DE60021449D1 - Photopolymerisationsinitiator für Farbfilter, Farbzusammensetzung und Farbfilter - Google Patents

Photopolymerisationsinitiator für Farbfilter, Farbzusammensetzung und Farbfilter

Info

Publication number
DE60021449D1
DE60021449D1 DE60021449T DE60021449T DE60021449D1 DE 60021449 D1 DE60021449 D1 DE 60021449D1 DE 60021449 T DE60021449 T DE 60021449T DE 60021449 T DE60021449 T DE 60021449T DE 60021449 D1 DE60021449 D1 DE 60021449D1
Authority
DE
Germany
Prior art keywords
color filter
photopolymerization initiator
color
composition
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60021449T
Other languages
English (en)
Other versions
DE60021449T2 (de
Inventor
Tsuyoshi Katoh
Tomonari Ogata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP4974299A external-priority patent/JP2000249822A/ja
Application filed by Showa Denko KK filed Critical Showa Denko KK
Publication of DE60021449D1 publication Critical patent/DE60021449D1/de
Application granted granted Critical
Publication of DE60021449T2 publication Critical patent/DE60021449T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
DE60021449T 1999-02-26 2000-02-25 Photopolymerisationsinitiator für Farbfilter, Farbzusammensetzung und Farbfilter Expired - Lifetime DE60021449T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP4974299 1999-02-26
JP4974299A JP2000249822A (ja) 1999-02-26 1999-02-26 カラーフィルタ用光重合開始剤、感光性着色組成物およびカラーフィルタ
US13244999P 1999-05-04 1999-05-04
US132449P 1999-05-04

Publications (2)

Publication Number Publication Date
DE60021449D1 true DE60021449D1 (de) 2005-09-01
DE60021449T2 DE60021449T2 (de) 2006-05-24

Family

ID=26390193

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60021449T Expired - Lifetime DE60021449T2 (de) 1999-02-26 2000-02-25 Photopolymerisationsinitiator für Farbfilter, Farbzusammensetzung und Farbfilter

Country Status (5)

