute Of Technology | System and method for directed self-assembly technique for the creation of carbon nanotube sensors and bio-fuel cells on single plane |
US7736979B2 (en) * | 2007-06-20 | 2010-06-15 | New Jersey Institute Of Technology | Method of forming nanotube vertical field effect transistor |
KR100927634B1 (ko) * | 2007-09-07 | 2009-11-20 | 한국표준과학연구원 | 멀티 게이트 나노튜브 소자의 제조 방법 및 그 소자 |
US7892956B2 (en) * | 2007-09-24 | 2011-02-22 | International Business Machines Corporation | Methods of manufacture of vertical nanowire FET devices |
US8624224B2 (en) | 2008-01-24 | 2014-01-07 | Nano-Electronic And Photonic Devices And Circuits, Llc | Nanotube array bipolar transistors |
CN101905877B (zh) * | 2009-06-02 | 2013-01-09 | 清华大学 | 碳纳米管膜的制备方法 |
CN101993055B (zh) * | 2009-08-14 | 2013-02-13 | 清华大学 | 碳纳米管膜先驱、碳纳米管膜及其制备方法 |
TWI417238B (zh) * | 2009-08-25 | 2013-12-01 | Hon Hai Prec Ind Co Ltd | 奈米碳管膜先驅、奈米碳管膜及其製備方法 |
US8350360B1 (en) | 2009-08-28 | 2013-01-08 | Lockheed Martin Corporation | Four-terminal carbon nanotube capacitors |
US8405189B1 (en) * | 2010-02-08 | 2013-03-26 | Lockheed Martin Corporation | Carbon nanotube (CNT) capacitors and devices integrated with CNT capacitors |
KR101927415B1 (ko) | 2012-11-05 | 2019-03-07 | 삼성전자주식회사 | 나노갭 소자 및 이로부터의 신호를 처리하는 방법 |
US10654718B2 (en) * | 2013-09-20 | 2020-05-19 | Nantero, Inc. | Scalable nanotube fabrics and methods for making same |
EP3053185A4 (de) * | 2013-10-03 | 2017-05-17 | Intel Corporation | Interne abstandshalter für nanodraht-transistoren und verfahren zur herstellung davon |
RU2601044C2 (ru) * | 2015-02-04 | 2016-10-27 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Тамбовский государственный технический университет" ФГБОУ ВПО ТГТУ | Способ формирования углеродных нанообъектов на ситалловых подложках |
US9899529B2 (en) | 2015-11-09 | 2018-02-20 | Samsung Electronics Co., Ltd. | Method to make self-aligned vertical field effect transistor |
TWI729457B (zh) | 2016-06-14 | 2021-06-01 | 美商應用材料股份有限公司 | 金屬及含金屬化合物之氧化體積膨脹 |
TWI719262B (zh) | 2016-11-03 | 2021-02-21 | 美商應用材料股份有限公司 | 用於圖案化之薄膜的沉積與處理 |
EP3539154A4 (de) * | 2016-11-08 | 2020-06-03 | Applied Materials, Inc. | Geometrische steuerung von aufwärtssäulen für musterungsanwendungen |
TW201839897A (zh) | 2017-02-22 | 2018-11-01 | 美商應用材料股份有限公司 | 自對準接觸圖案化之臨界尺寸控制 |
US10636659B2 (en) | 2017-04-25 | 2020-04-28 | Applied Materials, Inc. | Selective deposition for simplified process flow of pillar formation |
US10840186B2 (en) | 2017-06-10 | 2020-11-17 | Applied Materials, Inc. | Methods of forming self-aligned vias and air gaps |
TW201906035A (zh) | 2017-06-24 | 2019-02-01 | 美商微材料有限責任公司 | 生產完全自我對準的介層窗及觸點之方法 |
TWI760540B (zh) * | 2017-08-13 | 2022-04-11 | 美商應用材料股份有限公司 | 自對準高深寬比結構及製作方法 |
US10510602B2 (en) | 2017-08-31 | 2019-12-17 | Mirocmaterials LLC | Methods of producing self-aligned vias |
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US10600688B2 (en) | 2017-09-06 | 2020-03-24 | Micromaterials Llc | Methods of producing self-aligned vias |
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KR100360476B1 (ko) | 2000-06-27 | 2002-11-08 | 삼성전자 주식회사 | 탄소나노튜브를 이용한 나노 크기 수직 트랜지스터 및 그제조방법 |
DE10036897C1 (de) * | 2000-07-28 | 2002-01-03 | Infineon Technologies Ag | Feldeffekttransistor, Schaltungsanordnung und Verfahren zum Herstellen eines Feldeffekttransistors |
