DE60007287T2 - Verfahren und vorrichtung zum beschichten mittels bogenentladung - Google Patents

Verfahren und vorrichtung zum beschichten mittels bogenentladung Download PDF

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Publication number
DE60007287T2
DE60007287T2 DE60007287T DE60007287T DE60007287T2 DE 60007287 T2 DE60007287 T2 DE 60007287T2 DE 60007287 T DE60007287 T DE 60007287T DE 60007287 T DE60007287 T DE 60007287T DE 60007287 T2 DE60007287 T2 DE 60007287T2
Authority
DE
Germany
Prior art keywords
reactant
plasma
coating
substrate
depositing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60007287T
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English (en)
Other versions
DE60007287D1 (de
Inventor
Dominic Iacovangelo
Milton Borst
Calvin Jerabek
Peter Marzano
Lee-Mean Yang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SABIC Global Technologies BV
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Application granted granted Critical
Publication of DE60007287D1 publication Critical patent/DE60007287D1/de
Publication of DE60007287T2 publication Critical patent/DE60007287T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32422—Arrangement for selecting ions or species in the plasma
DE60007287T 1999-03-17 2000-02-04 Verfahren und vorrichtung zum beschichten mittels bogenentladung Expired - Lifetime DE60007287T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/271,655 US6365016B1 (en) 1999-03-17 1999-03-17 Method and apparatus for arc plasma deposition with evaporation of reagents
PCT/US2000/003028 WO2000055388A2 (en) 1999-03-17 2000-02-04 Method and apparatus for arc deposition

Publications (2)

Publication Number Publication Date
DE60007287D1 DE60007287D1 (de) 2004-01-29
DE60007287T2 true DE60007287T2 (de) 2004-10-21

Family

ID=23036497

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60007287T Expired - Lifetime DE60007287T2 (de) 1999-03-17 2000-02-04 Verfahren und vorrichtung zum beschichten mittels bogenentladung

Country Status (6)

Country Link
US (1) US6365016B1 (de)
EP (1) EP1161574B1 (de)
JP (1) JP4733273B2 (de)
AT (1) ATE256763T1 (de)
DE (1) DE60007287T2 (de)
WO (1) WO2000055388A2 (de)

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Also Published As

Publication number Publication date
ATE256763T1 (de) 2004-01-15
DE60007287D1 (de) 2004-01-29
JP4733273B2 (ja) 2011-07-27
JP2003518553A (ja) 2003-06-10
EP1161574A1 (de) 2001-12-12
EP1161574B1 (de) 2003-12-17
US6365016B1 (en) 2002-04-02
WO2000055388A3 (en) 2001-06-28
WO2000055388A2 (en) 2000-09-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: SABIC INNOVATIVE PLASTICS IP B.V., BERGEN OP Z, NL

8328 Change in the person/name/address of the agent

Representative=s name: PATENT- UND RECHTSANWAELTE BARDEHLE, PAGENBERG, DO