Country Link
US (1) US6455207B1 (de)
EP (1) EP1031579B1 (de)
KR (1) KR100644847B1 (de)
AT (1) ATE300558T1 (de)
DE (1) DE60021449T2 (de)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
CA2374944A1 (en) 1999-06-10 2000-12-21 Nigel Hacker Spin-on-glass anti-reflective coatings for photolithography
AU2002227106A1 (en) 2001-11-15 2003-06-10 Honeywell International Inc. Spin-on anti-reflective coatings for photolithography
KR100976995B1 (ko) * 2002-02-28 2010-08-19 쇼와 덴코 가부시키가이샤 티올 화합물, 광중합 개시제 조성물 및 감광성 조성물
JP4393051B2 (ja) * 2002-10-15 2010-01-06 昭和電工株式会社 ヘキサアリールビイミダゾール化合物およびそれを含む光重合開始剤組成物
AU2003269489A1 (en) * 2002-10-15 2004-05-04 Showa Denko K. K. Hexaarylbiimidazole compounds and photopolymerization initiator compositions containing the same
JP2004198542A (ja) * 2002-12-16 2004-07-15 Showa Denko Kk カラーフィルターブラックマトリックスレジスト組成物及びその組成物に用いる感光性組成物
JP2004198717A (ja) * 2002-12-18 2004-07-15 Showa Denko Kk カラーフィルターブラックマトリックスレジスト組成物及びその組成物に用いるカーボンブラック分散液組成物
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
JP4378163B2 (ja) * 2003-12-16 2009-12-02 東洋インキ製造株式会社 カラーフィルタ用青色着色組成物およびカラーフィルタ
WO2005103823A1 (en) * 2004-04-23 2005-11-03 Showa Denko K.K. Photosensitive composition for black matrix
JP4315892B2 (ja) * 2004-11-25 2009-08-19 東京応化工業株式会社 感光性樹脂組成物、およびこれを用いた感光性ドライフィルム
TW200736834A (en) * 2005-12-27 2007-10-01 Kansai Paint Co Ltd Active energy ray-curable resin composition and method for forming resist pattern
KR101059316B1 (ko) * 2006-08-23 2011-08-24 쇼와 덴코 가부시키가이샤 티오우레탄 화합물 및 감광성 수지 조성물
US8053167B2 (en) * 2006-11-21 2011-11-08 Showa Denko K.K. Curable compositions containing hydroxythiol compound, and cured products thereof
KR20090122184A (ko) * 2007-01-12 2009-11-26 도판 인사츠 가부시키가이샤 착색 조성물, 컬러 필터, 및 그의 제조 방법
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US8298452B2 (en) * 2007-02-26 2012-10-30 Dai Nippon Printing Co., Ltd. Negative type resist composition for color filter, color filter using same, and liquid crystal display
KR101374056B1 (ko) * 2008-01-10 2014-03-12 동우 화인켐 주식회사 컬러필터 인쇄용 잉크 조성물, 컬러필터 및 컬러필터를구비한 액정표시장치
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8575234B2 (en) 2010-09-06 2013-11-05 Samsung Display Co., Ltd. Ink composition, and method of forming pattern, color filter and method of preparing color filter using the same
KR101290249B1 (ko) 2010-09-06 2013-07-30 삼성디스플레이 주식회사 잉크 조성물, 이를 이용한 패턴 형성방법, 컬러필터 및 이의 제조방법
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
KR101958343B1 (ko) * 2011-12-16 2019-03-15 쓰리본드 화인 케미칼 가부시키가이샤 경화성 수지조성물
EP3194502A4 (de) 2015-04-13 2018-05-16 Honeywell International Inc. Polysiloxanformulierungen und beschichtungen für optoelektronische anwendungen
CN108779191B (zh) * 2016-03-07 2021-06-22 昭和电工株式会社 活性能量射线固化性组合物及其固化物
KR102071023B1 (ko) * 2017-09-27 2020-01-29 동우 화인켐 주식회사 터치 센서 및 이의 제조방법
JP7318533B2 (ja) * 2018-01-19 2023-08-01 株式会社レゾナック カラーフィルター用感光性樹脂組成物、カラーフィルター、画像表示素子及びカラーフィルターの製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4917977A (en) * 1988-12-23 1990-04-17 E. I. Du Pont De Nemours And Company Visible sensitizers for photopolymerizable compositions
US5176984A (en) * 1989-10-25 1993-01-05 The Mead Corporation Photohardenable compositions containing a borate salt
JP3195480B2 (ja) * 1993-12-09 2001-08-06 富士写真フイルム株式会社 遮光性感光性樹脂組成物、遮光性感光性転写材料及び遮光膜の形成方法
AU717137B2 (en) * 1995-11-24 2000-03-16 Ciba Specialty Chemicals Holding Inc. Borate coinitiators for photopolymerization
JPH10316708A (ja) * 1997-05-22 1998-12-02 Showa Denko Kk 光硬化性組成物及び色戻り防止方法
DE69817471T2 (de) * 1997-06-30 2004-07-01 Showa Denko K.K. Fotopolymerisierbare Zusammensetzung und trockener Filmresist
ATE255585T1 (de) * 1997-08-26 2003-12-15 Showa Denko Kk Stabilisator für organoboratsalze und diese enthaltende photoempfindliche zusammensetzung
US6207726B1 (en) * 1998-02-13 2001-03-27 Showa Denko Kabushiki Kaisha Photocurable prepreg composition and production method thereof
KR100563923B1 (ko) * 1998-07-14 2006-08-14 쇼와 덴코 가부시키가이샤 유기 붕산염의 안정화제 및 이를 함유하는 감광성 조성물

Also Published As

Publication number Publication date
DE60021449T2 (de) 2006-05-24
EP1031579A3 (de) 2000-12-06
US6455207B1 (en) 2002-09-24
KR20010006704A (ko) 2001-01-26
ATE300558T1 (de) 2005-08-15
EP1031579B1 (de) 2005-07-27
EP1031579A2 (de) 2000-08-30
KR100644847B1 (ko) 2006-11-13

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