KR100751736B1 (ko) | 2000-11-01 | 2007-08-27 | 도꾸리쯔교세이호징 가가꾸 기쥬쯔 신꼬 기꼬 | 포인트 컨택트 어레이, not 회로, 및 이를 이용한 전자회로 |
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DE10250984A1 (de) | 2002-10-29 | 2004-05-19 | Hahn-Meitner-Institut Berlin Gmbh | Feldeffekttransistor sowie Verfahren zu seiner Herstellung |
DE10250830B4 (de) | 2002-10-31 | 2015-02-26 | Qimonda Ag | Verfahren zum Herstellung eines Schaltkreis-Arrays |
KR100790859B1 (ko) | 2002-11-15 | 2008-01-03 | 삼성전자주식회사 | 수직 나노튜브를 이용한 비휘발성 메모리 소자 |
KR100493166B1 (ko) | 2002-12-30 | 2005-06-02 | 삼성전자주식회사 | 수직나노튜브를 이용한 메모리 |
US6933222B2 (en) * | 2003-01-02 | 2005-08-23 | Intel Corporation | Microcircuit fabrication and interconnection |
WO2004105140A1 (ja) | 2003-05-22 | 2004-12-02 | Fujitsu Limited | 電界効果トランジスタ及びその製造方法 |
US7038299B2 (en) | 2003-12-11 | 2006-05-02 | International Business Machines Corporation | Selective synthesis of semiconducting carbon nanotubes |
US7374793B2 (en) | 2003-12-11 | 2008-05-20 | International Business Machines Corporation | Methods and structures for promoting stable synthesis of carbon nanotubes |
US7211844B2 (en) | 2004-01-29 | 2007-05-01 | International Business Machines Corporation | Vertical field effect transistors incorporating semiconducting nanotubes grown in a spacer-defined passage |
US20050167655A1 (en) | 2004-01-29 | 2005-08-04 | International Business Machines Corporation | Vertical nanotube semiconductor device structures and methods of forming the same |
US7829883B2 (en) | 2004-02-12 | 2010-11-09 | International Business Machines Corporation | Vertical carbon nanotube field effect transistors and arrays |
-
2004
- 2004-01-29 US US10/767,039 patent/US7211844B2/en active Active
-
2005
- 2005-01-03 TW TW094100049A patent/TWI335669B/zh not_active IP Right Cessation
- 2005-01-13 DE DE602005005302T patent/DE602005005302T2/de active Active
- 2005-01-13 CN CNB2005800020485A patent/CN100568573C/zh active Active
- 2005-01-13 AT AT05701511T patent/ATE389242T1/de not_active IP Right Cessation
- 2005-01-13 JP JP2006550157A patent/JP4521409B2/ja not_active Expired - Fee Related
- 2005-01-13 WO PCT/EP2005/050128 patent/WO2005076382A1/en active IP Right Grant
- 2005-01-13 EP EP05701511A patent/EP1709700B1/de active Active
- 2005-01-13 KR KR1020067015013A patent/KR100974162B1/ko not_active IP Right Cessation
- 2005-01-13 RU RU2006130863/28A patent/RU2338683C2/ru not_active IP Right Cessation
- 2005-07-13 US US11/180,415 patent/US7329567B2/en not_active Expired - Fee Related
-
2006
- 2006-07-27 IL IL177126A patent/IL177126A/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE602005005302T2 (de) | 2009-03-12 |
RU2006130863A (ru) | 2008-03-10 |
US20050167740A1 (en) | 2005-08-04 |
WO2005076382A1 (en) | 2005-08-18 |
ATE389242T1 (de) | 2008-03-15 |
JP4521409B2 (ja) | 2010-08-11 |
EP1709700B1 (de) | 2008-03-12 |
KR20060125845A (ko) | 2006-12-06 |
JP2007520073A (ja) | 2007-07-19 |
CN1910767A (zh) | 2007-02-07 |
EP1709700A1 (de) | 2006-10-11 |
IL177126A (en) | 2010-06-30 |
RU2338683C2 (ru) | 2008-11-20 |
TW200537687A (en) | 2005-11-16 |
TWI335669B (en) | 2011-01-01 |
CN100568573C (zh) | 2009-12-09 |
US20050266627A1 (en) | 2005-12-01 |
KR100974162B1 (ko) | 2010-08-04 |
US7211844B2 (en) | 2007-05-01 |
US7329567B2 (en) | 2008-02-12 |
IL177126A0 (en) | 2006-12-10 |
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