DE60119421D1 - Lithographisches Gerät und Maskenträger - Google Patents

Lithographisches Gerät und Maskenträger

Info

Publication number
DE60119421D1
DE60119421D1 DE60119421T DE60119421T DE60119421D1 DE 60119421 D1 DE60119421 D1 DE 60119421D1 DE 60119421 T DE60119421 T DE 60119421T DE 60119421 T DE60119421 T DE 60119421T DE 60119421 D1 DE60119421 D1 DE 60119421D1
Authority
DE
Germany
Prior art keywords
mask carrier
lithographic device
lithographic
mask
carrier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60119421T
Other languages
English (en)
Other versions
DE60119421T2 (de
Inventor
Dijsseldonk Antonius Johan Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Application granted granted Critical
Publication of DE60119421D1 publication Critical patent/DE60119421D1/de
Publication of DE60119421T2 publication Critical patent/DE60119421T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/703—Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates
DE60119421T 2000-03-24 2001-03-21 Lithographisches Gerät und Maskenträger Expired - Fee Related DE60119421T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP00302420 2000-03-24
EP00302420 2000-03-24

Publications (2)

Publication Number Publication Date
DE60119421D1 true DE60119421D1 (de) 2006-06-14
DE60119421T2 DE60119421T2 (de) 2006-11-16

Family

ID=8172819

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60119421T Expired - Fee Related DE60119421T2 (de) 2000-03-24 2001-03-21 Lithographisches Gerät und Maskenträger

Country Status (5)

Country Link
US (1) US6597434B2 (de)
JP (1) JP3984428B2 (de)
KR (1) KR100546862B1 (de)
DE (1) DE60119421T2 (de)
TW (1) TW508653B (de)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004523906A (ja) * 2000-10-12 2004-08-05 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム 室温かつ低圧マイクロおよびナノ転写リソグラフィのためのテンプレート
DE10115915A1 (de) * 2001-03-30 2002-10-02 Zeiss Carl Vorrichtung zur Justierung von Einrichtungen und zum Einstellen von Verstellwegen
US6712132B1 (en) * 2001-10-26 2004-03-30 Revvie A. Green Piezoelectric wafer clamping system
EP1311007A1 (de) 2001-11-07 2003-05-14 ASML Netherlands B.V. Piezoelektrischer Aktor, lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
US6803994B2 (en) * 2002-06-21 2004-10-12 Nikon Corporation Wavefront aberration correction system
US6897940B2 (en) * 2002-06-21 2005-05-24 Nikon Corporation System for correcting aberrations and distortions in EUV lithography
US6842277B2 (en) * 2002-07-23 2005-01-11 Nikon Corporation Deformable mirror with high-bandwidth servo for rigid body control
SG110196A1 (en) 2003-09-22 2005-04-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7414701B2 (en) 2003-10-03 2008-08-19 Asml Holding N.V. Method and systems for total focus deviation adjustments on maskless lithography systems
JP2005153091A (ja) * 2003-11-27 2005-06-16 Hitachi Ltd 転写方法及び転写装置
US6950176B1 (en) * 2004-01-12 2005-09-27 Advanced Micro Devices, Inc. Method and system for monitoring EUV lithography mask flatness
US7126674B2 (en) * 2004-06-14 2006-10-24 Asml Netherlands B.V. Positioning device and device manufacturing method
US7196775B2 (en) * 2004-08-23 2007-03-27 Asml Holding N.V. Patterned mask holding device and method using two holding systems
US20060077579A1 (en) * 2004-10-12 2006-04-13 Margeson Christopher S Force actuator with clamp
US7239368B2 (en) * 2004-11-29 2007-07-03 Asml Netherlands B.V. Using unflatness information of the substrate table or mask table for decreasing overlay
KR101332035B1 (ko) * 2004-12-22 2013-11-22 가부시키가이샤 니콘 마스크 표면의 높이 방향 위치 측정 방법, 노광 장치 및노광 방법
KR100723483B1 (ko) * 2005-02-03 2007-05-31 삼성전자주식회사 레티클 로딩장치 및 로딩방법
JP4667140B2 (ja) * 2005-06-30 2011-04-06 キヤノン株式会社 露光装置およびデバイス製造方法
DE102005057860A1 (de) * 2005-12-03 2007-06-06 Carl Zeiss Smt Ag Objektiv, insbesondere Projektionsobjektiv für die Halbleiterlithographie
US7675607B2 (en) * 2006-07-14 2010-03-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7817252B2 (en) * 2006-09-29 2010-10-19 Intel Corporation Holder for carrying a photolithography mask in a flattened condition
US7853067B2 (en) 2006-10-27 2010-12-14 Asml Holding N.V. Systems and methods for lithographic reticle inspection
US7936960B2 (en) * 2006-11-09 2011-05-03 Corning Cable Systems Llc Optical fiber slack storage for splice trays and splice assemblies
JP4985392B2 (ja) * 2007-12-28 2012-07-25 株式会社ニコン 基板保持装置、露光装置およびデバイスの製造方法
JP2009302149A (ja) * 2008-06-10 2009-12-24 Nikon Corp 露光装置およびデバイスの製造方法
NL2006190A (en) * 2010-03-11 2011-09-13 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP2012033920A (ja) * 2010-07-29 2012-02-16 Nikon Corp 露光装置及び露光方法、並びにデバイス製造方法
KR102058515B1 (ko) * 2013-04-18 2019-12-24 삼성디스플레이 주식회사 증착장치, 이를 이용한 유기발광 디스플레이 장치 제조 방법 및 유기발광 디스플레이 장치

