DE602004017400D1 - Lithographischer Apparat und Methode zur Herstellung einer Vorrichtung - Google Patents

Lithographischer Apparat und Methode zur Herstellung einer Vorrichtung

Info

Publication number
DE602004017400D1
DE602004017400D1 DE602004017400T DE602004017400T DE602004017400D1 DE 602004017400 D1 DE602004017400 D1 DE 602004017400D1 DE 602004017400 T DE602004017400 T DE 602004017400T DE 602004017400 T DE602004017400 T DE 602004017400T DE 602004017400 D1 DE602004017400 D1 DE 602004017400D1
Authority
DE
Germany
Prior art keywords
making
lithographic apparatus
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602004017400T
Other languages
English (en)
Inventor
Arno Jan Bleeker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of DE602004017400D1 publication Critical patent/DE602004017400D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/03—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/12—Function characteristic spatial light modulator
DE602004017400T 2003-11-07 2004-11-03 Lithographischer Apparat und Methode zur Herstellung einer Vorrichtung Active DE602004017400D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03257056 2003-11-07

Publications (1)

Publication Number Publication Date
DE602004017400D1 true DE602004017400D1 (de) 2008-12-11

Family

ID=34610135

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004017400T Active DE602004017400D1 (de) 2003-11-07 2004-11-03 Lithographischer Apparat und Methode zur Herstellung einer Vorrichtung

Country Status (7)

Country Link
US (2) US7196772B2 (de)
JP (2) JP4397791B2 (de)
KR (1) KR100592826B1 (de)
CN (1) CN100517073C (de)
DE (1) DE602004017400D1 (de)
SG (1) SG112084A1 (de)
TW (1) TWI265382B (de)

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US7196772B2 (en) * 2003-11-07 2007-03-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060088076A1 (en) * 2004-10-25 2006-04-27 Yoram Lubianiker Operational range designation and enhancement in optical readout of temperature
US7268357B2 (en) * 2005-05-16 2007-09-11 Taiwan Semiconductor Manufacturing Company, Ltd. Immersion lithography apparatus and method
KR100764061B1 (ko) * 2006-12-04 2007-10-08 삼성전자주식회사 이미지 센서 및 그 형성 방법
WO2009050976A1 (en) * 2007-10-16 2009-04-23 Nikon Corporation Illumination optical system, exposure apparatus, and device manufacturing method
CN101681125B (zh) * 2007-10-16 2013-08-21 株式会社尼康 照明光学系统、曝光装置以及元件制造方法
EP2219077A1 (de) 2009-02-12 2010-08-18 Carl Zeiss SMT AG Projektionsbelichtungsverfahren, Projektionsbelichtungssystem und Projektionsobjektiv
NL2004852A (en) * 2009-06-30 2011-01-04 Asml Netherlands Bv Lithographic apparatus and an array of reflective elements.
US8318409B2 (en) * 2009-10-21 2012-11-27 GM Global Technology Operations LLC Dynamic masking method for micro-truss foam fabrication
FR2959025B1 (fr) * 2010-04-20 2013-11-15 St Microelectronics Rousset Procede et dispositif de photolithographie
NL2024009A (en) * 2018-10-18 2020-05-07 Asml Netherlands Bv Control of optical modulator
WO2023172228A2 (en) * 2022-03-07 2023-09-14 Istanbul Medipol Universitesi A photolithography method and system

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US3946370A (en) * 1972-11-02 1976-03-23 U.S. Philips Corporation Method of making light-dot distribution for the holographic storage of binary information with the aid of electronically controlled switching masks
JPS5987436A (ja) 1982-11-11 1984-05-21 Matsushita Electric Ind Co Ltd 光バルブ
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JPS61190935A (ja) * 1985-02-20 1986-08-25 Hitachi Ltd 露光装置
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US4786128A (en) 1986-12-02 1988-11-22 Quantum Diagnostics, Ltd. Device for modulating and reflecting electromagnetic radiation employing electro-optic layer having a variable index of refraction
US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
WO1991017483A1 (de) 1990-05-02 1991-11-14 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Belichtungsvorrichtung
JPH0536586A (ja) * 1991-08-02 1993-02-12 Canon Inc 像投影方法及び該方法を用いた半導体デバイスの製造方法
US5229872A (en) 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
US6219015B1 (en) 1992-04-28 2001-04-17 The Board Of Directors Of The Leland Stanford, Junior University Method and apparatus for using an array of grating light valves to produce multicolor optical images
JP3224041B2 (ja) 1992-07-29 2001-10-29 株式会社ニコン 露光方法及び装置
US5729331A (en) 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
JP3339149B2 (ja) 1993-12-08 2002-10-28 株式会社ニコン 走査型露光装置ならびに露光方法
JP3541327B2 (ja) * 1994-09-26 2004-07-07 富士通株式会社 露光装置
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JPH08250387A (ja) * 1995-03-08 1996-09-27 Mitsubishi Electric Corp 縮小投影露光装置
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WO1997034171A2 (en) 1996-02-28 1997-09-18 Johnson Kenneth C Microlens scanner for microlithography and wide-field confocal microscopy
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US6177980B1 (en) 1997-02-20 2001-01-23 Kenneth C. Johnson High-throughput, maskless lithography system
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
US5982553A (en) 1997-03-20 1999-11-09 Silicon Light Machines Display device incorporating one-dimensional grating light-valve array
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SE9800665D0 (sv) 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
US6798550B1 (en) * 1999-11-18 2004-09-28 Corning Applied Technologies Corporation Spatial light modulator
TW520526B (en) 2000-05-22 2003-02-11 Nikon Corp Exposure apparatus, method for manufacturing thereof, method for exposing and method for manufacturing micro-device
US6464692B1 (en) 2000-06-21 2002-10-15 Luis Antonio Ruiz Controllable electro-optical patternable mask, system with said mask and method of using the same
JP3563384B2 (ja) 2001-11-08 2004-09-08 大日本スクリーン製造株式会社 画像記録装置
CN1332267C (zh) 2002-06-12 2007-08-15 Asml荷兰有限公司 光刻装置和器件的制造方法
JP3613342B2 (ja) * 2002-08-27 2005-01-26 独立行政法人科学技術振興機構 マスクレス露光装置
US6870554B2 (en) 2003-01-07 2005-03-22 Anvik Corporation Maskless lithography with multiplexed spatial light modulators
US7061591B2 (en) * 2003-05-30 2006-06-13 Asml Holding N.V. Maskless lithography systems and methods utilizing spatial light modulator arrays
EP1482373A1 (de) 2003-05-30 2004-12-01 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
EP1530092B1 (de) 2003-11-07 2008-10-29 ASML Netherlands B.V. Lithographischer Apparat und Methode zur Herstellung einer Vorrichtung
US7196772B2 (en) 2003-11-07 2007-03-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
KR100592826B1 (ko) 2006-06-26
JP4397791B2 (ja) 2010-01-13
CN1614514A (zh) 2005-05-11
JP2005150714A (ja) 2005-06-09
CN100517073C (zh) 2009-07-22
KR20050044295A (ko) 2005-05-12
JP4860674B2 (ja) 2012-01-25
US20050118528A1 (en) 2005-06-02
TWI265382B (en) 2006-11-01
SG112084A1 (en) 2005-06-29
US7196772B2 (en) 2007-03-27
JP2009021618A (ja) 2009-01-29
US20070165203A1 (en) 2007-07-19
US7826035B2 (en) 2010-11-02
TW200527151A (en) 2005-08-16

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