Family Cites Families (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4059346A (en) 1976-06-30 1977-11-22 Grumman Aerospace Corporation Controlled focus mirror with rim controlled flexure
US4091274A (en) 1976-12-22 1978-05-23 United Technologies Corporation Active laser mirror system
US4203654A (en) 1977-11-10 1980-05-20 The United States Of America As Represented By The Secretary Of The Air Force Line-of-sight stabilization reflector assembly
US4492431A (en) 1982-05-04 1985-01-08 United Technologies Corporation Pressure actuated deformable mirror
US4516832A (en) 1982-06-23 1985-05-14 International Business Machines Corporation Apparatus for transformation of a collimated beam into a source of _required shape and numerical aperture
JPS60177316A (ja) 1984-02-24 1985-09-11 Ngk Spark Plug Co Ltd 光偏向装置
US4619508A (en) 1984-04-28 1986-10-28 Nippon Kogaku K. K. Illumination optical arrangement
US4917484A (en) 1984-05-15 1990-04-17 Rockwell International Corporation High-performance dynamic mount for laser-beam steering mirror and actuating motor therefor
US4708420A (en) 1984-05-24 1987-11-24 The Commonwealth Of Australia Focal plane scanning device
US4773748A (en) 1984-10-09 1988-09-27 Hughes Aircraft Company Dynamically controlled mirror for reduction of projected image distortion
DE3542154A1 (de) 1984-12-01 1986-07-10 Ngk Spark Plug Co Lichtumlenkvorrichtung
US4726671A (en) 1986-06-19 1988-02-23 The Perkin-Elmer Corporation High resonance adjustable mirror mount
US4939630A (en) 1986-09-09 1990-07-03 Nikon Corporation Illumination optical apparatus
DE3642128A1 (de) 1986-12-10 1988-06-16 Zeiss Carl Fa Unterstuetzungssystem fuer teleskopspiegel
US4918583A (en) 1988-04-25 1990-04-17 Nikon Corporation Illuminating optical device
JP2690960B2 (ja) * 1988-09-07 1997-12-17 株式会社日立製作所 拡大投影露光方法及びその装置
US4959531A (en) 1989-09-29 1990-09-25 Eastman Kodak Company Alignment sensing and correcting assembly for an optical element
US5151809A (en) 1990-07-10 1992-09-29 Carl-Zeiss-Stiftung Mirror support arrangement for a primary mirror of a telescope
JP2986534B2 (ja) 1990-11-01 1999-12-06 トヨタ自動車株式会社 オシレートミラー装置
US5204784A (en) 1990-12-06 1993-04-20 The United States Of America As Represented By The Secretary Of The Air Force Deformable mirror with pneumatic actuator pre-load
JP3360686B2 (ja) 1990-12-27 2002-12-24 株式会社ニコン 照明光学装置および投影露光装置並びに露光方法および素子製造方法
JPH04369209A (ja) 1991-06-17 1992-12-22 Nikon Corp 露光用照明装置
CA2075026A1 (en) 1991-08-08 1993-02-09 William E. Nelson Method and apparatus for patterning an imaging member
JPH05217855A (ja) 1992-02-01 1993-08-27 Nikon Corp 露光用照明装置
JP3075381B2 (ja) 1992-02-17 2000-08-14 株式会社ニコン 投影露光装置及び転写方法
WO1993025929A1 (en) 1992-06-08 1993-12-23 United Technologies Corporation Coaxial integrated deformable mirror actuator/retraction arrangement
JPH06138403A (ja) 1992-10-21 1994-05-20 Xerox Corp 画像装置
US5320918A (en) 1992-12-31 1994-06-14 At&T Bell Laboratories Optical lithographical imaging system including optical transmission diffraction devices
US5434697A (en) 1994-07-27 1995-07-18 Litton Systems, Inc. Deformable mirror system having replaceable actuators
US5535043A (en) 1994-08-22 1996-07-09 Hughes Aircraft Company Replaceable actuator assembly for optical mirror with kinematic mount
FR2732081B1 (fr) 1995-03-24 1997-05-16 Giat Ind Sa Verin support de structures lourdes et fragiles, tel un miroir de telescope
JP3345526B2 (ja) 1995-05-01 2002-11-18 三菱電機株式会社 物体駆動制御装置および物体駆動制御方法
US5684566A (en) 1995-05-24 1997-11-04 Svg Lithography Systems, Inc. Illumination system and method employing a deformable mirror and diffractive optical elements
US5828690A (en) 1995-12-18 1998-10-27 General Electric Company Unitary body laser head
SE9800665D0 (sv) * 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
US6188502B1 (en) 1998-03-26 2001-02-13 Nec Corporation Laser pointing apparatus and on-fulcrum drive apparatus
US5986795A (en) 1998-06-15 1999-11-16 Chapman; Henry N. Deformable mirror for short wavelength applications
US6411426B1 (en) 2000-04-25 2002-06-25 Asml, Us, Inc. Apparatus, system, and method for active compensation of aberrations in an optical system
US6398373B1 (en) 2000-08-09 2002-06-04 Asml Us, Inc. Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems

Also Published As

Publication number Publication date
JP2001297982A (ja) 2001-10-26
DE60119421T2 (de) 2006-11-16
TW508653B (en) 2002-11-01
US20010026358A1 (en) 2001-10-04
KR20010093056A (ko) 2001-10-27
KR100546862B1 (ko) 2006-01-25
US6597434B2 (en) 2003-07-22
JP3984428B2 (ja) 2007-10-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee